1 - 4 |
Non-polar GaN thin films deposition on glass substrate at low temperatures by conventional RF sputtering Simanullang M, Wang ZH, Kawakami N, Ogata R, Yoshida T, Sugiyama M |
5 - 10 |
Influence of rapid thermal annealing temperature on the photoluminescence of Tb ions embedded in silicon nitride films Klak MM, Zatryb G, Golacki LW, Benzo P, Labbe C, Cardin J, Misiewicz J, Gourbilleau F, Podhorodecki A |
11 - 15 |
The determination of carrier lifetimes and associated mobility magnitudes using photoconductivity recovery dynamics in thin-film amorphous semiconductors Goldie DM |
16 - 22 |
Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks Mallem K, Chandra SVJ, Ju M, Dutta S, Phanchanan S, Sanyal S, Pham DP, Hussain SQ, Kim Y, Park J, Cho YH, Cho EC, Yi J |
23 - 33 |
Intense pulsed light sintering of Cu nano particles/micro particles-ink assisted with heating and vacuum holding of substrate for warpage free printed electronic circuit Ryu CH, Joo SJ, Kim HS |
34 - 42 |
Formation of plasma-polymerized superhydrophobic coating using an atmospheric-pressure plasma jet Hossain MM, Trinh QH, Nguyen DB, Sudhakaran MSP, Mok YS |
43 - 49 |
Phenomenological modelling of light transmission through nanowires arrays Zhou J, Le Cunff LO, Nomenyo K, Vial A, Pauporte T, Lerondel G |
50 - 58 |
Effects of NH3 flow on structural and optical properties of ZnO films grown by atmospheric-pressure chemical vapor deposition Terasako T, Ogura Y, Yagi M |
59 - 65 |
Influence of oxygen flow rate and substrate positions on properties of Cu-oxide thin films fabricated by radio frequency magnetron sputtering using pure Cu target Patwary MAM, Saito K, Guo QX, Tanaka T |
66 - 72 |
Thickness dependence of Al0.88Sc0.12N thin films grown on silicon Knisely K, Douglas E, Mudrick J, Rodriguez M, Kotula P |
73 - 73 |
Symposium A on "Thin film chalcogenide photovoltaic materials" Preface Naghavi N, Buecheler S, Abou-Ras D, Uhl A, Kim WK |
74 - 85 |
Effect of N-2 flow rate on structural and infrared properties of multi-layer AlCrN/Cr/AlCrN coatings deposited by cathodic arc ion plating for low emissivity applications Li QY, Cheng XD, Gong DQ, Ye WP |
86 - 95 |
Structural, electronic, magnetic, and optical properties of monolayer WS2 doped with Co-X-6 (X = S, N, O, and F) Yang Y, Feng ZY, Zhang JM |
96 - 102 |
Effect of seed layers and rapid thermal annealing on the temperature coefficient of resistance of Ni-Cr thin films Kim YJ, Lee WB, Choi KK |
103 - 108 |
Carrier transport properties in a thin-film Cu2ZnSnSe4 solar cell Paul S, Gulyas I, Repins IL, Mou S, Li JV |
109 - 114 |
Characterization of SiNx:H thin film as a hydrogen passivation layer for silicon solar cells with passivated contacts Kim JE, Park SJ, Hyun JY, Park H, Bae S, Ji KS, Kim H, Lee KD, Kang Y, Lee HS, Kim D |
115 - 121 |
Improved corrosion protection of titanium implant material by crystallographic texturing of Sr doped calcium phosphate electrodeposits Munirathinam B, Jaladurgam NR, Magesh J, Narayanan R, Mol JMC, Neelakantan L |
122 - 122 |
Preface - The 8th global photovoltaic conference (GPVC) Kim DW, Kim WK |
123 - 127 |
Self-supporting tetrahedral amorphous carbon films consisting of multilayered structure prepared using filtered arc deposition Harigai T, Miyamoto Y, Yamano M, Tanimoto T, Suda Y, Takikawa H, Kawano T, Nishiuchi M, Sakaki H, Kondo K, Kaneko S, Kunitsugu S |
128 - 135 |
Poly-(3-hexylthiophene)/graphene composite based organic photodetectors: The influence of graphene insertion Yadav A, Upadhyaya A, Gupta SK, Verma AS, Negi CMS |
136 - 142 |
Direct formation of continuous multilayer graphene films with controllable thickness on dielectric substrates Akiba S, Kosaka M, Ohashi K, Hasegawa K, Sugime H, Noda S |
143 - 147 |
Low-temperature fabrication of nanographene on a copper substrate using pentacene Heya A, Matsuo N |
148 - 152 |
Effect of ammonia pretreatment on crystal quality of N-polar GaN grown on SiC by metalorganic chemical vapor deposition Choi U, Lee K, Han J, Jang T, Nam Y, So B, Kwak T, Nam O |
153 - 159 |
Improvement of the electrical and interfacial propertie of TiN/ZrO2 by a modulated atomic layer deposition process with controlled O-3 dosing Song H, Kim D, Kim Y, Jung H, Lim H, Lee S, Yong K |
160 - 171 |
Study of the permeability of TiN coatings through electrochemical ion detection Vega J, Scheerer H, Oechsner M |
172 - 176 |
Chemical state of phosphorous at the SiC/SiO2 interface Pitthan E, Amarasinghe VP, Xu C, Gobbi AL, Dartora GHS, Gustafsson T, Feldman LC, Stedile FC |
177 - 181 |
Electron energy loss and X-ray absorption behaviour of high density nonmagnetic cobalt Banu N, Kumar P, Pandey N, Satpati B, Gupta M, Dev BN |