1391 - 1410 |
Surface-Science Aspects of Vacuum Microelectronics Schwoebel PR, Brodie I |
1411 - 1414 |
Distinct Imaging of the Nucleic-Acid Bases on SrTiO3(100) Surface by Scanning-Tunneling-Microscopy Tanaka H, Kawai T |
1415 - 1422 |
Lattice and Defect Structures of Polymerizable Diacetylene Langmuir-Blodgett-Films Studied by Scanning Force Microscopy Vithana H, Johnson D, Shih R, Mann JA, Lando J |
1423 - 1428 |
Local Modification of N-Si(100) Surface in Aqueous-Solutions Under Anodic and Cathodic Potential Polarization with an in-Situ Scanning Tunneling Microscope Ye JH, Perezmurano F, Barniol N, Abadal G, Aymerich X |
1429 - 1433 |
Novel Fabrication Process Utilizing Thermal-Stress for Uniform Ultrafine SiO2 Gaps with Perfectly Vertical Sidewalls Nishibe T |
1434 - 1441 |
Surface-Topography of Phosphorus-Doped Polysilicon Hegde RI, Paulson WM, Tobin PJ |
1442 - 1446 |
A Study of Silicon Epitaxial-Growth on Silicon Substrates Exposed to Ar Electron-Cyclotron-Resonance Plasmas Buaud PP, Hu YZ, Spanos L, Irene EA, Christensen KN, Venables D, Maher DM |
1447 - 1450 |
Reactive Ion Etching of Silicon Oxynitride Formed by Plasma-Enhanced Chemical-Vapor-Deposition Ueno K, Kikkawa T, Tokashiki K |
1451 - 1455 |
Electron-Cyclotron-Resonance Plasma-Etching of Silicon Dioxide for Deep-Submicron Ultralarge Scale Integrations Nojiri K, Iguchi E |
1456 - 1459 |
Vertical Etching of Thick SiO2 Using C2F6-Based Reactive Ion-Beam Etching Dutta AK |
1460 - 1465 |
Vapor-Phase SiO2 Etching and Metallic Contamination Removal in an Integrated Cluster System Ma Y, Green ML, Feldman LC, Sapjeta J, Hanson KJ, Weidman TW |
1466 - 1472 |
Dry Sequential Process of Photochemical Etching and Surface Passivation of In0.52Al0.48As Using HBr and H2S Habibi S, Totsuka M, Tanaka J, Matsumoto S |
1473 - 1476 |
Fabrication of Sub-10-nm Silicon Lines with Minimum Fluctuation Namatsu H, Nagase M, Kurihara K, Iwadate K, Furuta T, Murase K |
1477 - 1483 |
Exposure Strategies for Polymethyl Methacrylate from in-Situ X-Ray-Absorption Near-Edge Structure Spectroscopy Zhang X, Jacobsen C, Lindaas S, Williams S |
1484 - 1495 |
Metrology of Subwavelength Photoresist Gratings Using Optical Scatterometry Raymond CJ, Murnane MR, Naqvi SS, Mcneil JR |
1496 - 1507 |
Improved Focusing-and-Deflection Columns Mui PH, Szilagyi M |
1508 - 1513 |
Transverse Chromatic Aberration in a Symmetrical Magnetic Doublet with Dynamically Compensated Field Aberrations Nakasuji M, Shimizu H |
1514 - 1518 |
Combining Transmission Electron-Microscopy with Focused Ion-Beam Sputtering for Microstructural Investigations of AlGaAs/GaAs Heterojunction Bipolar-Transistors Snyder CW, Frei MR, Bahnck D, Hopkins L, Hull R, Harriott L, Chiu TY, Fullowan T, Tseng B |
1519 - 1525 |
Effects of Interface States on Submicron GaAs Metal-Semiconductor Field-Effect Transistors Assessed by Gate Leakage Current Ahmed MM, Ahmed H, Ladbrooke PH |
1526 - 1528 |
Observation of 1.5 Mu-M Quantum-Confined Stark-Effect in InGaAs/AlGaAs Multiple-Quantum Wells on GaAs Substrates Kim SD, Trezza JA, Harris JS |
1529 - 1535 |
In-Situ Etching and Regrowth Process for Edge-Emitting and Surface-Emitting Laser-Diodes with an AlGaAs/GaAs Buried Heterostructure Ogura M |
1536 - 1538 |
Compositional Disordering of AlGaAs/GaAs Superlattices by Using the Low-Temperature-Grown GaAs Tsang JS, Lee CP, Fan JC, Tsai KL, Chen HR |
1539 - 1545 |
Preparation of InSb Substrates for Molecular-Beam Epitaxy Liu WK, Yuen WT, Stradling RA |
1546 - 1555 |
Analysis of Electromigration-Induced Failures in High-Temperature Sputtered Al-Alloy Metallization Onoda H, Hashimoto K, Touchi K |
1556 - 1559 |
Benign Making of Sharp Tips for STM and FIM - Pt, Ir, Au, Pd, and Rh Nam AJ, Teren A, Lusby TA, Melmed AJ |
1560 - 1562 |
Thermal-Stability of Rapidly Annealed Indium Tin Oxide N-GaAs Heterostructures Eftekhari G |
1565 - 1565 |
Papers from the 22nd Annual Conference on the Physics and Chemistry of Semiconductor Interfaces - 8-12 January 1995, Holiday Inn and Conference Center, Old-Town, Scottsdale, Arizona - Preface Dow JD, Allen RE, Aspnes DE |
1566 - 1570 |
High-Brightness Light-Emitting-Diodes Grown by Molecular-Beam Epitaxy on ZnSe Substrates Eason DB, Yu Z, Hughes WC, Boney C, Cook JW, Schetzina JF, Black DR, Cantwell G, Harsch WC |
1571 - 1577 |
Molecular-Beam Epitaxy Growth and Properties of GaN Films on GaN/SiC Substrates Hughes WC, Rowland WH, Johnson MA, Fujita S, Cook JW, Schetzina JF, Ren J, Edmond JA |
1578 - 1581 |
Electron-Microscopy Characterization of GaN Films Grown by Molecular-Beam Epitaxy on Sapphire and SiC Lilientalweber Z, Sohn H, Newman N, Washburn J |
1582 - 1584 |
Electrical Characterization of Single Barrier GaAs/GaN/GaAs Heterostructures Huang X, Cheng TS, Hooper SE, Foster TJ, Jenkins LC, Wang J, Foxon CT, Orton JW, Eaves L, Main PC |
1585 - 1590 |
Auger-Electron Spectroscopy, X-Ray-Diffraction, and Scanning Electron-Microscopy of Inn, GaN, and Ga(Asn) Films on Gap and GaAs(001) Substrates Jenkins LC, Cheng TS, Foxon CT, Hooper SE, Orton JW, Novikov SV, Tretyakov VV |
1591 - 1596 |
Na/Carbon-Rich Beta-SiC(100) Surface - Initial Interface Formation and Metallization Semond F, Soukiassian P, Mangat PS, Dicioccio L |
1597 - 1601 |
Microscopic Picture of Si(113) - A Novel Surface Reconstruction, the Origin of Defects, and the Process of Adsorption - Theoretical and Experimental-Study Dabrowski J, Mussig HJ, Wolff G |
1602 - 1607 |
Measurements of Local Strain Variation in Si1-xGex/Si Heterostructures Bell LD, Kaiser WJ, Manion SJ, Milliken AM, Pike WT, Fathauer RW |
1608 - 1612 |
Roughness Analysis of Si/SiGe Heterostructures Feenstra RM, Lutz MA, Stern F, Ismail K, Mooney PM, Legoues FK, Stanis C, Chu JO, Meyerson BS |
1613 - 1617 |
Hydrogen-Bonding Arrangements at Si-SiO2 Interfaces Jing Z, Lucovsky G, Whitten JL |
1618 - 1625 |
Initial Oxidation of Silicon(100) - A Unified Chemical-Model for Thin and Thick Oxide-Growth Rates and Interfacial Structure Whidden TK, Thanikasalam P, Rack MJ, Ferry DK |
1626 - 1629 |
Effects of Growth Temperature on the SiO2/Si(100) Interface Structure Lu ZH, Graham MJ, Tay SP, Jiang DT, Tan KH |
1630 - 1634 |
Scaling of Si/SiO2 Interface Roughness Yoshinobu T, Iwamoto A, Sudoh K, Iwasaki H |
1635 - 1638 |
Band Discontinuities at Heterojunctions Between Crystalline and Amorphous-Silicon Vandewalle CG, Yang LH |
1639 - 1644 |
Homoepitaxy and Controlled Oxidation of Silicon at Low-Temperatures Using Low-Energy Ion-Beams Albayati AH, Todorov SS, Boyd KJ, Marton D, Rabalais JW, Kulik J |
1645 - 1652 |
Stability of CaF2/Si(111) and Al/CaF2/Si(111) Interface Systems Studied with Photoelectron-Spectroscopy and Scanning-Tunneling-Microscopy Wen HJ, Dahneprietsch M, Bauer A, Manke I, Kaindl G |
1653 - 1656 |
Oxygen-Associated Defects Near Si-SiO2 Interfaces in Porous Si and Their Role in Photoluminescence Carlos WE, Prokes SM |
1657 - 1665 |
Formation of the CeSix/Si(111) Interface Manke I, Wen HJ, Hohr A, Bauer A, Dahneprietsch M, Kaindl G |
1666 - 1671 |
Hydrogen-Induced Modification of the Optical-Properties of the GaAs(100) Surface Esser N, Santos PV, Kuball M, Cardona M, Arens M, Pahlke D, Richter W, Stietz F, Schaefer JA, Fimland BO |
1672 - 1678 |
Surface Ordering on GaAs(100) by Indium-Termination Reschesser U, Esser N, Springer C, Zegenhagen J, Richter W, Cardona M, Fimland BO |
1679 - 1683 |
Scanning-Tunneling-Microscopy of the Reaction of NH3 with GaAs(110) Brown G, Weimer M |
1684 - 1688 |
Ballistic-Electron-Emission Microscopy of Strained and Relaxed In0.35Ga0.65As/AlAs Interfaces Ke ML, Westwood DI, Wilks S, Heghoyan S, Kestle A, Matthai CC, Richardson BE, Williams RH |
1689 - 1693 |
Study of Interface Asymmetry in InAs-GaSb Heterojunctions Wang MW, Collins DA, Mcgill TC, Grant RW, Feenstra RM |
1694 - 1704 |
Generation of Degradation Defects, Stacking-Faults, and Misfit Dislocations in ZnSe-Based Films Grown on GaAs Kuo LH, Salamancariba L, Wu BJ, Haugen GM, Depuydt JM, Hofler G, Cheng H |
1705 - 1710 |
Deep-Level Formation at ZnSe/GaAs(100) Interfaces Raisanen AD, Brillson LJ, Vanzetti L, Bonanni A, Franciosi A |
1711 - 1714 |
Study of Reconstruction at Interfaces of CdSe/ZnTe Superlattices by Total-Energy Calculations Ren SF, Gu ZQ, Chang YC |
1715 - 1727 |
First Principles Studies of Band Offsets at Heterojunctions and of Surface Reconstruction Using Gaussian Dual-Space Density-Functional Theory Chen XJ, Mintz A, Hu JS, Hua XL, Zinck J, Goddard WA |
1728 - 1735 |
Strain Dependence of the Valence-Band Offset in Arsenide Compound Heterojunctions Determined by Photoelectron-Spectroscopy Ohler C, Moers J, Forster A, Luth H |
1736 - 1739 |
Explanation of the Origin of Electrons in the Unintentionally Doped InAs/AlSb System Shen J, Goronkin H, Dow JD, Ren SY |
1740 - 1743 |
Fabrication of Sub-50-nm Gate Length N-Metal-Oxide-Semiconductor Field-Effect Transistors and Their Electrical Characteristics Ono M, Saito M, Yoshitomi T, Fiegna C, Ohguro T, Momose HS, Iwai H |
1744 - 1750 |
Fabrication and Characterization of Quantum-Wire Transistors with Schottky Inplane Gates Formed by an in-Situ Electrochemical Process Hasegawa H, Hashizume T, Okada H, Jinushi K |
1751 - 1754 |
Direct Sublattice Imaging of Semiconductor-Materials Mcgibbon AJ, Chisholm MF, Pennycook SJ |
1755 - 1759 |
Annealing-Induced Near-Surface Ordering in Disordered Ga0.5In0.5P Luo JS, Olson JM, Wu MC |
1760 - 1765 |
Optical Studies of Heterointerfacial Growth Interrupts in Type-II GaAs/AlAs Superlattices by Time-Resolved Photoluminescence Imaging Chang T, Fu LP, Bacalzo FT, Gilliland GD, Wolford DJ, Bajaj KK, Antonelli A, Chen R, Klem J, Hafich M |
1766 - 1772 |
Influence of GaAs(001) Substrate Misorientation Towards (111) on the Optical-Properties of InxGa1-xAs/GaAs Rich DH, Rammohan K, Tang Y, Lin HT, Goldman RS, Wieder HH, Kavanagh KL |
1773 - 1779 |
Effects of Interface Flatness and Abruptness on Optical and Electrical Characteristics of GaAs/AlGaAs Quantum Structures Grown by Metalorganic Vapor-Phase Epitaxy Shinohara M, Yokoyama H, Inoue N |
1780 - 1787 |
Characterizing Wearout, Breakdown, and Trap Generation in Thin Silicon-Oxide Dumin DJ, Maddux JR, Subramoniam R, Scott RS, Vanchinathan S, Dumin NA, Dickerson KJ, Mopuri S, Gladstone SM, Hughes TW |
1788 - 1793 |
Reliability of Nitrided Si-SiO2 Interfaces Formed by a New, Low-Temperature, Remote-Plasma Process Lee DR, Parker CG, Hauser J, Lucovsky G |
1794 - 1800 |
Silicon Interlayer Based Surface Passivation of Near-Surface Quantum-Wells Kodama S, Koyanagi S, Hashizume T, Hasegawa H |
1801 - 1804 |
Long-Term and Thermal-Stability of Hydrogen Ion-Passivated AlGaAs/GaAs Near-Surface Quantum-Wells Chang YL, Yi SI, Shi S, Hu E, Weinberg WH, Merz J |
1805 - 1809 |
Ge/Si Heterostructures Grown by Sn-Surfactant-Mediated Molecular-Beam Epitaxy Lin XW, Lilientalweber Z, Washburn J, Weber ER, Sasaki A, Wakahara A, Hasegawa T |
1810 - 1815 |
Hydrogen Desorption from Si - How Does This Relate to Film Growth Greenlief CM, Armstrong M |
1816 - 1819 |
Surface-Roughness and Pattern-Formation During Homoepitaxial Growth of Ge(001) at Low-Temperatures Vannostrand JE, Chey SJ, Cahill DG |
1820 - 1823 |
Surface-Chemistry Evolution During Molecular-Beam Epitaxy Growth of InGaAs Evans KR, Kaspi R, Ehret JE, Skowronski M, Jones CR |
1824 - 1829 |
Influence of Various Growth-Parameters on the Interface Abruptness of AlAs/GaAs Short-Period Superlattices Smith AR, Chao KJ, Shih CK, Shih YC, Anselm KA, Streetman BG |
1830 - 1840 |
Hot-Electron Transport Through Metal-Oxide-Semiconductor Structures Studied by Ballistic-Electron-Emission Spectroscopy Ludeke R, Bauer A, Cartier E |
1841 - 1847 |
Calculation of the Average Interface Field in Inversion-Layers Using Zero-Temperature Greens-Function Formalism Vasileska D, Bordone P, Eldridge T, Ferry DK |
1848 - 1852 |
In-Situ Ballistic-Carrier Spectroscopy on Epitaxial CoSi2/Si(111) and Si(100) Sirringhaus H, Lee EY, Kafader U, Vonkanel H |
1853 - 1858 |
Gate-Controlled Modulation of Charge-Transport in Long-Channel, Delta-Doped, Heterojunction Hall-Bar Structures Wieder HH, Goldman RS, Chen JH, Young AP |
1861 - 1861 |
Papers from the Topical Conference on Manufacturing Science and Technology - 24-27 October 1994, Colorado Convention Center, Denver, Colorado - Preface Rubloff GW, Liehr M |
1862 - 1866 |
Experimental Validation of a Direct Simulation by Monte-Carlo Molecular Gas-Flow Model Shufflebotham PK, Bartel TJ, Berney B |
1867 - 1874 |
Optimization of Intermetal Dielectric Deposition Module Using Simulation Li JL, Mcvittie JP, Ferziger J, Saraswat KC, Dong J |
1875 - 1878 |
Experimental and Simulation Studies of Thermal Flow of Borophosphosilicate and Phosphosilicate Glasses Thallikar G, Liao H, Cale TS, Myers FR |
1879 - 1882 |
Factory of the Future - The Whole Factory View Harrell S |
1883 - 1887 |
Photocatalytic Oxidation for Point-of-Use Abatement of Volatile Organic-Compounds in Microelectronics Manufacturing Raupp GB |
1888 - 1892 |
Subatmospheric Chemical-Vapor-Deposition Ozone/Teos Process for SiO2 Trench Filling Shareef IA, Rubloff GW, Anderle M, Gill WN, Cotte J, Kim DH |
1893 - 1899 |
Profile Modeling of High-Density Plasma Oxide Etching Han JS, Mcvittie JP, Zheng J |
1900 - 1905 |
Development of a Multitask and Multiinstrument Sample Transfer System Thevuthasan S, Baer DR, Englehard MH, Liang Y, Worthington JN, Howard TR, Munn JR, Rounds KS |
1906 - 1909 |
Long-Throw Low-Pressure Sputtering Technology for Very Large-Scale Integrated Devices Motegi N, Kashimoto Y, Nagatani K, Takahashi S, Kondo T, Mizusawa Y, Nakayama I |
1910 - 1916 |
Manufacturing Issues of Electrostatic Chucks Wright DR, Chen L, Federlin P, Forbes K |
1917 - 1923 |
Process-Control in Semiconductor Manufacturing Butler SW |
1924 - 1927 |
Real-Time Process and Product Diagnostics in Rapid Thermal Chemical-Vapor-Deposition Using in-Situ Mass-Spectrometric Sampling Tedder LL, Rubloff GW, Shareef I, Anderle M, Kim DH, Parsons GN |