Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.20, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (173 articles)

2183 - 2186	Comparison of atomic force microscopy imaging methods and roughness determinations for a highly polished quartz surface Dokou E, Zhang LP, Barteau MA
2187 - 2191	Initial oxidation phenomena of heavily phosphorus-doped silicon in dry oxygen Kamiura Y, Hasegawa K, Sano Y, Mizokawa Y, Kawamoto K
2192 - 2198	Silicon oxide contact hole etching employing an environmentally benign process Fujita K, Hori M, Goto T, Ito M
2199 - 2205	Simulations and experiments of etching of silicon in HBr plasmas for high aspect ratio features Hwang HH, Meyyappan M, Mathad GS, Ranade R
2206 - 2209	Resist distribution effect of spin coating Kim SK, Yoo JY, Oh HK
2210 - 2213	Reflection high-energy electron diffraction observation of the dynamics of semiconductor quantum dot formation and decay Finnie P, Riel BJ, Wasilewski ZR
2214 - 2218	Improved surface treatments for recycled (100) GaAs substrates in view of molecular-beam epitaxy growth: Auger electron spectroscopy, Raman, and secondary ion mass spectrometry analyses Negri F, Bedel-Pereira E
2219 - 2224	Comparison of in situ and ex situ plasma-treated metalorganic chemical vapor deposition titanium nitride thin films Lim BK, Park HS, See AKH, Liu EZ, Wu SH
2225 - 2228	Effect of implant oxide on ultrashallow junction formation Lindsay R, Lauwers A, Fruhauf J, de Potter M, Maex K
2229 - 2232	Polymer thickness effects on Bosch etch profiles Craigie CJD, Sheehan T, Johnson VN, Burkett SL, Moll AJ, Knowlton WB
2233 - 2237	Leveling effects of copper electrolytes with hybrid-mode additives Lin KC, Shieh JM, Chang SC, Dai BT, Chen CF, Feng MS, Li YH
2238 - 2242	Study of focused ion beam response of GaAs in the nanoscale regime Lugstein A, Basnar B, Bertagnolli E
2243 - 2247	Influence of the surface Si/buried oxide interface on extended defect evolution in silicon-on-insulator scaled to 300 angstrom Saavedra AF, Frazer J, Jones KS, Avci I, Earles SK, Law ME, Jones EC
2248 - 2251	Submicron pattern transfer to binary semiconductors via micromolding in capillaries Pisignano D, Gigli G, Visconti P, Zocco A, Perrone A, Cingolani R
2252 - 2255	Dry etching of GaP with emphasis on selective etching over AlGaP Epple JH, Sanchez C, Chung T, Cheng KY, Hsieh KC
2256 - 2264	Comparative study of Ga- and N-polar GaN films grown on sapphire substrates by molecular beam epitaxy Huang D, Reshchikov MA, Visconti P, Yun F, Baski AA, King T, Morkoc H, Jasinski J, Liliental-Weber Z, Litton CW
2265 - 2270	Cryogenic cleavage used in gold substrate production Mazurkiewicz J, Mearns FJ, Losic D, Weeks L, Waclawik ER, Rogers CT, Shapter JG, Gooding JJ
2271 - 2274	Beam-focusing characteristics of the diamond-film field emission arrays with parallel emitter, gates, and in-plane lens Zeng BQ, Liu Y, Yang ZH, Qian SJ, Yang CF
2275 - 2280	Plasma assisted deposition of nanocrystalline BCN thin films and property characterization Cao ZX, Liu LM, Oechsner H
2281 - 2287	Evaluation of the ion bombardment energy on silicon dioxide films deposited from O-2/TEOS plasmas on Si and unstrained Si0.83Ge0.17/Si substrates Goghero D, Goullet A, Lebrizoual L, Meyer F, Turban G
2288 - 2294	Investigation of active Si pitting and its impact on 0.15 and 0.30 mu m n-type metal-oxide-semiconductor and p-type metal-oxide-semiconductor transistors Chua CS, Chor EF, Goh F, See A, Chan L
2295 - 2298	Investigations of pulse current electrodeposition for damascene copper metals Chang SC, Shieh JM, Dai BT, Feng MS
2299 - 2302	Effects of Ar inductively coupled plasma exposure on 4H-SiC Schottky rectifiers Ip K, Nigam S, Lee KP, Baik KH, Chung GY, MacMillan MF, Ren F, Pearton SJ
2303 - 2308	Structure and size distribution of TiO2 nanoparticles deposited on stainless steel mesh Li W, Shah SI, Sung M, Huang CP
2309 - 2313	Fabrication of Si field emitter arrays integrated with metal-oxide-semiconductor field-effect transistor driving circuits Nagao M, Tamura Y, Matsukawa T, Kanemaru S, Itoh J, Tokunaga K
2314 - 2319	Texture and resistivity of dilute binary Cu(Al), Cu(In), Cu(Ti), Cu(Nb), Cu(Ir), and Cu(W) alloy thin films Gungor A, Barmak K, Rollett AD, Cabral C, Harper JME
2320 - 2327	Direct printing of polymer microstructures on flat and spherical surfaces using a letterpress technique Miller SM, Troian SM, Wagner S
2328 - 2336	Characteristics of ultrathin Ta and TaN films Rossnagel SM
2337 - 2345	Direct patterning of nanostructures by field-induced deposition from a scanning tunneling microscope tip Houel A, Tonneau D, Bonnail N, Dallaporta H, Safarov VI
2346 - 2350	Electrical conductivity of sidewall-deposited fluorocarbon polymer in SiO2 etching processes Shimmura T, Soda S, Samukawa S, Koyanagi M, Hane K
2351 - 2360	Thickness metrology and end point control in W chemical vapor deposition process from SiH4/WF6 using in situ mass spectrometry Xu Y, Gougousi T, Henn-Lecordier L, Liu Y, Cho S, Rubloff GW
2361 - 2366	Effects of Ti addition on the morphology, interfacial reaction, and diffusion of Cu on SiO2 Liu CJ, Jeng JS, Chen JS, Lin YK
2367 - 2374	Assessment of extreme ultraviolet-induced charging of subtractive metal lithography masks Klebanoff LE, Clift WM, Franco N, Bostedt C, Terminello LJ
2375 - 2383	Morphology and luminescence of porous GaN generated via Pt-assisted electroless etching Diaz DJ, Williamson TL, Adesida I, Bohn PW, Molnar RJ
2384 - 2387	Photoresponse characteristics of n-ZnO/p-Si heterojunction photodiodes Choi YS, Lee JY, Im S, Lee SJ
2388 - 2392	Scanning tunneling microscopy of endohedral metallofullerene Lu-C-82 on C-60 film Shi BR, Wang XS, Huang HJ, Yang SH, Bachmann A, Cue N
2393 - 2400	Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics Graham S, Steinhaus C, Clift M, Klebanoff L
2401 - 2407	Two-dimensional transverse cross-section nanopotentiometry of actively driven buried-heterostructure multiple-quantum-well lasers Ban D, Sargent EH, Dixon-Warren SJ, Calder I, Grevatt T, Knight G, White JK
2408 - 2412	Near-surface deep-trap and bulk deep-trap states in InxGa1-xAs/GaAs Halder NC, Genareau K
2413 - 2420	Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists Pawloski AR, Nealey PF
2421 - 2432	Comparing ionized physical vapor deposition and high power magnetron copper seed deposition Stout PJ, Zhang D, Rauf S, Ventzek PLG
2433 - 2440	Molybdenum-based nanostructured mixed oxides for sensing applications: Effect of the Mo oxide composition on the structure of sol-gel thin films Taurino A, Catalano M, Siciliano P, Galatsis K, Li YX, Wlodarski W
2441 - 2448	Near-surface electronic defects and morphology of CuIn1-xGaxSe2 Strzhemechny YM, Smith PE, Bradley ST, Liao DX, Rockett AA, Ramanathan K, Brillson LJ
2449 - 2458	Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation Otaki K, Ota K, Nishiyama I, Yamamoto T, Fukuda Y, Okazaki S
2459 - 2465	Fabrication of flexible polymer tubes for micro and nanofluidic applications Ilic B, Czaplewski D, Zalalutdinov M, Schmidt B, Craighead HG
2466 - 2469	Photoinduced organic nanowires from self-assembled monolayers Qiao YH, Zeng QD, Tan ZY, Xu SD, Wang D, Wang C, Wan LJ, Bai CL
2472 - 2472	Papers from the Third Low Energy Electron/Microscopy Photoemission Electron Microscopy Workshop - Preface Kellogg GL, van Gastel R
2473 - 2477	Low energy electron microscopy studies of steps on single crystal thin films of refractory metals Ondrejcek M, Swiech W, Yang G, Flynn CP
2478 - 2491	Low energy electron microscopy study of In on Si(111) Pavlovska A, Bauer E, Giessen M
2492 - 2495	Growth shapes of Ag crystallites on the Si(111) surface Tang WX, Man KL, Huang HC, Woo CH, Altman MS
2496 - 2499	Low energy electron microscopy/diffraction study on growth of Ge on Si(113) surface Yasue T, Koshikawa T, Bauer E
2500 - 2504	Growth dynamics of titanium silicide nanowires observed with low-energy electron microscopy Bennett PA, Ashcroft B, He Z, Tromp RM
2505 - 2508	In situ emission microscopy of field emitter cathode arrays Mulhollan GA, Jamison KD, Kordesch ME
2509 - 2513	Scanning photoelectron microscopy study of as-grown and heat-treated chemical vapor deposition boron-doped diamond films Zakharov AA, Ralchenko V, Khmelnitskii R, Lindau I
2514 - 2518	Photoelectron emission microscopy of ultrathin oxide covered devices Ballarotto VW, Breban M, Siegrist K, Phaneuf RJ, Williams ED
2519 - 2525	Comparison of stigmatically focusing magnetic prisms of square versus round symmetries Kan HC, Durkop T, Phaneuf RJ
2526 - 2534	Correction of chromatic and spherical aberration in electron microscopy utilizing the time structure of pulsed excitation sources Schonhense G, Spiecker H
2535 - 2538	Scanning electron microscope with polarization analysis: Micromagnetic structures in ultrathin films Oepen HP, Steierl G, Kirschner J
2539 - 2542	Low-energy electron microscopy/x-ray magnetic circular dichroism photoemission electron microscopy study of epitaxial MnAs on GaAs Bauer E, Cherifi S, Daeweritz L, Kaestner M, Heun S, Locatelli A
2543 - 2549	Magnetic dichroisms in absorption and photoemission for magnetic characterization in x-ray photoelectron emission microscopy Kuch W, Chelaru LI, Offi F, Kotsugi M, Kirschner J
2561 - 2561	Papers from the 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Preface Kunz RR
2562 - 2566	Effect of high numerical aperture lens on lithographic performance in 157 nm lithography Itani T, Suganaga T, Kanda N, Kim JH, Watanabe K, Cashmore J, Gower M
2567 - 2573	Prospects for photolithography at 121 nm Liberman V, Rothschild M, Murphy PG, Palmacci ST
2574 - 2577	121.6 nm radiation source for advanced lithography Yan JX, El-Dakrouri A, Laroussi M, Gupta MC
2578 - 2582	Optimizing vacuum ultraviolet attenuated phase shift masking materials Smith BW, Bourov AY, Liu Y
2583 - 2588	Polarization contact: Concept and initial assessment Lam M, Neureuther A
2589 - 2596	Optical imaging properties of dense phase shift feature patterns Fritze M, Tyrrell B, Mallen R, Wheeler B, Rhyins P, Martin P
2597 - 2601	Parallel maskless optical lithography for prototyping, low-volume production, and research Gil D, Menon R, Tang XD, Smith HI, Carter DJD
2602 - 2605	Interference pattern formation from an array of coherent laser beams Liu Y, Barhen J, Braiman Y, Zhong JX
2606 - 2609	Simulation of critical dimension error using Monte Carlo method and its experimental verification Zinn SY, Lee SW, Choi SW, Sohn JM
2610 - 2616	Operational model for pattern and probe based aberration monitors Robins G, Neureuther A
2617 - 2621	Generalized scanning beam interference lithography system for patterning gratings with variable period progressions Pati GS, Heilmann RK, Konkola PT, Joo C, Chen CG, Murphy E, Schattenburg ML
2622 - 2626	Electron projection lithography tool development status Miura T
2627 - 2633	Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses Stickel W, Pfeiffer HC, Golladay SD, Gordon MS
2634 - 2639	Direct measurement of chromatic aberrations induced by SiNx continuous membrane mask Yahiro T, Suzuki S, Irita T, Kawata S, Suzuki K
2640 - 2645	Development of a mask-scan electron beam mask writer Nishimura S, Shimizu M, Mitsui S, Akeno K, Kusakabe H, Ogasawara M, Hayashi R, Yanaga S, Kobayashi N, Tojo T
2646 - 2650	Digital electrostatic electron-beam array lithography Baylor LR, Lowndes DH, Simpson ML, Thomas CE, Guillorn MA, Merkulov VI, Whealton JH, Ellis ED, Hensley DK, Melechko AV
2651 - 2656	Maskless lithography using low-energy electron beam: Recent results for proof-of-concept system Nakasugi T, Ando A, Inanami R, Sasaki N, Ota J, Nagano O, Yamazaki Y, Sugihara K, Mori I, Miyoshi M, Okumura K
2657 - 2661	Prototype raster multibeam lithography tool Coyle ST, Holmgren D, Chen X, Thomas T, Sagle A, Maldonado J, Shamoun B, Allen P, Gesley M
2662 - 2665	Distributed axis electron-beam system for lithography and inspection - preliminary experimental results Pickard DS, Campbell C, Crane T, Cruz-Rivera LJ, Davenport A, Meisburger WD, Pease RFW, Groves TR
2666 - 2671	Comprehensive model of electron energy deposition Han G, Khan M, Fang YH, Cerrina F
2672 - 2677	Development of data conversion system for electron beam projection lithography Kato K, Nishizawa K, Haruki T, Inoue T, Kamijo K, Kojima S, Minami H, Okamoto K
2678 - 2681	Testing an electrostatic deflection innovation: Initial experimental results Retsky M, Stein R
2682 - 2685	Copper device editing: Strategy for focused ion beam milling of copper Casey JD, Phaneuf M, Chandler C, Megorden M, Noll KE, Schuman R, Gannon TJ, Krechmer A, Monforte D, Antoniou N, Bassom N, Li J, Carleson P, Huynh C
2686 - 2689	Graphitization of Fe-doped amorphous carbon pillars grown by focused-ion-beam-induced chemical-vapor deposition Fujita J, Ishida M, Ichihashi T, Ochiai Y, Kaito T, Matsui S
2690 - 2694	Conductance-atomic force microscope characterization of focused ion beam chip repair processes Marchman H, McMurray J, Wildman H
2695 - 2699	End point of silicon milling using an optical beam induced current signal for controlled access to integrated circuits for backside circuit editing Antoniou N, Bassom NJ, Huynh C, Monforte D, Casey JD, Krechmer A, Carleson P
2700 - 2704	Improvements in focused ion beam micromachining of interconnect materials Gonzalez JC, da Silva MIN, Griffis DP, Russell PE
2705 - 2708	Scattering mask concept for ion-beam nanolithography Ruchhoeft P, Wolfe JC, Torres JL, Bass R
2709 - 2712	Correcting for global space charge by positive ion generation Crane T, Campbell C, Pickard D, Han LQ, Takahashi K, Meisburger WD, Pease RF
2713 - 2716	Ion projection sensitized selective Cu electroplating on uncoated p-Si Spiegel A, Bruenger WH, Dzionk C, Schmuki P
2717 - 2720	Improvement in brightness of multicusp-plasma ion source Ji Q, Jiang X, King TJ, Leung KN, Standiford K, Wilde SB
2721 - 2725	Role of oxygen in semiconductor negative electron affinity photocathodes Machuca F, Liu Z, Sun Y, Pianetta P, Spicer WE, Pease RFW
2726 - 2729	Development of electromagnetic lenses for multielectron beam lithography system Haraguchi T, Sakazaki T, Hamaguchi S, Yasuda H
2730 - 2733	Nanopipe fabrication using vertically aligned carbon nanofiber templates Melechko AV, McKnight TE, Guillorn MA, Austin DW, Ilic B, Merkulov VI, Doktycz MJ, Lowndes DH, Simpson ML
2734 - 2738	Electrode modification by electron-induced patterning of self-assembled monolayers Kaltenpoth G, Volkel B, Nottbohm CT, Golzhauser A, Buck M
2739 - 2744	Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography Anderson ME, Smith RK, Donhauser ZJ, Hatzor A, Lewis PA, Tan LP, Tanaka H, Horn MW, Weiss PS
2745 - 2748	Localized and directed lateral growth of carbon nanotubes from a porous template Wind SJ, Martel R, Avouris P
2749 - 2752	Tunable distributed-feedback laser gratings for telecom applications, manufactured by electron-beam lithography Rishton SA, Pezeshki B, Zou S, Yoffe G, Henschel W
2753 - 2757	Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography Hastings JT, Lim MH, Goodberlet JG, Smith HI
2758 - 2762	Surface diffusion and size evolution of nanostructures in laser-focused atomic deposition Zhong JX, Wells JC, Braiman Y
2763 - 2767	Method for manufacturing nanoscale structures in transition metal layers van Delft FCMJM, Ketelaars WSMM, Kroon M, Lambregts J
2768 - 2772	Nanostructure fabrication by direct electron-beam writing of nanoparticles Griffith S, Mondol M, Kong DS, Jacobson JM
2773 - 2776	Characteristics of multiwalled carbon nanotube nanobridges fabricated by poly(methylmethacrylate) suspended dispersion Lee SB, Teo KBK, Robinson LAW, Teh AS, Chhowalla M, Hasko DG, Amaratunga GAJ, Milne WI, Ahmed H
2777 - 2779	Nanoscale electron beam lithography and etching for fully depleted silicon-on-insulator devices Dreeskornfeld L, Hartwich J, Kretz J, Risch L, Roesner W, Schmitt-Landsiedel D
2780 - 2783	Multilevel silicon diffractive optics for terahertz waves Walsby ED, Wang S, Xu J, Yuan T, Blaikie R, Durbin SM, Zhang XC, Cumming DRS
2784 - 2787	Density estimation for amorphous carbon nanopillars grown by focused ion beam assisted chemical vapor deposition Ishida M, Fujita J, Ochiai Y
2788 - 2792	Process integration of self-assembled polymer templates into silicon nanofabrication Guarini KW, Black CT, Zhang Y, Kim H, Sikorski EM, Babich IV
2793 - 2797	Design and prototyping of a micropropulsion system for microsatellites attitude control and orbit correction Vaccari L, Altissimo M, Di Fabrizio E, De Grandis F, Manzoni G, Santoni F, Graziani F, Gerardino A, Perennes F, Miotti P
2798 - 2801	Fabrication and electrical characterization of top gate single-wall carbon nanotube field-effect transistors Wind SJ, Appenzeller J, Martel R, Derycke V, Avouris P
2802 - 2805	Hybrid assembly technique using alternating current field for molecular electronic measurements Amlani I, Rawlett AM, Nagahara LA, Tsui RK
2806 - 2809	Single-electron parametron memory cell Emiroglu EG, Durrani ZAK, Hasko DG, Williams DA
2810 - 2813	Quantum dot with independently tunable tunneling barriers fabricated using an atomic force microscope Nemutudi R, Smith CG, Ford CJB, Appleyard NJ, Pepper M, Ritchie DA, Jones GAC
2814 - 2818	Fabrication of spin-current-induced domain-wall-nucleation device in planar configuration Kimura T, Wakaya F, Gamo K
2819 - 2823	Single ion implantation for solid state quantum computer development Schenkel T, Persaud A, Park SJ, Meijer J, Kingsley JR, McDonald JW, Holder JP, Bokor J, Schneider DH
2824 - 2828	Single-electron transistor structures based on silicon-on-insulator silicon nanowire fabrication by scanning probe lithography and wet etching Sheu JT, You KS, Wu CH, Chang KM
2829 - 2833	Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ
2834 - 2839	Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry Goldberg KA, Naulleau P, Bokor J, Chapman HN, Barty A
2840 - 2843	Particle-induced distortion in extreme ultraviolet lithography reticles during exposure chucking Tejeda R, Engelstad R, Lovell E, Blaedel K
2844 - 2848	Multiple-beam interference lithography with electron beam written gratings Solak HH, David C, Gobrecht J, Wang L, Cerrina F
2849 - 2852	Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand Lee SH, Tichenor DA, Naulleau P
2853 - 2856	High-resolution transfer printing on GaAs surfaces using alkane dithiol monolayers Loo YL, Hsu JWP, Willett RL, Baldwin KW, West KW, Rogers JA
2857 - 2861	Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates Dauksher WJ, Nordquist KJ, Mancini DP, Resnick DJ, Baker JH, Hooper AE, Talin AA, Bailey TC, Lemonds AM, Sreenivasan SV, Ekerdt JG, Willson CG
2862 - 2866	Polymer microring resonators fabricated by nanoimprint technique Chao CY, Guo LJ
2867 - 2871	Imprint lithography for curved cross-sectional structure using replicated Ni mold Hirai Y, Harada S, Kikuta H, Tanaka Y, Okano M, Isaka S, Kobayasi M
2872 - 2876	Reversal imprinting by transferring polymer from mold to substrate Huang XD, Bao LR, Cheng X, Guo LJ, Pang SW, Yee AF
2877 - 2880	High-resolution organic polymer light-emitting pixels fabricated by imprinting technique Cheng X, Hong YT, Kanicki J, Guo LJ
2881 - 2886	Nanoimprinting over topography and multilayer three-dimensional printing Bao LR, Cheng X, Huang XD, Guo LJ, Pang SW, Yee AF
2887 - 2890	Fabrication of high electron mobility transistors with T-gates by nanoimprint lithography Chen Y, Macintyre D, Boyd E, Moran D, Thayne I, Thoms S
2891 - 2895	Prediction of fabrication distortions in step and flash imprint lithography templates Martin CJ, Engelstad RL, Lovell EG, Resnick DJ, Weisbrod EJ
2896 - 2901	Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates Mancini DP, Gehoski KA, Ainley E, Nordquist KJ, Resnick DJ, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG
2902 - 2908	Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography Bellas V, Tegou E, Raptis I, Gogolides E, Argitis P, Iatrou H, Hadjichristidis N, Sarantopoulou E, Cefalas AC
2909 - 2912	Fluoropolymer-based resists for a single-resist process of 157 nm lithography Toriumi M, Yamazaki T, Furukawa T, Irie S, Ishikawa S, Itani T
2913 - 2919	Electrostatic effects during dissolution of positive tone photoresists Schmid GM, Burns SD, Tsiartas PC, Willson CG
2920 - 2926	Probing surface and bulk chemistry in resist films using near edge X-ray absorption fine structure Lenhart JL, Jones RL, Lin EK, Soles CL, Wu WL, Fischer DA, Sambasivan S, Goldfarb DL, Angelopoulos M
2927 - 2931	Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length Shin J, Ma Y, Cerrina F
2932 - 2936	Delay-time and aging effects on contrast and sensitivity of hydrogen silsesquioxane van Delft FCMJM
2937 - 2941	Low stress development of poly(methylmethacrylate) for high aspect ratio structures Rooks MJ, Kratschmer E, Viswanathan R, Katine J, Fontana RE, MacDonald SA
2942 - 2945	Photopatternable sol-gel for compound semiconductor processing Fallahi M, Bedford R, Lu D
2946 - 2952	Acid catalyst mobility in resist resins Stewart MD, Tran HV, Schmid GM, Stachowiak TB, Becker DJ, Willson CG
2953 - 2957	Suppression of secondary electron blur by using Br-containing resists in x-ray lithography Kise K, Marumoto K, Watanabe H, Itoga K, Kumada T, Sumitani H, Kitayama T, Amemiya M, Watanabe Y, Uda K
2958 - 2961	Evaluation of calixarene-derivatives as high-resolution negative tone electron-beam resists Sailer H, Ruderisch A, Kern DP, Schurig V
2962 - 2967	Photospeed considerations for extreme ultraviolet lithography resists Dentinger PM, Hunter LL, O'Connell DJ, Gunn S, Goods D, Fedynyshyn TH, Goodman RB, Astolfi DK
2968 - 2972	Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining Chatzichristidi M, Raptis I, Argitis P, Everett J
2973 - 2978	Thermal-flow techniques for sub-35 nm contact-hole fabrication in electron-beam lithography Chen HL, Chen CH, Ko FH, Chu TC, Pan CT, Lin HC
2979 - 2983	Extendibility of proximity x-ray lithography to 25 nm and below Toyota E, Washio M
2984 - 2990	Collimated point-source x-ray nanolithography Forber RA, Chen ZW, Menon R, Grygier R, Mrowka S, Turcu ICE, Gaeta CJ, Cassidy K, Smith HI
2991 - 2994	Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique Qi MH, Smith HI
2995 - 2999	Dynamic studies of hard pellicle response during exposure scanning Cotte EP, Abdo AY, Engelstad RL, Lovell EG
3000 - 3005	Characterization of extreme ultraviolet lithography mask defects by actinic inspection with broadband extreme ultraviolet illumination Park M, Yi M, Mirkarimi P, Larson C, Bokor J
3006 - 3009	Ultraviolet and direct ultraviolet inspection of next generation lithography reticles Pettibone D, Dayal A, Veldman A, Stokowski S
3010 - 3014	Fabrication of complete 8 in stencil mask for electron projection lithography Amemiya I, Yamashita H, Nakatsuka S, Kimura I, Tsukahara M, Yasumatsu S, Nagarekawa O
3015 - 3020	Complementary mask pattern split for 8 in stencil masks in electron projection lithography Yamashita H, Takahashi K, Amemiya I, Takeuchi K, Masaoka H, Takenaka H, Yamabe M
3021 - 3024	Sub-50 nm stencil mask for low-energy electron-beam projection lithography Yoshizawa M
3025 - 3028	Stencil reticle inspection using a deep ultraviolet microscope Okada M, Katakura N, Kawata S
3029 - 3034	Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks Lu B, Wasson JR, Weisbrod EJ, Masnyj Z, Mangat PJS, Nordquist K, Resnick D
3035 - 3039	Efficient phase defect modeling using domain decomposition methods Adam K, Neureuther AR
3040 - 3043	Fabrication of x-ray masks using evaporated electron sensitive layers for back patterning of membranes Awad Y, Lavallee E, Beauvais J, Drouin D, Yang P, Turcotte D, Mun LK
3044 - 3046	Submicron thermocouple measurements of electron-beam resist heating Chu DC, Bilir DT, Pease RFW, Goodson KE
3047 - 3052	Thermal modeling of extreme ultraviolet and step and flash imprint lithography substrates during dry etch Weisbrod EJ, Dauksher WJ, Zhang D, Rauf S, Mangat PJS, Ventzek PLG, Smith KH, Clemens SB, Martin CJ, Engelstad RL
3053 - 3057	Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion Reu PL, Chen CF, Engelstad RL, Lovell EG, Bayer T, Greschner J, Kalt S, Weiss H, Wood OR, Mackay RS
3058 - 3062	Advanced die-to-database inspection technique for embedded attenuated phase shift mask Yamashita K, Isomura I, Tsuchiya H, Watanabe T, Inoue H, Endo S, Tokita M
3063 - 3066	Two-dimensional dopant profiling of ultrashallow junctions by electron holography Thesen AE, Frost BG, Joy DC
3067 - 3070	Liquid immersion lens technology applied to laser voltage probing of 130 nm process technology devices Nataraj N, Deslandes H, Lo W, Eiles T, Pardy P
3071 - 3074	Beam alignment for scanning beam interference lithography Chen CG, Heilmann RK, Joo C, Konkola PT, Pati GS
3075 - 3079	Precision fringe metrology using a Fresnel zone plate Joo C, Pati GS, Chen CG, Konkola PT, Heilmann RK, Schattenburg ML, Liddle A, Anderson EH
3080 - 3084	Accurate reflectometry for extreme-ultraviolet lithography at the National Institute of Standards and Technology Grantham S, Tarrio C, Lucatorto TB
3085 - 3088	Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly(methylmethacrylate) resist Hu WC, Orlova T, Bernstein GH
3089 - 3094	Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy Schneider G, Meyer MA, Denbeaux G, Anderson E, Bates B, Pearson A, Knochel C, Hambach D, Stach EA, Zschech E
3095 - 3098	High precision stress measurement of ion projection lithography mask membranes Torres JL, Wolfe JC, Ruchhoeft P, Kennedy TF, Podolski J, Kragler K, Ehrmann A, Kaesmaier R, Loschner H
3099 - 3105	Adaptive alignment of photomasks for overlay improvement Chen CF, Engelstad RL, Lovell EG, White DL, Wood OR, Smith MK, Harriott LR
3106 - 3110	Advanced time-multiplexed plasma etching of high aspect ratio silicon structures Blauw MA, Craciun G, Sloof WG, French PJ, van der Drift E
3111 - 3117	Profile simulation of gas chopping based etching processes Volland BE, Ivanov T, Rangelow IW