Thin Solid Films

Thin Solid Films, Vol.457, No.1 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (39 articles)

1 - 1	The 16th Symposium on Plasma Science for Materials (SPSM-16), Tokyo, Japan, 4-5 June 2003 - Preface Ishigaki T, Fujioka H, Terashima K, Watanabe T
2 - 6	Structure control of carbon nanotubes using radio-frequency plasma enhanced chemical vapor deposition Kato T, Jeong GH, Hirata T, Hatakeyama R
7 - 11	Optical measurement in carbon nanotubes formation by pulsed laser ablation Ikegami T, Nakanishi F, Uchiyama M, Ebihara K
12 - 19	Sodium carboxylate effect of non-cross-linked hydrogel on plasma-induced radical formation as studied by electron spin resonance Kuzuya M, Izumi T, Sasai Y, Kondo SI
20 - 25	Plasma copolymer membranes of acrylic acid and the adsorption of lysozyme on the surface Hirotsu T, Tagaki C
26 - 33	Detection of deposition rate of plasma-polymerized acrylate and methacrylate derivatives using quartz crystal microbalance Kurosawa S, Atthoff B, Aizawa H, Hilborn J
34 - 38	Effect of liquid film on decomposition of CFC-12 using dielectric barrier discharge Sekiguchi H, Yamagata K
39 - 43	Effect Of O-2 on NO removal by ammonia radical injection using one-cycle sinusoidal power source Yamamoto K, Yukimura K, Kambara S, Moritomi H, Yamashita T, Maruyama T
44 - 47	Gasification of polyethylene using steam plasma generated by microwave discharge Sekiguchi H, Orimo T
48 - 54	Coupling of plasma and flow in materials processing Shiozawa M, Nanbu K
55 - 58	Production of high density and low electron-temperature plasma by a modified grid-biasing method using inductively coupled RF discharge Ikada R, Nishimura G, Kato K, Iizuka S
59 - 63	Control of the electron temperature by varying the resonance zone width in ECR plasma Itagaki N, Muta H, Ishii N, Kawaii Y
64 - 68	Effect of inductively-coupled plasma assist on the crystal orientation of magnesium oxide thin films produced by reactive sputtering Matsuda Y, Iwaya M, Koyama Y, Shinohara M, Fujiyama H
69 - 77	Dependence of nitriding degree of Ti surface by non-LTE nitrogen plasma on various plasma parameters Kobori H, Koike S, Watanabe S, Matsuzaki M, Matsuura H, Akatsuka H
78 - 83	Reaction field analysis of a non-thermal plasma flowing in a rectangular reactor Sato T, Ito D, Nishiyama H
84 - 89	High-rate growth of microcrystalline silicon films using a high-density SiH4/H-2 glow-discharge plasma Niikura C, Itagaki N, Kondo M, Kawai Y, Matsuda A
90 - 96	Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials Shirai H
97 - 102	Novel aspects in thin film silicon solar cells-amorphous, microcrystalline and nanocrystalline silicon Kondo M, Matsuda A
103 - 108	Electrical characterization of Ge microcrystallites by atomic force microscopy using a conducting probe Makihara K, Okamoto Y, Nakagawa H, Ikeda M, Murakami H, Higashi S, Miyazaki S
109 - 113	Epitaxial growth of InN on c-plane sapphire by pulsed laser deposition with rf nitrogen radical source Ohta J, Fujioka H, Honke I, Oshima M
114 - 117	Structural characterization of group III nitrides grown by pulsed laser deposition Takahashi H, Fujioka H, Ohta J, Oshima M, Kimura M
118 - 121	Effect of ambient gas on pulsed laser deposition of group III nitrides Ito S, Fujioka H, Ohta J, Kobayashi A, Honke T, Miki H, Oshima M
122 - 127	Mechanical durability of ultra-water-repellent thin film by microwave plasma-enhanced CVD Wu YY, Bekke M, Inoue Y, Sugimura H, Kitaguchi H, Liu CS, Takai O
128 - 132	UV Raman spectroscopic probing into nitrogen-doped hydrogenated amorphous carbon Ohta R, Saito N, Okazaki S, Inoue Y, Sugimura H, Takai O
133 - 138	Carbon nitride films deposited by reactive sputtering and pulsed laser ablation Yasui T, Kotani T, Fujiuchi K, Tahara H, Yoshikawa T
139 - 142	Structural analysis of Ti-Fe thin films prepared by pulsed laser deposition Suzuki S, Suzuki T, Suematsu H, Jiang WH, Yatsui K
143 - 150	Fabrication of diamond-like carbon film on rubber by T-shape filtered-arc-deposition under the influence of various ambient gases Takikawa H, Miyakawa N, Minamisawa S, Sakakibara T
151 - 157	Formation of graphite re-deposition layer by hydrogen RF plasma Katayama K, Nagase H, Manabe Y, Kodama Y, Takeishi T, Nishikawa M
158 - 167	Fully coupled 3D modeling of plasma-particle interactions in a plasma jet Ramachandran K, Nishiyama H
168 - 173	Grain structure in cathode spot trail of low vacuum arc discharge Sugimoto M, Mirkarimov A, Pozharov S, Takeda K
174 - 179	Characteristics of supersonic nitrogen/hydrogen-mixture and ammonia plasma jets and nitrided material properties Tahara H, Ando Y, Yoshikawa T
180 - 185	Plasma-applied machining of a narrow and deep hole in a metal using a dielectric-encased wire electrode Kumagai S, Misawa N, Takeda K, Abdukarimov ET
186 - 191	Preparation of pure rutile and anatase TiO2 nanopowders using RF thermal plasma Oh SM, Ishigaki T
192 - 200	Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma Shigeta M, Watanabe T, Nishiyama H
201 - 208	Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization Watanabe T, Sugimoto N
209 - 216	Improvement of the anode performance of graphite particles through surface modification in RF thermal plasma Tanaka H, Osawa T, Moriyoshi Y, Kurihara M, Maruyama S, Ishigaki T
217 - 223	Enlargement of the diamond deposition area in combustion flame method by traversing substrate Ando Y, Tobe S, Saito T, Sakurai JI, Tahara H, Yoshikawa T
224 - 229	Change in cathode spot behavior in vacuum arc cleaning with application of polyethylene glycol Nakamura T, Takahashi H, Takeda K, Sugimoto M
230 - 234	Synthesis of nano-sized Al doped TiO2 powders using thermal plasma Lee JE, Oh SM, Park DW