Thin Solid Films

Thin Solid Films, Vol.519, No.14 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (53 articles)

4409 - 4411	Sixth international conference on hot-wire CVD (Cat-CVD) process Preface Bouree JE, Mahan AH
4412 - 4414	Initiated chemical vapor deposition of responsive polymeric surfaces Alf ME, Hatton TA, Gleason KK
4415 - 4417	Initiated chemical vapor deposition of poly(2-hydroxyethyl methacrylate) hydrogels Bose RK, Lau KKS
4418 - 4420	Synthesis of poly(meta-diethynyl benzene) with initiated chemical vapour deposition Bakker R, Weijers P, Spee DA, van Steenbergen MJ, van der Werf CHM, Rath JK, Schropp REI
4421 - 4425	Boron doping: B/H/C/O gas-phase chemistry; H atom density dependences on pressure and wire temperature; puzzles regarding the gas-surface mechanism Mankelevich YA, Ashfold MNR, Comerford DW, Ma J, Richley JC
4426 - 4428	Surface transformations of carbon (graphene, graphite, diamond, carbide), deposited on polycrystalline nickel by hot filaments chemical vapour deposition Rey S, Le Normand F
4429 - 4431	Catalytic decomposition of NH3 on heated Ru and W surfaces Umemoto H, Kashiwagi Y, Ohdaira K, Kobayashi H, Yasui K
4432 - 4436	Quantitative elucidation of the rapid growth and growth saturation of millimeter-scale vertically aligned carbon nanotubes by hot-filament chemical vapor deposition Hong NT, Kim SY, Koh KH, Lee S
4437 - 4441	Growth kinetics of nc-Si:H deposited at 200 degrees C by hot-wire chemical vapour deposition Oliphant CJ, Arendse CJ, Knoesen D, Muller TFG, Prins S, Malgas GF
4442 - 4446	Silicidation and carburization of the tungsten filament in HWCVD with silacyclobutane precursor gases Shi YJ, Tong L, Eustergerling BD, Li XM
4447 - 4450	Effect of filament temperature and deposition time on the formation of tungsten silicide with silane Sveen CE, Shi YJ
4451 - 4454	Structural changes in tungsten wire and their effect on the properties of hydrogenated nanocrystalline cubic silicon carbide thin films Tabata A, Naito A
4455 - 4458	An alternative method to determine the steady state nucleation rate in thermally annealed HWCVD a-Si:H films Mahan AH, Parilla PA, Moutinho H, To B, Dabney MS, Ginley DS
4459 - 4461	Flash-lamp-crystallized polycrystalline silicon films with high hydrogen concentration formed from Cat-CVD a-Si films Ohdaira K, Tomura N, Ishii S, Matsumura H
4462 - 4465	Thermal annealing of protocrystalline a-Si:H Muller TFG, Arendse CJ, Halindintwali S, Knoesen D, Schropp REI
4466 - 4468	Extremely low recombination velocity on crystalline silicon surfaces realized by low-temperature impurity doping in Cat-CVD technology Hayakawa T, Miyamoto M, Koyama K, Ohdaira K, Matsumura H
4469 - 4472	Ultralow surface recombination in p-Si passivated by catalytic-chemical vapor deposited alumina films Ogita YI, Tachihara M, Aizawa Y, Saito N
4473 - 4475	Excellent passivation effect of Cat-CVD SiNx/i-a-Si stack films on Si substrates Koyama K, Ohdaira K, Matsumura H
4476 - 4478	Comparison of surface passivation of crystalline silicon by a-Si:H with and without atomic hydrogen treatment using hot-wire chemical vapor deposition Schuttauf JWA, van der Werf CHM, van Sark WGJHM, Rath JK, Schropp REI
4479 - 4482	Polymer layers by initiated chemical vapor deposition for thin film gas barrier encapsulation Spee DA, Bakker R, van der Werf CHM, van Steenbergen MJ, Rath JK, Schropp REI
4483 - 4486	Super H2O-barrier film using Cat-CVD (HWCVD)-grown SiCN for film-based electronics Nakayama H, Ito M
4487 - 4490	Evaluation of corrosion resistance of SiCN-coated metals deposited on an NH3-radical-treated substrate Harada T, Nakanishi H, Ogata T, Kadotani Y, Izumi A
4491 - 4494	Electrically active, doped monocrystalline silicon nanoparticles produced by hot wire thermal catalytic pyrolysis Scriba MR, Britton DT, Harting M
4495 - 4497	HWCVD MoO3 nanoparticles and a-Si for next generation Li-ion anodes Dillon AC, Riley LA, Jung YS, Ban C, Molina D, Mahan AH, Cavanagh AS, George SM, Lee SH
4498 - 4501	Size modulation of nanocrystalline silicon embedded in amorphous silicon oxide by Cat-CVD Matsumoto Y, Godavarthi S, Ortega M, Sanchez V, Velumani S, Mallick PS
4502 - 4505	Structural properties of microcrystalline Si films prepared by hot-wire/catalytic chemical vapor deposition under conditions close to the transition from amorphous to microcrystalline growth Niikura C, Cabarrocas PRI, Bouree JE
4506 - 4510	Variation of microstructure and transport properties with filament temperature of HWCVD prepared silicon thin films Gogoi P, Jha HS, Agarwal P
4511 - 4515	Microstructure and electronic properties of microcrystalline silicon carbide thin films prepared by hot-wire CVD Chen T, Kohler F, Heidt A, Huang Y, Finger F, Carius R
4516 - 4518	Aluminum doped silicon carbide thin films prepared by hot-wire CVD: Influence of the substrate temperature on material properties Chen T, Yang DR, Carius R, Finger F
4519 - 4522	Aluminum doped silicon carbide thin films prepared by hot-wire CVD: Investigation of defects with electron spin resonance Xiao LH, Astakhov O, Chen T, Stutzmann M, Finger F
4523 - 4526	Development of microcrystalline silicon carbide window layers by hot-wire CVD and their applications in microcrystalline silicon thin film solar cells Chen T, Huang YL, Yang DR, Carius R, Finger F
4527 - 4530	Amorphous/crystalline silicon heterojunction solar cells with varying i-layer thickness Page MR, Iwaniczko E, Xu YQ, Roybal L, Hasoon F, Wang Q, Crandall RS
4531 - 4534	Hot wire configuration for depositing device grade nano-crystalline silicon at high deposition rate Nos O, Frigeri PA, Bertomeu J
4535 - 4537	N-2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature Omori Y, Tabata A, Kondo A
4538 - 4541	Preparation of SnO2 thin films at low temperatures with H-2 gas by the hot-wire CVD method Natsuhara H, Tatsuyama T, Ushiro M, Furuhashi M, Fujii T, Ohashi F, Yoshida N, Nonomura S
4542 - 4544	Activated gas jet deposition Rebrov AK, Maltsev RV, Safonov AI, Timoshenko NI
4545 - 4550	Hot-wire chemical vapor deposition of epitaxial film crystal silicon for photovoltaics Branz HM, Teplin CW, Romero MJ, Martin IT, Wang Q, Alberi K, Young DL, Stradins P
4551 - 4554	Integration of polymer electrolytes in dye sensitized solar cells by initiated chemical vapor deposition Nejati S, Lau KKS
4555 - 4560	Opportunities for new materials synthesis by hot wire chemical vapor process Dusane RO
4561 - 4564	Hot wire chemical vapour deposition (HWCVD) of boron carbide thin films from ortho-carborane for neutron detection application Chaudhari P, Meshram N, Singh A, Topkar A, Dusane R
4565 - 4567	Low resistivity metal lines formed by functional liquids and successive treatment of catalytically generated hydrogen atoms in the Cat-CVD system Nguyen TTK, Ohdaira K, Shimoda T, Matsumura H
4568 - 4570	Advantage of plasma-less deposition in Cat-CVD to the performance of electronic devices Matsumura H, Hasegawa T, Nishizaki S, Ohdaira K
4571 - 4573	Single-chamber filament-assisted chemical vapor deposition of polymer and organosilicate films for air gap interconnect formation Lee E, Faguet J, Brcka J, Akiyama O, Liu JJ, Toma D
4574 - 4577	Piezoresistive silicon thin film sensor array for biomedical applications Alpuim P, Correia V, Marins ES, Rocha JG, Trindade IG, Lanceros-Mendez S
4578 - 4581	Ion-implanted resist removal using atomic hydrogen Horibe H, Yamamoto M, Maruoka T, Goto Y, Kono A, Nishiyama I, Tagawa S
4582 - 4584	Hydrogen etching of Si3N4 layers with plasma assisted hot wire CVD Kniffler N, Pflueger A, Schulz T, Sommer S, Schroeder B
4585 - 4588	High rate hot-wire chemical vapor deposition of silicon thin films using a stable TaC covered graphite filament Martin IT, Teplin CW, Stradins P, Landry M, Shub M, Reedy RC, To B, Portugal JV, Mariner JT
4589 - 4593	Synthesis of carbon nanowalls by hot-wire chemical vapor deposition Itoh T
4594 - 4597	High-quality single-walled carbon nanotubes synthesis by hot filament CVD on Ru nanoparticle catalyst Bouanis FZ, Baraton L, Huc V, Pribat D, Cojocaru CS
4598 - 4602	Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition Kim KH, Lefeuvre E, Chatelet M, Pribat D, Cojocaru CS
4603 - 4608	Optimization of organized silicon nanowires growth inside porous anodic alumina template using hot wire chemical vapor deposition process Lefeuvre E, Kim KH, He ZB, Maurice JL, Chatelet M, Pribat D, Cojocaru CS
4609 - 4612	Silicon nanowire growth on glass substrates using hot wire chemical vapor deposition Meshram NP, Kumbhar A, Dusane RO
4613 - 4616	Vapor-solid-solid Si nano-whiskers growth using pure hydrogen as the source gas Nagayoshi H, Nordmark H, Nishimura S, Terashima K, Marioara CD, Walmsley JC, Holmestad R, Ulyashin A