Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.25, No.3 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
| 193 - 214 |
Modeling injection of dense liquid sprays in radio frequency inductively coupled plasmas Shan YG, Mostaghimi J |
| 215 - 226 |
Effect of anode arc root position on the behavior of the DC non-transferred plasma jet at field free region Gao Y, An LY, Sun CQ, Fu YQ |
| 227 - 243 |
Decomposition of toluene and acetone in packed dielectric barrier discharge reactors Chang CL, Lin TS |
| 245 - 254 |
Control of electron density and temperature with a modified capacitive discharge You SJ, Bai KH, Chae SH, Chang HY |
| 255 - 273 |
Hydrophilic treatment of the dyed nylon-6 fabric using high-density and extensible antenna-coupling microwave plasma system Liao JD, Chen CY, Wu YT, Weng CC |
| 275 - 288 |
Comparative study on decomposition of CFCl3 in thermal and cold plasma Foglein KA, Szepvolgyi J, Szabo PT, Meszaros E, Pekker-Jakab E, Babievskaya IZ, Mohai I, Karoly Z |
| 289 - 302 |
Comparative study on the decomposition of chloroform in thermal and cold plasma Foglein KA, Szabo PT, Babievskaya IZ, Szepvolgyi J |