3007 - 3010 |
Microstructure and thermoelectric properties of Sn-doped Bi2Te2.7Se0.3 thin films deposited by flash evaporation method Duan XK, Jiang YZ |
3011 - 3020 |
Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition Barve SA, Jagannath, Mithal N, Deo MN, Biswas A, Mishra R, Kishore R, Bhanage BM, Gantayet LM, Patil DS |
3021 - 3025 |
Copper doped nickel oxide transparent p-type conductive thin films deposited by pulsed plasma deposition Yang M, Shi Z, Feng JH, Pu HF, Li GF, Zhou J, Zhang Q |
3026 - 3028 |
Effects of annealing atmosphere on thermoelectric signals from ZnO films Zhou XF, Zhang H, Chen QM, Shang J, Zhang PX |
3029 - 3031 |
Effect of substrate conductivity on the thickness and composition of GaAlSb epitaxial layers grown by liquid phase epitaxy Beristain EM, Olvera-Hernandez J, Martinez-Juarez J, de Anda F, Compean-Jasso VH, Mishurnyi VA, Mendez-Garcia VH, Juarez-Diaz G |
3032 - 3036 |
Electrochromic properties of N-doped tungsten oxide thin films prepared by reactive DC-pulsed sputtering Sun XL, Liu ZM, Cao HT |
3037 - 3042 |
Influence of hydrogen-doped MgO thin films on the discharge characteristics in plasma display panels Lee GS, Lee JY, Cheon YB, Kim KB, Kim JJ, Sohn SH |
3043 - 3049 |
Synthesis of niobium oxide nanowires using an atmospheric pressure plasma jet Lin Y, Yang YJ, Hsu CC |
3050 - 3054 |
Fabrication and transfer of nanoporous alumina thin films for templating applications: Metal dots array deposition and porous ZnO film growth Liu HF, Lim ES, Tung PKH, Xiang N |
3055 - 3060 |
Spray pyrolysis deposition of indium sulphide thin films Otto K, Katerski A, Mere A, Volobujeva O, Krunks M |
3061 - 3067 |
Effect of composition on mechanical behaviour of diamond-like carbon coatings modified with titanium Caschera D, Federici F, Pandolfi L, Kaciulis S, Sebastiani M, Bemporad E, Padeletti G |
3068 - 3073 |
Growth, structure and properties of sputtered niobium oxide thin films Foroughi-Abari A, Cadien KC |
3074 - 3080 |
Chlorinated precursor study in low temperature chemical vapor deposition of 4H-SiC Leone S, Beyer FC, Pedersen H, Andersson S, Kordina O, Henry A, Janzen E |
3081 - 3085 |
Texture control of fluorine-doped tin oxide thin film Kim CY, Riu DH |
3086 - 3089 |
Investigation of electrochemical properties of RuO2 thin films modified by e-beam irradiation Kim KH, Kim GP, Song IK, Yang KH, Lee BC, Baeck SH |
3090 - 3094 |
Investigation of the properties of diamond-like carbon thin films deposited by single and dual-mode plasma enhanced chemical vapor deposition Hosseini SI, Shokri B, Firouzjah MA, Kooshki S, Sharifian M |
3095 - 3099 |
Deposition of zinc oxide thin films by an atmospheric pressure plasma jet Hsu YW, Li HC, Yang YJ, Hsu CC |
3100 - 3106 |
Effects of substrate roughness on infrared-emissivity characteristics of Au films deposited on Ni alloy Huang ZB, Zhou WC, Tang XF, Zhu DM, Luo F |
3107 - 3112 |
Single step deposition method for nearly stoichiometric CuInSe2 thin films Karthikeyan S, Hill AE, Pilkington RD, Cowpe JS, Hisek J, Bagnall DM |
3113 - 3118 |
Preparation of transparent conductive indium tin oxide thin films from nanocrystalline indium tin hydroxide by dip-coating method Korosi L, Papp S, Dekany I |
3119 - 3122 |
Interfacial electronic structures between fullerene and calcium for high performance n-type organic semiconducting devices Yi Y, Kang SJ |
3123 - 3127 |
Monolayer structures of alkyl aldehydes: Odd-membered homologues Phillips TK, Clarke SM, Bhinde T, Castro MA, Millan C, Medina-Carrasco S |
3128 - 3134 |
Effect of Cr interlayer on the adhesion and corrosion enhancement of nanocomposite TiN-based coatings deposited on stainless steel 410 Li D, Guruvenket S, Hassani S, Bousser E, Azzi M, Szpunar JA, Klemberg-Sapieha JE |
3135 - 3140 |
Formation and properties of surface-anchored amine-terminated poly(dimethylsiloxane) assemblies with tunable physico-chemical characteristics Zengin A, Caykara T |
3141 - 3145 |
Atomically resolved surface structures of vapor deposited amorphous silicon-carbon alloys: An atomic force microscopy and spectroscopic study Barletta E, Fazio E, Neri F, Wandelt K |
3146 - 3154 |
Atomic layer deposition on polymer based flexible packaging materials: Growth characteristics and diffusion barrier properties Kaariainen TO, Maydannik P, Cameron DC, Lahtinen K, Johansson P, Kuusipalo J |
3155 - 3161 |
Pd-modified TiO2 electrode for electrochemical oxidation of hydrazine, formaldehyde and glucose Yi QF, Niu FJ, Yu WQ |
3162 - 3168 |
Correlation between surface damage and micro-defects in Si covered with insulating layer by implantation of He and H ions Liu CL, Li MK, Wang Z, Gao YJ, Liao JQ, Zhang DC, Zhang XL, Shen YY |
3169 - 3172 |
Comparative study of Cu-Zr and Cu-Ru alloy films for barrier-free Cu metallization Wang Y, Cao F, Zhang ML, Liu YT |
3173 - 3176 |
Performance improvement of dye-sensitized solar cells by surface patterning of fluorine-doped tin oxide transparent electrodes Kong SM, Xiao Y, Kim KH, Lee WI, Chung CW |
3177 - 3184 |
Tensile strain and water vapor transport testing of flexible, conductive and transparent indium-zinc-oxide/silver/indium-zinc-oxide thin films Dameron AA, Miller DC, George N, To B, Ginley DS, Simpson L |
3185 - 3190 |
Structural and mechanical properties of multi-element (AlCrMoTaTiZr)N-x coatings by reactive magnetron sputtering Cheng KH, Lai CH, Lin SJ, Yeh JW |
3191 - 3195 |
Properties of nanocomposite film combining hard TiN matrix with embedded fullerene-like WS2 nanoclusters Polcar T, Mohan DB, Sandu CS, Radnoczi G, Cavaleiro A |
3196 - 3202 |
Influence of interfaces on impedance response and breakdown of oxide-metal multilayer structures Abazari M, Xue QZ, Chang CL, Ramanathan S |
3203 - 3212 |
Analysis of plastic deformation in diamond like carbon films-steel substrate system with tribological tests Zeng QF, Eryilmaz O, Erdemir A |
3213 - 3220 |
Transition from dislocation controlled plasticity to grain boundary mediated shear in nanolayered aluminum/palladium thin films Dayal P, Quadir MZ, Kong C, Savvides N, Hoffman M |
3221 - 3224 |
Extracting thin film hardness of extremely compliant films on stiff substrates Han SM, Guyer EP, Nix WD |
3225 - 3235 |
Thermoelastic solutions for anisotropic cracked thin films Chang RC |
3236 - 3241 |
Evaluation of rhenium carbide as a prospective material for hard coating Soto G, Tiznado H, Diaz JA, Samano EC, Reyes-Serrato A |
3242 - 3248 |
Experimental and modeling studies of particle removal in post silicon chemical mechanical planarization cleaning process Fernando WJN, Lok YH, Don MM, Madhaven V, Tay WS |
3249 - 3253 |
A modified layer-removal method for residual stress measurement in electrodeposited nickel films Jiang LM, Peng J, Liao YG, Zhou YC, Liang J, Hao HX, Lu C |
3254 - 3258 |
Annealing effects of In2O3 thin films on electrical properties and application in thin film transistors Yuan ZJ, Zhu XM, Wang XO, Cai XK, Zhang BP, Qiu DJ, Wu HZ |
3259 - 3263 |
Efficiency optimization of green phosphorescent organic light-emitting device Park JS, Jeon WS, Yu JH, Pode R, Kwon JH |
3264 - 3267 |
Design and fabrication of linear pixel arrays for organic photovoltaic modules to achieve scalable power output Liao KS, Dias S, Alley NJ, Yambem SD, Haldar A, Curran SA |
3268 - 3271 |
Dye-sensitized solar cells with TiO2 nanocrystalline films prepared by conventional and rapid thermal annealing processes Kao MC, Chen HZ, Young SL |
3272 - 3275 |
Color emission and dielectric properties of Eu-doped Gd2O3 gate oxide thin films Choi S, Park BY, Ahn T, Kim JY, Hong CS, Yi MH, Jung HK |
3276 - 3282 |
Transparent Ga and Zn co-doped In2O3 electrode prepared by co-sputtering of Ga:In2O3 and Zn:In2O3 targets at room temperature Jeong JA, Kim HK |
3283 - 3287 |
Optical properties of thermochromic VO2 thin films on stainless steel: Experimental and theoretical studies Lafort A, Kebaili H, Goumri-Said S, Deparis O, Cloots R, De Coninck J, Voue M, Mirabella F, Maseri F, Lucas S |
3288 - 3290 |
Epitaxially grown crystalline silicon thin-film solar cells reaching 16.5% efficiency with basic cell process Rosenits P, Kopp F, Reber S |
3291 - 3294 |
Reproducible resistance switching for BaTiO3 thin films fabricated by RF-magnetron sputtering Jung CH, Woo SI, Kim YS, No KS |
3295 - 3300 |
Si-based photonic quantum dots with the self-similar distributed Bragg reflectors Chen S, Cheng C, Qian B, Chen KJ, Zhang XG, Xu J, Ma ZY, Li W, Huang XF |
3301 - 3304 |
Domain wall generation and propagation in an amorphous ferromagnetic NiFeSiB film confirmed by the magneto-optical indicator film method Chun BS, Kim YK, Hwang JY, Rhee JR, Lee YM, Gornakov VS, Lee CG |
3305 - 3311 |
Order-disorder transformation in Fe-Pd alloy nanoparticles studied by in situ transmission electron microscopy Sato K, Kovacs A, Hirotsu Y |
3312 - 3317 |
Intrinsic room temperature ferromagnetism in Zn0.92Co0.08O thin films prepared by pulsed laser deposition Wang HB, He QO, Wang H, Wang XN, Zhang J, Jiang Y, Li QA |
3318 - 3324 |
Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films Pore V, Dimri M, Khanduri H, Stern R, Lu J, Hultman L, Kukli K, Ritala M, Leskela M |
3325 - 3333 |
Improvement of the durability of porous silicon through functionalisation for biomedical applications Han HM, Li HF, Xiao SJ |
3334 - 3339 |
Photocatalytic characteristics of TiO2 nanotubes with different microstructures prepared under different pulse anodizations Chang YJ, Lee JW, Chen HP, Liu LS, Weng GJ |
3340 - 3345 |
Design of ZnO nanostructured films: Characterization and ecotoxicological studies Brayner R, Sicard C, Ben Sassi H, Beji Z, Yepremian C, Coute A, Fievet F |
3346 - 3351 |
Reliable and low-voltage electrowetting on thin parylene films Dhindsa M, Kuiper S, Heikenfeld J |
3352 - 3357 |
Suppression of damage to organic light-emitting layers during deposition of Al-doped ZnO thin films by radio-frequency magnetron sputtering Yamada M, Matsumura M, Maeda Y |
3358 - 3362 |
Ni-Al-O diffusion barrier layer for high-kappa metal-oxide-semiconductor capacitor Wu DQ, Jia R, Yao JC, Zhao HS, Chang AM |
3363 - 3367 |
Improvement in light output intensity of InGaN/GaN multiple-quantum-well blue light-emitting diode by SiO2/Si3N4 distributed Bragg reflectors and silver back mirror Lei PH |
3368 - 3372 |
Fabrication of CdS/SnS heterostructured device using successive ionic layer adsorption and reaction deposited SnS Ghosh B, Chowdhury S, Banerjee P, Das S |
3373 - 3377 |
Determination of Li-ion diffusion coefficient in amorphous Zn and ZnO thin films prepared by radio frequency magnetron sputtering Xie J, Imanishi N, Hirano A, Takeda Y, Yamamoto O, Zhao XB, Cao GS |
3378 - 3382 |
Influence of deposition parameters and heat treatment on the NO2 sensing properties of nanostructured indium tin oxide thin film Vijayalakshmi K, Ravidhas C, Pillay VV, GopalaKrishna D |
3383 - 3387 |
Experimental investigation of dimension effect on electrical oscillation in planar device based on VO2 thin film Seo G, Kim BJ, Lee YW, Choi S, Shin JH, Kim HT |
3388 - 3392 |
Electrical, optical and surface properties of P2S5/(NH4)(2)S-x+Se-treated doped-channel field-effect transistors with double etch-stop layers Lin YS, Lin YT, Huang YW |
3393 - 3396 |
Formation of polycrystalline thin-film transistors with stacked poly-SiGe/poly-Si channel layer for low-voltage applications Juang MH, Chang CW, Peng YS, Hwang CC, Wang JL, Shye DC |
3397 - 3400 |
Electrical characteristics of a ZrO2/SiO2 modified tunnel barrier for low-temperature non-volatile memory You HW, Cho WJ |
3401 - 3406 |
Sputter deposited LiPON thin films from powder target as electrolyte for thin film battery applications Nimisha CS, Rao KY, Venkatesh G, Rao GM, Munichandraiah N |
3407 - 3410 |
Effects of thermal annealing on Zr-N doped magnetron sputtered copper Wang Y, Cao F, Zhang ML, Liu YT |
3411 - 3416 |
Study of YBaCo4O7 (+) (delta) thin films grown by sputtering technique on (1012)-oriented sapphire substrates Montoya JF, Izquierdo JL, Gomez A, Arnache O, Osorio J, Marin J, Paucar C, Moran O |
3417 - 3420 |
The thermal treatment effects of CrN buffer layer on crystal quality of Zn-polar ZnO films Park J, Minegishi T, Park SH, Hong SK, Chang JH, Yao T |
3421 - 3424 |
Hot-electron relaxation in ZnO films Yang MD, Wu SW, Tong SC, Shu GW, Liu YW, Shen JL, Lan SM, Wu CH, Huang YH, Yang TN |
3425 - 3429 |
Proteorhodopsin characterization based on metal-insulator-metal structure technique Melikyan H, Khishigbadrakh BE, Babajanyan A, Lee K, Choi AR, Lee JH, Jung KH, Friedman B |
3430 - 3436 |
The effect of the terminating bonds on the electronic properties of sputtered carbon nitride thin films Alibart F, Peponas S, Charvet S, Benlahsen M |
3437 - 3442 |
Investigation of interdiffusion in Sb/As2S3 nano-layered structures by high-resolution X-ray photoelectron spectroscopy Takats V, Miller AC, Jain H, Kovalskiy A, Kokenyesi S |