Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.23, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (183 articles)

L17 - L21	Possible role of oxygen impurities in degradation of nc-TiN/a-Si3N4 nanocomposites Veprek S, Karvankova P, Veprek-Heijman MGJ
L22 - L24	Light-emitting diodes with nickel substrates fabricated by electroplating Chang PH, Chen NC, Wang YN, Shih CF, Wu MH, Yang TH, Tzou YH, Wang SJ
L25 - L27	Passivation of zinc-tin-oxide thin-film transistors Hong D, Wager JF
2261 - 2265	Thermal-induced formation of silver nanowires on titanium dioxide thin films Chen TK, Chen WT, Yang MC, Wong MS
2266 - 2271	Magnetoplasmons in a pair of armchair carbon nanotubes Lee CH, Chiu CW, Shyu FL, Lin MF
2272 - 2277	Co-gas impact of B2H6 plasma diluted with helium on the plasma doping process in a pulsed glow-discharge system Qin S, McTeer A, Hu YJ
2278 - 2283	Self-assembled tungsten nanocrystals in high-k dielectric for nonvolatile memory application Samanta SK, Tan ZYL, Yoo WJ, Samudra G, Lee SJ, Bera LK, Balasubramanian N
2284 - 2287	Enhancement of electroluminescence in GaN-based light-emitting diodes using an efficient current blocking layer Jang HW, Lee JL
2288 - 2291	Effects of focused gallium ion-beam implantation on properties of nanochannels on silicon-on-insulator substrates Pan A, Wang YL, Wu CS, Chen CD, Liu NW
2292 - 2296	Selective growth of vertical ZnO nanowires on ZnO : Ga/Si3N4/SiO2/Si templates Hsu CL, Chang SJ, Hung HC, Lin YR, Lu TH, Tseng YK, Chen IC
2297 - 2303	Tip characterization and surface reconstruction of complex structures with critical dimension atomic force microscopy Dahlen G, Osborn M, Okulan N, Foreman W, Chand A, Foucher J
2304 - 2308	Effect of a thin W interlayer on the thermal stability and electrical characteristics of NiSi film Huang W, Zhang LC, Gao YZ, Jin HY, Ning BJ, Zhang GQ
2309 - 2313	Spatially selective immobilization of ferritin using solid-solution interfacial interactions Manning E, Yau ST
2314 - 2318	Study of the buffer-layer and annealing-temperature impact on fabrication of polycrystalline Fe3O4 film for the application of spintronic devices Tang XL, Zhang HW, Su H, Zhong ZY
2319 - 2329	Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect Yeom J, Wu Y, Selby JC, Shannon MA
2330 - 2335	Ohmic contact formation mechanism of Ta/Al/Mo/Au and Ti/Al/Mo/Au metallizations on AlGaN/GaN HEMTs Mohammed FM, Wang L, Selvanathan D, Hu H, Adesida I
2336 - 2339	Operation of nanocrystalline silicon ballistic emitter in low vacuum and atmospheric pressures Ohta T, Kojima A, Hirakawa H, Iwamatsu T, Koshida N
2340 - 2346	Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber Smith JW, Seutter SM, Iyer RS
2347 - 2350	Physical characterization of ZnO nanorods grown on Si from aqueous solution and annealed at various atmospheres Yang CC, Chen SY, Lee HY
2351 - 2356	Observations of interfaces in direct wafer-bonded InP-GaAs structures Lao YF, Wu HZ, Li M
2357 - 2362	Passivation effects on the stability of pentacene thin-film transistors with SnO2 prepared by ion-beam-assisted deposition Kim WJ, Koo WH, Jo SJ, Kim CS, Baik HK, Lee J, Im S
2363 - 2368	Field emission of carbon nanotubes grown on carbon cloth Jo SH, Huang JY, Chen S, Xiong GY, Wang DZ, Ren ZF
2369 - 2372	Effects of bonding materials in screen-printing paste on the field-emission properties of carbon nanotube cathodes Shin HY, Chung WS, Kim KH, Cho YR, Shin BC
2373 - 2377	Characterization of bulk GaN rectifiers for hydrogen gas sensing Voss L, Gila BP, Pearton SJ, Wang HT, Ren F
2378 - 2383	Iridium/silicon capping layer for soft x-ray and extreme ultraviolet mirrors Prisbrey ST, Vernon SP, Clift WM
2384 - 2389	Temperature characteristics of stress-induced migration based on atom migration Aoyagi M
2390 - 2393	Magnetoresistance of patterned NiFe thin films with structures modified by atomic force microscope nanolithography Watanabe G, Koizumi S, Yamada T, Takemura Y, Shirakashi JI
2394 - 2397	Fabrication and characterization of CuO nanorods by a submerged arc nanoparticle synthesis system Lo CH, Tsung TT, Chen LC
2398 - 2402	Preparation and characterization of titania nanotubes and hybrid materials derived from them Lin YJ, Wang LY, Chiu WY
2403 - 2408	Nanoscale electron stimulated chemical vapor deposition of Au in an environmental transmission electron microscope Ketharanathan S, Sharma R, Drucker J
2409 - 2412	Bubbles in immersion lithography Switkes M, Rothschild M, Shedd TA, Burnett HB, Yeung MS
2413 - 2418	Photosensitive quantum dot composites and their applications in optical structures Pang L, Tetz K, Shen YM, Chen CH, Fainman Y
2419 - 2426	Modeling of protection schemes for critical surfaces under low pressure conditions: Comparison between analytical and numerical approach Asbach C, Pui DYH, Kim JH, Yook SJ, Fissan H
2427 - 2435	Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography Hinsberg W, Houle F
2436 - 2443	Barrier height enhancement and stability of the Au/n-InP Schottky barrier diodes oxidized by absorbed water vapor Cetin H, Ayyildiz E, Turut A
2444 - 2448	Formation of Ti-Si-N film using low frequency, high density inductively coupled plasma process Ee YC, Chen Z, Chan L, See KH, Law SB, Xu S, Tsakadze ZL, Rutkevych PP, Zeng KY, Shen L
2449 - 2456	High-efficiency light-emitting device based on silicon nanostructures and tunneling carrier injection Wong H, Filip V, Chu PL
2457 - 2464	Diamond nanorods Shenderova OA, Padgett CW, Hu Z, Brenner DW
2465 - 2470	Various driving modes of a field emission cathode Choi YS
2471 - 2475	Nanoscale fabrication in aqueous KOH solution using tribo-nanolithography Kawasegi N, Park JW, Morita N, Yamada S, Takano N, Oyama T, Ashida K
2476 - 2479	Wing-tilt-free gallium nitride laterally grown on maskless chemical-etched sapphire-patterned substrate Wang J, Guo LW, Jia HQ, Xing G, Wang Y, Chen H, Zhou JM
2480 - 2485	Lanthanum aluminate by atomic layer deposition and molecular beam epitaxy Triyoso DH, Li H, Hegde RI, Yu Z, Moore K, Grant J, White BE, Tobin PJ
2486 - 2495	Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films Eklund P, Emmerlich J, Hogberg H, Wilhelmsson O, Isberg P, Birch J, Persson ROA, Jansson U, Hultman L
2496 - 2498	Ultra small self-organized nitride nanotips Ji LW, Fang TH, Hung SC, Su YK, Chang SJ, Chuang RW
2499 - 2503	Reactive-ion etching of high-Q and submicron-diameter GaAs/AlAs micropillar cavities Varoutsis S, Laurent S, Sagnes I, Lemaitre A, Ferlazzo L, Meriadec C, Patriarche G, Robert-Philip I, Abram I
2504 - 2509	Design and simulation of ZnO-based light-emitting diode structures Han SY, Yang H, Norton DR, Pearton SJ, Ren F, Osinsky A, Dong JW, Hertog B, Chow PP
2510 - 2513	Electrical transport of tetragonal boron nanobelts Kirihara K, Wang Z, Kawaguchi K, Shimizu Y, Sasaki T, Koshizaki N, Hyodo H, Soga K, Kimura K
2514 - 2517	Effects of doping type and concentration on precipitation of nanometer arsenic clusters in low-temperature-grown GaAs Lee WN, Chen YF, Huang JH, Guo XJ, Kuo CT
2518 - 2521	Acidic acrylic polymers for nanoimprint lithography on flexible substrates Liao WC, Hsu SLC
2522 - 2525	Ultrathin pore-seal film by plasma enhanced chemical vapor deposition SiCH from tetramethylsilane Furuya A, Yoneda K, Soda E, Yoshie T, Okamura H, Shimada M, Ohtsuka N, Ogawa S
2526 - 2529	Pulse oscillation of self-organized In0.53Ga0.47As quantum wire lasers grown on (775)B InP substrates by molecular beam epitaxy Hino H, Shigenobu A, Ohmori K, Kitada T, Shimomura S, Hiyamizu S
2530 - 2537	Interfacial reactions in nickel/titanium ohmic contacts to n-type silicon carbide Park JH, Holloway PH
2538 - 2544	Investigation of surface treatment schemes on n-type GaN and Al0.20Ga0.80N Selvanathan D, Mohammed FM, Bae JO, Adesida I, Bogart KHA
2545 - 2552	Thickness and density evaluation for nanostructured thin films by glancing angle deposition Buzea C, Kaminska K, Beydaghyan G, Brown T, Elliott C, Dean C, Robbie K
2553 - 2556	Effects of etch barrier densification on step and flash imprint lithography Johnson S, Burns R, Kim EK, Dickey M, Schmid G, Meiring J, Burns S, Willson CG, Convey D, Wei Y, Fejes P, Gehoski K, Mancini D, Nordquist K, Dauksher WJ, Resnick DJ
2557 - 2560	Phase transformations in copper oxide nanowires Han S, Chen HY, Chu YB, Shih HC
2561 - 2563	Material and electrical analysis of hafnium titania bilayer dielectric metal-oxide-semiconductor field-effect transistors Rhee SJ, Kang CY, Choi CH, Zhang MH, Lee JC
2564 - 2566	Electrochemical fabrication of cobalt and nickel tips for scanning tunneling microscopy Albonetti C, Cavallini M, Massi M, Moulin JF, Biscarini F
2577 - 2577	Papers from the 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Preface Peckerar M
2578 - 2583	Modeling and simulation for nanometrics Neureuther AR, Ceperley D
2584 - 2588	History of extreme ultraviolet lithography Kinoshita H
2589 - 2595	Electron-electron interaction induced beam displacement in a multiple electron beam system Yu ML, Coyle ST, DeVore W, Shamoun B
2596 - 2600	Full wafer simulation of immersion fluid heating El-Morsi M, Nellis G, Schuetter S, Van Peski C, Grenville A
2601 - 2606	Charting the future (and remembering the past) of optical lithography simulation Mack CA
2607 - 2610	Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging Moon EE, Mondol MK, Everett PN, Smith HI
2611 - 2616	Control of the receding meniscus in immersion lithography Burnett H, Shedd T, Nellis G, El-Morsi M, Engelstad R, Garoff S, Varanasi K
2617 - 2623	Direct patterning of spin-on glass with 157 nm lithography: Application to nanoscale crystal growth Bloomstein TM, Juodawlkis PW, Swint RB, Cann SG, Deneault SJ, Efremow NN, Hardy DE, Marchant MF, Napoleone A, Oakley DC, Rothschild M
2624 - 2630	Hybrid exposure strategy: Combining e-beam direct writing with optical lithography for magnetic recording heads Yang XM
2631 - 2635	Use of optical defocus components to investigate and improve pattern spatial frequency characteristics for more robust layouts Melvin LS, Shiely JP, Yan QL
2636 - 2639	Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask Srituravanich W, Durant S, Lee H, Sun C, Zhang X
2640 - 2645	Doppler writing and linewidth control for scanning beam interference lithography Montoya JC, Chang CH, Heilmann RK, Schattenburg ML
2646 - 2652	Screening layouts for high-numerical aperture and polarization effects using pattern matching McIntyre GR, Holwill J, Neureuther A, Capodieci L, Zou Y, Levinson H, Kye J
2653 - 2656	Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate Shin J, Hwang C, Lee S, Woo SG, Cho HK, Moon JT
2657 - 2661	Immersion zone-plate-array lithography Chao D, Patel A, Barwicz T, Smith HI, Menon R
2662 - 2667	Pumped quantum systems: Immersion fluids of the future? Anant V, Radmark M, Abouraddy AF, Killian TC, Berggren KK
2668 - 2674	Hyper high numerical aperature achromatic interferometer for immersion lithography at 193 nm Charley AL, Lagrange A, Lartigue O, Simon J, Thony P, Schiavone P
2675 - 2678	Propagating modes in subwavelength cylindrical holes Catrysse PB, Shin H, Fan SH
2679 - 2683	Full field analysis of lithography performance for ArF immersion lithography Li YQ, Huang GS
2684 - 2693	Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography Lin CH, Wang LA
2694 - 2699	Fabrication of enclosed nanochannels using silica nanoparticles Xia DY, Brueck SRJ
2700 - 2704	Large-area, infrared nanophotonic materials fabricated using interferometric lithography Fan WJ, Zhang S, Malloy KJ, Brueck SRJ
2705 - 2710	Achromatic spatial frequency multiplication: A method for production of nanometer-scale periodic structures Solak HH, Ekinci Y
2711 - 2715	Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance Yamaguchi A, Fukuda H, Arai T, Yamamoto J, Hirayama T, Shiono D, Hada H, Onodera J
2716 - 2720	Proton and anion distribution and line edge roughness of chemically amplified electron beam resist Kozawa T, Yamamoto H, Saeki A, Tagawa S
2721 - 2727	Static and dynamic contact angles of water on photoresist Burnett H, Shedd T, Nellis G, Van Peski C
2728 - 2732	Study on acid generation from polymer Yamamoto H, Kozawa T, Nakano A, Okamoto K, Tagawa S, Ando T, Sato M, Komano H
2733 - 2737	Full three-dimensional characterization of 25 nm lines for chemically amplified resist simulation Landis S, Pauliac S, Foucher J, Thiault J, de Crecy F
2738 - 2742	Effects of through-focus symmetry in maskless lithography using micromirror arrays Wang JS, Hafeman S, Neureuther AR, Solgaard O
2743 - 2748	Hybrid optical maskless lithography: Scaling beyond the 45 nm node Fritze M, Bloomstein TM, Tyrrell B, Fedynyshyn TH, Efremow NN, Hardy DE, Cann S, Lennon D, Spector S, Rothschild M, Brooker P
2749 - 2753	Dynamic chromatic aberration correction in low energy electron microscopes Khursheed A
2754 - 2757	Performances by the electron optical system of low energy electron beam proximity projection lithography tool with a large scanning field Kasahara H, Shishido T, Samoto N, Shimazu N
2758 - 2762	Narrow cone emission from negative electron affinity photocathodes Liu Z, Sun Y, Pianetta P, Pease RFW
2763 - 2768	Negative charging-up contrast formation of multilayered structures with a nonpenetrating electron beam in scanning-electron microscope Miyoshi M, Ura K
2769 - 2774	Experimental optimization of the electron-beam proximity effect forward scattering parameter Rooks M, Belic N, Kratschmer E, Viswanathan R
2775 - 2779	Dependence of linewidth and its edge roughness on electron beam exposure dose Kotera M, Yagura K, Niu H
2780 - 2783	Electron-beam direct writing system employing character projection exposure with production dispatching rule Tominaga T, Nakamae K, Matsuo T, Fujioka H, Nakasugi T, Tawarayama K
2784 - 2788	SnO2 lithographic processing for nanopatterned gas sensors Candeloro P, Comini E, Baratto C, Faglia G, Sberveglieri G, Kumar R, Carpentiero A, Di Fabrizio E
2789 - 2792	Visualization and in situ contacting of carbon nanotubes in a scanning electron microscope Croitoru MD, Bertsche G, Kern DR, Burkhardt C, Bauerdick S, Sahakalkan S, Roth S
2793 - 2797	Towards nano-fluidics by solvent deformation of electron beam resist Pearson JL, Cumming DRS
2798 - 2800	Ion implantation with scanning probe alignment Persaud A, Liddle JA, Schenkel T, Bokor J, Ivanov T, Rangelow IW
2801 - 2805	Mechanical characteristics and its annealing effect of diamondlike-carbon nanosprings fabricated by focused-ion-beam chemical vapor deposition Nakamatsu K, Nagase M, Igaki JY, Namatsu H, Matsui S
2806 - 2810	Cross beam lithography (FIB plus EBL) and dip pen nanolithography for nanoparticle conductivity measurements Cabrini S, Barsotti RJ, Carpentiero A, Businaro L, Zaccaria RP, Stellacci F, Di Fabrizio E
2811 - 2815	Writing the identity in radio frequency identity tags with focused ion-beam implantation of transistor gates De Marco A, Bandy W, Parsa S, Kaufmann H, Melngailis J
2816 - 2820	Analytical model of a gas phase field ionization source Liu XF, Orloff J
2821 - 2824	Electrical properties of nanocontacts on silicon nanoparticles embedded in thin SiO2 synthesized by ultralow energy ion implantation Ben Assayag G, Shalchian M, Coffin H, Claverie A, Grisolia J, Dumas C, Atarodi SM
2825 - 2832	Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition Fowlkes JD, Randolph SJ, Rack PD
2833 - 2839	Development of a multi-electron-beam source for sub-10 nm electron beam induced deposition van Bruggen MJ, van Someren B, Kruit P
2840 - 2843	Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source Naulleau P, Cain JP, Anderson E, Dean K, Denham P, Goldberg KA, Hoef B, Jackson K
2844 - 2847	Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering technique Shumway MD, Naulleau P, Goldberg KA, Bokor JR
2848 - 2851	Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination Gomei Y, Takase H, Aoki T, Matsunari S, Terashima S, Kakutani Y, Niibe M
2852 - 2855	Mask defect inspection using an extreme ultraviolet microscope Hamamoto K, Tanaka Y, Lee SY, Hosokawa N, Sakaya N, Hosoya M, Shoki T, Watanabe T, Kinoshita H
2856 - 2859	Predicting the dynamic response of an extreme ultraviolet reticle during exposure scanning Dicks G, Mikkelson A, Engelstad R, Lovell E
2860 - 2865	Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks Farys V, Charpin-Nicolle C, Richard M, Robic JY, Muffato V, Quesnel E, Postnikov S, Schiavone P, Besacier M, Smaali R, Naulleau P
2866 - 2869	Investigation of multilayer structural changes in phase and amplitude-defects correction process Lee SY, Kim TG, Park JG, Song JK, Kim OH, Yong CW, Ahn J
2870 - 2874	Asymmetry of aerial image after mask pattern correction for off-axis incident light in extreme ultraviolet lithography Sugawara M, Nishiyama I, Takai M
2875 - 2878	Imaging characteristics and specification of mask mean-to-target and mask uniformity according to polarization status Lee SW, Finders J, Lee SJ, Woo SG, Cho HK
2879 - 2884	Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography Takenoshita K, Koay CS, George S, Teerawattansook S, Richardson M, Bakshi V
2885 - 2890	Extreme ultraviolet focus sensor design optimization Goldberg KA, Teyssier MM, Liddle JA
2891 - 2895	Electrical characterization of multilayer masks for extreme ultraviolet lithography Hartley JG, Raghunathan S, Govindaraju A
2896 - 2902	Development, installation, and performance of the X-ray stepper JSAL 5C Leonard Q, Malueg D, Wallace J, Taylor JW, Dhuey S, Cerrina F, Boerger B, Selzer R, Yu M, Ma Y, Myers K, Trybendis M, Moon E, Smith HI
2903 - 2909	Large area and wide dimension range X-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation Utsumi Y, Kishimoto T
2910 - 2913	Functionalized SU-8 patterned with X-ray lithography Balslev S, Romanato F
2914 - 2919	4 Inch lift-off process by trilayer nanoimprint lithography Tallal J, Berton K, Gordon M, Peyrade D
2920 - 2924	Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching Tormen M, Carpentiero A, Vaccari L, Altissimo M, Ferrari E, Cojoc D, Di Fabrizio E
2925 - 2928	Ultraviolet-based nanoimprint at reduced environmental pressure Fuchs A, Bender M, Plachetka U, Hermanns U, Kurz H
2929 - 2932	Enhanced molecular patterning via microdisplacement printing Dameron AA, Hampton JR, Gillmor SD, Hohman JN, Weiss PS
2933 - 2938	Defect control in nanoimprint lithography Chen L, Deng XG, Wang J, Takahashi K, Liu F
2939 - 2943	Fabrication of 1/4 wave plate by nanocasting lithography Yoshikawa T, Konishi T, Nakajima M, Kikuta H, Kawata H, Hirai Y
2944 - 2949	Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography Bilenberg B, Hansen M, Johansen D, Ozkapici V, Jeppesen C, Szabo P, Obieta IM, Arroyo O, Tegenfeldt JO, Kristensen A
2950 - 2953	High performance 100 mm-in-diameter true zero-order waveplates fabricated by imprint lithography Wang JJ, Deng XG, Liu F, Chen L, Nikolov A, Liu XM, Deng JD, Sciortino P
2954 - 2957	Three-dimensional polymer structures fabricated by reversal ultraviolet-curing imprint lithography Kehagias N, Zelsmann M, Torres CMS, Pfeiffer K, Ahrens G, Gruetzner G
2958 - 2962	Simulations of nonuniform embossing: The effect of asymmetric neighbor cavities on polymer flow during nanoimprint lithography Rowland HD, King WP, Sun AC, Schunk PR
2963 - 2966	Polymer time constants during low temperature nanoimprint lithography Scheer HC, Bogdanski N, Wissen M, Konishi T, Hirai Y
2967 - 2971	Vinyl ether formulations for step and flash imprint lithography Kim EK, Stewart MD, Wu K, Palmieri FL, Dickey MD, Ekerdt JG, Willson CG
2972 - 2978	Fabrication and surface chemistry of nanoscale bioarrays designed for the study of cytoskeletal protein binding interactions and their effect on cell motility Cherniavskaya O, Chen CJ, Heller E, Sun E, Provezano J, Kam L, Hone J, Sheetz MP, Wind SJ
2979 - 2983	Arrays of high-Q high stability ultrahigh-frequency resonators for chemical/biological sensors Kubena RL, Chang DT, Stratton FP, Joyce RJ, Hsu TY, Lim MK, M'Closkey RT
2984 - 2989	Effects of nanoimprinted patterns in tissue-culture polystyrene on cell behavior Hu W, Yim EKF, Reano RM, Leong KW, Pang SW
2990 - 2994	Three-dimensional digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal Prasciolu M, Malureanu R, Cabrini S, Cojoc D, Businaro L, Carpentiero A, Kumar R, Di Fabrizio E
2995 - 2999	Sealed three-dimensional nanochannels Reano RM, Pang SW
3000 - 3005	Self-aligned platinum-silicide nanowires for biomolecule sensing Ko FH, Yeh ZH, Chen CC, Liu TF
3006 - 3010	Resonant grating filters as refractive index sensors for chemical and biological detections Wang JJ, Chen L, Kwan S, Liu F, Deng XG
3011 - 3014	Polymer cell culture substrates with combined nanotopographical patterns and micropatterned chemical domains Charest JL, Eliason MT, Garcia AJ, King WP, Talin AA, Simmons BA
3015 - 3022	Advanced electron microscopy needs for nanotechnology and nanomanufacturing Postek MT, Villarrubia JS, Vladar AE
3023 - 3027	Effect of initial resist thickness on residual layer thickness of nanoimprinted structures Lee HJ, Ro HW, Soles CL, Jones RL, Lin EK, Wu WL, Hines DR
3028 - 3032	Traceable calibration of critical-dimension atomic force microscope linewidth measurements with nanometer uncertainty Dixson RG, Allen RA, Guthrie WF, Cresswell MW
3033 - 3036	Local critical dimension variation from shot-noise related line edge roughness Kruit P, Steenbrink S
3037 - 3042	Subpixel alignment for scanning-beam lithography using one-dimensional, phase-based mark detection Krishnamurthy AV, Namepalli RV, Hastings JT
3043 - 3046	Investigation of overlay errors due to the interaction of optical and extreme ultraviolet mask fabrication processes Zheng L, Engelstad RL, Lovell EG
3047 - 3051	Overlay alignment using optical microscopy and arbitrary surface features Picciotto C, Gao J, Hoarau E, Wu W, Jackson W, Tong WM
3052 - 3055	Technique for estimating the angle of incidence and depth of focus of an electron beam Mizuno F, Amemiya I, Taniguchi K
3056 - 3060	Portable coordinate measuring tool Jiang L, Feldman M
3061 - 3064	Fabrication of high-secondary-electron-yield grids for spatial-phase-locked electron-beam lithography Zhang F, Smith HI, Dai JF
3065 - 3068	Pattern matching between a scanning electron microscopy exposed pattern image of large-scale integrated fine structures and computer-aided design layout data by using the relaxation method Miura K, Fujita M, Nakamae K, Fujioka H
3069 - 3074	Measurement of residual thickness using scatterometry Fuard D, Perret C, Farys V, Gourgon C, Schiavone P
3075 - 3079	Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes Thiault J, Foucher J, Tortai JH, Joubert O, Landis S, Pauliac S
3080 - 3084	Reconstruction of pattern images from scanning electron microscope images Feng HY, Ye J, Pease RFW
3085 - 3089	Self inspection of integrated circuits pattern defects using support vector machines Feng HY, Ye J, Pease RF
3090 - 3093	Advanced atomic force microscopy probes: Wear resistant designs Liu H, Klonowski M, Kneeburg D, Dahlen G, Osborn M, Bao T
3094 - 3100	Improving critical dimension accuracy and throughput by subfield scheduling in electron beam mask writing Babin S, Kahng AB, Mandoiu II, Muddu S
3101 - 3105	Advanced photolithographic mask repair using electron beams Liang T, Frendberg E, Lieberman B, Stivers A
3106 - 3115	Electromagnetic phenomena in advanced photomasks Schellenberg FM, Adam K, Matteo J, Hesselink L
3116 - 3119	Innovative approach to nanoscale device fabrication and low-temperature nitride film growth Akhadov EA, Read DE, Mueller AH, Murray J, Hoffbauer MA
3120 - 3123	Electron beam lithography patterning of sub-10 nm line using hydrogen silsesquioxane for nanoscale device applications Baek IB, Yang JH, Cho WJ, Ahn CG, Im K, Lee S
3124 - 3128	Direct-write e-beam patterning of stimuli-responsive hydrogel nanostructures Tirumala VR, Divan R, Ocola LE, Mancini DC
3129 - 3131	Reduction of oxide layer on Ru surface by atomic-hydrogen treatment Nishiyama I, Oizumi H, Motai K, Izumi A, Ueno T, Akiyama H, Namiki A
3132 - 3137	Nanoscale patterning in application to materials and device structures Erbe A, Jiang W, Bao Z, Abusch-Magder D, Tennant DM, Garfunkel E, Zhitenev N
3138 - 3142	Low damage sputter deposition of tungsten for decanano compound semiconductor transistors Cao X, Macintyre DS, Thoms S, Li X, Zhou H, Wilkinson CDW, Holland M, Donaldson L, McEwan F, McLellend H, Thayne I
3143 - 3147	Copper germanide Ohmic contact on n-type gallium nitride using silicon tetrachloride plasma Schuette ML, Lu W
3148 - 3152	Simulation of the cathode surface damages in a HOPFED during ion bombardment Zhao HP, Lei W, Zhang XB, Li XH, Wang QL
3153 - 3157	Micromachined Arch-type cantilever as high sensitivity uncooled infrared detector Ivanova K, Ivanov T, Rangelow IW
3158 - 3163	Rapid prototyping of infrared bandpass filters using aperture array lithography Han KP, Morgan M, Ruiz A, Vemula SC, Ruchhoeft P
3164 - 3167	Monolithically integrated circular polarizers with two-layer nano-gratings fabricated by imprint lithography Wang JJ, Liu F, Deng XG, Liu XM, Chen L, Sciortino P, Varghese R
3168 - 3173	Lithographically fabricated optical cavities for refractive index sensing Adams M, DeRose GA, Loncar M, Scherer A
3174 - 3177	Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold Brintlinger T, Fuhrer MS, Melngailis J, Utke I, Bret T, Perentes A, Hoffmann P, Abourida M, Doppelt P
3178 - 3181	Positioning of carbon nanotubes using soft-lithography for electronics applications Plank NOV, Ishida M, Cheung R
3182 - 3187	Direct measurements and analyses of the Coulomb effects in electron projection lithography Yamamoto J, Yamashita H, Arimoto H, Ikeda J, Suzuki S, Kawata S
3188 - 3192	Proximity effect correction using blur map in electron projection lithography Yamashita H, Yamamoto J, Koba F, Arimoto H
3193 - 3196	Integrated four-channel GaAs-based quantum dot laser module with photonic crystals Scherer H, Namje K, Deubert S, Loffler A, Reithmaier JP, Kamp M, Forchel A
3197 - 3201	Fabrication of a hard mask for InP based photonic crystals: Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO2 and SiNx Wuest R, Strasser P, Robin F, Erni D, Jackel H
3202 - 3204	Subcritical carbon dioxide assisted polymer nanofabrication at low temperatures Yang Y, Lee LJ, Lu W
3205 - 3208	Formation of GaN layer on SiN surface using low-energy Ga ion implantation Yanagisawa J, Toda M, Kitamura T, Matsumoto H, Akasaka Y
3209 - 3213	Filling high aspect-ratio nano-structures by atomic layer deposition and its applications in nano-optic devices and integrations Wang JJ, Deng XG, Varghese R, Nikolov A, Sciortino P, Liu F, Chen L, Liu XM
3214 - 3218	Fabrication of a Si/SiO2 multiple-quantum-well light emitting diode using remote plasma enhanced chemical vapor deposition Rolver R, Bruninghoff S, Forst M, Spangenberg B, Kurz H