1 - 4 |
Camphoric carbon soot: a new target for deposition of diamond-like carbon films by pulsed laser ablation Mominuzzaman SM, Soga T, Jimbo T, Umeno M |
5 - 8 |
A method of studying carbon particle distribution in paint films Mozetic M, Zalar A, Panjan P, Bele M, Pejovnik S, Grmek R |
9 - 15 |
Titanium nitride thin films obtained by a modified physical vapor deposition process LeClair P, Berera GP, Moodera JS |
16 - 25 |
Application of mathematical morphology in measurement of droplet size distribution in dropwise condensation Maiti N, Desai UB, Ray AK |
26 - 31 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2 Byun KM, Lee WJ |
32 - 37 |
High temperature materials for thin-film thermocouples on silicon wafers Kreider KG, Gillen G |
38 - 46 |
Growth mechanisms of crystallites in the mixed-phase silicon films deposited by low-pressure chemical vapor deposition Wee H, Lee C, Shin SC |
47 - 55 |
Pyrosol deposition of ZnO and SnO2 based thin films: the interplay between solution chemistry, growth rate and film morphology Smith A |
56 - 66 |
Growth kinetics of sputtered amorphous carbon thin films: composition studies and phenomenological model Logothetidis S, Patsalas P, Gioti M, Galdikas A, Pranevicius L |
67 - 72 |
Pd-Ag alloy films prepared by metallorganic chemical vapor deposition process Lu SY, Lin YZ |
73 - 81 |
Evaluation of precursors for chemical vapor deposition of ruthenium Smith KC, Sun YM, Mettlach NR, Hance RL, White JM |
82 - 88 |
CuAu-I type ordering and orientation domains in tetragonal Zn2-2xCuxInxS2 films (0.78 <= x <= 1) crystallized on (001) gallium phosphide by pulsed laser deposition Wagner G, Oppermann D, Bente K, Lenzner J, Lorenz M |
89 - 98 |
Reaction of Si(111) surface with acetone Takami T, Ishidzuka S, Igari Y, Range H, Kusunoki I |
99 - 109 |
Structure and morphology of high quality indium-doped ZnO films obtained by spray pyrolysis Miki-Yoshida M, Paraguay-Delgado F, Estrada-Lopez W, Andrade E |
110 - 114 |
Deposition of MgO thin films by modified electrostatic spray pyrolysis method Kim SG, Kim JY, Kim HJ |
115 - 123 |
Effect of surface impurities on the Cu/Ta interface Chen L, Magtoto N, Ekstrom B, Kelber J |
124 - 130 |
A novel process and thermodynamic mechanisms of air gap formation for ULSI application Chang KM, Yang JY, Chen LW, Tseng MH |
131 - 139 |
Effects of ion beam bombardment on electrochromic tungsten oxide films studied by X-ray photoelectron spectroscopy and Rutherford back-scattering Wong HY, Ong CW, Kwok RWM, Wong KW, Wong SP, Cheung WY |
140 - 143 |
Preparation of hard super-hydrophobic films with visible light transmission. Nakajima A, Abe K, Hashimoto K, Watanabe T |
144 - 151 |
Manufacturing, structure and high temperature corrosion of palladium-modified aluminide coatings on nickel-base superalloy M38 He DX, Guan HR, Sun XF, Jiang XX |
152 - 158 |
Wear resistance of carbon nitride thin films formed by ion beam assisted deposition Hayashi T, Matsumuro A, Muramatsu M, Kohzaki M, Yamaguchi K |
159 - 163 |
Microstructures and properties of PVD aluminum bronze coatings Liang W, Xu XL, Xu JJ, Hei ZK |
164 - 169 |
An effective diffusion barrier metallization process on copper So WW, Choe S, Chuang R, Lee CC |
170 - 178 |
Dependence of microstructure and nanomechanical properties of amorphous carbon nitride thin films on vacuum annealing Bai MW, Kato K, Umehara N, Miyake Y, Xu JG, Tokisue H |
179 - 182 |
Fractal character of circumferences of polishing-induced pull outs of plasma sprayed Cr3C2-NiCr coatings Li JF, Ding CX |
183 - 187 |
Improvement of secondary electron emission property of MgO protective layer for an alternating current plasma display panel by addition of TiO2 Kim R, Kim Y, Park JW |
188 - 197 |
Phase formation in aluminium implanted titanium and the correlated modification of mechanical and corrosive properties Tsyganov I, Wieser E, Matz W, Mucklich A, Reuther H, Pham MT, Richter E |
198 - 207 |
Micromechanics study of thermomechanical characteristics of polycrystal shape-memory alloy films Jin YM, Weng GJ |
208 - 213 |
Double-layer anti-reflection coating using MgF2 and CeO2 films on a crystalline silicon substrate Lee SE, Choi SW, Yi J |
214 - 219 |
Electronic properties of the space charge layer of in situ prepared copper phthalocyanine thin films exposed to oxygen Szuber J, Grzadziel L |
220 - 224 |
Polarized electroluminescence from a uniaxially oriented polysilane thin film Ichino Y, Takada N, Tanigaki N, Kaito A, Yoshida M, Yokokawa S, Sakurai H |
225 - 231 |
Qualitative evaluation of pyroelectric mechanisms in Langmuir-Blodgett films containing a cyclic polysiloxane substituted with aliphatic side chains using Fourier transform infrared (FTIR) spectroscopy Abd Majid WH, Richardson TH, Lacey D, Topacli A |
232 - 235 |
PbBr-based layered perovskite film using the Langmuir-Blodgett technique Era M, Oka S |
236 - 240 |
Influence of composition on the electrical and optical properties of Ge20BixSe80-x films El-Zahed H, El-Korashy A |
241 - 248 |
Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique Jana T, Ray S |
249 - 254 |
Studies on the formation of microcrystalline silicon with PECVD under low and high working pressure Guo LH, Lin RM |
255 - 263 |
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature Zhang K, Zhu FR, Huan CHA, Wee ATS |
264 - 266 |
Critical exponents of diamond films: possible influence of spatially correlated noise Cattani M, Salvadori MC |
267 - 274 |
Energy-resolved photon flux dependence of the steady state photoconductivity in hydrogenated amorphous silicon: implications for the constant photocurrent method Schmidt JA, Koropecki RR, Arce RD, Rubinelli FA, Buitrago RH |