Thin Solid Films

Thin Solid Films, Vol.440, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (43 articles)

1 - 4	Polycrystalline silicon prepared by metal induced crystallization Choi JH, Kim DY, Kim SS, Park SJ, Jang J
5 - 10	Synthesis and characterization of p-type transparent conducting CuAlO2 thin film by DC sputtering Banerjee AN, Kundoo S, Chattopadhyay KK
11 - 18	Combinatorial synthesis and rapid characterization of Mo1-xSnx (0 <= x <= 1) thin films Bonakdarpour A, Hewitt KC, Hatchard TD, Fleischauer MD, Dahn JR
19 - 25	Non-aqueous Electrodeposition of ZnO and CdO films Jayakrishnan R, Hodes G
26 - 34	Thickness and erbium doping effects on the electrical properties of lead zirconate titanate thin films Es-Souni M, Zhang N, Iakovlev S, Solterbeck CH, Piorra A
35 - 40	In-plane magnetic anisotropy in RF sputtered Fe-N thin films Nie HB, Xu SY, Ong CK, Zhan Q, Li DX, Wang JP
41 - 44	Structure of DC sputtered Si-C-N thin films Radnoczi G, Safran G, Czigany Z, Berlind T, Hultman L
45 - 53	Electrodeposition under a time-dependent boundary condition Gomez E, Kipervaser ZG, Valles E
54 - 59	Magnetic properties of sputtered soft magnetic Fe-Ni films with an uniaxial anisotropy Kim JG, Han KH, Song SH, Reilly A
60 - 65	Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition Fang L, Shen MR
66 - 73	Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering Chappe JM, Martin N, Terwagne G, Lintymer J, Gavoille J, Takadoum J
74 - 77	The synthesis by successive ionic layer deposition of SnMo0.O-6(y)center dot nH(2)O nanolayers on silica Gulina LB, Tolstoy VP
78 - 86	The process window for diamond deposition from the vapor phase with sulfur in the C-H-O feed gas mixtures Bhimarasetti G, Sunkara MK
87 - 93	Nature of the as-deposited state of AlCuFeCrPVD coatings Daniels MJ, King D, Phillips B, Zabinski JS, Bilello JC
94 - 99	Temperature-dependent behavior of Langmuir monolayers of an amphiphilic spiropyran Tachibana H, Yamanaka Y, Abe M
100 - 108	Copper metallization of hydroxyl-modified amorphous Si : C : H films Pritchett M, Magtoto N, Tong J, Kelber JA, Zhao X
109 - 116	Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition Finnie KS, Triani G, Short KT, Mitchell DRG, Attard DJ, Bartlett JR, Barbe CJ
117 - 122	Investigation of the interfacial structure of ultra-thin platinum film deposited by cathodic-arc Swift PD, Solina DM, Cheary RW, McCredie GM
123 - 128	Metallization of cross-linked epoxy resins by reduction of polymer-incorporated metal ions Shibata M, Uda T, Yosomiya T
129 - 137	Chemical selectivity of self-assembled monolayers of calix[4]resorcinarene Faull JD, Gupta VK
138 - 144	Thickness of diamond-like carbon coatings quantified with Raman spectroscopy Scharf TW, Singer IL
145 - 151	Bias frequency, waveform and duty-cycle effects on the bias-enhanced nucleation of epitaxial diamond Wolter SD, Okuzumi F, Prater JT, Sitar Z
152 - 154	Atomic layer deposition growth of zirconium doped In2O3 films Asikainen T, Ritala M, Leskela M
155 - 168	Reactive electron beam evaporation of gadolinium oxide optical thin films for ultraviolet and deep ultraviolet laser wavelengths Sahoo NK, Thakur S, Senthilkumar M, Bhattacharyya D, Das NC
169 - 173	Excimer laser annealed poly-Si thin film transistor with self-aligned lightly doped drain structure Kim YH, Hwang CS, Song YH, Chung CH, Ko YW, Sohn CY, Kim BC, Lee JH
174 - 179	Recrystallization and grain growth of nanocomposite Ti-B-N coatings Mayrhofer PH, Willmann H, Mitterer C
180 - 183	Sol-gel broadband anti-reflective single-layer silica films with high laser damage threshold Yao X, Bing Z, Wen HF, Dong W, Yu HS
184 - 189	Lithographic patterning of benzoylacetone modified SnO2 and SnO2 : Sb thin films Kololuoma T, Karkkainen AHO, Tolonen A, Rantala JT
190 - 194	Infrared optical properties of Bi2Ti2O7 thin films by spectroscopic ellipsometry Hu ZG, Wang SW, Huang ZM, Wang GS, Zhang ZH, Lu W, Chu JH
195 - 197	Optimisation of growth temperature and post-growth annealing for GaInNAs/GaNAs/GaAs quantum-well structures emitting at 1.3 mu m Fedorenko Y, Jouhti T, Pavelescu EM, Karirinne S, Kontinnen J, Pessa M
198 - 207	Surface modification and characterization of photodefinable epoxy/copper systems Ge J, Turunen MPK, Kivilahti JK
208 - 216	AFM observation of silk fibroin on mica substrates: morphologies reflecting the secondary structures Yamada K, Tsuboi Y, Itaya A
217 - 222	The structure of multilayer films of DNA-aliphatic amine is preparation technique dependent Shabarchina LI, Montrel MM, Sukhorukov GB, Sukhorukov BI
223 - 239	Atomic force microscopy studies of lateral phase separation in mixed monolayers of dipalmitoylphosphatidylcholine and dilauroylphosphatidylcholine Sanchez J, Badia A
240 - 246	Studies on the formation of Langmuir monolayer and Langmuir-Blodgett films of octadecyl amine-bromocresol purple dye complex Choudhury S, Chitra R, Yakhmi JV
247 - 254	Photo- and electroluminescence properties of fluorene-based copolymers containing electron- or hole-transporting unit Sun QJ, Zhan XW, Yang CH, Liu YQ, Li YF, Zhu DB
255 - 260	Preparation and nitromethane sensing properties of chitosan thin films containing pyrene and beta-cyclodextrin units Wang H, Fang Y, Ding LP, Gao LN, Hu DD
261 - 267	Transmission electron microscope study of the topotactic reaction of (001), (011) and (111) Ag films and Te Safran G, Geszti O, Radnoczi G
268 - 277	Micro-Raman spectroscopy study of surface transformations induced by excimer laser irradiation of TiO2 Robert TD, Laude LD, Geskin VM, Lazzaroni R, Gouttebaron R
278 - 284	Effects of thermal treatment on the electrical and optical properties of silver-based indium tin oxide/metal/indium tin oxide structures Jung YS, Choi YW, Lee HC, Lee DW
285 - 292	Spontaneous ordering of composition pattern in an epitaxial monolayer by subsurfacial dislocation array Ni Y, He LH
293 - 293	Ultrathin Pd and Pt films on W(211) (vol 428, pg 47, 2003) Block J, Kolodziej JJ, Rowe JE, Madey TE, Schroder E
294 - 294	Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD (vol 430, pg 110, 2003) Bouree JE, Guillet J, Grattepain C, Chaumont J