Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.22, No.4 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (11 articles)

453 - 474	Two-temperature transport coefficients in argon-hydrogen plasmas - I: Elastic processes and collision integrals Rat V, Andre P, Aubreton J, Elchinger MF, Fauchais P, Lefort A
475 - 493	Two-temperature transport coefficients in argon-hydrogen plasmas - II: Inelastic processes and influence of composition Rat V, Andre P, Aubreton J, Elchinger MF, Fauchais P, Lefort A
495 - 522	Ozone production in the positive DC corona discharge: Model and comparison to experiments Chen JH, Davidson JH
523 - 536	Influence of gadolinium on carbon arc plasma and formation of fullerenes and nanotubes Lange H, Huczko A, Sioda M, Pacheco M, Razafinimanana M, Gleizes A
537 - 552	Decomposition of benzene in air in a plasma reactor: Effect of reactor type and operating conditions Ogata A, Miyamae K, Mizuno K, Kushiyama S, Tezuka M
553 - 571	Density and rotational temperature measurements of the OH degrees and NO degrees radicals produced by a gliding arc in humid air Benstaali B, Boubert P, Cheron BG, Addou A, Brisset JL
573 - 605	Formation of negative hydrogen ions in a Ne-H-2 hollow cathode discharge Petrov GM, Petrova T
607 - 617	Deposition of diamond-like carbon film in a closed-space CH4 RF plasma Mutsukura N, Handa Y
619 - 626	Optical diagnostics of the effect of oxygen on bi-level contact etch Lee S, Tien YC, Chang YW
627 - 637	Effect of wafer temperature on high aspect ratio hardmask etching Lee S, Tien YC, Chang YW
639 - 658	PAHs formation in the depositions in a methyl tert-butyl Ether/Ar, a methyl tert-butyl ether/O-2/Ar and a methyl tert-butyl ether/H-2/Ar RF plasma environment Hsieh LT, Fang GC, Yang HH, Wang YF, Tsao MC, Liao WT