Thin Solid Films

Thin Solid Films, Vol.575 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (27 articles)

1 - 2	Seventh international conference on hot-wire CVD (Cat-CVD) process Preface Bouree JE
3 - 8	Gas-phase diagnoses in catalytic chemical vapor deposition (hot-wire CVD) processes Umemoto H
9 - 11	Dependence of the catalytic decomposition of PH3 on wire material Umemoto H
12 - 16	Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals Arai Y, Noto Y, Goto Y, Takahashi S, Yamamoto M, Nishiyama T, Kono A, Ishijima T, Ishikawa K, Hori M, Horibe H
17 - 20	Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer Kono A, Arai Y, Goto Y, Yamamoto M, Takahashi S, Yamagishi T, Ishikawa K, Hori M, Horibe H
21 - 24	The control of the film stress of Cat-CVD a-Si films and its impact on explosive crystallization induced by flash lamp annealing Ohdaira K
25 - 29	Dual hot-wire arrangement for the deposition of silicon and silicon carbide thin films Chen T, Rajeeva BB, Wolff J, Schmalen A, Finger F
30 - 33	Technological solution for the automatic replacement of the catalytic filaments in HWCVD Nos O, Frigeri PA, Bertomeu J
34 - 37	Degradation of thin tungsten filaments at high temperature in HWCVD Frigeri PA, Nos O, Bertomeu J
38 - 41	Strategy for silicon based hot-wire chemical vapor deposition without wire silicide formation Laukart A, Harig T, Hofer M, Schafer L
42 - 46	Degradation of a tantalum filament during the hot-wire CVD of silicon nitride thin films Oliphant CJ, Arendse CJ, Muller TFG, Jordaan WA, Knoesen D
47 - 51	Formation of alumina film using alloy catalyzers in catalytic chemical vapor deposition Ogita YI, Saito N
52 - 55	Low surface recombination velocity in n-Si passivated by catalytic-chemical vapor deposited alumina films Ogita YI, Aizawa Y
56 - 59	Reduction of surface recombination velocity by rapid thermal annealing of p-Si passivated by catalytic-chemical vapor deposited alumina films Ogita YI, Tachihara M
60 - 63	Effect of hydrogen on passivation quality of SiNx/Si-rich SiNx stacked layers deposited by catalytic chemical vapor deposition on c-Si wafers Thi TC, Koyama K, Ohdaira K, Matsumura H
64 - 66	Passivation study of multi-crystalline silicon wafer with i-a-Si:H layer deposited by HWCVD Agarwal M, Dusane RO
67 - 71	Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation Spee DA, Rath JK, Schropp REI
72 - 75	Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma Majee S, Cerqueira MF, Tondelier D, Vanel JC, Geffroy B, Bonnassieux Y, Alpuim P, Bouree JE
76 - 83	Hetero- and homogeneous three-dimensional hierarchical tungsten oxide nanostructures by hot-wire chemical vapor deposition Houweling ZS, Harks PPRML, Kuang Y, van der Werf CHM, Geus JW, Schropp REI
84 - 91	The role of catalytic nanoparticle pretreatment on the growth of vertically aligned carbon nanotubes by hot-filament chemical vapor deposition Kim KH, Gohier A, Bouree JE, Chatelet M, Cojocaru CS
92 - 95	Low temperature boron doping into crystalline silicon by boron-containing species generated in Cat-CVD apparatus Ohta T, Koyama K, Ohdaira K, Matsumura H
96 - 99	Post-nitriding on mu c-InXGa1 (-) N-X films using hot-wire chemical vapor deposition technique Ohashi F, Koiso S, Hibino S, Sahashi T, Itoh T, Nonomura S
100 - 102	Photo-stability of a-Si solar cells fabricated by "Liquid-Si printing method" and treated with catalytic generated atomic hydrogen Murayama H, Ohyama T, Yoshida I, Terakawa A, Masuda T, Ohdaira K, Shimoda T
103 - 106	Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films Godavarthi S, Wang C, Verdonck P, Matsumoto Y, Koudriavtsev I, Dutt A, Tielens H, Baklanov MR
107 - 109	Comparison of metal oxide removal using hydrogen radicals generated by hot-wire and plasma-enhanced methods Nogita K, Kamatani R, Tayumotoa S, Izumi A
110 - 112	Transportation of hydrogen radicals for cleaning extreme ultraviolet lithography optics Kuroki Y, Funakoshi N, Nishiyama I, Izumi A
113 - 116	Carbon film deposition from high velocity rarefied flow Rebrov AK, Emelyanov AA, Yudin IB