1 - 5 |
Growth and Characterization of Liquid-Phase Epitaxial Hg1-xCdxTe Films Li B, Chen XQ, Chu JH, Cao JY, Zhu JQ, Tang DY |
6 - 11 |
Preparation of Ta2Al Intermetallic Compound Films and Their Application as Diffusion-Barriers to Cu Penetration Ohta A, Noya A, Takeyama M, Taguchi M, Sase T, Sasaki K |
12 - 17 |
Depth Profiling of Thin Ito Films by Grazing-Incidence X-Ray-Diffraction Neerinck DG, Vink TJ |
18 - 21 |
Fabrication of ZnTe-Au Composite Microcrystallites Utilizing Island Growth During Thin-Film Deposition Takeda Y, Satoh T, Motohiro T, Hioki T, Noda S |
22 - 27 |
Infrared Kinetic-Study of Ultrathin SiC Buffer Layers Grown on Si(100) by Reactive Chemical-Vapor-Deposition Ferro G, Monteil Y, Vincent H, Cauwet F, Bouix J, Durupt P, Olivier J, Bisaro R |
28 - 31 |
Instability of Si-F Bonds in Fluorinated Silicon-Oxide (Siof) Films Formed by Various Techniques Homma T |
32 - 36 |
Formation of Ge Nanocrystals in Amorphous Ceox and Sigeox Alloy-Films Zacharias M, Blasing J, Lohmann M, Christen J |
37 - 44 |
Thin Ticx Films Chemically Vapor-Deposited Onto Cemented Carbides from the TiCl4-CCl4-H-2 Mixture Konyashin IY |
45 - 48 |
Room-Temperature Growth of Cu Thin-Films by Nozzle-Type Partially-Ionized Beam Deposition with Various Acceleration Voltages Koh SK, Yoon YS, Kim KH, Jung HJ, Lee JY |
49 - 56 |
Effect of Normal Load on Microscale Friction Measurements Bhushan B, Kulkarni AV |
57 - 60 |
Formation of Titanium Silicides by Titanium Deposition Onto Silicon with Simultaneous Self-Ion Bombardment Gusev IV, Chapljuk VI, Belevsky VP |
61 - 66 |
Effects of Heavy Plasma Atoms on Spin Centers in Reactively Sputtered Sin Films Sugimoto I, Kuwano H, Nakano S |
67 - 73 |
Preparation of Tin Film on Brass by CAPD as a Decoration System Wang SG, Bai XD, Wang BC, Fan YD |
74 - 81 |
Durability of Dielectric Protective Layers Against Repetitious Thermal-Stress in Phase-Change Optical-Recording Horie M, Ohno T |
82 - 86 |
Growth of CuInSe2, Cu(in,Ga)Se-2 and Cuin(Se,S)(2) Films on SnO2 Thin-Film Substrates Masse G, Djessas K, Guenoun K, Smith A |
87 - 95 |
Ion-Beam-Assisted Film Growth by High-Dose Implantation of Carbon into a Liquid-Medium Manory RR, Sahagian R, Bunker SN, Armini AJ |
96 - 103 |
Residual-Stresses in Plasma-Sprayed Partially-Stabilized Zirconia Tbcs - Influence of the Deposition Temperature Scardi P, Leoni M, Bertamini L |
104 - 107 |
Excitation-Induced Optical Switching in Transparent Coatings Sernelius BE |
108 - 113 |
Photoelectrical Properties of Double-Layer Organic Solar-Cells Using C-60 and Phthalocyanines Yonehara H, Pac C |
114 - 117 |
Growth of Si1-X-Ygexcy Multiquantum Wells - Structural and Optical-Properties Boucaud P, Guedj C, Julien FH, Finkman E, Bodnar S, Regolini JL |
118 - 123 |
Electronic-Structure of Plasma Polymers of Quinoline Xie X, Oelhafen P |
124 - 128 |
Determination of Optical-Constants and Average Thickness of Thin-Films on Thick Substrates Using Angular-Distribution of Intensity of Reflected Radiation Jaglarz J, Nowak M |
129 - 134 |
Electrical and Photoelectrical Properties of Poly(Phenyl Azomethine Furane) Thin-Films Devices Sharma GD, Sandogaker SG, Roy MS |
135 - 139 |
Design of Reflective Tantala Optical Coatings Using Sol-Gel Chemistry with Ethanoic Acid Catalyst and Chelator Sun Y, Sermon PA, Vong MS |
140 - 143 |
Magnetic-Properties of Gadolinium Silicide Thin-Films Produced by Different Fabrication Processes Pescher C, Pierre J, Ermolieff A, Vannuffel C |
144 - 149 |
Magnetic-Properties of Stearate Films with 3D Transition-Metal Ions Fabricated by the Langmuir-Blodgett Method Ando Y, Hiroike T, Miyashita T, Miyazaki T |
150 - 154 |
The Influence of Rapid Thermal Annealing and Sulfur Passivation on the Electrical Characteristics of Anodically Grown InSb MOS Structures Eftekhari G |
155 - 165 |
Rutherford Backscattering Spectrometry, Particle-Induced X-Ray-Emission and Atomic-Force Microscopy of InAs Thin-Films Grown on GaAs - A Complementary Study Bouhacina T, Aime JP, Barriere AS, Guegan H, Grandjean N, Massies J |