1683 - 1688 |
Performance improvement of flash memories with HfOxNy/SiO2 stack tunnel dielectrics Lai HY, Chang-Liao KS, Wang TK, Wang PK, Cheng CL |
1689 - 1701 |
Synthesized processing techniques for monolithic integration of nanometer-scale hole type photonic band gap crystal with micrometer-scale microelectromechanical structures Teo SLHG, Liu AQ, Yu MB, Singh J |
1702 - 1704 |
Si nanowires sheathed with thin diamondlike carbon films Qiu T, Wu XL, Yang LW, Shen PN, Zhang ZY, Siu GG, Chu PK |
1705 - 1710 |
Impact of extension implant energy purity and angle on the electrical characteristics of a 65 nm device technology Gossmann HJL, Rubin L, Parrill T, Agarwal A |
1711 - 1715 |
Influence of silicon nitride passivation on transport properties in InAlAs/InGaAs/InP composite channel high electron mobility transistor structures Liu YW, Wang H |
1716 - 1723 |
Chemical bonding and interdiffusion in scaled down SiO2/Si3N4/SiO2 stacks with top oxide formed by thermal ed copyoxidation Saraf M, Edrei R, Akhvlediani R, Roizin Y, Shima-Edelstein R, Hoffman A |
1724 - 1727 |
Soft mold and gasbag pressure mechanism for patterning submicron patterns onto a large concave substrate Cheng FS, Yang SY, Nian SC, Wang LA |
1728 - 1733 |
Performance of organic thin-film transistors Marinov O, Deen MJ, Iniguez B |
1734 - 1738 |
Structural and magnetic properties of (Ga,Mn)As/AlAs multiple quantum wells grown by low-temperature molecular beam epitaxy Kolovos-Vellianitis D, Herrmann C, Trampert A, Daweritz L, Ploog KH |
1739 - 1745 |
On microscopic compositional and electrostatic properties of grain boundaries in polycrystalline CuIn1-xGaxSe2 Hetzer MJ, Strzhemechny YM, Gao M, Goss S, Contreras MA, Zunger A, Brillson LJ |
1746 - 1754 |
Interactive relationships between sidewall and bottom etch rates, as-affected by sidewall angle, during SiO2 etching in a CHF3 plasma Min JH, Lee JK, Moon SH, Kim CK |
1755 - 1761 |
Modification of polymethylmethacrylate by deep ultraviolet radiation and bromination for photonic applications Henzi P, Bade K, Rabus DG, Mohr J |
1762 - 1765 |
Efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs Zoccal LB, Diniz JA, Doi I, Swart JW, Daltrini AM, Moshkalyov SA |
1766 - 1775 |
Focused ion beam sculpting curved shape cavities in crystalline and amorphous targets Adams DP, Vasile MJ, Mayer TM |
1776 - 1779 |
Comparison of high resolution negative electron beam resists Bilenberg B, Scholer M, Shi P, Schmidt MS, Boggild P, Fink M, Schuster C, Reuther F, Gruetzner C, Kristensen A |
1780 - 1784 |
Microfabrication of ultrahigh density wafer-level thin film compliant interconnects for through-silicon-via based chip stacks Arunasalam P, Ackler HD, Sammakia BG |
1785 - 1793 |
Modeling and characterization of direct-tunneling current in dual-layer ultrathin-gate dielectric films Wong H, Iwai H |
1794 - 1798 |
Dependence of field emission properties of carbon nanotube films on their graphitization Ting JH, Li TL, Hong YC |
1799 - 1802 |
Improved Au Schottky contacts on GaAs using cryogenic metal deposition Wang HT, Jang S, Anderson T, Chen JJ, Kang BS, Ren F, Herrero A, Gerger AM, Gila BP, Pearton SJ, Shen H, LaRoche JR, Smith KV |
1803 - 1809 |
Silicon resonant microcantilevers for absolute pressure measurement Bianco S, Cocuzza M, Ferrero S, Giuri E, Piacenza G, Pirri CF, Ricci A, Scaltrito L, Bich D, Merialdo A, Schina P, Correale R |
1810 - 1817 |
Gate etch process model for static random access memory bit cell and FinFET construction Stout PJ, Rauf S, Peters RD, Ventzek PLG |
1818 - 1821 |
Postannealing effect on pseudobilayer HfO2/HfSixOy/Si gate oxides formed by an inductively coupled sputtering process Choi WJ, Lee EJ, Lee JH, Yang JY, Do YH, Hong JP |
1822 - 1826 |
Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations Kwark YJ, Bravo-Vasquez JP, Chandhok M, Cao HD, Deng H, Gullikson E, Ober CK |
1827 - 1832 |
Megasonic-assisted development of nanostructures Kupper D, Kupper D, Wahlbrink T, Bolten J, Lemme MC, Georgiev YM, Kurz H |
1833 - 1836 |
Reaction mechanism of fluorinated chemically amplified resists Yamamoto H, Kozawa T, Okamoto K, Saeki A, Tagawa S, Ando T, Sato M, Komano H |
1837 - 1843 |
Structure of sputtered nanocomposite CrCx/a-C : H thin films Gassner G, Patscheider J, Mayrhofer PH, Hegedus E, Toth L, Kovacs I, Pecz B, Srot V, Scheu C, Mitterer C |
1844 - 1849 |
Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination Kim JH, Fissan H, Asbach C, Yook SJ, Wang J, Pui DYH |
1850 - 1858 |
Studies of plasma surface interactions during short time plasma etching of 193 and 248 nm photoresist materials Hua X, Engelmann S, Oehrlein GS, Jiang P, Lazzeri P, Iacob E, Anderle M |
1859 - 1862 |
Impact of line edge roughness on copper interconnects Leunissen LHA, Zhang W, Wu W, Brongersma SH |
1863 - 1868 |
Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped AlxGa1-xAs Reuter D, Riedesel C, Wieck AD |
1869 - 1872 |
Process for 20 nm T gate on Al0.25Ga0.75As/In0.2Ga0.8As/GaAs epilayer using two-step lithography and zigzag foot Lee KS, Kim YS, Lee KT, Jeong YH |
1873 - 1877 |
Low interface states and high dielectric constant Y2O3 films on Si substrates Alarcon-Flores G, Aguilar-Frutis M, Falcony C, Garcia-Hipolito M, Araiza-Ibarra JJ, Herrera-Suarez HJ |
1878 - 1885 |
Negative transconductance region in the double-gated silicon field emitter arrays Chen LY, Akinwande AI |
1886 - 1890 |
Slowdown in development of self-assembled InAs/GaAs(001) dots near the critical thickness Hanada T, Totsuka H, Hong SK, Godo K, Miyajima K, Goto T, Yao T |
1891 - 1901 |
Gun lens theory for nonparaxial trajectories by canonical mapping transformation: Characterization of general skewed rays inside electron guns by electron gun focal length Fujita S, Shimoyama H |
1902 - 1908 |
Shot noise models for sequential processes and the role of lateral mixing Neureuther AR, Pease RFW, Yuan L, Parizi KB, Esfandyarpour H, Poppe WJ, Liddle JA, Anderson EH |
1909 - 1912 |
Fabrication and photoluminescence of InGaN-based nanorods fabricated by plasma etching with nanoscale nickel metal islands Huang HW, Chu JT, Hsueh TH, Ou-Yang MC, Kuo HC, Wang SC |
1913 - 1917 |
Directed nucleation of ordered nanoparticle arrays on amorphous surfaces Coffee SS, Stanley SK, Ekerdt JG |
1918 - 1921 |
Smoothing of polycrystalline copper with rough surface by oblique argon-ion irradiation Hino T, Nakai T, Nishikawa M, Hirohata Y, Yamauchi Y |
1922 - 1924 |
1.32 mu m InAs/GaAs quantum-dot resonant-cavity light-emitting diodes grown by metalorganic chemical vapor deposition Huang KF, Lee FM, Hu CW, Peng TC, Wu MC, Lin CC, Hsieh TP, Chyi JI |
1925 - 1933 |
Growth and application of highly ordered array of vertical nanoposts Kuo TF, Xu J |
1934 - 1940 |
Study of nanoimprint pattern transfer on hydrogen silsesquioxane Chen SZ, Liu JF, Chen HJH, Huang FS |
1941 - 1946 |
Three-dimensional nanochannels formed by fast etching of polymer Peng C, Pang SW |
1947 - 1950 |
Microwave assisted patterning of vertically aligned carbon nanotubes onto polymer substrates Sunden E, Moon JK, Wong CP, King WP, Graham S |
1951 - 1955 |
Field and electron trajectory modeling in the vicinity of an emitting tip Janik J, Balon F, Vinduska P, Danis T |
1956 - 1956 |
Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier (vol 24, pg 1432, 2006) Lee CW, Kim YT |
1959 - 1959 |
Papers from the 33rd Annual Conference on the Physics and Chemistry of Semiconductor Interfaces - Preface Lampert B, Aspnes D |
1960 - 1966 |
PCSI 2006: Old problems and new visions Cooper L |
1967 - 1971 |
Energy conversion from catalytic reaction to hot electron current with metal-semiconductor Schottky nanodiodes Park JY, Somorjai GA |
1972 - 1976 |
Liquid-phase sensors using open-gate AlGaN/GaN high electron mobility transistor structure Kokawa T, Sato T, Hasegawa H, Hashizume T |
1977 - 1986 |
Nature of high-temperature superconductivity Dow JD, Harshman DR |
1987 - 1991 |
Complexities in modeling the metal to molecule interface Speyer G, Akis R, Ferry DK |
1992 - 1996 |
First-principles calculations of dielectric constants for ultrathin Sio(2) films Wakui S, Nakamura J, Natori A |
1997 - 2003 |
Self-consistent full band two-dimensional Monte Carlo two-dimensional Poisson device solver for modeling SiGe p-channel devices Krishnan S, Fischetti M, Vasileska D |
2004 - 2008 |
Growth temperature dependent evolution of the interface structure in Co2FeSi/GaAs(001) hybrid structures Hashimoto M, Herfort J, Trampert A, Schonherr HP, Ploog KH |
2009 - 2011 |
Ballistic electron transport properties of Fe-based films on Si(001) Stollenwerk AJ, Krause MR, Idell DH, Moore R, LaBella VP |
2012 - 2017 |
Magnetic properties of epitaxial Co-doped anatase TlO2 thin films with excellent structural quality Kaspar TC, Droubay T, McCready DE, Nachimuthu P, Heald SM, Wang CM, Lea AS, Shutthanandan V, Chambers SA, Toney MF |
2018 - 2023 |
Nonequilibrium phases in epitaxial Mn/GaAs interfacial reactions Farrell HH, Hilton JL, Schultz BD, Palmstrom CJ |
2024 - 2028 |
Spin manipulation in a double quantum-dot-quantum-wire coupled system Sasaki S, Kang S, Kitagawa K, Yamaguchi M, Miyashita S, Maruyama T, Tamura H, Akazaki T, Hirayama Y, Takayanagi H |
2029 - 2035 |
Radiative recombination during acoustically induced transport in GaAs quantum wells Alsina F, Stotz JAH, Hey R, Santos PV |
2036 - 2040 |
Scanned electrical probe characterization of carrier transport behavior in InAs nanowires Zhou X, Dayeh SA, Aplin D, Wang D, Yu ET |
2041 - 2046 |
Fabrication of single-crystalline insulator/Si/insulator nanostructures Fissel A, Kuhne D, Bugiel E, Osten HJ |
2047 - 2052 |
Characterization of ZnO nanorod arrays fabricated on Si wafers using a low-temperature synthesis method Tak Y, Park D, Yong KJ |
2053 - 2059 |
Calculation of critical dimensions for wurtzite and cubic zinc blende coaxial nanowire heterostructures Raychaudhuri S, Yu ET |
2060 - 2068 |
Device interference in GaAs quantum wire transistors and its suppression by surface passivation using Si interface control layer Jia R, Hasegawa H, Shiozaki N, Kasai S |
2069 - 2074 |
Stress evolution during ripening of self-assembled InAs/GaAs quantum dots Schaadt DM, Hu DZ, Ploog KH |
2075 - 2079 |
Wavelength tuning of InAs/InP quantum dots: Control of As/P surface exchange reaction Notzel R, Anantathanasarn S, van Veldhoven PJ, van Otten FWM, Eijkemans TJ, Trampert A, Satpati B, Wolter JH |
2080 - 2086 |
Oxidized GaN(0001) surfaces studied by scanning tunneling microscopy and spectroscopy and by first-principles theory Dong Y, Feenstra RM, Northrup JE |
2087 - 2092 |
Selective molecular beam epitaxy growth of size- and position-controlled GaN/AlGaN nanowires on nonplanar (0001) substrates and its growth mechanism Sato T, Oikawa T, Hasegawa H, Hashizume T |
2093 - 2099 |
Ill-nitride growth and characteristics on ferroelectric materials using plasma-assisted molecular beam epitaxy Lee KK, Namkoong G, Doolittle WA, Losurdo M, Bruno G, Jundt DH |
2100 - 2104 |
In situ growth regime characterization of AlN using reflection high energy electron diffraction Burnham SD, Doolittle WA |
2105 - 2110 |
Molecular beam epitaxy of Sm2O3, Dy2O3, and Ho2O3 on Si (111) Craft HS, Collazo R, Sitar Z, Maria JP |
2111 - 2114 |
Synthesis of polycrystalline ytterbium monoxide thin films by molecular beam deposition Losego MD, Maria JP |
2115 - 2118 |
Characterization of crystalline rare-earth oxide high-K dielectrics grown by molecular beam epitaxy on silicon carbide Fissel A, Czernohorsky M, Osten HJ |
2119 - 2123 |
Growth of a stacked silicon nitride/silicon oxide dielectric on Si (100) Bahari A, Morgen P, Pedersen K, Li ZS |
2124 - 2131 |
Thermal diffusion of Co into atomically flat ZnO(000-1) surfaces investigated by scanning probe microscopies and low energy electron diffraction Dumont J, Seldrum T, Couet S, Moisson C, Turover D, Sporken R |
2132 - 2137 |
Comparison of ultrathin SiO2/Si(100) and SiO2/Si(111) interfaces from soft x-ray photoelectron spectroscopy Ulrich MD, Rowe JE, Keister JW |
2138 - 2143 |
Epitaxial Bi/GaAs diodes via electrodeposition Bao ZL, Kavanagh KL |
2144 - 2147 |
Type-II InAs/GaSb superlattices grown on GaSb (311)B by molecular beam epitaxy for long-wavelength infrared applications Shao H, Li W, Torfi A, Moscicka D, Wang WI |
2148 - 2155 |
Large reduction of leakage currents in AlGaN Schottky diodes by a surface control process and its mechanism Kotani J, Kaneko M, Hasegawa H, Hashizume T |
2156 - 2159 |
Spectroscopic ellipsometry characterization of ultrathin silicon-on-insulator films Price J, Diebold AC |
2160 - 2168 |
Optical characterization of process-dependent charging in hafnium oxide structures Carriles R, Kwon J, An YQ, Sun L, Stanley SK, Ekerdt JG, Downer MC, Price J, Boescke T, Diebold AC |
2169 - 2171 |
Cathodoluminescence spectra of surface-oxidized GaN crystallites Honda T, Akiyama M, Baba T, Watanabe M |
2172 - 2177 |
Local photocurrent mapping as a probe of contact effects and charge carrier transport in semiconductor nanowire devices Gu Y, Romankiewicz JP, David JK, Lensch JL, Lauhon LJ, Kwak ES, Odom TW |
2178 - 2183 |
Characterization of defects in the drift region of 4H-SiC pin diodes via optical beam induced current Caldwell JD, Stahlbush RE, Glembocki OJ, Liu KX, Hobart KD |