Thin Solid Films

Thin Solid Films, Vol.518, No.11 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (48 articles)

2925 - 2925	6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-6) April 15-17, 2009 Tokyo Fashion Town, Japan Preface Hosono H
2926 - 2929	A study of deposition of ITO films on organic layer using facing target sputtering in Ar and Kr gases Lei H, Ichikawa K, Hoshi Y, Wang MH, Uchida T, Sawada Y
2930 - 2933	Application of hydrogen-doped In2O3 transparent conductive oxide to thin-film microcrystalline Si solar cells Koida T, Sai H, Kondo M
2934 - 2936	Review of pulmonary toxicity of indium compounds to animals and humans Tanaka A, Hirata M, Kiyohara Y, Nakano M, Omae K, Shiratani M, Koga K
2937 - 2940	Comparative study of resistivity characteristics between transparent conducting AZO and GZO thin films for use at high temperatures Nomoto J, Konagai M, Okada K, Ito T, Miyata T, Minami T
2941 - 2944	The effect of annealing on Al-doped ZnO films deposited by RF magnetron sputtering method for transparent electrodes Cho HJ, Lee SU, Hong B, Shin YD, Ju JY, Kim HD, Park M, Choi WS
2945 - 2948	Effect of sublayer surface treatments on ZnO transparent conductive oxides using dc magnetron sputtering Imanishi Y, Taguchi M, Onisawa K
2949 - 2952	Characterization of Zn1-xMgxO transparent conducting thin films fabricated by multi-cathode RF-magnetron sputtering Maejima K, Shibata H, Tampo H, Matsubara K, Niki S
2953 - 2956	Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition Asahara H, Takamizu D, Inokuchi A, Hirayama M, Teramoto A, Saito S, Takahashi M, Ohmi T
2957 - 2960	Control of cathodic potential for deposition of ZnO by constant-current electrochemical method Nouzu N, Ashida A, Yoshimura T, Fujimura N
2961 - 2966	Polycrystalline ZnO: B grown by LPCVD as TCO for thin film silicon solar cells Fay S, Steinhauser J, Nicolay S, Ballif C
2967 - 2970	Microstructure of a-plane ZnO grown on LaAlO3 (001) Wang WL, Peng CY, Ho YT, Chang L
2971 - 2974	Growth process observation of homoepitaxial ZnO thin films using optical emission spectra during pulsed laser deposition Nakamura T, Masuko K, Ashida A, Yoshimura T, Fujimura N
2975 - 2979	Influence of VI/II ratios on the growth of ZnO thin films on sapphire substrates by low temperature MOCVD Kong BH, Kim DC, Mohanta SK, Cho HK
2980 - 2983	Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems Hirohata K, Nishi Y, Tsukamoto N, Oka N, Sato Y, Yamamoto I, Shigesato Y
2984 - 2987	Improvements of spatial resistivity distribution in transparent conducting Al-doped ZnO thin films deposited by DC magnetron sputtering Oda J, Nomoto J, Miyata T, Minami T
2988 - 2991	Substrate engineering of LaAlO3 for non-polar ZnO growth Ho YT, Wang WL, Peng CY, Chen WC, Liang MH, Tian JS, Chang L
2992 - 2995	Thermal crystallization kinetics and crystallite size distribution of amorphous ITO film deposited in the presence or absence of water vapor Wang MH, Sawada Y, Lei H, Seki Y, Hoshi Y, Uchida T, Konya T, Kishi A
2996 - 2999	Fabrication of GaN epitaxial thin film on InGaZnO4 single-crystalline buffer layer Shinozaki T, Nomura K, Katase T, Kamiya T, Hirano M, Hosono H
3000 - 3003	Steady-state photoconductivity of amorphous In-Ga-Zn-O Lee DH, Kawamura K, Nomura K, Yanagi H, Kamiya T, Hirano M, Hosono H
3004 - 3007	DC sputter deposition of amorphous indium-gallium-zinc-oxide (a-IGZO) films with H2O introduction Aoi T, Oka N, Sato Y, Hayashi R, Kumomi H, Shigesato Y
3008 - 3011	Electronic structural analysis of transparent In2O3-ZnO films by hard X-ray photoelectron spectroscopy Shibuya T, Yoshinaka M, Shimane Y, Utsuno F, Yano K, Inoue K, Ikenagab E, Kim JJ, Ueda S, Obata M, Kobayashi K
3012 - 3016	Comprehensive studies on the stabilities of a-In-Ga-Zn-O based thin film transistor by constant current stress Nomura K, Kamiya T, Kikuchi Y, Hirano M, Hosono H
3017 - 3021	Device characteristics improvement of a-In-Ga-Zn-O TFTs by low-temperature annealing Kikuchi Y, Nomura K, Yanagi H, Kamiya T, Hirano M, Hosono H
3022 - 3025	Characteristics of laser-annealed ZnO thin film transistors Kim JJ, Bak JY, Lee JH, Kim HS, Jang NW, Yun Y, Lee WJ
3026 - 3029	Analysis of carrier modulation in channel of ferroelectric-gate transistors having polar semiconductor Fukushima T, Yoshimura T, Masuko K, Maeda K, Ashida A, Fujimura N
3030 - 3032	Role of high-k gate insulators for oxide thin film transistors Lee SY, Chang S, Lee JS
3033 - 3036	Surface-oxidized tungsten for energy-storable dye-sensitized solar cells Saito Y, Uchida S, Kubo T, Segawa H
3037 - 3041	The effects of permittivity and thickness of dielectric layers on micro dielectric barrier discharges Shim SB, Cho SY, Lee DK, Song IC, Park CH, Lee HJ, Lee HJ
3042 - 3045	OLED manufacturing for large area lighting applications Eritt M, May C, Leo K, Toerker M, Radehaus C
3046 - 3053	Advances in chromogenic materials and devices Granqvist CG, Green S, Niklasson GA, Mlyuka NR, von Kraemer S, Georen P
3054 - 3058	Potential of thin-film silicon solar cells by using high haze TCO superstrates Krc J, Lipovsek B, Bokalic M, Campa A, Oyama T, Kambe M, Matsui T, Sai H, Kondo M, Topic M
3059 - 3062	Highly sensitive ultraviolet detector using a ZnO/Si layered SAW oscillator Wei CL, Chen YC, Cheng CC, Kao KS, Cheng DL, Cheng PS
3063 - 3066	Fabrication of Tb-Mg codoped CaSnO3 perovskite thin films and electroluminescence devices Ueda K, Shimizu Y
3067 - 3070	Blue PL and EL emissions from Bi-activated binary oxide thin-film phosphors Fukada H, Ueda K, Ishino J, Miyata T, Minami T
3071 - 3074	Highly flexible indium zinc oxide electrode grown on PET substrate by cost efficient roll-to-roll sputtering process Park YS, Kim HK, Jeong SW, Cho WJ
3075 - 3080	Investigation of brittle failure in transparent conductive oxide and permeation barrier oxide multilayers on flexible polymers Lee GH, Yun J, Lee S, Jeong Y, Jung JH, Cho SH
3081 - 3084	Properties of Ce-doped ITO films deposited on polymer substrate by DC magnetron sputtering Kang YM, Kwon SH, Choi JH, Cho YJ, Song PK
3085 - 3088	Enhanced characterization of ITO films deposited on PET by RF superimposed DC magnetron sputtering Kim SI, Jung TD, Song PK
3089 - 3092	Plastic substrate with gas barrier layer and transparent conductive oxide thin film for flexible displays Hanada T, Negishi T, Shiroishi I, Shiro T
3093 - 3096	Fabrication of highly conductive Ta-doped SnO2 polycrystalline films on glass using seed-layer technique by pulse laser deposition Nakao S, Yamada N, Hitosugi T, Hirose Y, Shimada T, Hasegawa T
3097 - 3100	Control of carrier concentration of p-type transparent conducting CuScO2(0001) epitaxial films Kakehi Y, Satoh K, Yoshimura T, Ashida A, Fujimura N
3101 - 3104	Transparent conducting Nb-doped anatase TiO2 (TNO) thin films sputtered from various oxide targets Yamada N, Hitosugi T, Kasai J, Hoang NLH, Nakao S, Hirose Y, Shimada T, Hasegawa T
3105 - 3108	Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings Frach P, Gloess D, Bartzsch H, Taeschner K, Liebig J, Schultheiss E
3109 - 3114	Development of new transparent conductors and device applications utilizing a multidisciplinary approach Szyszka B, Loebmann P, Georg A, May C, Elsaesser C
3115 - 3118	Optical on-line monitoring for the long-term stabilization of a reactive mid-frequency sputtering process of Al-doped zinc oxide films Sittinger V, Ruske F, Pflug A, Dewald W, Szyszka B, Dittmar G
3119 - 3121	Thermophysical properties of aluminum oxide and molybdenum layered films Oka N, Arisawa R, Miyamura A, Sato Y, Yagi T, Taketoshi N, Baba T, Shigesato Y
3122 - 3125	Discharge characteristics of a plasma display panel with hump-shape electrodes Song IC, Ok JW, Hwang SW, Lee HJ, Park CH, Lee DK, Lee HJ