Thin Solid Films

Thin Solid Films, Vol.253, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (96 articles)

1 - 8	Annealing and Sb-Doping of Sn-O Films Produced by Filtered Vacuum-Arc Deposition - Structure and Electrooptical Properties Kaplan L, Benshalom A, Boxman RL, Goldsmith S, Rosenberg U, Nathan M
9 - 13	Preparation of Conductive ZnO-Al Films by a Facing Target System with a Strong Magnetic-Field Tominaga K, Kataoka M, Ueda T, Chong MF, Shintani Y, Mori I
14 - 19	Preparation of Milky Transparent Conducting ZnO Films with Textured Surface by Atmospheric Chemical-Vapor-Deposition Using Zn (C5H7O2)(2) Minami T, Sato H, Sonohara H, Takata S, Miyata T, Fukuda I
20 - 24	Optical Quantum-Size Effects in Diamond-Like Carbon Superlattice Structures Silva SR, Amaratunga GA, Rusli, Haq S, Salje EK
25 - 27	Optical Analysis of Complex Multilayer Structures Using Multiple Data-Types Johs BD, Mcgahan WA, Woollam JA
28 - 32	Laser-Assisted Deposition of Optical Coatings Thomsenschmidt P, Schafer D, Steiger B, Brausse H, Johansen H, Martini T
33 - 40	Decorative Optical Coatings Reiners G, Beck U, Jehn HA
41 - 46	Spatially-Resolved Densification of Solution Deposited Zirconium Dioxide Films by Laser Irradiation Exarhos GJ, Wang LQ, Dennis T
47 - 52	Effects of Ion-Beam Irradiation on the Properties and Epitaxial-Growth of Aluminum Nitride Film by the Ion-Beam-Assisted Deposition Process Kim IH, Kim SH
53 - 56	Baxsr1-Xtio3 Thin-Films by a Chemical Process Burhanuddin ZA, Tomar MS, Dayalan E
57 - 61	Modified Forouhi and Bloomer Dispersion Model for the Optical-Constants of Amorphous Hydrogenated Carbon Thin-Films Mcgahan WA, Makovicka T, Hale J, Woollam JA
62 - 66	Amorphous Si Thin-Films Prepared by Vacuum Arc Deposition Arbilly D, Boxman RL, Goldsmith S, Rothwarf A, Kaplan L
67 - 71	Characterization of P-Cuga0.25In0.75Se2 N-Zn0.35Cd0.65S Polycrystalline Thin-Film Heterojunctions Aparna Y, Naidu BS, Reddy PJ
72 - 77	Cross-Sectional Transmission Electron-Microscopy Observations of C-BN Films Deposited on Si by Ion-Beam-Assisted Deposition Yamashita H, Kuroda K, Saka H, Yamashita N, Watanabe T, Wada T
78 - 84	Synthesis and Structural Characterization of Boron-Nitride Thin-Films Elena M, Guzman L, Calliari L, Moro L, Steiner A, Miotello A, Bonelli M, Capelletti R, Ossi PM
85 - 89	Physical-Properties of Nitrogenated Amorphous-Carbon Films Produced by Ion-Beam-Assisted Deposition Rossi F, Andre B, Vanveen A, Mijnarends PE, Schut H, Labohm F, Delplancke MP, Dunlop H, Anger E
90 - 94	Carbon Nitride Formation by Low-Energy Nitrogen Implantation into Graphite Gouzman I, Brener R, Hoffman A
95 - 102	Diamond Coatings from a Solid Carbon Source Jou S, Doerr HJ, Bunshah RF
103 - 108	Optimizing the Gas-Phase Chemistry in a DC Arcjet Diamond Chemical-Vapor-Deposition Reactor Reeve SW, Weimer WA
109 - 113	Deposition of White Diamond Thin-Films by Increasing the Total Pressure in a Microwave-Plasma-Enhanced Chemical-Vapor-Deposition System Kim SH, Park YS, Lee JW
114 - 118	Nucleation Studies of Thin Diamond Films on Model Substrates Patscheider J, Oral B
119 - 124	Internal-Stress of Chemical-Vapor-Deposition Diamond Film on Silicon Chiou YH, Hwang CT, Han MY, Jou JH, Chang YS, Shih HC
125 - 129	Elastic-Modulus of Diamond-Like Carbon-Films Prepared by Pulsed Vacuum-Arc Schultrich B, Scheibe HJ, Grandremy G, Schneider D, Siemroth P
130 - 135	Effects of Ambient Conditions on the Adhesion of Cubic Boron-Nitride Films on Silicon Substrates Cardinale GF, Mirkarimi PB, Mccarty KF, Klaus EJ, Medlin DL, Clift WM, Howitt DG
136 - 140	Comparative-Study of Trimethylboron Doping of Hot-Filament Chemically Vapor-Deposited and Microwave Plasma Chemically Vapor-Deposited Diamond Films Polo MC, Cifre J, Puigdollers J, Esteve J
141 - 145	Electrical-Properties of Diamond Thin-Films Grown by Chemical-Vapor-Deposition Technique Kulkarni AK, Shrotriya A, Cheng P, Rodrigo H, Bashyam R, Keeble DJ
146 - 150	Use of Space-Charge-Limited Current to Evaluate the Electronic Density-of-States in Diamond-Like Carbon Thin-Films Silva SR, Amaratunga GA
151 - 156	Fabrication of an Electron Multiplier Utilizing Diamond Films Mearini GT, Krainsky IL, Wang YX, Dayton JA, Ramesham R, Rose MF
157 - 161	The Effect of Impurities on the Ir Absorption of Chemically Vapor-Deposited Diamond Mcnamara KM, Scruggs BE, Gleason KK
162 - 167	Optical Characterization of Diamond Synthesized Using CH4-CO2 Gas-Mixtures Without Supplying Hydrogen Gas Chen CF, Chen SH, Hong TM, Leu JS
168 - 172	Study of the Loss of Pattern Definition in Diamond Growth Chen CF, Chen SH
173 - 178	Coatings Tribology - A Concept, Critical Aspects and Future-Directions Holmberg K, Mathews A
179 - 184	Electrostatic-Based Model for Alumina Surfaces Streitz FH, Mintmire JW
185 - 189	Molecular-Dynamics Simulations of Friction in Self-Assembled Monolayers Tupper KJ, Brenner DW
190 - 193	Atomic-Scale Friction Measurements on Silver and Chemisorbed Oxygen Surfaces Mak C, Daly C, Krim J
194 - 198	Triboscopic Description of Local Wear Phenomena Under an AFM Tip Loubet JL, Belin M, Durand R, Pascal H
199 - 203	Plastic-Deformation in Atomic Size Contacts Agrait N, Rodrigo JG, Rubio G, Sirvent C, Vieira S
204 - 211	Mechanical Property Characterization of Thin-Films Using Spherical Tipped Indenters Swain MV, Mencik J
212 - 217	Effects of Activated Reactive Evaporation Process Parameters on the Microhardness of Polycrystalline Silicon-Carbide Thin-Films Cha YH, Kim G, Doerr HJ, Bunshah RF
218 - 222	Enhanced Mechanical Hardness in Compositionally Modulated Fe(001)/Pt(001) and Fe(001)/Cr(001) Epitaxial Thin-Films Daniels BJ, Nix WD, Clemens BM
223 - 227	Microstructure and Thermal-Conductivity of Epitaxial AlN Thin-Films Kuo PK, Auner GW, Wu ZL
228 - 232	Holographic and Spectroscopic Characterization of Spiropyran Doped Poly(Methyl Methacrylate) Films Xue SS, Manivannan G, Lessard RA
233 - 237	Emittance Characterization of Thermal Control Paints, Coatings and Surfaces Using a Calorimetric Technique Jaworske DA
238 - 242	Characterization of Thin-Film ZnO/Zncds/Cugase2 Heterojunctions Reddy KT, Reddy PJ
243 - 246	Characterization of Laser-Ablated Boron-Nitride Thin-Films on Silicon Pryor RW, Wu ZL, Padmanabhan KR, Villanueva S, Thomas RL
247 - 253	Atmosphere Influence on in-Situ Ion-Beam Analysis of Thin-Film Growth Lin YP, Krauss AR, Chang RP, Auciello OH, Gruen DM, Schultz JA
254 - 256	Opening and Closing of Channels During Phase-Transitions in Al-Mn Thin-Films Reyesgasga J, Garcia R
257 - 261	Growth of Low and High Refractive-Index Dielectric Layers as Studied by in-Situ Ellipsometry Van VN, Fisson S, Frigerio JM, Rivory J, Vuye G, Wang Y, Abeles F
262 - 268	Numerical Ellipsometry - Enhancement of New Algorithms for Real-Time, in-Situ Film Growth Monitoring Urban FK, Comfort JC
269 - 276	Use of Valence-Band Auger-Electron Spectroscopy to Study Thin-Film Growth - Oxide and Diamond-Like Carbon-Films Steffen HJ
277 - 284	A New Interpretation of the Binding-Energies in X-Ray Photoelectron Studies of Oxides Barr TL, Seal S, Chen LM, Kao CC
285 - 292	Effects of Hydrogen Annealing, Sulfur Segregation and Diffusion on the Cyclic Oxidation Resistance of Superalloys - A Review Smialek JL, Jayne DT, Schaeffer JC, Murphy WH
293 - 298	Interfacial Reactions in Dynamically Heated Si/Me/Si Sandwich Layers Zalar A, Hofmann S, Pimentel F, Panjan P
299 - 302	Characterization of TiO2/SiO2 Multilayers by High-Resolution Transmission Electron-Microscopy and Electron-Energy-Loss Spectroscopy Yuzhang K, Boisjolly G, Rivory J, Kilian L, Colliex C
303 - 307	Surface-Morphology Examination of Sol-Gel Deposited TiO2 Films Anast M, Jamting A, Bell JM, Bennissan B
308 - 310	Aspects of the Surface-Roughness of Ceramic Bonding Tools on a Nanometer-Scale Investigated with Atomic-Force Microscopy Burger J, Dietler G, Binggeli M, Christoph R, Marti O
311 - 317	Microstructural Investigation of the Kappa-Al2O3-)Alpha-Al2O3 Transformation in Multilayer Coatings of Chemically Vapor-Deposited Kappa-Al2O3 Lindulf N, Halvarsson M, Norden H, Vuorinen S
318 - 325	Advanced Image-Processing in Scanning Probe Microscopy Urban FK, Romine P, Islam MS
326 - 332	Modeling of Surface-Roughness in Variable-Angle Spectroscopic Ellipsometry, Using Numerical Processing of Atomic-Force Microscopy Images Urban FK, Athey PR, Islam MS
333 - 338	Photoacoustic Studies of Laser Damage in Oxide Thin-Films Reichling M, Siegel J, Matthias E, Lauth H, Hacker E
339 - 343	Investigations on N-CdO/P-CdTe Thin Him Heterojunctions Sravani C, Reddy KT, Hussain OM, Reddy PJ
344 - 348	Microstructure and Mechanical-Properties of Sputtered Platinum Films Tokura H, Window B, Neely D, Swain M
349 - 355	Residual-Stress in Stabilized Zirconia Thin-Films Prepared by RF Magnetron Sputtering Scardi P, Polonioli P, Ferrari S
356 - 361	Residual-Stress Distribution in Electroplated Zn-Ni Alloy Layer Determined by X-Ray-Diffraction Sasaki T, Hirose Y
362 - 366	Pin-Pull Adhesion Measurements of Copper-Films on Ion-Bombarded Alumina Erck RA
367 - 371	Al Planarization Processes for Multilayer Metallization of Quarter Micrometer Devices Xu Z, Kieu H, Raaijmakers IJ, Tepman A
372 - 376	The Effects of Collimation on Intrinsic Stress in Sputter-Deposited Metallic Thin-Films Janacek T, Liu D, Dew SK, Brett MJ, Smy TJ
377 - 381	Formation of Low-Pressure Chemically Vapor-Deposited W-Thin-Film on Silicon Dioxide for Gate Electrode Application Sone JH, Kim SO, Kim KJ, Kim HS, Kim HJ
382 - 385	Cu Deposition Using a Permanent-Magnet Electron-Cyclotron-Resonance Microwave Plasma Source Berry LA, Gorbatkin SM, Rhoades RL
386 - 390	Bombardment and Gas Rarefaction Effects on the Properties of Sputtered Ti Thin-Films Tsai W, Brett MJ, Dew SK, Liu D, Smy T, Tait RN
391 - 394	Selective Electroless Copper Plating on Silicon Seeded by Copper-Ion Implantation Bhansali S, Sood DK, Zmood RB
395 - 401	Tin-Capped TiSi2 Formation in W/TiSi2 Process for a Quarter-Micron Complementary Metal-Oxide-Semiconductor Matsubura Y, Sekine M, Kodama N, Noguchi K, Okumura K
402 - 406	Gold and Zinc Thin-Films Deposited by the Ionized Cluster Beam Technique Feng SW, Nainaparampil JJ, Tabet MF, Urban FK
407 - 412	Au (Ti-W) and Au Cr Metallization of Chemically Vapor-Deposited Diamond Substrates for Multichip-Module Applications Meyyappan I, Malshe AP, Naseem HA, Brown WD
413 - 418	Electrical-Properties of the P(+)-Gate Electrode of an A-Si/Poly-Si Double-Layer Kim SO, Kim KJ, Kim HS, Kang SB, Sone JH, Byun JS, Kim HJ
419 - 424	Numerical Simulations of Thin-Film Thermal Flow Liao H, Cale TS
425 - 429	Properties of Silicon-Nitride Films Prepared by Magnetron Sputtering Hirohata Y, Shimamoto N, Hino T, Yamashima T, Yabe K
430 - 434	UV-Radiation-Induced Degradation of Fluorinated Polyimide Films Chang LH, Saha NC
435 - 439	The Effects of Substrate and Annealing Ambient on the Electrical-Properties of Ta2O5 Thin-Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition Kim SO, Kim HJ
440 - 444	Comparison of Chemical-Vapor-Deposition of Tin Using Tetrakis-Diethylamino-Titanium and Tetrakis-Dimethylamino-Titanium Sun SC, Tsai MH
445 - 450	Single-Phase Polycrystalline Ti1-Xwxn Alloys (O-Less-Than-or-Equal-to-X-Less-Than-or-Equal-to-0.7) Grown by UHV Reactive Magnetron Sputtering - Microstructure and Physical-Properties Moser JH, Tian F, Haller O, Bergstrom DB, Petrov I, Greene JE, Wiemer C
451 - 455	Effect of Dimension Scaling on the Nucleation of C54 TiSi2 Ma Z, Allen LH, Allman DD
456 - 461	Kinetics of Ni/A-Ge Bilayer Reactions Patterson JK, Park BJ, Ritley K, Xiao HZ, Allen LH, Rockett A
462 - 466	High-Resistivity Co and Ti Silicide Formation on Silicon-on-Insulator Substrates Hsia SL, Mcguire GE, Tan TY, Smith PL, Lynch WT
467 - 472	Thickness Dependence of the Properties and Thermal-Stability of PtSi Films Das SR, Sheergar K, Xu DX, Naem A
473 - 478	Chemical-Vapor-Deposition of TiSi2 Using SiH4 and TiCl4 Mendicino MA, Southwell RP, Seebauer EG
479 - 484	Thermal-Stability of Silicide on Polycrystalline Si Hong QZ, Hong SQ, Dheurle FM, Harper JM
485 - 489	Electrical and Structural-Properties of Buried CoSi2 Layers in Si(100) Grown by Molecular-Beam Allotaxy Dolle M, Gassig U, Bay HL, Schuppen A, Mantl S
490 - 495	Morphology of Al-Ni-Ge Ohmic Contacts to N-GaAs as a Function of Contact Composition Lin XW, Lampert WV, Swider W, Haas TW, Holloway PH, Washburn J, Lilientalweber Z
496 - 500	Nonalloyed, Refractory-Metal Contact Optimization with Shallow Implantations of Zn and Mg Lovejoy ML, Zolper JC, Sherwin ME, Baca AG, Shul RJ, Rieger DJ, Klem JF
501 - 507	Development of a Gate Metal Etch Process for Gallium-Arsenide Wafers Bammi R, Cale TS, Grivna G
508 - 512	Realistic Electromigration Lifetime Projection of VLSI Interconnects Kawasaki H, Lee C, Yu TK
513 - 517	Effect of Electro and Stress Migration Forces on the 1/F(Alpha) Noise of Patterned Thin Metal Films Cottle JG, Klonaris N
518 - 521	Properties of Boron Coatings Used as Plasma-Facing Material of Fusion Device Hino T, Iwamoto K, Hirohata Y, Yamashina T, Sagara A, Noda N, Inoue N, Kubota Y, Natsir N, Motojima O, Matsuda T, Sogabe T, Kuroda K, Yabe M
522 - 528	Transport Through Multicomponent Dual-Frequency Plasma Sheaths Myers FR, Peters MW, Ramaswami M, Cale TS
529 - 533	AC Properties of ZnO Thin-Films Prepared by RF Magnetron Sputtering Mahmood FS, Gould RD