Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.22, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (201 articles)

L35 - L37	Fabrication and evaluation of highly manufacturable nanoscale flow-through parallel electrode structures Nam WJ, Fonash SJ, Cuiffi JD
L38 - L43	Analytical study on small contact hole process for sub-65 nm node generation Kim HW, Yoon JY, Hah JH, Woo SG, Cho HK, Moon JT
L44 - L46	Reversible nanochemical conversion Sugimura H, Lee SH, Saito N, Takai O
2563 - 2567	Thermally actuated probe array for parallel dip-pen nanolithography Wang XF, Bullen DA, Zou J, Liu C, Mirkin CA
2568 - 2573	Effect of spontaneous and piezoelectric polarization on intersubband transition in AlxGa1-xN-GaN quantum well Li JM, Lu YW, Li DB, Han XX, Zhu QS, Liu XL, Wang ZG
2574 - 2579	Modeling of electronic transport in GaN n-i-p junctions Mayer A, Miskovsky NM, Cutler PH
2580 - 2588	Redeposition of etch products on sidewalls during SiO2 etching in a fluorocarbon plasma. V. Effects of C/F ratio in plasma gases Min JH, Lee GR, Lee JK, Moon SH
2589 - 2593	Fabrication of ordered array of tungsten nanoparticles on anodic porous alumina by electron-beam-induced selective deposition Xie GQ, Song MH, Mitsuishi K, Furuya K
2594 - 2603	Investigation of surface modifications of 193 and 248 nm photoresist materials during low-pressure plasma etching Ling L, Hua X, Li X, Oehrlein GS, Hudson EA, Lazzeri P, Anderle M
2604 - 2610	Influence of molecular weight of resist polymers on surface roughness and line-edge roughness Yamaguchi T, Yamazaki K, Namatsu H
2611 - 2614	Mechanism of Cu oxidation in ashing process Kojima A, Sakai T, Ohiwa T
2615 - 2619	Dielectric properties of highly (100) oriented (Pb-0.5,Sr-0.5)TiO3 thin films grown on Si with MgO buffer layer Kim KT, Kim C
2620 - 2627	Mechanisms, of nano-hole drilling due to nano-probe intense electron beam irradiation on a stainless steel Bysakh S, Shimojo M, Mitsuishi K
2628 - 2631	Pt nanostructured electrode encapsulated by a tantalum oxide for thin-film fuel cell Park KW, Sung YE
2632 - 2634	Surface flatness of polycrystalline copper after argon ion etching followed by annealing Hino T, Taguchi T, Yarnauchi Y, Hirohata Y, Nishikawa M
2635 - 2639	Annealing temperature stability of Ir and Ni-based Ohmic contacts on AlGaN/GaN high electron mobility transistors Kang BS, Kim S, La Roche JR, Ren F, Fitch RC, Gillespie JK, Moser N, Jenkins T, Sewell J, Via D, Crespo A, Dabiran AM, Chow PP, Osinsky A, Pearton SJ
2640 - 2648	High resolution and aspect ratio two-dimensional photonic band-gap crystal Teo SHG, Liu AQ, Singh J, Yu MB
2649 - 2653	Damascene Cu electrodeposition on metal organic chem-ical vapor deposition-grown Ru thin film barrier Cho SK, Kim SK, Han H, Kim JJ, Oh SM
2654 - 2657	Low temperature growth of amorphous Si nanoparticles in oxide matrix for efficient visible, photoluminescence Ma LB, Ji AL, Liu C, Wang YQ, Cao ZX
2658 - 2662	Dielectric function of thin-film titanium oxide with a granular nanostructure Sorbello RS, DeLoach JD, Aita CR, Fejes P
2663 - 2667	Molecular-beam-epitaxy growth of high-quality InGaAsN/GaAs quantum well lasers emitting at 1.3 mu m Wang JS, Hsiao RS, Lin G, Lin KF, Liu HY, Lai CM, Wei L, Liang CY, Chi JY, Kovsh AR, Maleev NA, Livshits DA, Chen JF, Yu HC, Ustinov VM
2668 - 2672	Optical study of spin injection dynamics in InGaN/GaN quantum wells with GaMnN injection layers Buyanova IA, Bergman JP, Chen WM, Thaler G, Frazier R, Abernathy CR, Pearton SJ, Kim J, Ren F, Kyrychenko FV, Stanton CJ, Pan CC, Chen GT, Chyi J, Zavada JM
2673 - 2679	Evaluation of atomic exchange in GaAs/GaP interfaces by tetragonal distortion measurements Ferrer JC, Peiro F, Cornet A, Armelles G
2680 - 2684	Fabrication of diamond-like amorphous carbon cantilever resonators Chua DHC, Milne WI, Sheeja D, Tay BK, Schneider D
2685 - 2690	Fabrication of masters for nanoimprint, step and flash, and soft lithography using hydrogen silsesquioxane and x-ray lithography Junarsa I, Nealeya PF
2691 - 2697	Strain and electrical characterization of metal-oxide-semiconductor field-effect transistor fabricated on mechanically and thermally transferred silicon on insulator films Lu F, Bickford J, Novotny C, Yu PKL, Lau SS, Henttinen K, Suni T, Suni I
2698 - 2701	Effect of the deposition temperature on temperature coefficient of resistance in CuNi thin film resistors Hur SG, Kim DJ, Kang YD, Yoon SG
2702 - 2708	Effects of postannealing on the bulk and interfacial characteristics of ZrO2 gate dielectrics prepared on Si by metalorganic chemical vapor deposition Huang SS, Wu TB
2709 - 2714	Synthesis of tin-incorporated nanocomposite diamond like carbon films by plasma enhanced chemical vapor deposition and their characterization Kundoo S, Saha P, Chattopadhyay KK
2715 - 2718	Microstructure and resistivity characterization of CuAuI superlattice formed in Gu/Au thin films Zhang W, Brongersma SH, Richard O, Brijs B, Palmans R, Froyen L, Maex K
2719 - 2726	Hydrogen in Si-Si bond center and platelet-like defect configurations in amorphous hydrogenated silicon Agarwal S, Hoex B, van de Sanden MCM, Maroudas D, Aydil ES
2727 - 2733	Temperature-dependent dc characteristics of an InGaAs/InGaAsP heterojunction bipolar transistor with an InGaAsP spacer and a composite-collector structure Chen JY, Chen CY, Lee KM, Yen CH, Tsai SF, Cheng SY, Liu WC
2734 - 2742	Chemically enhanced physical vapor deposition of tantalum nitride-based films for ultra-large-scale integrated devices Li N, Ruzic DN, Powell RA
2743 - 2747	Experimental relationship between work function and dipole moment on ErO/W(100) and LuO/W(100) emitter surfaces Saito Y, Yada K, Minami K, Nakane H, Adachi H
2748 - 2753	Format ion of silicon on plasma synthesized aluminum nitride structure by ion cutting Zhu M, Chen P, Fu RKY, Liu WL, Lin CL, Chu PK
2754 - 2757	Effects of applied voltages on planarization efficiency of Cu electropolishing Chang SC, Wang YL
2758 - 2763	Optical and electrical properties of AlCrN films grown by molecular beam epitaxy Polyakov AY, Smirnov NB, Govorkov AV, Frazier RM, Liefer JY, Thaler GT, Abernathy CR, Pearton SJ, Zavada JM
2764 - 2767	High aspect ratio pattern transfer in imprint lithography using a hybrid mold Liao WC, Hsu SLC
2768 - 2771	Fabrication of metallic nanostructures by atomic force microscopy nanomachining and lift-off process Hsu JH, Lin CY, Lin HN
2772 - 2784	Etching of porous SiOCH materials in fluorocarbon-based plasmas Posseme N, Chevolleau T, Joubert O, Vallier L, Rochat N
2785 - 2791	Detection of bacterial cells and antibodies using surface micromachined thin silicon cantilever resonators Gupta A, Akin D, Bashir R
2792 - 2798	Formation of density controlled Cr-filled carbon nanotubes on Au-Cr solid solution Kamide K, Araki H, Hiwatashi S, Yoshino K, Sakata T, Lee JG, Mori H
2799 - 2803	Nanocomposite low-k SiCOH films by plasma-enhanced chemical vapor deposition using vinyltrimethylsilane and CO2 Jeong KH, Park SG, Rhee SW
2804 - 2810	Ag metallization on silicides with nitride barriers Mitan MM, Kim HC, Alford TL, Mayer JW, Malgas GF, Adams D
2811 - 2817	Fabrication and properties of ultranano, nano, and microcrystalline diamond membranes and sheets Reinhard DK, Grotjohn TA, Becker M, Yaran MK, Schuelke T, Asmussen J
2818 - 2822	Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processesx Okigawa M, Ishikawa Y, Ichihashi Y, Samukawa S
2823 - 2835	Nanostructures produced by ultraviolet laser irradiation of silicon. I. Rippled structures Pedraza AJ, Guan YF, Fowlkes JD, Smith DA
2836 - 2843	Nanostructures produced by ultraviolet laser irradiation of silicon. II. Nanoprotrusions and nanoparticles Guan YF, Pedraza AJ, Fowlkes JD, Joy DA
2844 - 2852	Particle adhesion and removal mechanisms during brush scrubber cleaning Xu K, Vos R, Vereecke G, Doumen G, Fyen W, Mertens PW, Heyns MM
2853 - 2859	Application of ion beam etching technique to the direct fabrication of silicon microtip arrays Zhang XY, Tang QL, Tang JM
2860 - 2862	Cold-field-emission tips aging study using surface potential measurements Dongmo H, Guasch C, Bonnet J
2863 - 2863	Nanofabrication using structure controlled hydrogenated Si clusters deposited on Si surfaces (vol 18, pg 3497, 2000) Kanayama T, Watanabe MO, Bolotov L, Uchida N
2876 - 2876	Papers from the 48th International Conference on Electron, Ion, And photon Beam Technology and Nanofabrication - Preface Engelstad RL
2877 - 2881	Liquid immersion lithography: Why, how, and when? Rothschild M, Bloomstein TM, Kunz RR, Liberman V, Switkes M, Palmacci ST, Sedlacek JHC, Hardy D, Grenville A
2882 - 2884	Reaching for the bottom: The evolution of EIPBN Smith HI, Pease RF
2885 - 2890	Full-field exposure performance of electron projection lithography tool Suzuki K, Hirayanagi N, Fujiwara T, Yamada A, Ikeda J, Yahiro T, Kojima S, Udagawa J, Yamamoto H, Katakura N, Suzuki M, Aoyama T, Takekoshi H, Umemoto T, Shimizu H, Fukui S, Suzuki S, Okino T, Ohkubo Y, Shimoda T, Tanida T, Watanabe Y, Kohama Y, Ohmori K, Mori F, Takemoto S, Yoshioka T, Hirose H, Morita K, Hada K, Kawata S, Kakizaki Y, Miura T
2891 - 2896	Influence of Coulomb effects on electron projection lithography process Yamamoto J, Yamashita H, Yamabe M, Admoto H
2897 - 2901	Probe shape measurement in an electron beam lithography system Liddle JA, Naulleau P, Schmid G
2902 - 2906	Electron-beam-based photomask repair Edinger K, Becht H, Bihr J, Boegli V, Budach M, Hofmann T, Koops HWP, Kuschnerus P, Oster J, Spies P, Weyrauch B
2907 - 2911	Electron beam induced conductivity in polymethyl methacrylate, polyimide, and SiO2 thin films Bai M, Pease F
2912 - 2916	Full MEMS monolithic microcolumn for wafer-level arrayal Kim H, Han C, Kim J, Kim H, Chun K
2917 - 2922	Variable cell projection as an advance in electron-beam cell projection system Yamada A, Yabe T
2923 - 2928	3D proximity effect correction based on the simplified electron energy flux model in electron-beam lithography Osawa M, Ogino K, Hoshino H, Machida Y, Arimoto H
2929 - 2935	Representation of nonrectangular features for exposure estimation and proximity effect correction in electron-beam lithography Lee SY, Hu F, Ji J
2936 - 2942	Electron beam lithography for data storage: Quantifying the proximity effect as a function of CAD design and thin metal layers Eckert A, Mountfield K
2943 - 2947	Experimental and simulation comparison of electron-beam proximity correction Leunissen LHA, Jonckheere R, Hofmann U, Unal N, Kalus C
2948 - 2955	Optimum dose for shot noise limited CD uniformity in electron-beam lithography Kruit P, Steenbrink S, Jager R, Wieland M
2956 - 2961	At-wavelength alignment and testing of the 0.3 NA MET optic Goldberg KA, Naulleau PP, Denham PE, Rekawa SB, Jackson K, Anderson EH, Liddle JA
2962 - 2965	Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic Naulleau PP, Goldberg KA, Anderson E, Cain JP, Denham P, Jackson K, Morlens AS, Rekawa S, Salmassi F
2966 - 2969	Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand Chandhok M, Lee SH, Bacuita T
2970 - 2974	Phase measurement of reflection of EUV multilayer mirror using EUV standing waves Miyake A, Amemiya M, Masaki F, Watanabe Y
2975 - 2979	Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA) Oshino T, Takahashi S, Yamamoto T, Miyoshi T, Shiraishi M, Komiya T, Kandaka N, Kondo H, Mashima K, Nomura K, Murakami K, Okuyama T, Oizumi H, Nishiyama I, Okazaki S
2980 - 2983	Astigmatism measurement by lateral shearing interferometer Liu ZQ, Sugisaki KR, Ishii M, Zhu Y, Saito J, Suzuki A, Hasegawa M, Murakami K
2984 - 2986	Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system Kang IY, Chung YC, Ahn J, Oh HK, Watanabe T, Kinoshita H
2987 - 2991	Conductive nanostructure fabrication by focused ion beam direct-writing of silver nanoparticles Kong DS, Varsanik JS, Griffith S, Jacobson JM
2992 - 2994	Single ion implantation with scanning probe alignment Persaud A, Allen FI, Giccluel F, Park SJ, Liddle JA, Schenkel T, Ivanov T, Ivanova K, Rangelow IW, Bokor J
2995 - 2999	Advanced nanoscale material processing with focused ion beams Lugstein A, Basnar B, Smoliner J, Bertagnolli E, Weil M
3000 - 3003	Focused ion beam induced deposition of low-resistivity copper material Gannon TJ, Gu G, Casey JD, Huynh C, Bassom N, Antoniou N
3004 - 3007	Optimum mode of operation for a low energy focused ion beam system Rauscher M, Plies E
3008 - 3011	Gas delivery and virtual process chamber concept for gas-assisted material processing in a focused ion beam system Ray V
3012 - 3015	Formation of GaN films by Ga ion direct deposition under nitrogen radical atmosphere Toda M, Yanagisawa J, Gamo K, Akasaka Y
3016 - 3020	Investigations of the Ga+ focused-ion-beam implantation in resist films for nanometer lithography applications Arshak K, Mihov M, Nakahara S, Arshak A, McDonagh D
3021 - 3024	Initial lithography results from the digital electrostatic e-beam array lithography concept Baylor LR, Gardner WL, Yang X, Kasica RJ, Guillorn MA, Blalock B, Cui H, Hensley DK, Islam S, Lowndes DH, Melechko AV, Merkulov VI, Joy DC, Rack PD, Simpson ML, Thomas DK
3025 - 3031	Cs halide photocathode for multi-electron-beam pattern generator Maldonado JR, Coyle ST, Shamoun B, Yu M, Gesley M, Pianetta P
3032 - 3037	Alpha-prototype system for zone-plate-array lithography Menon R, Patel A, Moon EE, Smith HI
3038 - 3042	Comparison of tilting and piston mirror elements for 65 nm node spatial light modulator optical maskless lithography Watson GP, Aksyuk V, Tennant DM, Cirelli RA
3043 - 3048	Effect of electrostatic chucking and substrate thickness uniformity on extreme ultraviolet lithography mask flatness Mikkelson A, Engelstad R, Sohn J, Lovell E
3049 - 3052	High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes Chen HL, Cheng HC, Ko TS, Ko FH, Chu TC
3053 - 3058	Effect of mask pattern correction for off-axis incident light in extreme ultraviolet lithography Sugawara M, Nishiyama I, Takai M
3059 - 3062	Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry Perlich J, Kamm FM, Rau J, Scholze F, Ulm G
3063 - 3066	Influence of glass substrate surface roughness on extreme ultraviolet reflectivity of Mo/Si multilayer Miyagaki S, Yamanashi H, Yamaguchi A, Nishiyama L
3067 - 3071	Lithographic performance of diamond-like carbon membrane mask in electron projection lithography Yamashita H, Amemiya I, Yamabe M, Arimoto H
3072 - 3076	Ultrathin membrane masks for electron projection lithography Wood OR, Trybula WJ, Greschner J, Kalt S, Bayer T, Shimizu S, Yamamoto H, Suzuki K, Gordon MS, Robinson CF, Dhaliwal RS, Thiel CW, Caldwell N, Lawliss MS, Huang C
3077 - 3081	Assessment of image placement errors induced in electron projection lithography masks by chucking Chang J, Engelstad RL, Lovell EG, Trybula WJ, Wood OR
3082 - 3086	Thermal analysis of diamondlike carbon membrane masks in projection electron-beam lithography Babin S, Butomo V, Kuzmin IY, Yamashita H, Yamabe M
3087 - 3091	Stress and image-placement distortions of 200 mm low-energy electron projection lithography masks Eguchi H, Susa T, Sumida T, Kurosu T, Yoshii T, Yotsui K, Itoh K, Tamura A, Engelstad RL, Lovell EG, Azkorra X, Mikkelson A, Chang J, Janowski SM
3092 - 3096	Approach to full-chip simulation and correction of stencil mask distortion for proximity electron lithography Sawamura J, Suzuki K, Omori S, Ashida I, Ohnuma H
3097 - 3101	Optimized HT-AttPSM blanks using Al2O3/TiO2 multilayer films for the 65 nm technology node Lai FD
3102 - 3106	Pattern transferring technique using reversal mask process Kato H, Abe J, Onishi Y
3107 - 3111	Assembly and electrical characterization of DNA-wrapped carbon nanotube devices Talin AA, Dentinger PM, Jones FE, Pathak S, Hunter L, Leonard F, Morales AM
3112 - 3114	Silicon nitride gate dielectric for top-gated carbon nanotube field effect transistors Li SD, Yu Z, Burke PJ
3115 - 3118	Formation of 15 nm scale Coulomb blockade structures in silicon by electron beam lithography with a bilayer resist process Park SJ, Liddle JA, Persaud A, Allen FI, Schenkel T, Bokor J
3119 - 3123	Single electron memory devices utilizing Al2O3 tunnel oxide barriers Yadavalli KK, Anderson NR, Orlova TA, Orlov AO, Snider GL, Elam J
3124 - 3127	Electron beam stimulated field-emission from single-walled carbon nanotubes Nojeh A, Wong WK, Yieh E, Pease RF, Dai HJ
3128 - 3132	Fabrication and characterization of Au island single-electron transistors with CrOx step edge junctions Luo XN, Orlov AO, Snider GL
3133 - 3136	Wavelength tuning of an antenna-coupled infrared microbolometer Gritz MA, Metzler M, Malocha D, Abdel-Rahman M, Monacelli B, Zummo G, Boreman GD
3137 - 3142	Nanomechanical switch fabrication by focused-ion-beam chemical vapor deposition Morita T, Kondo K, Hoshino T, Kaito T, Fujita J, Ichihashi T, Ishida M, Ochiai Y, Tajima T, Matsui S
3143 - 3146	Fatigue life of a microcantilever beam in bending Hocheng H, Kao KS, Fang W
3147 - 3150	Compliant pin chuck for minimizing the effect of backside particles on wafer planarity Nimmakayala PK, Sreenivasan SV
3151 - 3153	Piezoelectric projective displays Park BM, Ha SW, Lee GS, Wong HY, Feldman M, Yun SK
3154 - 3157	Nanoflash device with self-aligned double floating gates using scanning probe lithography and tetramethylammonium hydroxide wet etching Sheu JT, Chen CC, You KS, Tsai ST
3158 - 3162	Three-dimensional and multimaterial microfabrication using focused-ion-beam chemical-vapor deposition and its application to processing nerve electrodes Hoshino T, Kawamori M, Suzuki T, Matsui S, Mabuchi K
3163 - 3167	Biological lithography: Improvements in DNA synthesis methods Kim C, Li M, Rodesch M, Lowe A, Richmond K, Cerrina F
3168 - 3173	Assembled micro-electromechanical-systems microcolumn from a single layer silicon process Saini R, Jandric Z, Tsui K, Udeshi T, Tuggle D
3174 - 3177	Deep-ultraviolet-microelectromechanicaI systems stencils for high-throughput resistless. patterning of mesoscopic structures van den Boogaart MAF, Kim GM, Pellens R, van den Heuvel JP, Brugger J
3178 - 3181	Fabrication of sub-5 nm gaps between metallic electrodes using conventional lithographic techniques Steinmann P, Weaver JMR
3182 - 3185	Nanoscale electronics based on two-dimensional dopant patterns in silicon Shen TC, Kline JS, Schenkel T, Robinson SJ, Ji JY, Yang C, Du RR, Tucker JR
3186 - 3190	25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance Olynick DL, Harteneck BD, Veklerov E, Tendulkar M, Liddle JA, Kilcoyne ALD, Tyliszczak T
3191 - 3195	Patterned grafting of polymer brushes onto flexible polymer substrates Padeste C, Solak HH, Brack HP, Slaski M, Gursel SA, Scherer GG
3196 - 3201	Structure quality of high aspect ratio sub-micron polymer structures patterned at the electron storage ring ANKA Achenbach S, Mappes T, Mohr J
3202 - 3205	Direct metal pattern writing by VUV photodissociation Yan JX, Gupta MC
3206 - 3209	Assessment of lithographic process variation effects in InGaAsP annular Bragg resonator lasers Green WMJ, Scheuer J, DeRose GA, Yariv A, Scherer A
3210 - 3213	Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor devices Cho WJ, Im K, Ahn CG, Yang JH, Oh J, Baek IBO, Lee S
3214 - 3216	Towards intersubband quantum box lasers: Electron-beam lithography update Tsvid G, D'Souza M, Botez D, Hawkins B, Khandekar A, Kuech T, Zory P
3217 - 3220	Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes Basu AS, McNamara S, Gianchandani YB
3221 - 3223	In situ observation of carbon-nanopi liar tubulization process Ichihashi T, Ishida M, Ochiai Y, Fujita J
3224 - 3228	Impact of residual layer uniformity on UV stabilization after embossing Wissen M, Schulz H, Bogdanski N, Scheer HC, Hirai Y, Kikuta H, Ahrens G, Reuther F, Glinsner T
3229 - 3232	High resolution lithography with PDMS molds Bender M, Plachetka U, Ran J, Fuchs A, Vratzov B, Kurz H, Glinsner T, Lindner F
3233 - 3241	Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography Chen JK, Ko FH, Hsieh KF, Chou CT, Chang FC
3242 - 3245	Interferometric in situ alignment for UV-based nanoimprint Fuchs A, Vratzov B, Wahlbrink T, Georgiev Y, Kurz H
3246 - 3250	Stamps for nanoimprint lithography by extreme ultraviolet interference lithography Park S, Schift H, Solak HH, Gobrecht J
3251 - 3256	Duo-mold imprinting of three-dimensional polymeric structures Kong YP, Low HY, Pang SW, Yee AF
3257 - 3259	Direct imprint of sub-10 nm features into metal using diamond and SiC stamps Lister KA, Thoms S, Macintyre DS, Wilkinson CDW, Weaver JMR, Casey BG
3260 - 3264	High fidelity blazed grating replication using nanoimprint lithography Chang CH, Montoya JC, Akilian M, Lapsa A, Heilmann RK, Schattenburg ML, Li M, Flanagan KA, Rasmussen AP, Seely JF, Laming JM, Kjornrattanawanich B, Goray LI
3265 - 3270	Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography Cardinale GF, Skinner JL, Talin AA, Brocato RW, Palmer DW, Mancini DP, Dauksher WJ, Gehoski K, Le N, Nordquist KJ, Resnick DJ
3271 - 3274	Imprint lithography issues in the fabrication of high electron mobility transistors Thoms S, Macintyre DS, Moran D, Thayne I
3275 - 3278	DNA nanopatterning with self-organization by using nanoimprint Ohtake T, Nakamatsu K, Matsui S, Tabata H, Kawai T
3279 - 3282	Predicting the fluid behavior during the dispensing process for step-and-flash imprint lithography Abdo A, Schuetter S, Nellis G, Wei A, Engelstad R, Truskett V
3283 - 3287	Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography Keil M, Beck M, Frennesson G, Theander E, Bolmsjo E, Montelius L, Heidari B
3288 - 3293	Simulation and experimental study of polymer deformation in nanoimprint lithography Hirai Y, Konishi T, Yoshikawa T, Yoshida S
3294 - 3299	Stability of functional polymers after plasticizer-assisted imprint lithography Reano RM, Kong YP, Low HY, Tan L, Wang F, Pang SW, Yee AF
3300 - 3305	Inspection of templates for imprint lithography Hess HF, Pettibone D, Adler D, Bertsche K, Nordquist KJ, Mancini DP, Dauksher WJ, Resnick DJ
3306 - 3311	Repair of step and flash imprint lithography templates Dauksher WJ, Nordquist KJ, Le NV, Gehoski KA, Mancini DP, Resnick DJ, Casoose L, Bozak R, White R, Csuy J, Lee D
3312 - 3317	Controlling imprint distortions in step-and-flash imprint lithography Schuetter SD, Dicks GA, Nellis GF, Engelstad RL, Lovell EG
3318 - 3322	Mold deformation in nanoimprint lithography Lazzarino F, Gourgon C, Schiavone P, Perret C
3323 - 3326	Polyvinyl alcohol templates for low cost, high resolution, complex printing Schaper CD, Miahnahri A
3327 - 3330	Fabrication of 1D and 2D vertical nanomagnetic resonators Zhang S, Fan WJ, Minhas BK, Frauenglass A, Malloy KJ, Brueck SRJ
3331 - 3334	Nanoscopic templates using self-assembled cylindrical diblock copolymers for patterned media Yang XM, Xiao SG, Liu C, Pelhos K, Minor K
3335 - 3338	Elliptical-ring magnetic arrays fabricated using zone-plate-array lithography Jung W, Castano FJ, Ross CA, Menon R, Patel A, Moon EE, Smith HI
3339 - 3343	Electron-beam SAFIER (TM) process and its application for magnetic thin-film heads Yang XM, Gentile H, Eckert A, Brankovic SR
3344 - 3347	GaAs-based 1.3 mu m microlasers with.photonic crystal mirrors Scherer H, Gollub D, Kamp M, Forchel A
3348 - 3351	Photonic crystals in polymers by direct electron-beam lithography presenting a photonic band gap Panepucci RR, Kim BH, Almeida VR, Jones MD
3352 - 3355	Large-area patterning for photonic crystals via coherent diffraction lithography Zanke C, Qi MH, Smith HI
3356 - 3358	Photonic crystal waveguides with propagation losses in the 1 dB/mm range Zimmermann J, Scherer H, Kamp M, Deubert S, Reithmaier JP, Forchel A, Marz R, Anand S
3359 - 3362	Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition Chen HL, Lee HF, Chao WC, Hsieh CI, Ko FH, Chu TC
3363 - 3365	Fabrication of photonic crystal waveguides composed of a square lattice of dielectric rods Assefa S, Petrich GS, Kolodziejski LA, Mondol MK, Smith HI
3366 - 3372	Optical inspection of next generation, lithography masks Pettibone D, Stokowski S
3373 - 3377	Dynamic self-inspection of integrated circuit pattern defects Feng HY, Ye J, Pease RFW
3378 - 3381	Nanometer gap measurement and verification via the chirped-Talbot effect Moon EE, Chen L, Everett PN, Mondol MK, Smith HI
3382 - 3385	Scanning-spatial-phase alignment for zone-plate-array lithography Menon R, Moon EE, Mondol MK, Castano FJ, Smith HI
3386 - 3389	Self-inspection of IC pattern defects Feng HY, Ye J, Pease RFW
3390 - 3393	Stress estimation of patterned films using a high-energy electron beam Mizuno F, Toshinawa T
3394 - 3398	Impacts of probe-tip tilt on scanning probe microscopy Mizuno F, Misumi I, Gonda S, Kurosawa T
3399 - 3404	Three-dimensional simulation of top down scanning electron microscopy images Grella L, Lorusso G, Lee P, Frank F, Adler DL
3405 - 3408	Technique for separately viewing multiple levels Jiang L, Feldman M
3409 - 3414	Lithographically directed self-assembly of nanostructures Liddle JA, Cui Y, Alivisatos P
3415 - 3420	Lithographically directed deposition of silica nanoparticles using spin coating Xia DY, Brueck SRJ
3421 - 3425	Electric-field-directed growth of carbon nanotubes in two dimensions Nojeh A, Ural A, Pease RF, Dai HJ
3426 - 3430	Selective growth of sculptured nanowires on microlithographic lattices Horn MW, Pickett MD, Messier R, Lakhtakia A
3431 - 3438	Immersion lithography: New opportunities for semiconductor manufacturing Gil D, Brunner TA, Fonseca C, Seong N, Streefkerk B, Wagner C, Stavenga M
3439 - 3443	Hyper NA water immersion lithography at 193 nm and 248 nm Smith BW, Fan YF, Zhou JM, Bourov A, Zavyalova L, Lafferty N, Cropanese F, Estroff A
3444 - 3449	Predicting air entrainment due to topography during the filling and scanning process for immersion lithography Wei A, El-Morsi M, Nellis G, Abdo A, Engelstad R
3450 - 3453	Fluid refractive index measurements using rough surface and prism minimum deviation techniques Synowicki RA, Pribil GK, Cooney G, Herzinger CM, Green SE, French RH, Yang MK, Burnett JH, Kaplan S
3454 - 3458	Optimizing the fluid dispensing process for immersion lithography Abdo A, Nellis G, Wei A, El-Morsi M, Engelstad R, Brueck SRJ, Neumann A
3459 - 3464	Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography Raub AK, Frauenglass A, Brueck SRJ, Conley W, Dammel R, Romano A, Sato M, Hinsberg W
3465 - 3469	244-nm imaging interferometric lithography Frauenglass A, Smolev S, Biswas A, Brueck SRJ
3470 - 3474	Near-field optical lithography using a planar silver lens Melville DOS, Blaikie RJ
3475 - 3478	Sub-100 nm lithography using ultrashort wavelength of surface plasmons Srituravanich W, Fang N, Durant S, Ambati M, Sun C, Zhang X
3479 - 3484	Sub-50 nm half-pitch imaging,with a low activation energy chemically amplified photoresist Wallraff GM, Medeiros DR, Sanchez M, Petrillo K, Huang WS, Rettner C, Davis B, Larson CE, Sundberg L, Brock PJ, Hinsberg WD, Houle FA, Hoffnagle JA, Goldfarb D, Temple K, Wind S, Bucchignano J
3485 - 3488	High resolution electron beam lithography using a chemically amplified calix[4]arene based resist Sailer H, Ruderisch A, Henschel W, Schurig V, Kern DP
3489 - 3492	Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes Kozawa T, Saeki A, Tagawa S
3493 - 3496	Lithographic patterning of a highly metallized polymer resist system and pyrolytic or plasma treatment to afford ferromagnetic ceramics Clendenning SB, Manners I
3497 - 3502	Nonaqueous development of silsesquioxane electron beam resist Schmid GM, Carpenter LE, Liddle JA
3503 - 3508	Patterning via surface monolayer initiated polymerization: A study of surface initiator photoreaction kinetics McCoy K, Hess DW, Henderson CL, Tolbert LM
3509 - 3512	Dissolution behavior of main-chain-fluorinated polymers for 157 nm lithography Kodani T, Ishikawa T, Yoshida T, Hayami T, Koh M, Moriya T, Yamashita T, Toriumi M, Araki T, Aoyama H, Hagiwara T, Furukawa T, Itani T, Fujii K
3513 - 3517	Evaluation of outgassing from a fluorinated resist for 157 nm lithography Irie S, Hagiwara T, Fujii K, Itakura Y, Kawasa Y, Egawa K, Uchino I, Sumitani A, Itani T
3518 - 3521	Impacts of 30-nm-thick resist on improving resolution performance of low-energy electron beam lithography Yoshizawa M, Moriya S, Oguni K, Nakano H, Omori S, Kitagawa T, Kotera M, Niu H
3522 - 3524	Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists Yamamoto H, Kozawa T, Nakano A, Okamoto K, Tagawa S, Ando T, Sato M, Komano H
3525 - 3527	Pinning effect of microliquid drop on geometrical complex substrates composed with different surface energy materials Yamanaka M, Okada A, Kawai A
3528 - 3533	Miniaturized finger-size electron-beam column with ceramic-type lenses for scanning electron microscopy Miyoshi M, Okumura K, Awata S, Okada Y, Maeda T, Yamaguchi H, Amano S
3534 - 3538	Low energy large scan field electron beam column for wafer inspection Liu X, Zhang X, Zhao Y, Desai A, Chen ZW
3539 - 3542	Addressable field emitter array: A tool for designing field emitters and a multibeam electron source Bauerdick S, Burkhardt C, Kern DP, Nisch W
3543 - 3546	Writing strategy and electron-beam system with an arbitrarily shaped beam Babin S
3547 - 3551	Gated photocathode arrays as sources for multibeam electron nanolithography McCarthy J, Simonson R
3552 - 3556	Preliminary evaluation of surface plasmon enhanced light transmission with a scanning 257 nm ultraviolet microscope Maldonado JR, Coyle ST, Varner JK, Moore RC, Stark PRH, Larson DN
3557 - 3559	High-speed and high-precision deflectors applied in electron beam lithography system based on scanning electron microscopy Liu ZM, Gu WQ
3560 - 3564	Direct spherical and chromatic aberration correction for charged particle optical systems Turnbull W
3565 - 3569	Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source Machuca F, Liu Z, Maldonado JR, Coyle ST
3570 - 3574	Minimal zone plates for x-ray lithography Amy D, Jiang L, Zheng R, Feldman M, Cerrina F, Dhuey S, Leonard Q, Thielman D
3575 - 3580	Modeling, fabrication, and experimental application of clear x-ray phase masks Malueg DH, Taylor JW, Thielman D, Leonard Q, Dhuey S, Cerrina F
3581 - 3584	Temperature distributions to correct distortions in membrane masks Jiang L, Feldman M