Thin Solid Films

Thin Solid Films, Vol.446, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (22 articles)

161 - 166	Preparation and characterization of luminescent nanocomposite film containing polyoxometalate Ma HY, Peng J, Han ZG, Feng YH, Wang E
167 - 171	Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U, Ivanova T, Szekeres A, Gesheva K
172 - 177	Atomic layer deposition of thin films of ZnSe - structural and optical characterization Guziewicz E, Godlewski M, Kopalko K, Lusakowska E, Dynowska E, Guziewicz M, Godlewski MM, Phillips M
178 - 183	Deposition of particulate-free thin films by two synchronised laser sources: effects of ambient gas pressure and laser fluence Gyorgy E, Mihailescu IN, Kompitsas M, Giannoudakos A
184 - 193	Texture evolution of transition-metal nitride thin films by ion beam assisted deposition Ma CH, Huang JH, Chen HD
194 - 199	New electroplating method of nickel in emulsion of supercritical carbon dioxide and electroplating solution to enhance uniformity and hardness of plated film Yoshida H, Sone M, Wakabayashi H, Yan H, Abe K, Tao XT, Mizushima A, Ichihara S, Miyata S
200 - 204	Effect of the orientation on the ferroelectric-antiferroelectric behavior of sol-gel deposited (Pb,Nb)(Zr,Sn,Ti)O-3 thin films Zhai JW, Li X, Chen HD
205 - 217	Comparative study of chemically synthesized and plasma polymerized pyrrole and thiophene thin films Wang JG, Neoh KG, Kang ET
218 - 226	Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride Caussat B, Scheid E, de Mauduit B, Berjoan R
227 - 231	Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition Lee YJ, Kang SW
232 - 237	Capillary rise between two TiO2 thin-films: evaluating photo-activated wetting Kataoka S, Anderson MA
238 - 247	Surface phase transitions upon reduction of epitaxial WO3 (100) thin films Li M, Altman EI, Posadas A, Ahn CH
248 - 257	Nondestructive characterization of surface chemical wear films via X-rays Hershberger J, Ajayi OO, Fenske GR
258 - 263	Interband optical absorption in a small-radius quantized spherical film Haroutyunian VA
264 - 270	The influence of erbium doping of Al-N sputtered coatings on their optical properties Oliveira JC, Cavaleiro A, Vieira MT, Bigot L, Garapon C, Mugnier J, Jacquier B
271 - 276	Third-order nonlinear optical responses of nanoparticulate Co3O4 films Ando M, Kadono K, Kamada K, Ohta K
277 - 286	A chemical mechanical polishing model incorporating both the chemical and mechanical effects Qin K, Moudgil B, Park CW
287 - 295	Optimized infrared switching properties in thermochromic vanadium dioxide thin films: role of deposition process and microstructure Guinneton F, Sauques L, Valmalette JC, Cros F, Gavarri JR
296 - 300	Conductance switching and data-storage in oriented polymer-based devices: impedance characteristics Majumdar HS, Bolognesi A, Pal AJ
301 - 306	Langmuir-Blodgett films from polyaniline/ruthenium complexes as modified electrodes for detection of dopamine Ferreira M, Dinelli LR, Wohnrath K, Batista AA, Oliveira ON
307 - 312	Effects of oxygen pressure on the growth of pulsed laser deposited ZnO films on Si(001) Kim SS, Lee BT
313 - 317	Surface instability of an annular thin film Yang FQ