1 - 42 |
Surface reactions during growth and erosion of hydrocarbon films Jacob W |
43 - 46 |
Proposal of a novel in situ stress-reducing method for the growth of c-BN Ullmann J |
47 - 50 |
Growth of Fe3N films via chemical vapor deposition of iron acetylacetonate and anhydrous ammonia Roberson SL, Finello D, Banks AD, Davis RF |
51 - 55 |
Fabrication of high valence Sr(Fe0.65Co0.35)O-3 film by a pulsed laser ablation technique. Tanaka H, Matsuoka N, Oki S, Gohda S, Kawai T |
56 - 59 |
Gate-oxide integrity in metal-oxide-semiconductor structures with Ti-polycide gates for ULSI applications Ko DH, Lee NI, Kim YW, Lee MY |
60 - 62 |
Transparent conducting ZnO : Al films deposited on organic substrates deposited by r.f. magnetron-sputtering Yang TL, Zhang DH, Ma J, Ma HL, Chen Y |
63 - 66 |
Growth of MgO on Si(100) and GaAs(100) by laser ablation Stampe PA, Kennedy RJ |
67 - 71 |
Dependence of film composition and thicknesses on optical and electrical properties of ITO-metal-ITO multilayers Bender M, Seelig W, Daube C, Frankenberger H, Ocker B, Stollenwerk J |
72 - 77 |
Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films Bender M, Seelig W, Daube C, Frankenberger H, Ocker B, Stollenwerk J |
78 - 82 |
Electrodeposition of PbTe thin films Saloniemi H, Kanniainen T, Ritala M, Leskela M |
83 - 87 |
Nozzle diameter effects on CuInSe2 films grown by ionized cluster beam deposition Kondo K, Sano H, Sato K |
88 - 91 |
Characterizations of SnO2 thin films deposited on Si substrates Yan H, Chen GH, Man WK, Wong SP, Kwok RWM |
92 - 98 |
The preparation of photoluminescent Si nanocrystal-SiOx films by reactive evaporation Zhang S, Zhang W, Yuan J |
99 - 105 |
Active optical properties of erbium-doped GeO2-based sol-gel planar waveguides Strohhofer C, Capecchi S, Fick J, Martucci A, Brusatin G, Guglielmi M |
106 - 116 |
Transmission electron microscopy study of zirconia-alumina nanolaminates grown by reactive sputter deposition. Part I : zirconia nanocrystallite growth morphology Schofield MA, Aita CR, Rice PM, Gajdardziska-Josifovska M |
117 - 125 |
Transmission electron microscopy study of zirconia-alumina nanolaminates grown by reactive sputter deposition. Part II : transformation behavior of tetragonal zirconia nanocrystallites Schofield MA, Aita CR, Rice PM, Gajdardziska-Josifovska M |
126 - 133 |
TEM study of B2+L1(2) decomposition in a nanoscale Ni-rich Ni-Al film Schryvers D, Yandouzi M, Toth L |
134 - 142 |
Structure and mechanical properties of vacuum arc-deposited NbN coatings Zhitomirsky VN, Grimberg I, Rapoport L, Travitzky NA, Boxman RL, Goldsmith S, Raihel A, Lapsker I, Weiss BZ |
143 - 150 |
Material aspects of nickel silicide for ULSI applications Xu DX, Das SR, Peters CJ, Erickson LE |
151 - 153 |
Reactive ion (N-2(+)) beam pretreatment of sapphire for GaN growth Byun D, Jeong J, Kim HJ, Koh SK, Choi WK, Park D, Kum DW |
154 - 159 |
Effects of gas composition and r.F. power on properties of a-C : H/SiC : H composite films grown by plasma-enhanced chemical vapor deposition Yi JW, Lee YH, Farouk B |
160 - 165 |
Simulation and analysis of X-ray photoemission and Auger valence band spectra of hydrogenated amorphous silicon Clare BW, Jennings PJ, Lund CP, Cornish JCL, Hefter GT |
166 - 170 |
Investigation of the relationship between the reflectance and the deposited nickel and tin amount on the aluminium anodic oxide film Kallithrakas-Kontos N, Moshohoritou R, Ninni V, Tsangaraki-Kaplangolou I |
171 - 174 |
Effect of O-2 pressure on the preferred orientation of TiO2 films prepared by filtered arc deposition Zhang F, Liu XH |
175 - 179 |
SiC formation and influence on the morphology of polycrystalline silicon thin films on graphite substrates produced by zone melting recrystallization Hauttmann S, Kunze T, Muller J |
180 - 188 |
Crevice corrosion behavior of A516-70 carbon steel in solutions containing inhibitors and chloride ions Yang MZ, Wilmott M, Luo JL |
189 - 193 |
Voltage controlled reactive sputtering process for aluminium oxide thin films Koski K, Holsa J, Juliet P |
194 - 200 |
An analysis of photoluminescence voltage quenching and band structure of nanoporous silicon Parkinson M, Bayliss SC, Clarke DT, Law D, Beamson G |
201 - 204 |
Fabrication and characterization of high quality organic multiple quantum well structures An HY, Hou JY, Chen BJ, Shen JC, Liu SY |
205 - 210 |
Optical absorption of island films of noble metals : wave length of the plasma absorption band Doremus R |
211 - 216 |
Thermal behavior of Langmuir-Blodgett films of 5-(4-N-octadecylpyridyl)-10,15,20-tri-p-tolylporphyrin studied by ultraviolet-visible and infrared spectroscopies Zhang ZJ, Lal Verma A, Nakashima K, Yoneyama M, Iriyama K, Ozaki Y |
217 - 222 |
Molecular recognition of nucleolipid amphiphile octadecanoyl ester of 1-(2-carboxyethyl) adenine to the complementary nucleobases. Part I : characterization of the monolayer behavior at the air/water interface and photodimerization in the Langmuir-Blodgett film matrix under ultraviolet irradiation Huang JQ, Liang YQ |
223 - 226 |
Monolayers and Langmuir-Blodgett films of yttrium stearate Zotova TV, Arslanov VV, Gagina IA |
227 - 232 |
Hydroxyapatite powders and thin films prepared by a sol-gel technique Lopatin CM, Pizziconi V, Alford TL, Laursen T |
233 - 237 |
Electrical and optical properties of InP grown by molecular beam epitaxy using a valved phosphorus cracker cell Yoon SF, Zheng HQ, Zhang PH, Mah KW, Ng GI |
238 - 244 |
XPS study of Nb-doped oxygen sensing TiO2 thin films prepared by sol-gel method Atashbar MZ, Sun HT, Gong B, Wlodarski W, Lamb R |
245 - 250 |
Influence of peripheral electron-withdrawing substituents on the conductivity of zinc phthalocyanine in the presence of gases. Part 1 : reducing gases Schollhorn B, Germain JP, Pauly A, Maleysson C, Blanc JP |
251 - 255 |
Low-temperature growth of cubic GaN by metalorganic chemical-vapor deposition Zheng LX, Yang H, Xu DP, Wang XJ, Li XF, Li JB, Wang YT, Duan LH, Hu XW |
256 - 262 |
Temperature dependence of the electrical conductivity and Seebeck coefficient of new poly(ester-syloxane)urethane elastomers in thin films Rusu M, Stanciu A, Bulacovschi V, Rusu GG, Bucescu M, Rusu GI |