1 - 3 |
Growth of highly oriented of Pb(Zr-x, Ti1-x)O-3 film on porous silicon Chen Q, Wu WB, Mak CL, Wong KH |
4 - 7 |
A simple low-temperature laser-doping employing phosphosilicate glass and borosilicate glass films for the source and drain formation in poly-Si thin film transistors Kim CH, Jung SH, Jeon JH, Han MK |
8 - 11 |
Polymerization of Langmuir-Blodgett films. A comparison of two different methods Bardosova M, Hodge P, Korenova A, Nakanishi F, Tredgold RH |
12 - 16 |
Transmission electron microscopy study of silicon nitride amorphous films obtained by reactive pulsed laser deposition Teodorescu VS, Nistor LC, Popescu M, Mihailescu IN, Gyorgy E, Van Landuyt J, Perrone A |
17 - 23 |
Characterization of inhomogeneous dielectric coatings with arbitrary refractive index profiles by multiple angle of incidence ellipsometry Tonova DA, Konova AA |
24 - 29 |
Microstructural observation and wear properties of thin chrome layers prepared by pulse plating Choi Y, Baik NI, Hong SI |
30 - 39 |
Transmission electron microscopy study of rapid solidification of plasma sprayed zirconia - part I. First splat solidification Chraska T, King AH |
40 - 48 |
Transmission electron microscopy study of rapid solidification of plasma sprayed zirconia - part II. Interfaces and subsequent splat solidification Chraska T, King AH |
49 - 55 |
Deposition of indium-tin-oxide films on polymer substrates for application in plastic-based flat panel displays Park SK, Han JI, Kim WK, Kwak MG |
56 - 62 |
Depth profiles of As and B implanted into Si-on-insulator substrates Ogura A, Hiroi M |
63 - 69 |
Self-assembly of ZnO/riboflavin 5'-phosphate thin films by one-step electrodeposition and its characterization Karuppuchamy S, Yoshida T, Sugiura T, Minoura H |
70 - 77 |
Chemical vapor deposition of copper film from hexafluoroacetylacetonateCu((I))vinylcyclohexane Choi KK, Rhee SW |
78 - 82 |
Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol Miller KA, John C, Zhang KZ, Nicholson KT, McFeely FR, Holl MMB |
83 - 89 |
Electrodeposition of Cu/Ni-P multilayers by a single bath technique Miyake T, Kume M, Yamaguchi K, Amalnerkar DP, Minoura H |
90 - 94 |
Elimination Of O-2 plasma damage of low-k methyl silsesquioxane film by As implantation Wang CY, Zheng JZ, Shen ZX, Lin Y, Wee ATS |
95 - 101 |
Fourier transform infrared spectroscopy and oxygen luminescence probing combined study of modified sol-gel derived film Zhu H, Ma YG, Fan YG, Shen JC |
102 - 108 |
Comparison of monolayer films of stearic acid and methyl stearate on an Al2O3 surface Oberg K, Persson P, Shchukarev A, Eliasson B |
109 - 115 |
Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers Sun YM, Lee SY, Lemonds AM, Engbrecht ER, Veldman S, Lozano J, White JM, Ekerdt JG, Emesh I, Pfeifer K |
116 - 124 |
Structure and growth mode of thin Co films on Fe(001): comparison of purely thermal and ion-assisted deposition Giovanardi C, Luches P, di Bona A, Borghi A, Valeri S |
125 - 132 |
Photoluminescence and Raman study of porous silicon synthesized by visible and infrared laser etching Mavi HS, Rasheed BG, Soni RK, Abbi SC, Jain KP |
133 - 137 |
Structures and local electrical properties of ferroelectric polymer thin films in thermal process investigated by dynamic-mode atomic force microscopy Fukuma T, Kobayashi K, Horiuchi T, Yamada H, Matsushige K |
138 - 142 |
Epitaxial dysprosium silicide films on silicon: growth, structure and electrical properties Travlos A, Salamouras N, Boukos N |
143 - 151 |
A model of abrasive-free removal of copper films using an aqueous hydrogen peroxide-glycine solution Zhang L, Subramanian RS |
152 - 156 |
Kinetic study of the formation of a surface-confined Cu50Pt50 alloy Tsay JS, Mangen T, Wandelt K |
157 - 161 |
Growth of epitaxial anatase (001) and (101) films Herman GS, Gao Y |
162 - 169 |
Interfacial roughening in lattice-matched GaInP/GaAs heterostructures Wang YQ, Wang ZL, Brown T, Brown A, May G |
170 - 175 |
Study of the secondary-electron emission from thermally grown SiO2 films on Si Yi WK, Jeong T, Yu SG, Lee J, Jin SW, Heo J, Kim JM |
176 - 185 |
How cracks in SiOx-coated polyester films affect gas permeation Yanaka M, Henry BM, Roberts AP, Grovenor CRM, Briggs GAD, Sutton AP, Miyamoto T, Tsukahara Y, Takeda N, Chater RJ |
186 - 193 |
Effect of silicon nitride capping layer on via electromigration and failure criterion methodology in multilevel interconnection Huang JS, Deng XJ, Yih PH, Shofner TL, Obeng YS, Darling C |
194 - 202 |
The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures Cabral C, Lavoie C, Harper JME, Jordan-Sweet J |
203 - 207 |
Oxidation behavior of TiN/AlN multilayer films prepared by ion beam-assisted deposition Kim DG, Seong TY, Baik YJ |
208 - 210 |
Effect of LiF buffer layer on the performance of organic electroluminescent devices Zhao Y, Liu SY, Hou JY |
211 - 215 |
Er doping of nanocrystalline-Si/SiO2 superlattices Schmidt M, Zacharias M, Richter S, Fischer P, Veit P, Blasing J, Breeger B |
216 - 222 |
Modeling thin TiO2 films of various densities as an effective optical medium Mergel D |
223 - 228 |
Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films Fortin JB, Lu TM |
229 - 237 |
Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry Tikhonravov AV, Trubetskov MK, Krasilnikova AV, Masetti E, Duparre A, Quesnel E, Ristau D |
238 - 243 |
Electrical and optical properties of WO3 thin films Regragui M, Jousseaume V, Addou M, Outzourhit A, Bernede JC, El Idrissi B |
244 - 248 |
p-type transparent thin films of CuY1-xCaxO2 Jayaraj MK, Draeseke AD, Tate J, Sleight AW |
249 - 254 |
Electrochemical oxidation of Y1Ba2Cu3 alloyed layers using an alkaline bath Ekal LA, Shivagan DD, Shirage PM, Desai NV, Mane SB, Pawar SH |
255 - 265 |
Preparation of hybrid films of an anionic Ru(II) cyanide polypyridyl complex with layered double hydroxides by the Langmuir-Blodgett method and their use as electrode modifiers He JX, Kobayashi K, Takahashi M, Villemure G, Yamagishi A |
266 - 275 |
Spectroscopic studies of the multiporphyrin arrays at the air-water interface and in Langmuir-Blodgett films Qian DJ, Nakamura C, Miyake J |
276 - 279 |
Speeding-up effects of hard carbon films on surface acoustic wave on crystalline quartz Zhang Q, Yoon SF, Zhgoon S, Ligatchev V, Ahn J, Rusli, Sun Z |
280 - 287 |
Percolation calculation with non-nearest neighbor hopping of hopping resistances for granular metals Lin CH, Wu GY |
288 - 295 |
Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films Shaginyan LR, Onoprienko AA, Britun VF, Smirnov VP |
296 - 296 |
Formation of the wetting layer in Ge/Si(111) studied by STM and XAFS (vol 369, pg 29, 2000) Rosei F, Motta N, Sgarlata A, Capellini G, Boscherini F |