화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.24, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

353 - 372 Molecular beam mass spectrometry system for characterization of thermal plasma chemical vapor deposition
Park S, Liao F, Larson JM, Girshick SL, Zachariah MR
373 - 392 Absolute calibration of TALIEF of atomic nitrogen by NO titration -Experimental and theoretical analysis
Repsilber T, Uhlenbusch J
393 - 403 The preparation and characterization of highly dispersed PdO over alumina for low-temperature combustion of methane
Yu KL, Liu CJ, Zhang YP, He F, Zhu XL, Eliasson B
405 - 420 Gap space optimization for NO removal in a non-thermal plasma discharge
Wang ZC, Yeboah YD, Bai TJ, Bota KB
421 - 434 The chemistry of methane remediation by a non-thermal atmospheric pressure plasma
Pringle KJ, Whitehead JC, Wilman JJ, Wu JH
435 - 446 A statistical mechanical view of the determination of the composition of multi-temperature Plasmas
Andre P, Aubreton J, Elchinger MF, Rat V, Fauchais P, Lefort A, Murphy AB
447 - 473 A robust and efficient method for the computation of equilibrium composition in gaseous mixtures
Godin D, Trepanier JY
475 - 492 Composition, enthalpy, and vaporization temperature calculation of Ag-SiO2 plasmas with air in the temperature range from 1000 to 6000 K and for pressure included between 1 and 50 bars
Rochette D, Bussiere W, Andre P