Thin Solid Films

Thin Solid Films, Vol.518, No.3 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (21 articles)

911 - 911	Proceedings of the 21st Symposium on Plasma Science for Materials Preface Watanabe T, Shirafuji T, Pu YK
912 - 917	Synthesis process of gold nanoparticles in solution plasma Saito N, Hieda J, Takai O
918 - 923	Needle electrode erosion in water plasma discharge Potocky S, Saito N, Takai O
924 - 928	Decomposition mechanism of organic compounds by DC water plasmas at atmospheric pressure Nishioka H, Saito H, Watanabe T
929 - 935	Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure Narengerile, Saito H, Watanabe T
936 - 942	Thermally and chemically non-equilibrium modelling of Ar-N-2-H-2 inductively coupled plasmas at reduced pressure Tanaka Y
943 - 951	Observation of non-chemical equilibrium effect on Ar-CO2-H-2 thermal plasma model by changing pressure Al-Mamun SA, Tanaka Y, Uesugi Y
952 - 956	Simulating effects of gas flow on arc plasma to anode heat transfer during incinerator ash treatment Shimizu T, Tashiro S, Tanaka M, Inaba T
957 - 961	Modeling for plasma-enhanced catalytic reduction of nitrogen oxides Tochikubo F
962 - 966	Characteristics of pulse-modulated radio-frequency atmospheric pressure glow discharge Shi JJ, Cai YQ, Zhang J, Yang Y
967 - 970	A cold plasma cross made of three bullet-like plasma plumes Lu XP, Xiong Q, Xiong ZL, Hu J, Zhou F, Gong WW, Xian YB, Zhou CL, Tang ZY, Jiang ZH, Pan Y
971 - 975	Investigation of surface treatment of conductive wire in cylindrical atmospheric pressure plasmas Ye R, Kagohashi T, Zheng W
976 - 980	Instantaneous cleaning of silicon substrates by mesoplasma for high-rate and low-temperature epitaxy Diaz JMA, Harima K, Kambara M, Yoshida T
981 - 986	Effect of gas composition on metal surface cleaning using atmospheric pressure microwave plasma Ono S, Teii S, Suzuki Y, Suganuma T
987 - 992	Diesel emission control system using combined process of nonthermal plasma and exhaust gas components' recirculation Yoshida K, Kuroki T, Okubo M
993 - 1000	Plasma-enhanced chemical vapor deposition of carbon films using dibromoadamantane Shirafuji T, Nishimura Y, Tachibana K, Ishii H
1001 - 1005	Electrochromic properties of InN:Sn films deposited by reactive evaporation Inoue Y, Takeuchi H, Ishikawa H, Takai O
1006 - 1011	Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units Setsuhara Y, Cho K, Takenaka K, Ebe A, Shiratani M, Sekine M, Hori M, Ikenaga E, Kondo H, Nakatsuka O, Zaima S
1012 - 1015	Spherical MgO microparticle deposition by RF impulse discharge with small coaxial electrodes Muraoka T, Kashimura T, Iizuka S
1016 - 1019	Growth of ZnO nanowires in hollow-type magnetron O-2/Ar RF plasma Ono H, Iizuka S
1020 - 1023	Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method Setsuhara Y, Nagao K, Shiratani M, Sekine M, Hori M