화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.368, No.2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (34 articles)

V - V Proceedings from the 1st Asian Conference on Chemical Vapour Deposition, May 10-13 1999, Shanghai, China - Preface
Zhang DW, Wang JT, Liang JW
169 - 175 Resonance enhanced multiphoton ionization probing of H atoms and CH3 radicals in a hot filament chemical vapour deposition reactor
Smith JA, Cook MA, Langford SR, Redman SA, Ashfold MNR
176 - 180 Rates of reactions of H atoms with some CVD precursors
Arthur NL, Cooper IA, Czerwinski A, Miles LA
181 - 184 Deposition of a-SiC : H thin film from organosilicon material by remote plasma CVD method
Xu YY, Muramatsu T, Taniyama M, Aoki T, Hatanaka Y
185 - 192 Investigations of the gas phase mechanism of diamond deposition in combustion CVD
Kohse-Hoinghaus K, Lowe A, Atakan B
193 - 197 Chemical vapor deposition of novel carbon materials
Chow L, Zhou D, Hussain A, Kleckley S, Zollinger K, Schulte A, Wang H
198 - 202 Mechanical properties and corrosion studies of amorphous carbon on magnetic disks prepared by ECR plasma technique
Fung MK, Lai KH, Chan CY, Bello I, Lee CS, Lee ST, Mao DS, Wang X
203 - 207 Electrodeposition diamond-like carbon films from organic liquids
Cao CB, Zhu HS, Wang H
208 - 210 Effects of fluorine addition on driving force for CVD diamond growth
Liu ZJ, Ding SJ, Wang PF, Zhang DW, Zhang JY, Wang JT, Kohse-Hoinghaus K
211 - 215 Study of diamond film growth mechanism on porous silicon during hot-filament chemical vapor deposition
Liao Y, Ye F, Shao QY, Chang C, Wang GZ, Fang RC
216 - 221 Characterization of elastic properties of hard carbon and boron nitride films using the Brillouin light scattering technique
Wittkowski T, Wiehn V, Jorzick J, Jung K, Hillebrands B
222 - 226 Effects at reactive ion etching of CVD diamond
Bello I, Fung MK, Zhang WJ, Lai KK, Wang YM, Zhou ZF, Yu RKW, Lee CS, Lee ST
227 - 230 Preparation of SrRuO3 thin film by chemical reactive pulsed laser deposition
Fang XD, Tachiki M, Kobayashi T
231 - 236 Development of diamond synthesis techniques at low pressures
Matsumoto S
237 - 240 The content calculation of hexagonal phase inclusions in cubic GaN films on GaAs(001) substrates grown by metalorganic chemical vapor deposition
Sun XL, Wang YY, Yang H, Li JB, Zheng LX, Xu DP, Wang ZG
241 - 243 Structure characteristic of buried SiC layers
Yan H, Wang B, Song XM, Chen GH, Wong SP, Kwok RWM
244 - 248 ZnSe growth by radical assisted MOCVD using hollow cathode plasma
Aoki T, Ikeda T, Korzec D, Hatanaka Y
249 - 252 Epitaxial growth of GaNAs/GaAs heterostructure materials
Lin YW, Pan Z, Li LH, Zhou ZQ, Wang H, Zhang W
253 - 256 Projective phase diagrams for CVD diamond growth from C-H and C-H-O systems
Liu ZJ, Zhang DW, Wang PF, Ding SJ, Zhang JY, Wang JT, Kohse-Hoinghaus K
257 - 260 Reactive ion beam assisted deposition of a titanium dioxide film on a transparent polyester sheet
Ding XZ, Zhang FM, Wang HM, Chen LZ, Liu XH
261 - 265 Comparison of deposition behavior of Pb(Zr,Ti)O-3 films and its end-member-oxide films prepared by MOCVD
Funakubo H, Nagashima K, Shinozaki K, Mizutani N
266 - 268 Thermodynamics analyses of the effect of CH3 and C2H2 on morphology of CVD diamond films
Zhang JY, Wang PF, Ding SJ, Zhang DW, Wang JT, Liu ZJ
269 - 274 Enhanced diamond film growth by Xe-added microwave plasma CVD
Hosomi T, Maki T, Kobayashi T
275 - 278 Aerosol and plasma assisted chemical vapor deposition process for multicomponent oxide Lao(0.8)Sro(0.2)MnO(3) thin film
Wang HB, Meng GY, Peng DK
279 - 282 Influences of initial buffer layer deposition on electrical and optical properties in cubic GaN grown on GaAs(100) by metalorganic chemical vapor deposition
Xu DP, Yang H, Li JB, Li SF, Zhao DG, Wang YT, Sun XL, Wu RH
283 - 286 Microstructure and semiconducting properties of c-BN films using r.f. plasma CVD thermally assisted by a tungsten filament
Wang WL, Liao KJ, Wang SX, Sun YW
287 - 291 Experiments and analyses of SiC thin film deposition from organo-silicon by a remote plasma method
Hatanaka Y, Sano K, Aoki T, Wrobel AM
292 - 296 Formation of cubic boron nitride films on nickel substrates
Zhou ZF, Bello I, Kremnican V, Fung MK, Lai KH, Li KY, Lee CS, Lee ST
297 - 299 CVD diamond thin film for IR optics and X-ray optics
Ying XT, Xu XM
300 - 302 Photoconductive properties of ClAlPcCl and ClInPe composite thin film prepared by physical vapor deposition approach
Xu MS, Ji ZG, Xu QF, Yuan J, Que DL, Chen HZ, Wang M
303 - 306 Two-step growth of high quality diamond films
Liao Y, Chang C, Li CH, Ye ZY, Wang GZ, Fang RC
307 - 311 Raman study on residual strains in thin 3C-SiC epitaxial layers grown on Si(001)
Zhu JJ, Liu SY, Liang JW
312 - 314 The growth of cubic boron nitride films by RF reactive sputter
Deng JX, Wang B, Tan LW, Yan H, Chen GG
315 - 318 The preparation of nanosized silicon by laser-induced chemical vapour deposition
Zhang HY, Wei AX, Liu SH, Wang WX, Chen DH, Liang LH, Chen KX