1 - 37 |
Formation of polymer-like hydrocarbon films from radical beams of methyl and atomic hydrogen von Keudell A |
38 - 42 |
Epitaxial Y2O3 film growth on an oxidized Si surface Cho MH, Ko DH, Choi YK, Lyo IW, Jeong K, Whang CN |
43 - 48 |
Epitaxial growth of high quality AlGaAs/GaAs structures on atomically flat GaAs surfaces in deep dielectric windows cleaned using atomic hydrogen Loke WK, Yoon SF, Zheng HQ, Fonstad CG |
49 - 54 |
Preparation and characterization of pyrolytically deposited (Co-V-O and Cr-V-O) thin films Adedeji AV, Egharevba GO, Jeynes C, Ajayi EOB |
55 - 59 |
Effect of gas pressure on the synthesis of carbon nitride films during plasma-enhanced chemical vapor deposition Yu W, Ren GB, Wang SF, Han L, Li XW, Zhang LS, Fu GS |
60 - 64 |
Characterization of CNx films by X-ray emission measurements Kurmaev EZ, Moewes A, Winarski RP, Shamin SN, Ederer DL, Feng JY, Turner SS |
65 - 70 |
Microstructural characterization of donor-doped lead zirconate titanate films prepared by sol-gel processing Zou Q, Ruda H, Yacobi BG, Farrell M |
71 - 78 |
Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor Thangaraju B |
79 - 82 |
Copper phthalocyanine film grown by vacuum deposition under magnetic field Ji ZG, Wong KW, Tse PK, Kwok RWM, Lau WM |
83 - 89 |
A comprehensive study of SiC growth processes in a VPE reactor Chassagne T, Ferro G, Chaussende D, Cauwet F, Monteil Y, Bouix J |
90 - 98 |
Investigations on the optical properties of sol-gel derived lanthanum doped lead titanate thin films Majumder SB, Jain M, Katiyar RS |
99 - 110 |
Synthesis of amorphous silicon carbonitride films by pulsed laser deposition Boughaba S, Sproule GI, McCaffrey JP, Islam M, Graham MJ |
111 - 116 |
Synthesis and characterization of porous silica thin films deposited from MCM-41 evaporation Velez MH, Garrido OS, Barbeyto RMB, Shmytko IM, Poza MMG, Burgos LV, Martinez-Duart JM, Ruiz-Hitzky E |
117 - 120 |
Cubic BN formation by ion implantation Hu C, Wu QMJ, Shen J, Kotake S, Suzuki Y |
121 - 125 |
The role of aluminum anodizing conditions on the effect of the additive light green Dimogerontakis T, Tsangaraki-Kaplanoglou I |
126 - 130 |
Investigation of electrochromic properties of nanocrystalline tungsten oxide thin film Meda L, Breitkopf RC, Haas TE, Kirss RU |
131 - 142 |
Growth and hydrogenation of epitaxial yttrium switchable mirrors on CaF2 Kooij ES, Rector JH, Nagengast DG, Kerssemakers JWJ, Dam B, Griessen R, Remhof A, Zabel H |
143 - 153 |
Quest for an optoelectronic material: tetragonal SixGe1-x films Bottomley DJ, Delaunay JJ, Tomita M, Hayashi T |
154 - 161 |
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films Alayo MI, Pereyra I, Scopel WL, Fantini MCA |
162 - 166 |
Plasma-assisted deposition of BN thin films from B(N-3)(3) Hobbs KR, Coombe RD |
167 - 171 |
Atomic layer deposition of BN thin films Marlid B, Ottosson M, Pettersson U, Larsson K, Carlsson JO |
172 - 182 |
Phase composition and microstructure of polycrystalline and epitaxial TaNx layers grown on oxidized Si(001) and MgO(001) by reactive magnetron sputter deposition Shin CS, Kim YW, Gall D, Greene JE, Petrov I |
183 - 189 |
TEM and simulation studies of Ti3N ordered superstructure formed in intensified plasma assisted nitrided Ti-6Al-4V alloy Jiang JC, Meletis EI |
190 - 194 |
Dipole moment of a modified poly(3-alkylthiophene) at the air/water interface Cirak J, Tomcik P, Barancok D, Bolognesi A, Ragazzi M |
195 - 202 |
Residual stress states in sputtered Ti1-xSixNy films Vaz F, Rebouta L, Goudeau P, Riviere JP, Schaffer E, Kleer G, Bodmann M |
203 - 210 |
Microstructure and properties of Ti(C,N) coatings produced by moderate temperature chemical vapour deposition Larsson A, Ruppi S |
211 - 214 |
Surface modification of 2Cr13 oil pump steel by plasma immersion ion implantation-ion beam enhanced deposition (PIII-IBED) Tang BY, Gan KY, Yang P, Wang XF, Wang LP, Wang SY, Chu PK |
215 - 221 |
Ni2V2O7 thin films for negative electrode application of rechargeable microbatteries Ali EB, Bernede JC, Guyomard D |
222 - 225 |
Effects of gamma irradiation on electroluminescence spectra from Au/amorphous Si/SiO2 superlattices/p-Si structures Ma SY |
226 - 231 |
Tungsten and fluorine co-doping of VO2 films Burkhardt W, Christmann T, Franke S, Kriegseis W, Meister D, Meyer BK, Niessner W, Schalch D, Scharmann A |
232 - 236 |
Optical properties of Ag8In14Sb55Te23 phase-change films Li JY, Gan FX |
237 - 241 |
Synthesis and characterization of polymetalate based photochromic inorganic-organic nanocomposites Zhang TR, Feng W, Lu R, Zhang XT, Jin M, Li TJ, Zhao YY, Yao JN |
242 - 247 |
Electrical properties of ZrO2 thin films Jonsson AK, Niklasson GA, Veszelei M |
248 - 261 |
Thin film atomic layer deposition equipment for semiconductor processing Sneh O, Clark-Phelps RB, Londergan AR, Winkler J, Seidel TE |
262 - 271 |
Electrochemical synthesis of Ag/Co multilayered nanowires in porous polycarbonate membranes Valizadeh S, George JM, Leisner P, Hultman L |
272 - 279 |
Electrochemical characterization of Langmuir-Blodgett films from the ruthenium complex mer-[RuCl3(dppb)(4-Mepy)] Wohnrath K, Garcia JR, Nart FC, Batista AA, Oliveira ON |
280 - 289 |
Application of inverse problem algorithm for temperature uniformity in rapid thermal processing Lin S, Chu HS |
290 - 295 |
Preferential growth of thin rutile TiO2 films upon thermal oxidation of sputtered Ti films Ting CC, Chen SY, Liu DM |
296 - 301 |
Low-temperature crystallization of amorphous silicon films in contact with palladium by hydrogen plasma heating Kim HY, Kang YS, Lee PS, Lee JY |
302 - 306 |
Photoluminescence and structure of ZnO films deposited on Si substrates by metal-organic chemical vapor deposition Fu ZX, Lin BX, Zu J |
307 - 310 |
Structural and dielectric properties of Ba0.7Sr0.3TiO3 thin films grown on thin Bi layer-coated Pt(111)/Ti/SiO2/Si substrates Yi WC, Kalkur TS, Philofsky E, Kammerdiner L |
311 - 311 |
Reflectance and transmittance of a slightly inhomogeneous thin film bounded by rough, unparallel interfaces (vol 396, pg 262, 2001) Montecchi M, Montereali RM, Nichelatti E |