Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.16, No.1 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (25 articles)

1 - 16	Monte-Carlo Global Sensitivity Analysis of Boltzmann-Equation for Electron Kinetics in H-2 Discharges Esposito F, Colonna G, Longo S, Capitelli M
3 - 4	Special Issue in Honor of Pfender,Emil on the Occasion of His 70th Birthday - Foreword Heberlein J, Kong PC, Young RM, Verprek S
5 - 17	Modeling of Nonequilibrium Effects in a High-Velocity Nitrogen-Hydrogen Plasma-Jet Chang CH, Ramshaw JD
17 - 38	Computational Study of High-Speed Plasma-Flow Impinging on an Enthalpy Probe Chang CH, Ramshaw JD
19 - 42	An Approximate Quantitative-Analysis of Nonequilibrium Plasma Transport for High-Density Plasmas Schram DC, Dehaas JC, Vandermullen JA, Vandesanden MC
39 - 57	Sound-Velocity in Different Reacting Thermal Plasma Systems Pateyron B, Elchinger MF, Delluc G, Fauchais P
43 - 56	Nozzle Optimization for Dissociated Species Transport in Low-Pressure Plasma Chemical-Vapor-Deposition George C, Candler G, Young R, Pfender E, Heberlein J
57 - 69	2-Dimensional Model for Thermal Plasma Chemical-Vapor-Deposition Kolman D, Heberlein J, Pfender E, Young R
59 - 77	Formation of Gaseous Intermediates in Titanium(IV) Chloride Plasma Oxidation Karlemo B, Koukkari P, Paloniemi J
71 - 82	Plasma-Particle Momentum-Transfer Under Conditions of Great Knudsen-Numbers and Thin Plasma Sheath Chen X
79 - 97	Rarefied Plasma - Metallic Particle Heat and Momentum-Transfer Under Hypersonic Flow Conditions Gnedovets AG, Gusarov AV, Uglov AA
83 - 98	On the Spreading and Solidification of Molten Particles in a Plasma Spray Process - Effect of Thermal Contact Resistance Pasandidehfard M, Mostaghimi J
99 - 120	Role of Etch Products in Polysilicon Etching in a High-Density Chlorine Discharge Lee C, Graves DB, Lieberman MA
99 - 125	Parameters Controlling the Generation and Properties of Plasma-Sprayed Zirconia Coatings Fauchais P, Vardelle M, Vardelle A, Bianchi L, Leger AC
121 - 140	Theoretical-Studies on Microscopic and Macroscopic Nonuniformities in Electric-Discharge-Excited XeCl Lasers Demyanov AV, Kochetov IV, Napartovich AP, Longo S, Capitelli M
127 - 139	Study of Deposition Offset in Plasma Spray of Zirconia Zhuang WH, Gray D, Etemadi K, Benenson DM
141 - 156	The Role of Radicals and Clusters in Thermal Plasma Flash Evaporation Processing Takamura Y, Hayasaki K, Terashima K, Yoshida T
141 - 152	X-Ray-Imaging During Plasma-Source Ion-Implantation Piper M, Shohet JL, Booske JH, Chew KH, Zhang L, Sandstrom P, Jacobs J
157 - 168	Control of Substrate-Temperature During Diamond Deposition Bieberich MT, Girshick SL
169 - 189	Diffusion Phenomena of a Cold Gas in a Thermal Plasma Stream Rahmane M, Soucy G, Boulos MI
191 - 210	Co-Processing Conception of a Quenching Plasma Reactor Associated to a Fluidized-Bed Designed to Hydrogen Radical Production at Low-Temperatures Mohammedi MN, Cavvadias S, Leuenberger JL, Francke E, Amouroux J
211 - 227	Characterization of DC Plasma Torch Voltage Fluctuations Coudert JF, Planche MP, Fauchais P
229 - 244	Characterization of the Arc Cathode Attachment by Emission-Spectroscopy and Comparison to Theoretical Predictions Zhou X, Heberlein J
245 - 265	Theoretical Radiative Emission Results for Argon/Copper Thermal Plasmas Menart J, Heberlein J, Pfender E
267 - 302	Transport-Properties of High-Temperature Air Components - A Review Capitelli M, Celiberto R, Gorse C, Giordano D