1 - 5 |
Uniform films deposited on convex surfaces by magnetron sputtering with a small target Yang ZH, Yang L, Dai B, Huang XW, Wang Q, Zhang YM, Han JC, Zhu JQ |
6 - 8 |
Interfacial reactions in Al2O3/Cr2O3 layers: Electronic structure calculations and X-ray photoelectron spectra Korotin MA, Zhidkov IS, Kukharenko AI, Cholakh SO, Kamenetskikh AS, Gavrilov NV, Kurmaev EZ |
9 - 16 |
WO3/TiO2 superhydrophilic and underwater superoleophobic membrane for effective separation of oil-in-water emulsions Wang B, Chen C, Liu HT, Xia BB, Fan YA, Chen TC |
17 - 28 |
Control of physical and microstructural properties in molybdenum by direct current magnetron sputtering deposition producing bilayer thin film Latif R, Aziz MF, Majlis BY |
29 - 35 |
Growth mode transition in Au-based thin film metallic glasses Denis P, Liu SY, Fecht HJ |
36 - 45 |
Effect of growth conditions on microstructure of sputtered precursor for CuIn1-xGaxSe2 (CIGS) absorber layer deposited on stainless steel substrates Behr M, Sharma M, Sprague S, Shinkel N, Kerbleski J, Alvey C, Rozeveld S, Hasan T, Wintland C, Mushrush M, Wall A |
46 - 50 |
Chemical crystallographic investigation on Cu2S-In2S3-Ga2S3 ternary system Thomere A, Guillot-Deudon C, Caldes MT, Bodeux R, Barreau N, Jobic S, Lafond A |
51 - 58 |
Etch characteristics of copper thin films in high density plasma of CH4/O-2/Ar gas mixture Lim ET, Ryu JS, Chung CW |
59 - 67 |
Development towards simple fabrication steps for flexible optoelectronic films Schmidt D, Lin YZ |
68 - 74 |
Layering influence on Nd agglomeration and hard magnetic properties of Mo/NdFeB/Mo thick films Grigoras M, Borza F, Urse M, Stoian G, Ababei G, Lupu N, Chiriac H |
75 - 84 |
Principal component analysis: Reveal camouflaged information in x-ray absorption spectroscopy photoemission electron microscopy of complex thin oxide films Giesen M, Jugovac M, Zamborlini G, Feyer V, Gunkel F, Mueller DN |
85 - 90 |
Structure control of a zinc tetraphenylporphyrin thin film by vapor annealing using fluorine containing solvent Tomita K, Shioya N, Kise R, Shimoaka T, Yoshida H, Koganezawa T, Eda K, Hasegawa T |
91 - 95 |
Lithographic fabrication of point contact with Al2O3 rear-surface-passivated and ultra-thin Cu(In,Ga)Se-2 solar cells Choi S, Kamikawa Y, Nishinaga J, Yamada A, Shibata H, Niki S |
96 - 98 |
Crystal structure of YbFe2O4 films prepared under different partial oxygen pressure Nagata T, Hiraoka K, Okamoto T, Iwata N |
99 - 108 |
Atomic and electronic structure of graphene oxide/Cu interface Boukhvalov DW, Kurmaev EZ, Urbanczyk E, Dercz G, Stolarczyk A, Simka W, Kukharenko AI, Zhidkov IS, Slesarev AI, Zatsepin AF, Cholakh SO |
109 - 116 |
Structure of uniform and high-quality Al-doped ZnO films by magnetron sputter deposition at low temperatures Meng FP, Peng S, Xu GB, Wang Y, Ge FF, Huang F |
117 - 122 |
Performance improvements of tungsten and zinc doped indium oxide thin film transistor by fluorine based double plasma treatment with a high-K gate dielectric Ruan DB, Liu PT, Chiu YC, Yu MC, Gan KJ, Chien TC, Chen YH, Kuo PY, Sze SM |
123 - 130 |
Early stages of growth of Pb, Sn and Ge on Ru(0001): A comparative density functional theory study Topolnicki R, Kucharczyk R |
131 - 136 |
Electro-mechanical behavior of Al/Mo bilayers studied with in situ straining methods Kreiml P, Rausch M, Terziyska VL, Kostenbauer H, Winkler J, Mitterer C, Cordill MJ |
137 - 142 |
Characteristics of indium zinc oxide/silver/indium zinc oxide multilayer thin films prepared by magnetron sputtering as flexible transparent film heaters Zhao P, Kim S, Yoon S, Song P |
143 - 147 |
In vacuo XPS investigation of Cu(In,Ga)Se-2 surface after RbF post-deposition treatment Maticiuc N, Kodalle T, Lauche J, Wenisch R, Bertram T, Kaufmann CA, Lauermann I |
148 - 158 |
Carburized titanium as a solid lubricant on hip implants: Corrosion, tribocorrosion and biocompatibility aspects Cheng KY, Pagan N, Bijukumar D, Mathew MT, McNallan M |
159 - 163 |
Low temperature incorporation of selenium in Cu2ZnSnS4: Diffusion and nucleation Grini S, Ross N, Persson C, Platzer-Bjorkman C, Vines L |
164 - 167 |
Adsorption of hexacontane on atomically-flat surfaces of graphite and Au (111) Lopatina YY, Marchenko AA |
168 - 172 |
From sputtered metal precursors towards Cu2Zn(Sn1-x,Ge-x)Se-4 thin film solar cells with shallow back grading Andres C, Cabas-Vidani A, Tiwari AN, Romanyuk YE |
173 - 178 |
SrTa2O6 induced low voltage operation of InGaZnO thin-film transistors Takahashi T, Hoga T, Miyanaga R, Fujii MN, Ishikawa Y, Uraoka Y, Uchiyama K |
179 - 183 |
Low-resistance orthorhombic MoO3-x thin film derived by two-step annealing Meng L, Yamada A |
184 - 192 |
Combined in-depth X-ray Photoelectron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectroscopy study of the effect of deposition pressure and substrate bias on the electrical properties and composition of Ga-doped ZnO thin films grown by magnetron sputtering Correia FC, Ribeiro JM, Salvador PB, Welle A, Bruns M, Mendes A, Tavares CJ |
193 - 193 |
RETRACTION: Retraction of Current Conduction Mechanisms through Au/SnO/n-type Si/In Devices (Retraction of Vol 611, Pg 1, 2016) Tsao HY, Wang YW |
194 - 194 |
RETRACTION: Retraction of Fractals and superstructures in gadolinia thin film morphology: Influence of process variables on their characteristic parameters (Retraction of Vol 503, Pg 85, 2006) Sahoo NK, Thakur S, Tokas RB |
195 - 195 |
RETRACTION: Investigating Degradation Behavior of InGaZnO Thin-Film Transistors induced by Charge-Trapping Effect under DC and AC GateBias Stress (Retraction of Vol 528, Pg 53, 2013) Hsieh TY, Chang TC, Chen TC, Tsai MY, Chen YT |
196 - 196 |
RETRACTION: Polystyrene-b-poly(ethylene oxide) block copolymer thin films as templates for carbon nanotubes dispersion (Retraction of Vol 536, Pg 191, 2013) Wang J, Li F, Li QF, Sun JL, Chen GX |
197 - 197 |
RETRACTION: The demonstration of a high efficient SiGe Type-II hetero-junction solar cell with an optimal stress design (Retraction of Vol 544, Pg 112, 2013) Liao MH |
198 - 198 |
RETRACTION: Structural, morphological, optical and photoluminescence properties of HfO2 thin films (Retraction of Vol 545, Pg 279, 2013) Ma CY, Wang WJ, Wang J, Miao CY, Li SL, Zhang QY |
199 - 199 |
RETRACTION: Current Conduction Mechanism through Au/SnO/n-type Si/In Devices (Retraction of Vol 611, Pg 1, 2016) Tsao HY, Wang YW |