Thin Solid Films

Thin Solid Films, Vol.506 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (158 articles)

1 - 1	Proceedings of the Joint Meeting of the 71h APCPST (Asia Pacific Conference on Plasma Science and Technology) and the 171h SPSM (Symposium on Plasma Science for Materials) Fukuoka, Japan, June 29 July 2, 2004 - Preface Watanabe Y, Asano T, Chang HY, Fujiyama H, McWilliams R, Watanabe T
2 - 7	Synthesis and application perspective of advanced plasma polymerized organic thin films Bae IS, Cho SH, Park YS, Hong B, Park ZT, Kim JG, Boo JH
8 - 12	The characteristics of carbon-doped silicon oxide films with nano-pore structure deposited using UV-assisted PECVD Yang CS, Choi CK
13 - 16	World's largest amorphous silicon photovoltaic module Takatsuka H, Yamauchi Y, Kawamura K, Mashima H, Takeuchi Y
17 - 21	Species responsible for Si-H-2 bond formation in a-Si : H films deposited using silane high frequency discharges Shiratani M, Koga K, Kaguchi N, Bando K, Watanabe Y
22 - 26	Development of large-area a-Si : H films deposition using controlled VHF plasma Kawamura K, Mashima H, Takeuchi Y, Takano A, Noda M, Yonekura Y, Takatsuka H
27 - 32	In situ study on the growth of microcrystalline silicon film using the high-density microwave plasma for Si thin film solar cells Jia HJ, Shirai H
33 - 37	High-deposition-rate of microcrystalline silicon solar cell by using VHFPECVD Nakano Y, Goya S, Watanabe T, Yamashita N, Yonekura Y
38 - 44	Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition Li YL, Ikeda Y, Toyoshima Y, Shirai H
45 - 49	Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N2O gas Kang MS, Chung TH, Kim Y
50 - 54	Investigation of low dielectric carbon-doped silicon oxide films prepared by PECVD using methyltrimethoxysilane precursor Yang CS, Yu YH, Lee KM, Lee HJ, Choi CK
55 - 58	Deposition of diamond-like carbon films on polymers by plasma source ion implantation Baba K, Hatada R
59 - 62	Enhancement of adhesive strength of DLC film perpared by PBIID on Co-Cr alloy for biomaterial Tomita A, Kusuda M, Otsuki S, Oka Y, Nishimura Y, Murakami A, Yatsuzuka M
63 - 67	Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films Anita V, Saito N, Takai O
68 - 72	Negative pulsed voltage discharge and DLC preparation in PBIID system Kirinuki M, Onoi M, Nishikawa K, Oka Y, Azuma K, Fujiwara E, Yatsuzuka M
73 - 76	Nanocrystalline diamond deposition in electron-temperature-controlled CH4/H-2/Ar plasma Ikada R, Kato K, Abe T, Iizuka S
77 - 81	Bonding characteristics of Si and Ge incorporated amorphous carbon (a-C) films grown by magnetron sputtering Jung HS, Park HH, Jung SB, Balk HK
82 - 86	Structural and electrical studies on fluorinated amorphous carbon films as intermetal dielectric layer in ULSI devices Ko HJ, Lee KM, Lee HJ, Choi CK
87 - 91	Synthesis and mechanical properties of hydrogenated carbon and carbon nitride films prepared by magnetron sputtering Myung HS, Park YS, Hong B, Han JG, Shaginyan LR
92 - 95	The structures and properties of a-C : H films deposited at a wide range of relative hydrogen gas flow rate by RF sputtering Oshiro T, Begum F, Yamazato M, Higa A, Maehama T, Toguchi M
96 - 100	Plasma-assisted pulsed laser deposition of carbon films: Effect of oxygen plasma on amorphous carbon film etching Hoh M, Suda Y, Bratescu MA, Sakai Y
101 - 105	KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers Jelinek M, Kocourek T, Kadlec J, Vorlicek V, Cernansky M, Studnicka V, Santoni A, Bohac P, Uherek F
106 - 110	Laser ablated plasma plume characteristics for photocatalyst TiO2 thin films preparation Ohshima T, Nakashima S, Ueda T, Kawasaki H, Suda Y, Ebihara K
111 - 114	Preparation of TiO2/WO3 multilayer thin film by PLD method and its catalytic response to visible light Shinguu H, Bhuiyan MMH, Ikegami T, Ebihara K
115 - 119	Hydroxyapatite coatings on titanium dioxide thin films prepared by pulsed laser deposition method Suda Y, Kawasaki H, Ohshima T, Nakashima S, Kawazoe S, Toma T
120 - 122	LiMn2O4 thin films prepared by pulsed laser deposition for rechargeable batteries Otsuji H, Kawahara K, Ikegami T, Ebihara K
123 - 127	Plasma CVD on the inner surface of a microchannel Kadowaki M, Yoshizawa H, Mori S, Suzuki M
128 - 132	Effect of Si content on the properties of TiAl-Si-N films deposited by closed field unbalanced magnetron sputtering with vertical magnetron sources Kim GS, Kim BS, Lee SY, Hahn JH
133 - 135	Effect of surface roughness on splat shapes in the plasma spray coating process Raessi A, Mostaghimi J, Bussmann M
136 - 139	Segmented thermal barrier coatings produced by atmospheric plasma spraying hollow powders Guo HB, Kuroda S, Murakami H
140 - 144	Large applications of electromagnetically accelerated plasma to material spraying Tahara H, Moriyama M, Fujiuchi K, Ando Y
145 - 149	Correlation between a-C : H film properties and Ar/CH4 dielectric barrier discharge Bratescu MA, Yoshizaki Y, Suda Y, Sakai Y, Sugawara H, Takai O
150 - 154	Characteristics of magnetically driven shunting arc plasma for amorphous carbon film deposition Takaki K, Kumagai O, Hasegawa R, Mukaigawa S, Fujiwara T, Kumagai M, Yukimura K
155 - 158	Deposition of ZnO film using an open-air cold plasma generator Suzaki Y, Ejima S, Shikama T, Azuma S, Tanaka O, Kajitani T, Koinuma H
159 - 162	Fluorinated polymer coatings on PLGA microcapsules for drug delivery system using atmospheric pressure glow plasma Tanaka K, Kogoma M, Ogawa Y
163 - 167	Iron nitrocarburising in flowing post-discharge: Evolution of the compound layer Jaoul C, Belmonte T, Czerwiec I, Ablitzer D, Ricard A, Michel H
168 - 172	A study on the effects of two reactive gases in the reactive sputtering process Li C, Hsieh JH, Cheng JC
173 - 175	Plasma graft polymerization of glycidyl methacrylate and cyclodextrin immobilization Hirotsu T
176 - 179	Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films Kurosawa S, Choi BG, Park JW, Aizawa H, Shim KB, Yamamoto K
180 - 183	Preparation and characteristic of ZnO thin film with high and low resistivity for an application of solar cell Jeong WJ, Kim SK, Park GC
184 - 187	Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition Sakaguchi I, Ryoken H, Hishita S, Haneda H
188 - 191	Hydrogen retention in carbon-tungsten co-deposition layer formed by hydrogen RF plasma Katayama K, Kawasaki T, Manabe Y, Nagase H, Takeishi T, Nishikawa M
192 - 196	Effect of Si doping on the wear properties of CrN coatings synthesized by unbalanced magnetron sputtering Lee SY, Kim B, Kim SD, Kim G, Hong YS
197 - 201	Mechanism of Cu deposition from Cu(EDMDD)(2) using H-assisted plasma CVD Takenaka K, Koga K, Shiratani M, Watanabe Y, Shingen T
202 - 206	Structural and mechanical properties of multilayered gradient CrN/ZrN coatings Li DJ, Liu F, Wang MX, Zhang JJ, Liu QX
207 - 211	Growth responses of ultrathin CNx overcoats to process parameters Li DJ, Chung YW
212 - 216	Oxygen grafting and etching of hexatriacontane in late N-2-O-2 post-discharges Hody V, Belmonte T, Czerwiec T, Henrion G, Thiebaut JM
217 - 221	Dry etching of LaNiO3 thin films using inductively coupled plasma Kim GH, Kim DP, Kim KT, Kim CI, Lee CI, Kim TH
222 - 224	Study of ashing for low-k dielectrics using the N-2/O-2 ferrite-core inductively coupled plasmas Kim HW, Myung JH, Kim NH, Lee HS, Park SG, Lee JG, Chung CW, Park WJ, Kang CJ, Yoo CG, Ko KH, Woo JH, Choi SD, Choi DK
225 - 229	NEMS fabrication of metal coated sub-wavelength size aperture array and its optical characterization Kim JW, Moon JS, Kim DW, Jung MY, Ok JT, Choi SS, Lim HJ, Yang JS, Boo JH
230 - 234	Etching characteristics of Ta and TaN usingCl(2)/Ar inductively coupled plasma Shin MH, Na SW, Lee NE, Ahn JH
235 - 238	Maskless etching of microstructures using a scanning microplasma etcher Ideno T, Ichiki T
239 - 243	Modification of dielectric properties of C-60, C-70 and C-84 thin films by oxygen absorption Bhuiyan KH, Mieno T
244 - 249	Continuous process of carbon nanotubes synthesis by decomposition of methane using an arc-jet plasma Choi SI, Nam JS, Kim JI, Hwang TH, Seo JH, Hong SH
250 - 254	Production of carbon nanoonions and nanotubes using an intermittent arc discharge in water Imasaka K, Kanatake Y, Ohshiro Y, Suehiro J, Hara M
255 - 258	Production of single-wall carbon nanotubes by a XeCl excimer laser ablation Kusaba M, Tsunawaki Y
259 - 262	Effects of strong magnetic field on carbon nanotube formation using rf glow-discharge plasma Kaneko T, Matsuoka H, Hirata T, Hatakeyama R, Tohji K
263 - 267	Growth mechanism for carbon nanotubes in a plasma evaporation process Watanabe T, Notoya T, Ishigaki T, Kuwano H, Tanaka H, Moriyoshi Y
268 - 273	Deposition of carbon nanotubes by capillary-type atmospheric pressure PECVD Kyung S, Lee Y, Kim C, Lee J, Yeom G
274 - 277	Nano-wire pig-tailed ZnO nano-rods synthesized by laser ablation Okada T, Kawashima K, Nakata Y
278 - 282	Fe-doped TiO2 nanopowders by oxidative pyrolysis of organometallic precursors in induction thermal plasma: synthesis and structural characterization Wang XH, Li JG, Kamiyama H, Ishigaki T
283 - 287	Assembly and photoluminescence of SiCN nanoparticles Ng VM, Xu M, Huang SY, Long JD, Xu S
288 - 291	Production of crystalline Si nano-clusters using pulsed H-2+SiH(4)VHFdischarges Kakeya T, Koga K, Shiratani M, Watanabe Y, Kondo M
292 - 296	RF plasma processing of Er-doped TiO2 luminescent nanoparticles Li JG, Wang XH, Kamiyama H, Ishigaki T, Sekiguchi T
297 - 302	Chemical bonding study of nanocrystalline diamond films prepared by plasma techniques Popov C, Novotny M, Jelinek M, Boycheva S, Vorlicek V, Trchova M, Kulisch W
303 - 306	Improved UV emission of zinc oxide through hyrogen doping in pulse-modulated high-power ICP Ishigaki T, Ohashi N, Taguchi H, Ye RB, Haneda H, Ito S
307 - 310	Investigation of secondary electron emission effects in plasma immersion ion implantation with dielectric substrates Li XC, Wang YN
311 - 315	Influence of Ar-H-2-SF6 then-nal plasma treatment of MCMB powders on the anode properties of a lithium ion rechargeable battery Tanaka H, Kurihara M, Xu JY, Ohashi N, Maruyama S, Moriyoshi Y, Ishigaki T
316 - 322	Development of painting technology using plasma surface technology for automobile parts Jung CK, Bae IS, Lee SB, Cho JH, Shin ES, Choi SC, Boo JH
323 - 326	Frequency distribution of dust particle size after removal of oxide on carbon steel using low-pressure arc Kimitsuka N, Kubo Y, Inaba T, Furukawa S, Amakawa T, Adachi K
327 - 330	Estimation of point of zero charge for activated carbon treated with atmospheric pressure non-thermal oxygen plasmas Kodama S, Sekiguchi H
331 - 336	Reaction rates of refractory metal oxidation in cold oxygen plasma Saburi T, Suzuki T, Kiuchi K, Fujii Y
337 - 341	Surface variation caused by vacuum arc cleaning of organic contaminant Sugimoto M, Takeda K
342 - 345	Dominant species for oxidation of stainless steel surface in water vapor plasma Suzuki T, Saburi T, Tokunami R, Murata H, Fujii Y
346 - 349	Effect of electrode gap width in vacuum arc cleaning Takahashi H, Sugimoto M, Takeda K, Ushio M, Tanaka M
350 - 354	Low temperature plasma-chemical treatment of PdCl2 film by atmospheric pressure hydrogen plasma Koo IG, Lee MS, Lee WM
355 - 359	Feasibility study of material surface treatment using an atmospheric large-area glow plasma Moon SY, Han JW, Choe W
360 - 363	Improvement of electrical properties silica thin films by of surfactant-templated mesoporous plasma treatment Jung SB, Park HH
364 - 368	Microarc plasma treatment of titanium and aluminum surfaces in electrolytes Anita V, Saito N, Takai O
369 - 372	High-temperature oxidation of magnetron-sputtered Cr-N-coated steels Lee DB, Jang YD, Myung HS, Han JG
373 - 377	Evidence for direct activation of solid surface by plasma discharge on CFC decomposition Ogata A, Kim HH, Oh SM, Futamura S
378 - 383	Effect of peening as pretreatment for DLC coatings on magnesium alloy Yamauchi N, Demizu K, Ueda N, Sone T, Tsujikawa M, Hirose Y
384 - 388	Multipeak behavior and mode transition of a homogeneous barrier discharge in atmospheric pressure helium Wang DZ, Wang YH, Liu CS
389 - 395	One-dimensional discharge simulation of nitrogen DBD atmospheric pressure plasma Choi YH, Kim JH, Hwang YS
396 - 399	Ozone generation by dielectric barrier discharge for soil sterilization Takayama M, Ebihara K, Stryczewska H, Ikegami T, Gyoutoku Y, Kubo K, Tachibana M
400 - 403	Experimental study and sterilizing application of atmospheric pressure plasmas Xu L, Liu P, Zhan RJ, Wen XH, Ding LL, Nagatsu M
404 - 408	A novel cold plasma jet generated by atmospheric dielectric barrier capillary discharge Zhang JL, Sun H, Wang DZ, Wang XG
409 - 413	Generation of dielectric barrier discharge in high-pressure N-2 andCO(2) environments up to supercritical conditions Tomai T, Ito T, Terashima K
414 - 417	Scale-up of ferro-electric packed bed reactor for C2F6 decomposition Takaki K, Urashima K, Chang JS
418 - 422	Zeolite-combined plasma reactor for decomposition of toluene Oh SM, Kim HH, Einaga H, Ogata A, Futamura S, Park DW
423 - 426	Reaction of Si with excited nitrogen species in pure nitrogen plasma near atmospheric pressure Hayakawa R, Yoshimura T, Ashida A, Uehara T, Fujimura N
427 - 431	Epoxidation of carbon double bond using atmospheric non-equilibrium oxygen plasma Suga Y, Sekiguchi H
432 - 435	Thermal plasma treatment of waste ion exchange resins by CO2 injection Nezu A, Moro K, Watanabe T
436 - 439	Characteristics of a micro-plasma produced by atmospheric pressure RF impulse discharge using coaxial micro-electrode Tanaka Y, Iizuka S
440 - 443	Stabilization of DC atmospheric pressure glow discharge by a fast gas flow along the anode surface Hattori K, Ishii Y, Tobari H, Ando A, Inutake M
444 - 448	Production and characterization of high-pressure microwave glow discharge in a microgap aiming at VUV light source Kono A, Wang J, Aramaki M
449 - 453	Plasma propulsion for interplanetary flight Chang-Diaz FR
454 - 459	Two-dimensional calculation of spatial distribution of neutral atoms for a planar inductively coupled oxygen discharge Yoon HJ, Chung TH, Chung CJ, Lee JK
460 - 463	Low impedance antenna arrangement of internal linear ICP source for large area FPD processing Jung SJ, Kim KN, Yeom GY
464 - 468	Development of broadband ultrashort-pulse reflectometer for inductively coupled plasma Kogi Y, Mase A, Yasuda T, Kudo K, Bruskin LG, Ignatenko M
469 - 473	Characterization of a high-frequency inductively coupled plasma source Lee DS, Jun HS, Chang HY
474 - 478	Generation of large-volume plasma by making use of multi-needle plasma at low-pressure Hong YC, Shin DH, Lee SC, Uhm HS
479 - 484	Electron temperature measurement in SiH4/H-2 ECR plasma produced by 915 MHz microwaves Itagaki N, Sasaki K, Kawai Y
485 - 488	Characteristics of the plasma parameters in the fabrication of microcrystalline silicon thin films using 915 MHz ECR plasma Thang DH, Sasaki K, Muta H, Itagaki N, Kawai Y
489 - 493	Oxygen atom density in rare gas diluted O-2 radio frequency plasma Kitajima T, Nakashima J, Nakano T, Makabe T
494 - 498	Ion temperature in a large diameter ECR plasma Koga M, Muta H, Yonesu A, Kawai Y
499 - 502	Production of a large diameter ECR plasma with low electron temperature Koga M, Hishikawa Y, Tsuchiya H, Kawai Y
503 - 507	Plasma distribution in a planar-type surface wave-excited plasma source Kousaka H, Ono K, Umehara N, Sawada I, Ishibashi K
508 - 511	Estimation of hot electron beam in planar surface wave plasmas from measured magnetic field Siry M, Yoshikawa A, Terebessy T, Kando M
512 - 516	Large area VHF plasma production using a ladder-shaped electrode Mashima H, Yamakoshi H, Kawamura K, Takeuchi Y, Noda M, Yonekura Y, Takatsuka H, Uchino S, Kawai Y
517 - 521	Dc self-bias voltages in radio frequency magnetron discharges Yonemura S, Nanbu K
522 - 526	Dependence of H- extraction probability on filter magnetic field and gas pressure of a volume-type negative ion source Matsumoto Y, Nishiura M, Matsuoka K, Sasao M, Wada M, Yamaoka H
527 - 530	Enhancement of extracted H- current by streaming neutral gas injection Mendenilla A, Takahashi H, Kasuya T, Wada M
531 - 535	D- density distribution and its dependence on plasma parameters in volume negative ion sources Mori S, Fukumasa O
536 - 540	Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy Nakada N, Fukumasa O
541 - 544	Characteristics of the electron temperature in the downstream regions of N-2/Ar ECR plasmas Muta H, Thang DH, Kawai Y
545 - 549	Influences of oxide material on high density plasma production using capacitively coupled discharge Ohtsu Y, Shimazoe I, Misawa I, Fujita H
550 - 554	Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields Sato G, Kato T, Oohara W, Hatakeyama R
555 - 558	Modeling electromagnetic field excitation and rf power absorption in a large helicon plasma Shamrai KP, Shinohara S
559 - 563	Plasma performance in very large helicon device Tanikawa T, Shinohara S
564 - 570	Characteristics of bistable transition in magnetized plasma by control of voltage biasing Shinohara S, Nakamura Y, Horii S
571 - 574	Improvement of the dose uniformity in plasma immersed ion implantation by introducing a vertical biased ring Stamate E, Holtzer N, Sugai H
575 - 578	Grid bias effect upon the negative ion density in a tandem plasma source Takahashi H, Kasuya T, Wada M
579 - 582	High power light gas helicon plasma source for VASIMR Squire JP, Chang-Diaz FR, Glover TW, Jacobson VT, McCaskill GE, Winter DS, Baity FW, Carter MD, Goulding RH
583 - 587	Focusing magnetic field contribution for helicon plasma on Mini-RFTF Yoshitaka M, Hideki N, Baity FW, Goulding RH, Carter MD, Sparks DO
588 - 591	20-cm ECR plasma generator for xenon ion propulsion Nishiyama K, Kuninaka H
592 - 596	Microwave-sustained miniature plasmas for an ultra small thruster Takao Y, Ono K, Takahashi K, Setsuhara Y
597 - 600	Small helicon plasma source for electric propulsion Toki K, Shinohara S, Tanikawa T, Shamrai KP
601 - 604	Ion heating experiment by a helical antenna in a fast-flowing plasma Ando A, Hosokawa Y, Hatanaka M, Tobari H, Hattori K, Inutake M
605 - 608	Development of small microwave discharge ion thruster Kataharada H, Takao Y, Yamamoto N, Ijiri H, Nakashima H
609 - 612	Numerical analysis of microwave ion engine using electromagnetic particle code Masui H, Tanoue T, Nakashima H, Funaki I
613 - 616	A magnetized sheet plasma source for the synthesis of TiN on stainless steel substrates Noguera VR, Ramos HJ
617 - 621	Plasma CVD reactor with two-microwave oscillators for diamond film synthesis Nagatsu M, Miyake M, Maeda J
622 - 625	Experiment and modeling of plasma and neutral transports in slot-excited microwave discharges Miyamoto Y, Tamal Y, Daimon K, Esaki M, Takeno H, Yasaka Y
626 - 630	Wave propagation and plasma production in slot-excited microwave discharges Tamai Y, Miyamoto Y, Hayashi T, Tsuji A, Takeno H, Yasaka Y
631 - 636	Acoustic velocity of phonons in complex plasma crystal lattices Wang XG, Yang XF, Liu Y, Hu SH
637 - 641	Bohm criterion for electronegative dusty plasmas Wang ZX, Liu Y, Ren LW, Liu JY, Wang XG
642 - 646	Simulation on cluster structuring of dust particles confined in a plasma Yamanouchi T, Shindo M, Ishihara O, Kamimura T
647 - 651	Rotation of 2D finite dust Coulomb clusters in magnetic field Wang YN, Hou LJ
652 - 655	Particle growth in hydrogen-methane plasmas Shimizu T, Jacob W, Thornas H, Morfill G, Abe I, Watanabe Y, Sato N
656 - 659	Nano-particle formation due to interaction between H-2 plasma and carbon wall Koga K, Kitaura Y, Shiratani M, Watanabe Y, Komori A
660 - 664	In-flight particle characteristics in a DC-RF hybrid plasma flow system Kawajiri K, Nishiyama H
665 - 668	Laser-induced fluorescence measurements for plasma processing McWilliams R, Boehmer H, Edrich D, Zhao L, Zimmerman D
669 - 673	Oxygen atom behaviour in the nonthermal plasma Oda T, Yamashita Y, Takezawa K, Ono R
674 - 678	Ion flow and sheath physics studies in multiple ion species plasmas using diode laser based laser-induced fluorescence Severn GD, Wang X, Ko E, Hershkowitz N, Turner MM, McWilliams R
679 - 682	Development of high-efficiency laser Thomson scattering measurement system for the investigation of EEDF in surface wave plasma Aramaki M, Kobayashi J, Kono A, Stamate E, Sugai H
683 - 687	Simple method for ion current measurement at RF biased electrode Kawata H, Yasuda M, Hirai Y
688 - 691	Improvement of thermal probe method for the plasma diagnostics Matsuura H, Michimoto K
692 - 696	Evaluation of Mach probe characteristics and measurement of high-Mach-number plasma flow Ando A, Watanabe T, Watanabe T, Sato R, Harata K, Tobari H, Hattori K, Inutake M
697 - 700	Measurement of velocity distributions of neutral particles in a plasma Nishigaito S, Kasuya T, Wada M
701 - 704	Investigation of energetic electrons in a 915 MHz microwave discharge produced in Ar Stamate E, Nakao S, Sugai H
705 - 709	Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas Sasaki K, Okamoto M
710 - 714	Evolution of hydrocarbon species on a silicon surface during methane plasma investigated by in-situ infrared spectroscopy Shinohara M, Katagiri T, Iwatsuji K, Shibata H, Matsuda Y, Fujiyama H
715 - 719	Sticking probability of the CN(X-2 Sigma(+)) radicals onto the hydrogenated amorphous carbon nitride films Ito H, Oda K, Saitoh H
720 - 723	Coulomb collisions in materials processing plasmas Nanbu K, Furubayashi T, Takekida H
724 - 728	Modeling study of shrouding gas effects on a laminar argon plasma jet impinging upon a flat substrate in air surroundings Cheng K, Chen X, Wang HX, Pan WX
729 - 733	Particle modeling of non-collisional heating in inductively coupled argon plasmas Takekida H, Nanbu K
734 - 737	A fast solution method for the Poisson equation in simulating the direct current and radio frequency discharges Nanbu K, Tong LZ