화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.19, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (6 articles)

327 - 340 The treatment of water-based toxic waste using induction plasma technology
Yargeau V, Soucy G, Boulos MI
341 - 362 Modeling and spectroscopic investigations on the evaporation of zirconia in a thermal rf plasma
Buchner P, Schubert H, Uhlenbusch J, Willee K
363 - 381 Numerical modeling of an impinging and compressible dusted plasma jet controlled by a magnetic field
Nishiyama H, Kuzuhara M, Solonenko OP, Kamiyama S
383 - 394 Oxidation of dilute benzene ire an alumina hybrid plasma reactor at atmospheric pressure
Ogata A, Yamanouchi K, Mizuno K, Kushiyama S, Yamamoto T
395 - 419 Tunable diode laser diagnostic studies of H-2-Ar-O-2 microwave plasmas containing methane or methanol
Ropcke J, Mechold L, Kaning M, Fan WY, Davies PB
421 - 443 Oxidation and reduction processes during NOx removal with corona-induced nonthermal plasma
Yan K, Kanazawa S, Ohkubo T, Nomoto Y