Thin Solid Films

Thin Solid Films, Vol.290-291 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (100 articles)

1 - 5	Highly Transparent and Conductive ZrO-In2O3 Thin-Films Prepared by DC Magnetron Sputtering Minami T, Kakumu T, Takeda Y, Takata S
6 - 9	Transparent-Conductive Indium Tin Oxide-Films Fabricated by Atmospheric RF Plasma Deposition Technique Lee DH, Moss RW, Vuong KD, Dietrich M, Condrate RA, Wang XW
10 - 12	Influence of a Parallel Electric-Field on the Conductivity of a Growing Indium Oxide Film Alterkop B, Parkansky N, Boxman RL, Goldsmith S
13 - 17	CdS Thin-Film Deposition by CW Nd-YAG Laser Trujillo O, Moss R, Vuong KD, Lee DH, Noble R, Finnigan D, Orloff S, Tenpas E, Park C, Fagan J, Wang XW
18 - 22	A Study on the Double Insulating Layer for HgCdTe MIS Structure Jung JW, Lee HC, Wang JS
23 - 29	Optical Reflectance Reduction of Textured Silicon Surfaces Coated with an Antireflective Thin-Film Kolesar ES, Bright VM, Sowders DM
30 - 33	Thermochromism of Rapid Thermal Annealed VO2 and Sn-Doped VO2 Thin-Films Lee MH, Kim MG, Song HK
34 - 39	Residual-Stress in Silicon Dioxide Thin-Films Produced by Ion-Assisted Deposition Robic JY, Leplan H, Pauleau Y, Rafin B
40 - 45	The Calculation of Thin-Film Parameters from Spectroscopic Ellipsometry Data Jellison GE
46 - 50	Real-Time Control of the Growth of Silicon Alloy Multilayers by Multiwavelength Ellipsometry Kildemo M, Deniau S, Bulkin P, Drevillon B
51 - 56	An Algorithm for Analyzing Ellipsometric Data Taken with Multiple Angles of Incidence Comfort JC, Urban FK, Barton D
57 - 62	Multilayer Reference Coatings for Depth Profile Standards Beck U, Reiners G, Wirth T, Hoffmann V, Prassler F
63 - 67	A New Method for Fabricating Transparent Barrier Layers Affinito JD, Gross ME, Coronado CA, Graff GL, Greenwell EN, Martin PM
68 - 73	Improvement of the Adhesion of Silica Layers to Polypropylene Induced by Nitrogen Plasma Treatment Vallon S, Hofrichter A, Drevillon B, Klembergsapieha JE, Martinu L, Poncinepaillard F
74 - 79	Relaxation of Mechanical-Stress in Polyimide Films by Softbaking Bhattacharya PK, Bhosale KS
80 - 83	Electron-Beam Deposition of ZrO2-ZnO Films Qadri SB, Skelton EF, Lubitz P, Nguyen NV, Khan HR
84 - 87	Transparent ZnO-Al Films Prepared by Cosputtering of ZnO-Al with Either a Zn or an Al Target Tominaga K, Kataoka M, Manabe H, Ueda T, Mori I
88 - 93	Influence of Oxygen on Some Oxide-Films Prepared by Ion-Beam Sputter-Deposition Lee CC, Wei DT, Hsu JC, Shen CH
94 - 98	Synthesis and Characterization of Amorphous-Carbon Nitride Films Holloway BC, Shuh DK, Kelly MA, Tong W, Carlisle JA, Jimenez I, Sutherland DG, Terminello LJ, Pianetta P, Hagstrom S
99 - 102	The Effect of Annealing on the Structure of Cathodic Are Deposited Amorphous-Carbon Nitride Films Mcculloch DG, Merchant AR
XI - XI	Papers Presented at the 23rd International-Conference on Metallurgical Coatings and Thin-Films, San-Diego, Ca, USA, April 22-26, 1996 - Preface Sartwell BD, Mcguire GE, Jehn HA, Petrov I
103 - 106	Investigation of Carbon Nitride Films by Cathodic Arc Evaporation Chhowalla M, Alexandrou I, Kiely C, Amaratunga GA, Aharonov R, Fontana RF
107 - 111	Ion-Beam Deposited Carbon Nitride Films - Characterization and Identification of Chemical Sputtering Hammer P, Baker MA, Lenardi C, Gissler W
112 - 119	Plasma Diagnostic Studies to the Carbon Nitride Film Deposition by Reactive RF Magnetron Sputtering Kaltofen R, Sebald T, Weise G
120 - 125	Synthesis of Cubic Boron-Nitride Films Using a Helicon Wave Plasma and Reduction of Compressive Stress Kim IH, Kim KS, Kim SH, Lee SR
126 - 130	Transformation of Sp(3) to Sp(2) Sites of Diamond-Like Carbon Coatings During Friction in Vacuum and Under Water-Vapor Environment Lehuu T, Zaidi H, Paulmier D, Voumard P
131 - 135	Heteroepitaxial Nucleation of Diamond by Bias Pretreatment in an Electron-Cyclotron-Resonance Microwave Chemical-Vapor-Deposition System Marechal N, Yamashita S
136 - 142	Lattice Disorder and Texture in Diamond Coatings Deposited by Hfcvd on Co-Cemented Tungsten Carbide Scardi P, Veneri S, Leoni M, Polini R, Traversa E
143 - 147	Optical-Emission Spectroscopy of the Plasma During CVD Diamond Growth with Nitrogen Addition Vandevelde T, Nesladek M, Quaeyhaegens C, Stals L
148 - 152	Structural Phase-Transitions of Carbon Observed with Photoelectron-Spectroscopy Reinke P, Francz G, Oelhafen P
153 - 156	Investigation of the Field-Emission Current from Polycrystalline Diamond Films Glesener JW, Morrish AA
157 - 160	Fabrication of Freestanding Diamond Membranes Salvadori MC, Cattani M, Mammana V, Monteiro OR, Ager JW, Brown IG
161 - 164	Effect of the Cyclic Growth/Etching Time Ratio on the (100)-Oriented Texture Growth of a Diamond Film Kim SH, Park YS, Han IT, Yun WS, Lee JW
165 - 170	High-Sensitivity Thermal Sensors on Insulating Diamond Denisenko AV, Zaitsev AM, Melnikov AA, Werner M, Fahrner WR
171 - 175	Field-Emission Behavior of (Nitrogen Incorporated) Diamond-Like Carbon-Films Lee KR, Eun KY, Lee S, Jeon DR
176 - 180	Enhanced Electron-Emission from Phosphorus-Doped and Boron-Doped Diamond-Clad Si Field Emitter Arrays Ku TK, Chen SH, Yang CD, She NJ, Tarntair FG, Wang CC, Chen CF, Hsieh IJ, Cheng HC
181 - 185	Epitaxial-Growth of Beta-SiC Thin-Films Using bis-Trimethylsilylmethane on Si(100) with a Polycrystalline Buffer Layer Bahng W, Kim HJ
186 - 189	Enhanced Diffusion of C in Fe Under CVD Diamond Deposition Conditions Weiser PS, Prawer S, Jamieson DN, Manory RR
190 - 195	Field-Emission Observations from CVD Diamond-Coated Silicon Emitters Raiko V, Spitzl R, Aschermann B, Theirich D, Engemann J, Pupeter N, Habermann T, Muller G
196 - 199	Chemical-Vapor-Deposition of Diamond at Low Substrate Temperatures Using Fluorinated Precursors Hentschel F, Schmidt I, Benndorf C
200 - 205	Fe-C-H-Film Growth by Plasma-Assisted CVD from Organometallic Precursors Luithardt W, Benndorf C
206 - 210	Nanoscale Mechanical Property Measurements Using Modified Atomic Forte Microscopy Kulkarni AV, Bhushan B
211 - 215	Molecular-Dynamics Investigations of the Effects of Debris Molecules on the Friction and Wear of Diamond Perry MD, Harrison JA
216 - 220	Measurement of the Hardness of Hard Coatings Using a Force Indentation Function Friedrich C, Berg G, Broszeit E, Berger C
221 - 225	Local Yield Map of Hard Coating with an Interlayer Under Sliding Contact Diao DF
226 - 231	Characterization of Tin Films Deposited Onto Stainless-Steel Strips by Continuous Dry-Coating Process Arezzo F, Gimondo P, Hashimoto M, Ono N, Takahashi T
232 - 237	Mechanical-Properties of Hard W-C Physically Vapor-Deposited Coatings in Monolayer and Multilayer Configuration Juliet P, Rouzaud A, Aabadi K, Mongecadet P, Pauleau Y
238 - 242	The Ultimate Vacuum Pressure and the Characteristics of Sputtered Coatings Cavaleiro A, Vieira MT, Ramos F, Dias JP
243 - 247	Effects of Deflection on Bulge Test Measurements of Enhanced Modulus in Multilayered Films Jankowski AF, Tsakalakos T
248 - 253	Residual-Stress and in-Situ Thermal-Stress Measurement of Aluminum Film Deposited on Silicon-Wafer Kusaka K, Hanabusa T, Nishida M, Inoko F
254 - 259	Origins of the Residual-Stress in CVD Diamond Films Kuo CT, Lin CR, Lien HM
260 - 263	Effect of a Plasma Protection Net on Residual-Stress in AlN Films Deposited by a Magnetron Sputtering System Kusaka K, Hanabusa T, Tominaga K
264 - 270	In-Situ Ir Ellipsometry Study of the Adhesion and Growth of Plasma-Deposited Silica Thin-Films on Stainless-Steel Substrates Bertrand N, Drevillon B, Klembergsapieha JE, Martinu L
271 - 277	Nondestructive Evaluation of Thin-Film Coatings Using a Laser-Induced Surface Thermal Lensing Effect Wu ZL, Kuo PK, Lu YS, Gu ST, Krupka R
278 - 282	Optical and Calorimetric Evaluation of Z-93-P and Other Thermal Control Coatings Jaworske DA
283 - 288	The in-Situ Characterization of Metal-Film Resistance During Deposition Rycroft IM, Evans BL
289 - 293	Spectrophotometric Study of Oxide-Growth on Are Evaporated Tin and Zrn Coatings During Hot Air Oxidation Tests Luridiana S, Miotello A
294 - 298	Impulsive Stimulated Thermal Scattering for Sub-Micron-Thickness Film Characterization Maznev AA, Nelson KA, Yagi T
299 - 304	Filtered Cathodic Vacuum-Arc (Fcva) Deposition of Thin-Film Silicon Bilek MM, Milne WI
305 - 311	Nondestructive Characterization and Evaluation of Thin-Films by Laser-Induced Ultrasonic Surface-Waves Schneider D, Tucker MD
312 - 316	Comparison of Atomic-Force Microscope and Rutherford Backscattering Spectrometry Data of Nanometer-Size Zinc Islands Tabet MF, Urban FK
317 - 322	The Structure of Tetrahedral Amorphous-Carbon Thin-Films Silva SR, Xu S, Tay BK, Tan HS, Scheibe HJ, Chhowalla M, Milne WI
323 - 327	XPS Investigation of Ti-O Containing Diamond-Like Carbon-Films Muller U, Hauert R
328 - 333	Pretreatment of GaAs(001) for Sulfur Passivation with (NH4)(2)S-X Kang MG, Park HH, Suh KS, Lee JL
334 - 338	Valence-Band Photoemission-Study of the Ti-Mo-N System Sanjines R, Wiemer C, Almeida J, Levy F
339 - 342	Study on DC Magnetron Sputter-Deposition of Titanium Aluminum Nitride Thin-Films - Effect of Aluminum Content on Coating Wuhrer R, Yeung WY, Phillips MR, Mccredie G
343 - 347	Corrosion Behavior of Hybrid Coatings Brandl W, Gendig C
348 - 354	Localized Micro-Hardness Measurements with a Combined Scanning Force Microscope/Nanoindentation System Randall NX, Christoph R, Droz S, Juliaschmutz C
355 - 361	STM and XPS Study of Filtered Vacuum-Arc Deposited Sn-O Films Kaplan L, Rusman I, Boxman RL, Goldsmith S, Nathan M, Benjacob E
362 - 366	Modeling and Finite-Element Analysis of Ultra-Microhardness Indentation of Thin-Films Gan L, Bennissan B, Bendavid A
367 - 369	Effect of Oxygen Plasma-Etching on Adhesion Between Polyimide Films and Metal Nakamura Y, Suzuki Y, Watanabe Y
370 - 375	Influence of Ni-P Electroless Coating on the Fatigue Behavior of Plain Carbon-Steels Puchi ES, Staia MH, Hintermann H, Pertuz A, Chitty J
376 - 380	Study by X-Ray Photoelectron-Spectroscopy and X-Ray-Diffraction of the Growth of Tin Thin-Films Obtained by Nitridation of Ti Layers Santucci S, Lozzi L, Passacantando M, Picozzi P, Alfonsetti R, Diamanti R, Moccia G
381 - 385	Plasma Wall Interaction for TiNx Film Deposition in a Hollow-Cathode Arc-Discharge Eggs C, Kersten H, Wagner HE, Wulff H
386 - 389	Deposition of Titanium in a Hollow-Cathode Arc-Discharge - Correlation Between Deposition Conditions and Film Properties Steffen H, Eggs C, Kersten H
390 - 394	Studies of Phase-Transformations in Some Metal Phthalocyanine Thin-Films Using Measurements of Current as a Function of Temperature Shihub SI, Gould RD
395 - 400	Physical-Properties of CdTe-Sb Thin-Films Picosvega A, Ramirezbon R, Espinozabeltran FJ, Zelayaangel O, Alvarezfregoso O, Mendozaalvarez JG
401 - 405	Aging Effects of Thin-Films Prepared by Ion-Beam-Assisted Deposition - A Multitechnique Characterization Beghi MG, Bottani CE, Calliari L, Bonelli M, Miotello A, Ossi PM, Kovac J, Scarel G, Sancrotti M
406 - 410	Modeling of Selective Tungsten Low-Pressure Chemical-Vapor-Deposition Kuijlaars KJ, Kleijn CR, Vandenakker HE
411 - 416	Encapsulation of Silver by Nitridation of Ag-Ti Alloy Bilayer Structures Laursen T, Adams D, Alford TL, Tu KN, Deng F, Morton R, Lau SS
417 - 421	Effects of Au Overlayers on the Electrical and Morphological-Characteristics of Pd/Sn Ohmic Contacts to N-GaAs Islam MS, Mcnally PJ, Cameron DC, Herbert PA
422 - 426	Optimization of SiO2 Film Conformality in Teos/O-3 APCVD Yuan Z, Mokhtari S, Ferdinand A, Eakin J, Bartholomew L
427 - 434	Plasma and Surface Diagnostics During Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 from SiH4/O-2/Ar Discharges Han SM, Aydil ES
435 - 439	Multilevel Interconnects for Heterojunction Bipolar-Transistor Integrated-Circuit Technologies Patrizi GA, Lovejoy ML, Enquist PM, Schneider RP, Hou HQ
440 - 446	Tantalum Pentoxide for Advanced DRAM Applications Mckinley KA, Sandler NP
447 - 452	The Addition of Surfactant to Slurry for Polymer CMP - Effects on Polymer Surface, Removal Rate and Underlying Cu Neirynck JM, Yang GR, Murarka SP, Gutmann RJ
453 - 457	Chemical-Mechanical Polishing of PECVD Silicon-Nitride Hu YZ, Yang GR, Chow TP, Gutmann RJ
458 - 463	Effects of Mechanical Characteristics on the Chemical-Mechanical Polishing of Dielectric Thin-Films Tseng WT, Liu CW, Dai BT, Yeh CF
464 - 468	Crystallization of Amorphous SiGe Thin-Films Tong HY, King TJ, Shi FG
469 - 472	TiSi2 Phase-Transformation Characteristics on Narrow Devices Miles GL, Mann RW, Bertsch JE
473 - 476	Materials Aspects of Ti and Co Silicidation of Narrow Polysilicon Lines Kittl JA, Hong QZ
477 - 484	Prediction of Silicide Formation and Stability Using Heats of Formation Pretorius R
485 - 492	Evaluation of Barriers for B-Diffusion and P-Diffusion into as-Doped Polysilicon Naeem MD, Parks C, Wangemann K, Glawischnig H
493 - 496	Nigew Ohmic Contacts on GaAs Heterostructure Epitaxial Layers Huang JH, Tehrani S, Durlam M, Martinez MJ, Schirmann E, Cody N
497 - 502	A Low-Resistance Pd/Ge/Ti/Au Ohmic Contact to a High-Low Doped GaAs Field-Effect Transistor Kwak JS, Baik HK, Lee JL, Park CG, Kim H, Suh KS
503 - 507	Adhesion Studies of GaAs-Based Ohmic Contact and Bond Pad Metallization Seigal PK, Briggs RD, Rieger DJ, Baca AG, Howard AJ
508 - 512	A Study of P-Type Ohmic Contacts to InAlAs/InGaAs Heterostructures Briggs RD, Howard AJ, Baca AG, Hafich MJ, Vawter GA
513 - 517	Thin-Film Tantalum Nitride Resistor Technology for Phosphide-Based Optoelectronics Lovejoy ML, Patrizi GA, Rieger DJ, Barbour JC
518 - 524	Quantitative Investigation of Copper/Indium Multilayer Thin-Film Reactions Lindahl KA, Moore JJ, Olson DL, Noufi R, Lanning B
525 - 530	Formation of Iron Silicides on Si(110) by Reactive Deposition Epitaxy Wu J, Shimizu S