Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.39, No.4 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (25 articles)

729 - 749	Decomposition of Crystal Violet by an Atmospheric Pressure RF Plasma Jet: The Role of Radicals, Ozone, Near-Interfacial Reactions and Convective Transport Taghvaei H, Kondeti VSSK, Bruggeman PJ
751 - 767	Simultaneous Degradation of Aqueous Trichloroacetic Acid by the Combined Action of Anodic Contact Glow Discharge Electrolysis and Normal Electrolytic Processes at the Cathode Zhao C, Yang HM, Ju MW, Zhao XT, Li LX, Wang SY, An BG
769 - 786	Assessing the Efficiency of Sodium Ferrate Production by Solution Plasma Process Samimi-Sedeh S, Saebnoori E, Talaiekhozani A, Fulazzaky MA, Roestamy M, Amani AM
787 - 808	1D Modeling of the Microwave Discharge in Liquid n-Heptane Including Production of Carbonaceous Particles Lebedev YA, Tatarinov AV, Epstein IL
809 - 824	Investigation of CO2 Splitting Process Under Atmospheric Pressure Using Multi-electrode Cylindrical DBD Plasma Reactor Niu GH, Qin Y, Li WW, Duan YX
825 - 844	Experimental Study of CO2 Decomposition in a DC Micro-slit Sustained Glow Discharge Reactor Ma T, Wang HX, Shi Q, Li SN, Sun SR, Murphy AB
845 - 862	Cascaded Plasma-Ozone Injection System: A Novel Approach for Controlling Total Hydrocarbon Emission in Diesel Exhaust Madhukar A, Rajanikanth BS
863 - 876	Mechanisms of Xylene Isomer Oxidation by Non-thermal Plasma via Paired Experiments and Simulations Shou TY, Xu N, Li YH, Sun GJ, Bernards MT, Shi Y, He Y
877 - 896	Effective Removal of CF4 by Combining Nonthermal Plasma with -Al2O3 Pan KL, Chen YS, Chang MB
897 - 912	Cold Atmospheric Pressure Nitrogen Plasma Jet for Enhancement Germination of Wheat Seeds Lotfy K, Al-Harbi NA, Abd El-Raheem H
913 - 928	Plasma Jet and Dielectric Barrier Discharge Treatment of Wheat Seeds Velichko I, Gordeev I, Shelemin A, Nikitin D, Brinar J, Pleskunov P, Choukourov A, Pazderu K, Pulkrabek J
929 - 936	Regeneration of a Coked Zeolite via Nonthermal Plasma Process: A Parametric Study Pinard L, Ayoub N, Batiot-Dupeyrat C
937 - 947	Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Xu Y, Zhang Y, Li LJ, Ding K, Guo Y, Shi JJ, Huang XJ, Zhang J
949 - 968	Fluid Modelling of DC Argon Microplasmas: Effects of the Electron Transport Description Baeva M, Loffhagen D, Becker MM, Uhrlandt D
969 - 984	Simulation for the Characteristics of Plasma of the Multi-gap Pseudospark Discharge Zhang J, Zheng Y
985 - 1000	The Effect of Background Gas on the Excitation Temperature and Electron Number Density of Basalt Plasma Induced by 10.6 Micron Laser Radiation Momcilovic M, Zivkovic S, Kuzmanovic M, Ciganovic J, Rankovic D, Trtica M, Savovic J
1001 - 1017	The Application of the Microwave Plasma Ionization Source in Ambient Mass Spectrometry Guc M, Reszke E, Ceglowski M, Schroeder G
1019 - 1048	Underwater Electrical Discharges: Temperature, Density and Basic Instability Features with Different Anode Materials Bhattacharya S, Tiwari N, Mishra A, Mitra S, Dey GK, Ghorui S
1049 - 1069	Optical Radiation Associated with Photobiological Hazards for Argon GTAW Arcs Wang F, Cressault Y, Teulet P, Li H, Yang K
1071 - 1086	Formation of CuCo Alloy From Their Oxide Mixtures Through Reduction by Low-Temperature Hydrogen Plasma Sabat KC
1087 - 1102	Equilibrium Chemistry in BCl3-H2-Ar Plasma Gornushkin IB, Shabanov SV, Sennikov PG
1103 - 1114	Densities of Active Species in R/x%(N-2-5%H-2) (R=Ar or He) Microwave Flowing Afterglows Ricard A, Sarrette JP
1115 - 1126	Strong Sensitized Ultraviolet Luminescence from He-C2F4-NO Flowing Plasma Afterglow: A Route to Short-Wavelength Gas-Flow Lasers? Schmiedberger J, Fuss W, Juha L
1127 - 1144	Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma Lee J, Kim J, Efremov A, Kim C, Lee HW, Kwon KH
1145 - 1159	A Study on the NF3 Plasma Etching Reaction with Cobalt Oxide Grown on Inconel Base Metal Surface Lee J, Kim K, Kim YS