화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.18, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (9 articles)

153 - 180 On the nonlocal electron kinetics in s- and p-striations of DC glow discharge plasmas : I. Electron establishment in striation-like fields
Sigeneger F, Golubovskii YB, Porokhova IA, Winkler R
181 - 187 Simple model for calculating the rate constants of plasma-chemical reactions in low-pressure DC magnetron discharges
Pekker L
189 - 214 On the correlation between deposition rate and process parameters in remote plasma-enhanced chemical vapor deposition
Bayer C, von Rohr PR
215 - 239 Converting methane by using an RF plasma reactor
Hsieh LT, Lee WJ, Chen CY, Chang MB, Chang HC
241 - 245 The CO2 reforming of natural gas in a silent discharge reactor
Gesser HD, Hunter NR, Probawono D
247 - 261 Plasma-chemical conversion of lower alkanes with stimulated condensation of incomplete oxidation products
Bugaev SP, Kozyrev AV, Kuvshinov VA, Sochugov NS, Khryapov PA
263 - 283 Velocity measurements for arc jets produced by a DC plasma spray torch
Planche MP, Coudert JF, Fauchais P
285 - 303 A mathematical model of the carbon arc reactor for fullerene synthesis
Bilodeau JF, Pousse J, Gleizes A
305 - 324 Diamond deposition on substrates with different geometries in a thermal plasma reactor
Borges CFM, Asmann M, Pfender E, Heberlein J