Thin Solid Films

Thin Solid Films, Vol.442, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (43 articles)

1 - 10	Diamond-like amorphous carbon coatings for large areas of glass Veerasamy VS, Luten HA, Petrmichl RH, Thomsen SV
X - X	Selected papers from the 4th International Conference on Coatings on Glass (ICCG), Braunschweig, Germany, November 3-7, 2002 - Preface Klages CP
11 - 14	Equipment, materials and processes: a review of high rate sputtering technology for glass coating Nadel SJ, Greene P, Rietzel J, Strumpfel J
15 - 20	Meeting the demands of modern large area glass coating: latest developments of horizontal and vertical coaters and applications Geisler M, Braatz C, Bruch J, Kastner A, Kress M, Ruske M, Willms I, Zmelty A
21 - 26	Simulation of reactive sputtering kinetics in real in-line processing chambers Pflug A, Szyszka B, Niemann J
27 - 31	Magnetron plasma structure with strong magnetic field Shidoji E, Makabe T
32 - 35	Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering Miyagi T, Kamei M, Ogawa T, Mitsuhashi T, Yamazaki A, Sato T
36 - 39	Assessment of discharges for large area atmospheric pressure plasma-enhanced chemical vapor deposition (AP PE-CVD) Engemann J, Korzec D
40 - 43	Liquid film spray deposition of transparent conducting oxide coatings Puetz J, Gasparro G, Aegerter MA
44 - 47	High rate deposition of silicon nitride films by APCVD Otani T, Hirata M
48 - 52	A sol-gel approach to nanophasic copper oxide thin films Armelao L, Barreca D, Bertapelle M, Bottaro G, Sada C, Tondello E
53 - 59	Wet chemical deposition of transparent conducting coatings in glass tubes Puetz J, Chalvet FN, Aegerter MA
60 - 65	In-situ monitoring for CVD processes Hopfe V, Sheel DW, Spee CIMA, Tell R, Martin P, Beil A, Pemble M, Weiss R, Vogt U, Graehlert W
66 - 73	Plasma diagnostic of ion and plasma PVD processes Strauss GN, Pulker HK
74 - 79	An automated directional reflectance/transmittance analyser for coating analysis van Nijnatten PA
80 - 85	Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour Kluth O, Schope G, Hupkes J, Agashe C, Muller J, Rech B
86 - 92	Composite Ag/C : H films prepared by DC planar magnetron deposition Boldyryeva H, Hlidek P, Biederman H, Slavinska D, Choukourov A
93 - 97	Raman spectroscopy analysis of magnetron sputtered RuO2 thin films Meng LJ, Teixeira V, dos Santos MP
98 - 101	Preparation of sub-nanometer thickness-controlled tin dioxide films by pulsed atomic-layer CVD Takeuchi T, Shoji K, Tadano T, Doteshita I, Onodera S
XI - XI	Selected papers from the 4th International Conference on Coatings on Glass (ICCG), Braunschweig, Germany, November 3-7, 2002 - Preface Brauer G
102 - 106	New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering Assuncao V, Fortunato E, Marques A, Goncalves A, Ferreira I, Aguas H, Martins R
107 - 116	Coatings on plastics with the PICVD technology Kuhr M, Bauer S, Rothhaar U, Wolff D
117 - 120	Degradation of Ag and Ag-alloy mirrors sputtered on poly(ethylene terephthalate) substrates under visible light irradiation Fukuda S, Kawamoto S, Gotoh Y
121 - 126	Growth of ZnO : Ga thin films at room temperature on polymeric substrates: thickness dependence Fortunato E, Goncalves A, Assuncao V, Marques A, Aguas H, Pereira L, Ferreira I, Martins R
127 - 131	Surface modification of a new flexible substrate based on hydroxypropylcellulose for optoelectronic applications Fortunato E, Godinho MH, Santos H, Marques A, Assuncao V, Pereira L, Aguas H, Ferreira I, Martins R
132 - 139	OLED matrix displays: in-line process technology and fundamentals Dobbertin T, Becker E, Benstem I, Ginev G, Heithecker D, Johannes HH, Metzdorf D, Neuner H, Parashkov R, Kowalsky W
140 - 144	Effect of a zirconium oxide undercoat on microstructure and properties of tin-doped indium oxide films for organic light emitting devices Mitsui A, Masumo K
145 - 152	Spectrally selective reflecting thin-film filters for laser display technology Rickers C, Vergohl M
153 - 157	Low resistance AR stack including silver layer Ohsaki H, Tachibana Y
158 - 162	State-of-the-art mid-frequency sputtered ZnO films for thin film silicon solar cells and modules Muller J, Schope G, Kluth O, Rech B, Sittinger V, Szyszka B, Geyer R, Lechner P, Schade H, Ruske M, Dittmar G, Bochem HP
163 - 166	Silicon thin films deposited at very low substrate temperatures Ito M, Ro K, Yoneyama S, Ito Y, Uyama H, Mates T, Ledinsky M, Luterova K, Fojtik P, Stuchlikova H, Fejfar A, Kocka J
167 - 172	Optimization of the electrical properties of magnetron sputtered aluminum-doped zinc oxide films for opto-electronic applications Agashe C, Kluth O, Schope G, Siekmann H, Hupkes J, Rech B
173 - 178	Graded selective coatings based on chromium and titanium oxynitride Nunes C, Teixeira V, Prates ML, Barradas NP, Sequeira AD
179 - 183	Transparent and conductive ZnO : Al films deposited by large area reactive magnetron sputtering Szyszka B, Sittinger V, Jiang X, Hong RJ, Werner W, Pflug A, Ruske M, Lopp A
184 - 188	Sn- or Hf-doped InSbO4 films deposited by RF magnetron sputtering Song PK, Shimada Y, Shigeasto Y, Hattori T, Ishida M, Saegusa K
189 - 193	Optical multilayers for ultra-narrow bandpass filters fabricated by PICVD Bauer S, Klippe L, Rothhaar U, Kuhr A
194 - 200	Inorganic-organic hybrid materials for application in optical devices Houbertz R, Domann G, Cronauer C, Schmitt A, Martin H, Park JU, Frohlich L, Buestrich R, Popall M, Streppel U, Dannberg P, Wachter C, Brauer A
201 - 211	Electrochromic coatings and devices: survey of some recent advances Granqvist CG, Avendano E, Azens A
212 - 216	Optical properties of multilayers composed of silver and dielectric materials Tachibana Y, Kusunoki K, Watanabe T, Hashimoto K, Ohsaki H
217 - 221	Fabrication of multifunctional coating which combines low-e property and visible-light-responsive photocatalytic activity Okada M, Yamada Y, Jin P, Tazawa M, Yoshimura K
222 - 226	Antireflection treatment of low-emitting glazings for energy efficient windows with high visible transmittance Hammarberg E, Roos A
227 - 231	Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering Yamagishi M, Kuriki S, Song PK, Shigesato Y
XII - XII	Selected papers from the 4th International Conference on Coatings on Glass (ICCG), Braunschweig, Germany, November 3-7, 2002 - Preface Klages CP, Brauer G, Aegerter MA