Thin Solid Films

Thin Solid Films, Vol.475, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (70 articles)

1 - 5	Optical spectroscopy on processing plasmas: cathode magnetron sputtering and flowing post-discharges for elastomer activation and medical sterilization Ricard A
6 - 11	Spatially resolved optical emission studies of pulsed DC plasmas for TiN deposition by unbalanced magnetron sputtering Oh SG, Kim YM, Han JG
12 - 16	Characterization of hydrogen plasma with a fiber optics catalytic probe Cvelbar U, Mozetic M, Poberaj I, Babib D, Ricard A
17 - 23	Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system Kwon UH, Choi SH, Park YH, Lee WJ
24 - 31	Plasma molding over surface topography: measurement of energy and angular distributions of ions extracted through a large hole Kim CK, Shin CB
32 - 35	Characteristics of Ru etching using ICP and helicon O-2/Cl-2 plasmas Kim HW
36 - 40	Investigation of nanoprotrusion induced by isolated impact of Ar cluster ion beam on Si and GaAs crystal Park HS, Jung HJ, Jeong K, Choi WK
41 - 44	Fabrication of Si nano-pillar array through Ni nano-dot mask using inductively coupled plasma Kim MJ, Lee JS, Kim SK, Yeom GY, Yoo JB, Park CY
45 - 48	Self-organized lamellar structured tantalum-nitride by UHV unbalanced-magnetron sputtering Lee GR, Lee JJ, Shin CS, Petrov I, Greene JE
49 - 53	Formation of fullerene dimers in pair-ion plasma Oohara W, Iwata H, Date D, Hatakeyama R
54 - 57	Characteristics of RuO2-SnO2 nanocrystalline-embedded amorphous electrode for thin film microsupercapacitors Kim HK, Choi SH, Yoon YS, Chang SY, Ok YW, Seong TY
58 - 62	Electromigration resistance-related microstructural change with rapid thermal annealing of electroplated copper films Kwon D, Park H, Lee C
63 - 67	Reduction of TiO2 assisted by a microwave plasma at atmospheric pressure Huet S, Belmonte T, Thiebaut JM, Bockel S, Michel H
68 - 71	Micro-scale metallization on flexible polyimide substrate by Cu electroplating using SU-8 photoresist mask Cho SH, Kim SH, Lee NE, Kim HM, Nam YW
72 - 80	Numerical modeling of SF6 thermal plasma generated during the switching process Lee JC, Kim YJ
81 - 85	The effect of SiCl4 additive gas on the Cl-based Al plasma etch procedure Kim DW, Jung MY, Choi SS, Kim JW, Boo JH
86 - 90	Plasma etching of (Ba,Sr)TiO3 thin films using inductively coupled Cl-2/Ar and BCl3/Cl-2/Ar plasma Kim GH, Kim KT, Kim DP, Kim CI
91 - 96	Spatially resolved optical emission spectroscopy of pulse magnetron sputtering discharge Kim YM, Jung MJ, Oh SG, Han JG
97 - 101	Strain effect on dielectric property of SrTiO3 lattice: first-principles study Kim L, Kim J, Jung D, Lee J
XI - XI	Proceedings of the 4th Asian-European International Conference on Plasma Surface Engineering, Jeju City, Korea, September 28-October 3, 2003 - Preface Han JG
102 - 108	Stability analysis of reactive sputtering process with variable sticking coefficients Li C, Hsieh JH
109 - 112	Investigation of a-C : F films as hydrogenated diamond-like carbon and low-k materials Oh T, Choi CK, Lee KM
113 - 117	Optical emission studies of atomic and ionic species in the ionized sputter-deposition process of magnesium oxide thin films Matsuda Y, Koyama Y, Iwaya M, Shinohara M, Fujiyama H
118 - 123	Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results Goujon M, Belmonte T, Henrion G
124 - 127	Influence of electrode size on the generation of low-pressure coaxial ECR microplasmas Kumamoto M, Inoue H, Matsushita A, Fujiyama H
128 - 132	Oxidation of the hydrogen terminated silicon surfaces by oxygen plasma investigated by in-situ infrared spectroscopy Shinohara M, Katagiri T, Iwatsuji K, Matsuda Y, Fujiyama H, Kimura Y, Niwano M
133 - 138	Spectro-ellipsometric studies of Au/SiO2 nanocomposite films Cho S, Lim H, Lee KS, Lee TS, Cheong B, Kim WM, Lee S
139 - 143	Asymmetrical increase of memory window in MFIS devices after avalanche electron injection Lee KJ, Roh Y, Kim IS, Kim YT
144 - 149	Sputter deposition modeling of Ti thin film on a sharp tip Han HW, Lee NE
150 - 154	The effect of the CH4 plasma treatment on deposited SiOC(-H) films with low dielectric constant prepared by using TMS/O-2 PECVD Yang CS, Yu YH, Lee HJ, Lee KM, Choi CK
155 - 159	Influence of Ar ion-beam assistance and annealing temperatures on properties of TiO2 thin films deposited by reactive DC magnetron sputtering Kim SH, Hwangbo CK
160 - 165	Structural and electrical characteristics of RF magnetron sputtered ZnO films Kang DJ, Kim JS, Jeong SW, Roh Y, Jeong SH, Boo JH
166 - 170	Characterization of BLT thin films using MgO buffer layer for MRS-FET Kim KT, Lee JM, Song SH, Kim CI
171 - 177	Development of surface coating technology of TiO2 powder and improvement of photocatalytic activity by surface modification Kim TK, Lee MN, Lee SH, Park YC, Jung CK, Boo JH
178 - 182	Production and control of high-pressure surface-wave plasmas for water-repellant fluorocarbon film deposition Mezerette D, Kuroda M, Sugai H
183 - 188	Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics Heo CH, Lee SB, Boo JH
189 - 193	Nanofabrication of InGaAsP periodic 2D columns with square and hexagonal lattices by reactive ion etching Lee JM, Oh SH, Lee CW, Ko H, Park S, Kim KS, Park MH
194 - 197	Enhancement of Ru nucleation by pretreatments of the underlying TaSiN film surface in Ru MOCVD Lim J, Park H, Lee C
198 - 201	Growth of carbon nitride using microwave plasma CVD Sakamoto Y, Takaya M
202 - 207	Deposition of tantalum nitride thin films by DC magnetron sputtering Kim SK, Cha BC
208 - 218	Reactive magnetron sputtering of thin films: present status and trends Musil J, Baroch P, Vlcek J, Nam KH, Han JG
219 - 226	Influence of the bias voltage on the structure and the tribological performance of nanoscale multilayer C/Cr PVD coatings Kok YN, Hovsepian PE, Luo Q, Lewis DB, Wen JG, Petrov I
227 - 230	Stability improvement of organic light-emitting diode with aluminum cathode deposited by ion beam assisted deposition method Jeong SM, Koo WH, Choi SH, Jo SJ, Baik HK, Lee SJ, Song KM
231 - 234	Luminescence of Er-doped amorphous silicon quantum dots Park NM, Kim TY, Kim SH, Sung GY, Cho KS, Shin JH, Kim BH, Park SJ, Lee JK, Nastasi M
235 - 238	Preparation of Cr-Si multilayer structures for thin film heater applications Cho NI, Kim MC
239 - 242	Effect of substrate temperature on surface roughness and optical properties of Ta2O5 using ion-beam sputtering Yoon SG, Kim HK, Kim MJ, Lee HM, Yoon DH
243 - 245	Nano-oxide layer and magnetic properties in Mn-Ir-Pt-based spin valve multilayers Jeon DM, Lee JP, Lee DH, Yoon SY, Kim JH, Yoon DH, Suh SJ
246 - 250	Growth and magnetic properties of LPE-grown (EuTbBi)(3)(FeAlGa)(5)O-12 garnet films Kim GY, Yoon SG, Chung IS, Park SB, Suh SJ, Yoon DH
251 - 255	Characterization of nano-oxide layer in specular spin valve multilayer Lee DH, Yoon SY, Kim JH, Suh SJ
256 - 261	Enhancement of ZnO nucleation in ZnO epitaxy by atomic layer epitaxy Lim J, Shin K, Kim H, Lee C
262 - 266	Electrical and optical characteristics of ITO films by pulsed laser deposition using a 10 wt.% SnO2-doped In2O3 ceramic target Kim SH, Park NM, Kim TY, Sung GY
267 - 270	Growth of vertically aligned carbon nanotube emitters on patterned silicon trenches for field emission applications Huh Y, Lee JY, Lee CJ
271 - 274	PECVD SiO2 and SiON films dependant on the rf bias power for low-loss silica waveguide Kim YT, Kim DS, Yoon DH
275 - 278	Low temperature deposition of Al-doped zinc oxide films by ICP-assisted reactive DC magnetron sputtering Jung SJ, Han YH, Koo BM, Lee JJ, Joo JH
279 - 282	The study of doped DLC films by Ti ion implantation Cui L, Li GQ, Chen WW, Mu ZX, Zhang CW, Wang L
283 - 286	Structural and dielectric properties of artificial PbZrO3/PbTiO3 superlattices grown by pulsed laser deposition Choi T, Lee J
287 - 290	The effect of RF power on tribological properties of the diamond-like carbon films Choi WS, Heo J, Chung I, Hong B
291 - 297	Electrochemical behavior of diamond-like carbon films for biomedical applications Kim HG, Ahn SH, Kim JG, Park SJ, Lee KR
298 - 302	Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering Park YS, Myung HS, Han JG, Hong B
303 - 307	Structures and mechanical properties of diamond like carbon films prepared by closed-field unbalanced magnetron sputtering Myung HS, Park YS, Lee JW, Hong B, Han JG
308 - 312	Amorphous carbon and carbon nitride multilayered films prepared by shielded arc ion plating Lee KH, Ohta R, Sugimura H, Inoue Y, Takai O, Sugimura H
313 - 317	The etching properties of MgO thin films in Cl-2/Ar gas chemistry Gu SM, Kim DP, Kim KT, Kim CI
318 - 322	Fabrication of SiC micro-lens by plasma etching Lee HY, Kim DW, Sung YJ, Yeom GY
323 - 326	Deposition of TiN thin films using grid-assisting magnetron sputtering Jung MJ, Kim YM, Chung YM, Ahn SH, Kim JG, Han JG
327 - 331	Influence of xenon mole fraction on luminous efficiency of the plasma display panel Uhm HS, Choi EH
332 - 336	Formation of nano iridium oxide: material properties and neural cell culture Lee IS, Whang CN, Lee YH, Lee GH, Park BJ, Park JC, Seo WS, Cui FZ
337 - 341	Preparation of nitrogen-doped titanium oxide thin film using a PLD method as parameters of target material and nitrogen concentration ratio in nitrogen/oxygen gas mixture Suda Y, Kawasaki H, Ueda T, Ohshima T
342 - 347	Dopant activation after ion shower doping for the fabrication of low-temperature poly-Si TFTs Kim DM, Kim DS, Ro JS
348 - 353	Electrical properties of an epitaxial Si film prepared by RF magnetron plasma at low temperature Yuji T, Sung YM
354 - 358	Physical and electrical properties of ZrO2 and YSZ high-k gate dielectric thin films grown by RF magnetron sputtering Jeong SH, Bae IS, Shin YS, Lee SB, Kwak HT, Boo JH