1187 - 1202 |
Gas-induced current decay of molybdenum field emitter arrays Reuss RH, Chalamala BR |
1203 - 1209 |
Redeposition of etch products on sidewalls during SiO2 etching in a fluorocarbon plasma. 11. Effects of source power and bias voltage in a CF4 plasma Min JH, Hwang SW, Lee GR, Moon SH |
1210 - 1215 |
Redeposition of etch products on sidewalls during SiO2 etching in a fluorocarbon plasma. III. Effects of O-2 addition to CF4 plasma Min JH, Hwang SW, Lee GR, Moon SH |
1216 - 1223 |
Electron emission from nanotips of amorphous diamond Kan MC, Huang JL, Sung JC, Lii DF |
1224 - 1229 |
Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthosilicate films Lan JK, Wang YL, Chao CG, Lo K, Cheng YL |
1230 - 1239 |
Enhanced field emission from chemically etched and electropolished broad-area niobium Wang T, Reece CE, Sundelin RM |
1240 - 1247 |
Fabrication of controlled sidewall angles in thin films using isotropic etches Ponoth SS, Agarwal NT, Persans PD, Plawsky JL |
1248 - 1253 |
Plasma molding over deep trenches and the resulting ion and energetic neutral distributions Kim D, Economou DJ |
1254 - 1257 |
Conductance imaging of thermally desorbed silicon oxide Park JY, Phaneuf RJ |
1258 - 1264 |
Temperature-dependent inelastic response of passivated copper films: Experiments, analyses, and implications Shen YL, Ramamurty U |
1265 - 1267 |
High-resolution scanning tunneling microscopy imaging of Escherichia coli lysine transfer ribonucleic acid Nishimura M, Tanaka H, Kawai T |
1268 - 1272 |
Etch mechanism and etch-induced effects in the inductively coupled plasma etching of GaN Cheung R, Rong B, van der Drift E, Sloof WG |
1273 - 1277 |
Inductively coupled plasma reactive ion etching of ZnO using BCI3-based plasmas Kim HK, Bae JW, Kim TK, Kim KK, Seong TY, Adesida I |
1278 - 1285 |
Transition from sub-Poissonian to super-Poissonian shot noise in planar cold cathodes Krishnan R, Cahay M |
1286 - 1290 |
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang GJ |
1291 - 1296 |
Field emission electroluminescence on diamond and carbon nanotube films Kim U, Aslam DM |
1297 - 1300 |
Scanning tunneling microscopy and spectroscopy studies of the oxide nanofilms on the stainless steel surface Chung ON, Chung SM |
1301 - 1305 |
Rectifying characteristics of sputter-deposited SiGe diodes Ru GP, Wang GW, Jiang YL, Huang W, Qu XP, Zhu SY, Li BZ |
1306 - 1313 |
Rapid thermal annealing effects on the electrical behavior of plasma oxidized silicon/silicon nitride stacks gate insulators San Andres E, del Prado A, Martil I, Gonzalez-Diaz G, Martinez FL |
1314 - 1317 |
Modeling of vacancy flux due to stress-induced migration Aoyagi M |
1318 - 1322 |
Embossing of polymers using a thermosetting polymer mold made by soft lithography Xing R, Wang Z, Han YC |
1323 - 1328 |
Copper blocking ability of nitrogen-incorporated silicon oxide film Takeda K, Ryuzaki D, Mine T, Hinode K, Yoneyama R |
1329 - 1334 |
Reliability retention in in situ pyrolytic-gas passivated ultrathin silicon oxide gate films oxidized at 700 degrees C Yamada H |
1335 - 1343 |
Initial phases of CuInS2-Si heteroepitaxy Calvet W, Pettenkofer C, Lewerenz HJ |
1344 - 1349 |
Etching characteristics of porous silica (k=1.9) in neutral loop discharge plasma Morikawa Y, Mizutani N, Ozawa M, Hayashi T, Chen W, Uchida T |
1350 - 1356 |
Growth of M-plane GaN films on gamma-LiAlO2(100) with high phase purity Sun YJ, Brandt O, Ploog KH |
1357 - 1360 |
Field emission induced fabrication of nanostructures on Au thin films using a noncontact mode atomic force microscope Park KH, Kim J, Ha JS, Song KB |
1361 - 1363 |
Lithography-free fabrication of sub-100 nm structures by self-aligned plasma etching of silicon dioxide layers and silicon Georgiev G, Muller-Wiegand M, Georgieva A, Ludolph K, Oesterschulze E |
1364 - 1368 |
Electrical characterization Of SiO2/n-GaN metal-insulator-semiconductor diodes Nakano Y, Jimbo T |
1369 - 1374 |
Three-dimensional measurement and analysis of the light emitted from Ne-Xe (4%) alternating current plasma display panel by an optical method Choi HY, Lee SH, Lee SG |
1375 - 1379 |
Silicon carbide formation by methane plasma immersion ion implantation into silicon An ZH, Fu RKY, Chen P, Liu WL, Chu PK, Lin CL |
1380 - 1383 |
Integrating vertically aligned carbon nanotubes on micromechanical structures Teh WH, Smith CG, Teo KBK, Lacerda RG, Amaratunga GAJ, Milne WI, Castignolles M, Loiseau A |
1384 - 1390 |
Hybrid deposition of sputtered and evaporated multilayer thin films Martin PM, Olsen LC, Johnston JW, Depoy DM |
1391 - 1402 |
Fundamental beam studies of deuterium and fluorine radical reaction kinetics on surfaces Greer F, Fraser D, Coburn JW, Graves DB |
1403 - 1410 |
Polyelectrolyte effects in model photoresist developer solutions Prabhu VM, Jones RL, Lin EK, Wu WL |
1411 - 1414 |
Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect Sim HS, Kim SI, Kim YT |
1415 - 1421 |
Characteristics and mechanism of inductive coupled plasma etching of hydrogenated amorphous silicon carbide films Choi WK, Shi J, Chor EF |
1422 - 1427 |
Depth profiling for ultrashallow implants using backside secondary ion mass spectrometry Hongo C, Tomita M, Takenaka M, Suzuki M, Murakoshi A |
1428 - 1432 |
Effects of treatment parameters in electric-field-enhanced postexposure bake Cheng M, Poppe J, Neureuther A |
1433 - 1436 |
Investigation of protein adsorption with simultaneous measurements of atomic force microscope and quartz crystal microbalance Choi KH, Friedt JM, Laureyn W, Frederix F, Campitelli A, Borghs G |
1437 - 1441 |
Synthesis of aligned bamboo-like carbon nanotubes using radio frequency magnetron sputtering Lee KY, Ikuno T, Tsuji K, Ohkura S, Honda S, Katayama M, Oura K, Hirao T |
1442 - 1448 |
Selective sublimation processing of a molybdenum-tungsten mixed oxide thin film Ferroni M, Guidi V, Comini E, Sberveglieri G, Vomiero A, Della Mea G, Martinelli G |
1449 - 1452 |
Two processing techniques to sandwich a 100 nm GaAs layer between ferromagnetic metallic electrodes Aziz A, Smith CG, Winiecki GP, Beere HE, Ritchie DA |
1453 - 1458 |
Electron-beam lithography for thick refractive optical elements in SU-8 Shields EA, Williamson F, Leger JR |
1459 - 1465 |
Temperature cycling and control system for photosensitive materials processing El-Awady K, Schaper CD, Kailath T |
1466 - 1471 |
Effect of NH3 thermal treatment on an atomic layer deposited on tungsten films and formation of W-B-N Byun JS, Mak A, Zhang A, Yoon A, Zhang T, Gelatos A, Jackson R, Thakur R, Lee SY, Kim H |
1472 - 1475 |
Detection of antibody peptide interaction using microcantilevers as surface stress sensors Kim BH, Mader O, Weimar U, Brock R, Kern DP |
1476 - 1481 |
Ferromagnetism in Mn- and Co-implanted ZnO nanorods Ip K, Frazier RM, Heo YW, Norton DP, Abernathy CR, Pearton SJ, Kelly J, Rairigh R, Hebard AF, Zavada JM, Wilson RG |
1482 - 1486 |
Impact of quantum well intermixing on polarization anisotropy of InGaAs/InGaAsP quantum well modulators Ng SL, Djie HS, Lim HS, Lam YL, Chan YC, Dowd P, Ooi BS, Aimez V, Beauvais J, Beerens J |
1487 - 1490 |
Characterization of advanced complementary metal-oxide-semiconductor processes with reverse secondary ion mass spectrometry profiling Jiang ZX, Lerma J, Lee JJ, Sieloff D, Chen S, Beck J, Backer S, Taylor W, Tseng H, Tobin P, Svedberg L |
1491 - 1495 |
Pattern multiplication method and the uniformity of nanoscale multiple lines Chung KH, Choi WY, Sung SK, Kim DH, Lee JD, Park BG |
1496 - 1500 |
Downstream oxygen etching characteristics of polymers from the parylene family Callahan RRA, Pruden KG, Raupp GB, Beaudoin SP |
1501 - 1504 |
Low resistance Ohmic contacts to n-GaN by Ar plasma and forming gas ambient treatments Lee CC, Lee CP, Yeh MH, Lee WI, Kuo CT |
1505 - 1510 |
Method on surface roughness modification to alleviate stiction of microstructures Lee CC, Hsu W |
1511 - 1512 |
Electron cyclotron resonance plasma etching of GaSb in Cl-2/BCl3/CH4/Ar/H-2 at room temperature Langer JP, Dutta PS |
1513 - 1515 |
In situ x-ray photoelectron spectroscopy measurement during Ta deposition on low-k dielectric SiLK (TM) Uchibori CJ, Kimura T |
1518 - 1518 |
An International Journal Devoted to Microelectronics and Nanometer Structures - Processing, Measurement, and Phenomena - Preface Binh VT, Blavette D |
1519 - 1523 |
Current-voltage characteristics of nonplanar cold field emitters Edgcombe CJ, Johansen AM |
1524 - 1527 |
In situ analyzer of electron emission properties: Fowler-Nordheim plotter and Seppen-Katamuki plotter Gotoh Y, Ishizu K, Tsuji H, Ishikawa J |
1528 - 1544 |
Electron emission theory and its application: Fowler-Nordheim equation and beyond Jensen KL |
1545 - 1549 |
Simulations of transport and field-emission properties of carbon nanotubes Mayer A, Miskovsky NM, Cutler PH |
1550 - 1555 |
Model parameter extraction for nonlinear Fowler-Nordheim field emission data Nicolaescu D, Nagao M, Filip V, Kanemaru S, Itoh J |
1556 - 1559 |
Photoelectric properties of nanostructural carbonaceous films containing Ni nanocrystals investigated by picosecond laser-induced photoelectric charge emission Vouagner D, Czerwosz E, Champagnon B, Wronka H, Girardeau-Montaut JP |
1560 - 1565 |
Fabrication of a self-aligned microtip field emission array Forrest RD, Cox DC, Tang YF, Shannon JM, Silva SRP |
1566 - 1569 |
Fabrication and characteristics of lateral type GaN field-emission arrays using metalorganic chemical vapor deposition Lee JH, Lee MB, Hahm SH, Lee JH, Kim JS, Choi KM, Kim YH |
1570 - 1573 |
Study of micro-glow discharges as ion sources for ion mobility spectrometry Longwitz RG, van Lintel H, Renaud P |
1574 - 1580 |
Emission fluctuation and slope-intercept plot characterization of Pt and transition metal carbide field-emission cathodes in limited current regimes Mackie WA, Southall LA, Xie TB, Cabe GL, Charbonnier FM, McClelland PH |
1581 - 1585 |
Emission uniformity improvement of Si field emitter arrays by surface modification Nagao M, Nicolaescu D, Matsukawa T, Kanemaru S, Itoh J, Koga K, Kawase T, Honda K, Norikane T |
1586 - 1588 |
Diode structure amorphous selenium photodetector with nitrogen (N)-doped diamond cold cathode Oonuki K, Suzuki Y, Yamaguchi H, Okano K, Okamura Y |
1589 - 1593 |
Fabrication and characterization of HfC coated Si field emitter arrays Sato T, Yamamoto S, Nagao M, Matsukawa T, Kanemaru S, Itoh J |
1594 - 1597 |
Submicron poly-Si gate Si field-emitter array for generation of a collimated electron beam Shimawaki H, Shibuya S, Mimura H, Yokoo K |
1598 - 1601 |
Optimization of Pt tip field emitter array fabricated using focused ion and electron beams Jarupoonphol W, Murakami K, Sakata K, Takai M, Hosono A, Okuda S |
1602 - 1606 |
Stable field emission from W tips in poor vacuum conditions Tondare VN, van Druten NJ, Hagen CW, Kruit P |
1607 - 1611 |
Measurement of work function of transition metal nitride and carbide thin films Gotoh Y, Tsuji H, Ishikawa J |
1612 - 1615 |
Electron emission from porous silicon planar emitters Mimura H, Miyajima K, Yokoo K |
1616 - 1617 |
Emission characteristics of ultrathin layer solid-state emitters, temperature, and thickness dependence Nakane H, Dupin JP, Binh VT |
1618 - 1621 |
Efficiency of cathodoluminescent phosphors for a field-emission light source application Chubun NN, Chakhovskoi AG, Hunt CE |
1622 - 1628 |
Deterioration of ZnS-type and Eu3+-activated phosphors for high-voltage field-emission displays Kajiwara K |
1629 - 1632 |
Application of holographic diffusers to improve light uniformity of source with carbon fiber cathodes Baturin AS, Chadaev NN, Leshukov MY, Sheshin EP, Chakhovskoi AG |
1633 - 1639 |
Role of nanostructure on electron field emission from amorphous carbon thin films Carey JD, Forrest RD, Poa CH, Silva SRP |
1640 - 1643 |
Electron field emission properties of carbon nanotubes grown on nickel caps Cheng HF, Tsau YM, Chen YC, Hsieh YS, Lin IN |
1644 - 1647 |
Effect of oxygen on field emission properties of ultrananocrystalline diamond-coated ungated Si tip arrays Ding MQ, Auciello O, Carlisle JA, Gruen DM |
1648 - 1654 |
Computer simulation of the field emission properties of multiwalled carbon nanotubes for flat panel displays Hu Y, Huang CH |
1655 - 1659 |
Excellent field emission from carbon nanotubes grown by microwave-heated chemical vapor deposition Huang JH, Chuang CC, Tsai CH, Chen WJ |
1660 - 1664 |
Field emission characteristics of multiwalled carbon nanotubes grown at low temperatures using electron cyclotron resonance chemical vapor deposition Woo YS, Jeon DY, Han IT, Park YJ, Kim HJ, Jung JE, Kim JM, Lee NS |
1665 - 1670 |
Modeling of the transistor characteristics of a monolithic diamond vacuum triode Wisitsora-at A, Kang WP, Davidson JL, Li C, Kerns DV, Howell M |
1671 - 1674 |
High current diamond field emission diode Wisitsora-at A, Kang WP, Davidson JL, Howell M, Hofmeister W, Kerns DV |
1675 - 1679 |
Fabrication of triode field emitter with planar carbon-nanoparticle cathode Park KH, Seo WJ, Lee S, Koh KH |
1680 - 1683 |
Simulation of triode-type field emitters with thin-film cathodes Park KH, Lee S, Koh KH |
1684 - 1687 |
Field emission characteristics of nodular carbon nanotubes Li Q, Xu JF, Yu K, Zhu ZQ, Feng T, Wang X, Liu XH, Kang WP, Davidson JL |
1688 - 1691 |
Electron field emission properties of carbon nanotubes converted from nanodiamonds Lin IN, Teng MY, Liu KS, Hsu T, Huang JH, Tsai CH, Cheng HF |
1692 - 1699 |
Sequential tunneling model of field emission through dielectric deposits on nanotips Filip V, Nicolaescu D, Tanemura M, Okuyama F |
1700 - 1704 |
Energy spectra of field emission electrons from multiwalled carbon nanotubes Oshima C, Matsuda K, Kona T, Mogami Y, Yamashita T, Saito Y, Hata K, Takakura A |
1705 - 1709 |
Selective growth of carbon nanotubes on Si microfabricated tips and application for electron field emitters Minh PN, Tuyen LTT, Ono T, Miyashita H, Suzuki Y, Mimura H, Esashi M |
1710 - 1714 |
Effects of stress on electron emission from nanostructured carbon materials Poa CHP, Lacerda RG, Cox DC, Marques FC, Silva SRP |
1715 - 1719 |
Field emission from nonaligned carbon nanotube-polymer matrix cathodes Poa CHP, Smith RC, Silva SRP, Watts PCP, Hsu WK, Kroto HW, Walton DRM |
1720 - 1726 |
Field emission and growth characteristics of carbon nanotubes with optical emission spectroscopy analysis in C2H4 and CO deposition systems Han JH, Lee TY, Yoo JB, Park CY, Jung T, Kim JM, Yu S, Yi W |
1727 - 1729 |
Flat-panel luminescent lamp using carbon nanotube cathodes Chen J, Liang XH, Deng SZ, Xu NS |
1730 - 1733 |
Broad area electron emission from oxygen absorbed homoepitaxially grown nitrogen (N)-doped chemical vapor deposited diamond (111) surface Yamaguchi H, Mine T, Suzuki Y, Okano K, Yamada T, Sawabe A |
1734 - 1737 |
Field emission from screen-printed carbon nanotubes irradiated by tunable ultraviolet laser in different atmospheres Zhao WJ, Kawakami N, Sawada A, Takai M |
1738 - 1741 |
Gated carbon-based cold cathode for high current applications Jamison KD, Zollars BG, Patterson DE, Schueller R, Windischmann H, Mulhollan GA, Kloba A |
1744 - 1744 |
Papers from the 30th Conference on the Physics and Chemistry of Semiconductor Interfaces - Preface Dow JD, Aspnes DE |
1745 - 1748 |
Pulsed laser deposition growth of Fe3O4 on III-V semiconductors for spin injection Preisler EJ, Brooke J, Oldham NC, McGill TC |
1749 - 1755 |
Cobalt growth on InGaP(001)(2X4): Interface formation Ludge K, Vogt P, Braun W, Richter W, Esser N |
1756 - 1759 |
Structural and magnetic properties of (Ga,Mn)N layers grown on SiC by reactive molecular beam epitaxy Ploog KH, Dhar S, Trampert A |
1760 - 1764 |
Self-assembled CoAs nanostructures Farrell HH, LaViolette RA, Schultz BD, Ludge K, Palmstrom CJ |
1765 - 1772 |
Towards understanding epitaxial growth of alternative high-K dielectrics on Si(001): Application to praseodymium oxide Fissel A, Osten HJ, Bugiel E |
1773 - 1776 |
Selective growth of TiO2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods Kang BC, Lee JH, Chae HY, Jung DY, Lee SB, Boo JH |
1777 - 1782 |
Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures Ulrich MD, Hong JG, Rowe JE, Lucovsky G, Chan ASY, Madey TE |
1783 - 1791 |
Spectroscopic study of chemical phase separation in zirconium silicate alloys Rayner GB, Kang D, Lucovsky G |
1792 - 1797 |
Bonding and structure of ultrathin yttrium oxide films for Si field effect transistor gate dielectric applications Ulrich MD, Rowe JE, Niu D, Parsons GN |
1798 - 1803 |
Application of the simplified bond-hyperpolarizability model to fourth-harmonic generation Hansen JK, Peng HJ, Aspnes DE |
1804 - 1811 |
Polarity control during molecular beam epitaxy growth of Mg-doped GaN Green DS, Haus E, Wu F, Chen L, Mishra UK, Speck JS |
1812 - 1817 |
Plasma-assisted molecular beam epitaxy of GaN on porous SiC substrates with varying porosity Sagar A, Lee CD, Feenstra RM, Inoki CK, Kuan TS |
1818 - 1821 |
Influence of AlN buffer on electronic properties and dislocation microstructure of AlGaN/GaN grown by molecular beam epitaxy on SiC Simpkins BS, Yu ET |
1822 - 1824 |
Reflection high-energy electron diffraction pattern of GaN grown on 6H-SiC by metalorganic molecular beam epitaxy using AlGaN template Honda T, Kawanishi H |
1825 - 1827 |
Virtual interface approximation model applied to spectroscopic ellipsometry for on-line composition determination of metalorganic chemical vapor deposition grown ternary nitrides Bonanni A, Schmidegg K, Montaigne-Ramil A, Sitter H, Hingerl K, Stifter D |
1828 - 1838 |
Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors Hashizume T, Ootomo S, Inagaki T, Hasegawa H |
1839 - 1843 |
X-ray diffraction study of InGaN/GaN superlattice interfaces Kusakabe K, Ohkawa K |
1844 - 1855 |
Mechanisms of current collapse and gate leakage currents in AlGaN/GaN heterostructure field effect transistors Hasegawa H, Inagaki T, Ootomo S, Hashizume T |
1856 - 1862 |
Recombination dynamics of localized excitons in cubic InxGa1-xN/GaN multiple quantum wells grown by radio frequency molecular beam epitaxy on 3C-SiC substrate Chichibu SF, Onuma T, Aoyama T, Nakajima K, Ahmet P, Chikyow T, Sota T, DenBaars SP, Nakamura S, Kitamura T, Ishida Y, Okumura H |
1863 - 1869 |
Oxygen species in Cs/O activated gallium nitride (GaN) negative electron affinity photocathodes Machuca F, Liu Z, Sun Y, Pianetta P, Spicer WE, Pease RFW |
1870 - 1875 |
Growth of cubic SiC thin films on Si(001) by high vacuum chemical vapor deposition using 1,3-disilabutane and an investigation of the effect of deposition pressure Boo JH, Lim DC, Lee SB, Lee KW, Sung MM, Kim Y, Yu KS |
1876 - 1880 |
High resolution synchrotron radiation-based x-ray photoemission spectroscopy study of the Si-rich beta-SiC(100) 3X2 surface oxidation Dunham D, Mehlberg S, Chamberlin S, Soukiassian P, Denlinger JD, Rotenberg E, Tonner BP, Hurych ZD |
1881 - 1885 |
Silicon carbide surface structure investigated by synchrotron radiation-based x-ray diffraction Enriquez H, D'angelo M, Aristov VY, Derycke V, Soukiassian P, Renaud G, Barbier A, Chiang S, Semond F |
1886 - 1890 |
Synthesis of a material for semiconductor applications: Boron oxynitride prepared by low frequency rf plasma-assisted metalorganic chemical vapor deposition Chen GC, Lim DC, Lee SB, Boo JH, Kim YJ, Hong BY |
1891 - 1895 |
Generalized interfaces Ferry DK, Akis RA, Bird JP, Elhassan M, Knezevic I, Prasad C, Shailos A |
1896 - 1902 |
Theory of optical properties of 6.1 angstrom III-V superlattices: The role of the interfaces Magri R, Zunger A |
1903 - 1907 |
Green's function approach for transport calculation in a In0.53Ga0.47As/In0.52Al0.48As modulation-doped heterostructure Vasileska D, Prasad C, Wieder HH, Ferry DK |
1908 - 1914 |
Comparison of density functional theory methods as applied to compound semiconductor-oxide interfaces: Slab versus cluster models Sexton JZ, Kummel AC |
1915 - 1919 |
Surface and interface barriers of InxGa1-xAs binary and ternary alloys Wieder HH |
1920 - 1923 |
Mechanisms of lateral ordering of InAs/GaAs quantum dot superlattices Chen W, Shin B, Goldman RS, Stiff A, Bhattacharya PK |
1924 - 1927 |
Semiconductor waveguide inversion in disordered narrow band-gap materials Gilbert MJ, Akis R, Ferry DK |
1928 - 1935 |
Nature of electrical contacts in a metal-molecule-semiconductor system Hsu JWP, Loo YL, Lang DV, Rogers JA |
1936 - 1939 |
Electron heating measurements in an In0.52Al0.48As/In0.53Ga0.47As/In0.52Al0.48As heterostructure system Prasad C, Ferry DK, Vasileska D, Wieder HH |
1940 - 1944 |
Study of InGaAsP/InP multiple quantum wells grown by solid source molecular beam epitaxy Sun L, Zhang DH |
1945 - 1952 |
Effects of Si deposition on the properties of Ga-rich (4X6) GaAs (001) surfaces Negoro N, Anantathanasarn S, Hasegawa H |
1953 - 1958 |
Optimization and characterization of III-V surface cleaning Liu Z, Sun Y, Machuca F, Pianetta P, Spicer WE, Pease RFW |
1959 - 1962 |
Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen Tsutsumi K, Terakado H, Enami M, Kobayashi M |