Thin Solid Films

Thin Solid Films, Vol.422, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (40 articles)

1 - 3	Highly transparent Ni-Mg and Ni-V-Mg oxide films for electrochromic applications Azens A, Isidorsson J, Karmhag R, Granqvist CG
4 - 7	Fabrication of polysilane-titania hybrid thin films Matsuura Y, Kumon K, Tohge N, Inoue H, Matsukawa K
8 - 13	Microstructure of BaxSr1-xTiO3 thin films grown on sapphire substrates Rafaja D, Kub J, Simek D, Lindner J, Petzelt J
14 - 19	Influence of nitrogen trifluoride and nitrogen plasma treatment on the formation of hillocks during aluminum induced crystallization of a-Si : H Al-Dhafiri AM, El-Jammal HA, Al-Shariah A, Naseem HA, Brown WD
20 - 27	Properties of diamond films grown from CH4-CF4-H-2 gas mixture using the hot-filament chemical vapor deposition technique Musale DV, Pavaskar NR, Kshirsagar ST
28 - 32	The effect of target nitridation on structural properties of InN grown by radio-frequency reactive sputtering Motlan, Goldys EM, Tansley TL
33 - 38	Electrical properties of stacked gate dielectric (SiO2/ZrO2) deposited on strained SiGe layers Chatterjee S, Samanta SK, Banerjee HD, Maiti CK
39 - 47	Atomic mixing and chemical bond formation in MoSx/Fe thin-film system deposited from a laser plume in a high-intensity electrostatic field Fominski V, Nevolin V, Romanov R, Smirnov A, Titov V, Scharff W
48 - 54	Use of 2-hydroxylhydrazine as a new modifier in dip-coating nickel films Syukri, Ito Y, Ban T, Ohya Y, Takahashi Y
55 - 61	Hydrophilicity of TiO2 thin films obtained by radio frequency magnetron sputtering deposition Sirghi L, Aoki T, Hatanaka Y
62 - 68	Low-temperature deposition of carbon nitride films from a molecular azide, (C3N3)(N-3)(3) Wang JJ, Gillan EG
69 - 72	The oriented growth of ZnO films on NaCl substrates by pulsed laser ablation Henley SJ, Ashfold MNR, Cherns D
73 - 79	Characterization of epitaxial thin films of Bi2VO5.5 on La-doped SrTiO3 substrates prepared by coating-pyrolysis process Tsukada K, Nagahama T, Sohma M, Yamaguchi I, Manabe T, Tsuchiya T, Suzuki S, Shimizu T, Mizuta S, Kumagai T
80 - 86	Indium-tin-oxide thin film prepared by microwave-enhanced d.c. reactive magnetron sputtering for telecommunication wavelengths Meng LJ, Crossan E, Voronov A, Placido F
87 - 91	Degradation during sputter deposition of solid electrolyte thin films for microsystems Seguin JL, Lambert-Mauriat C, Aguir K, Bendahan A, Jacolin C, Lauque P
92 - 97	Synthesis of diamond-like carbon film by novel electrodeposition route Roy RK, Deb B, Bhattacharjee B, Pal AK
98 - 103	ZnS : Mn nanocrystallites in SiO2 matrix: preparation and properties Bhattacharjee B, Ganguli D, Chaudhuri S, Pal AK
104 - 111	Structural studies on thin films of an unsubstituted oligo(para-phenylenevinylene) Veenstra SC, van Hutten PF, Post A, Wang Y, Hadziioannou G, Jonkman HT
112 - 119	X-Ray photoelectron spectroscopy characterisation of Langmuir-Blodgett films containing TiO2 nanoparticles grown by room-temperature hydrolysis of TiO(C2O4)(2)(2-) Malitesta C, Tepore A, Valli L, Genga A, Siciliano T
120 - 125	Synthesis of vertically aligned carbon nanotubes films on silicon wafers by pyrolysis of ethylenediamine Zhang WD, Wen Y, Li J, Xu GQ, Gan LM
126 - 129	Titanium metallization of Si3N4 ceramics by molten salt reaction: coating microstructure and brazing property Wei P, Li JQ, Chen J
130 - 134	Preparation of amorphous carbon films by layer-by-layerhydrogen plasma annealing method and their luminescence properties Huang XH, Xu J, Li W, Chen KJ
135 - 140	A novel process for the generation of pristine sapphire surfaces Park H, Chan HM
141 - 149	Ion solid surface interactions in ionized copper physical vapor deposition Liu XY, Daw MS, Kress JD, Hanson DE, Arunachalam V, Coronell DG, Liu CL, Voter AF
150 - 154	Improved interface properties of yttrium oxide buffer layer on silicon substrate for ferroelectric random access memory applications Lim DG, Kwak DJ, Yi JS
155 - 160	Investigation of reversible and irreversible polarizations in thin films of SrBi2(Ta-0.5,Nb-0.5)(2)O-9 Bhattacharyya S, Saha S, Krupanidhi SB
161 - 165	Measurement of the refractive-index variations with temperature of hybrid sol-gel glasses Moujoud A, Saddiki Z, Touam T, Najafi SI
166 - 169	Epitaxial stabilization of single crystal anatase films via reactive sputter deposition Jeong BS, Budai JD, Norton DP
170 - 175	CeO2 thin films obtained by sol-gel deposition and annealed in air or argon Skofic IK, Sturm S, Ceh M, Bukovec N
176 - 179	Room-temperature deposition of Al-doped ZnO films by oxygen radicalassisted pulsed laser deposition Matsubara K, Fons P, Iwata K, Yamada A, Niki S
180 - 185	Structure and characteristics of ZnO : Al/n-Si heterojunctions prepared by magnetron sputtering Song DY, Neuhaus DH, Xia J, Aberle AG
186 - 192	Effect of titanium substitution on film structure and ferroelectric properties of Sr-deficient Sr0.75Bi2.35Ta2O9 thin films Chen SY, Lan BC, Taso CS
193 - 199	Field- and optically induced electron emission from tin oxide films Olesik J, Malachowski M
200 - 204	Optical vibrational modes in (Cd, Pb, Zn)S quantum dots embedded in Langmuir-Blodgett matrices Milekhin AG, Sveshnikova LL, Repinsky SM, Gutakovsky AK, Friedrich M, Zahn DRT
205 - 210	Investigation of photoelectrochemical oxidation of Fe2+ ions on porous nanocrystalline TiO2 electrodes using electrochemical quartz crystal microbalance Si SH, Huang KL, Wang XG, Huang MZ, Chen HF
211 - 219	Errors introduced in a-Si : H-based solar cell modeling when dangling bonds are approximated by decoupled states Klimovsky E, Rath JK, Schropp REI, Rubinelli FA
220 - 224	Preparation and humidity sensing behaviors of nanocrystalline SnO2/TiO2 bilayered films Tai WP, Oh JH
225 - 229	Study on Al-induced crystallization of Al/a-Si : H bilayer thin film Wang RC, Du PY, Shen G, Weng WJ, Han GR
230 - 234	The effect of Eu substitution on the ferroelectric properties of Bi4Ti3O12 thin films prepared by metal-organic decomposition Kim KT, Kim CI, Kang DH, Shim IW
235 - 238	A novel method for improving photocatalytic activity of TiO2 film: the combination of Ag deposition with application of external electric field He C, Xiong Y, Zhu XH