화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.518, No.8 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (73 articles)

1851 - 1878 The M(n+1)AX(n) phases: Materials science and thin-film processing
Eklund P, Beckers M, Jansson U, Hogberg H, Hultman L
1879 - 1882 Structural and magnetic properties of Co-Ga co-doped ZnO thin films fabricated by pulsed laser deposition
Zhu LP, Ye ZG, Wang XT, Ye ZZ, Zhao BH
1883 - 1891 Structural characterization of sputtered single-phase gamma''' iron nitride coatings
Jouanny I, Weisbecker P, Demange V, Grafoute M, Pena O, Bauer-Grosse E
1892 - 1896 Investigation on structural, electrical and optical properties of tungsten-doped tin oxide thin films
Huang YW, Li GF, Feng JH, Zhang Q
1897 - 1913 A combinatorial study on the influence of Cu addition, film thickness and heat treatment on phase composition, texture and mechanical properties of Ti-Ni shape memory alloy thin films
Borgia C, Olliges S, Dietiker M, Pigozzi G, Spolenak R
1914 - 1919 Ion assistance in epitaxial growth as a strategy to suppress twinning
Bleikamp S, Michely T
1920 - 1924 Size-controlled Ag nanoparticle modified WO3 composite films for adjustment of electrochromic properties
Pang YH, Chen Q, Shen XF, Tang LL, Qian H
1925 - 1928 Band alignment of Cd(1-x)ZnxS produced by spray pyrolysis method
Baykul MC, Orhan N
1929 - 1934 Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition
Kim SR, Choudhury MH, Kim WH, Kim GH
1935 - 1942 Heteroepitaxial growth of Fe2Al5 inhibition layer in hot-dip galvanizing of an interstitial-free steel
Wang KK, Chang LW, Gan D, Wang HP
1943 - 1946 Effect of the substrate temperature on zirconium oxynitride thin films deposited by water vapour-nitrogen radiofrequency magnetron sputtering
Signore MA, Rizzo A, Tapfer L, Piscopiello E, Capodieci L, Cappello A
1947 - 1952 Fe(CN)(6)(3-) incorporation on Poly(3,4-ethylenedioxythiophene) films: Preparation and X-ray Photoelectron Spectroscopy characterization of the modified electrodes
Melato AI, Abrantes LM, do Rego AMB
1953 - 1957 Relation between the plasma characteristics and physical properties of functional zinc oxide thin film prepared by radio frequency magnetron sputtering process
Hsu CW, Cheng TC, Huang WH, Wu JS, Cheng CC, Cheng KW, Huang SC
1958 - 1961 Preparation of monoclinic BiVO4 thin film by citrate route for photocatalytic application under visible light
Xie BP, He C, Cai PX, Xiong Y
1962 - 1965 Hysteresis behaviour of reactive high power impulse magnetron sputtering
Audronis M, Bellido-Gonzalez V
1966 - 1972 Phosphonate-anchored thin films on titanium and niobium oxide surfaces: Fabrication and characterization
Adadi R, Zorn G, Brener R, Gotman I, Gutmanas EY, Sukenik CN
1973 - 1979 The driving force for homeotropic alignment of a triphenylene derivative in a hexagonal columnar mesophase on single substrates
Wang JJ, He ZQ, Zhang YN, Zhao H, Zhang CX, Kong XF, Mu LP, Liang CJ
1980 - 1984 Photoemission studies of the initial interface formation of ultrathin MgO dielectric layers on the Si(111) surface
Brennan B, McDonnell S, Hughes G
1985 - 1989 Effect of bias in patterning diamond by a dual electron cyclotron resonance-radio-frequency oxygen plasma
Wang L, Zhu XD, Ke B, Ni TL, Ding F, Chen MD, Wen XH, Zhou HY
1990 - 1993 Morphology of strained and relaxed SiGe layers grown on high-index Si substrates
Ware ME, Nemanich RJ
1994 - 2000 Pad flattening ratio, coefficient of friction and removal rate analysis during silicon dioxide chemical mechanical planarization
Lee H, Zhuang Y, Sugiyama M, Seike Y, Takaoka M, Miyachi K, Nishiguchi T, Kojima H, Philipossian A
2001 - 2005 Light scattering losses of high reflection dielectric multilayer optical devices
Pan YQ, Wu ZS, Hang LX, Yin YB
2006 - 2009 Native oxide consumption during the atomic layer deposition of TiO2 films on GaAs (100) surfaces
Gougousi T, Lacis JW
2010 - 2020 Mechanisms of interdiffusion in Pd-Cu thin film diffusion couples
Chakraborty J, Welzel U, Mittemeijer EJ
2021 - 2028 Effect of coating thickness on the deformation behaviour of diamond-like carbon-silicon system
Haq AJ, Munroe PR, Hoffman M, Martin PJ, Bendavid A
2029 - 2036 Real contact temperatures as the criteria for the reactivity of diamond-like-carbon coatings with oil additives
Kalin M, Vizintin J
2037 - 2044 In-situ observations of stress-induced thin film failures
Zhao ZB, Hershberger J, Bilello JC
2045 - 2049 Temperature effects on the chemical composition of nickel-phosphorus alloy thin films
Oguocha INA, Taheri R, Yannacopoulos S, Uju WA, Sammynaiken R, Wettig S, Hu YF
2050 - 2055 Deposition and characterisation of MoSi2 films
Rau JV, Teghil R, Ferro D, Generosi A, Albertini VR, Spoliti M, Barinov SM
2056 - 2064 A non-contact, thermally-driven buckling delamination test to measure interfacial fracture toughness of thin film systems
Goyal S, Srinivasan K, Subbarayan G, Siegmund T
2065 - 2069 Behavior of strain at a thin Ge pile-up layer formed by dry oxidation of a Si0.7Ge0.3 film
Min BG, Yoo JH, Sohn HC, Ko DH, Cho MH, Chung KB, Lee TW
2070 - 2076 Metal induced amino acid adsorption on nanotubes
Chang CM, Jalbout AF
2077 - 2081 Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
Ding WY, Xu J, Lu WQ, Deng XL, Dong C
2082 - 2089 An experimental methodology for characterizing fracture of hard thin films under cyclic contact loading
Yonezu A, Xu BX, Chen X
2090 - 2096 Residual stresses and thermal fatigue in CrN hard coatings characterized by high-temperature synchrotron X-ray diffraction
Kirchlechner C, Martinschitz KJ, Daniel R, Klaus M, Genzel C, Mitterer C, Keckes J
2097 - 2101 Comments on the paper "Modification of composite hardness models to incorporate indentation size effects in thin films", D. Beegan, S. Chowdhury and MT Laugier, Thin Solid Films 516 (2008), 3813-3817
Guillemot G, Iost A, Chicot D
2102 - 2104 Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
Aoki H, Masuzumi T, Hara M, Watanabe D, Kimura C, Sugino T
2105 - 2114 Modeling of In segregation, stress and strain in InGaAs/GaAs(100) quantum well heterostructures
Akchurin RK, Berliner LB, Marmalyuk AA
2115 - 2118 Composition depth profile analysis of bulk heterojunction layer by time-of-flight secondary ion mass spectrometry with gradient shaving preparation
Yamamoto S, Kitazawa D, Tsukamoto J, Shibamori T, Seki H, Nakagawa Y
2119 - 2123 Photovoltaic properties of low-band-gap fluorene-based donor-acceptor copolymers
Lee WY, Cheng KF, Wang TF, Chen WC, Tsai FY
2124 - 2127 Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition
Hwang DS, Lee SY, Lee HM, Kim SJ, Kim GJ
2128 - 2133 Localized surface plasmon resonance effect on photo-induced alignment of films composed of silver nanoparticles and azopolymers with cyano or methyl substitutes on azobenzene moieties
Shen J, Wu S, Huang JT, Zhang QJ, Wang KY
2134 - 2140 Reflectance of surfactant-templated mesoporous silica thin films: Simulations versus experiments
Hutchinson NJ, Coquil T, Richman EK, Tolbert SH, Pilon L
2141 - 2146 Effective optical properties of highly ordered mesoporous thin films
Hutchinson NJ, Coquil T, Navid A, Pilon L
2147 - 2151 Photosensitive terpolymer for all-wet-etching process: Material characterization and device fabrication
Moujoud A, Kang S, Kim HJ, Andrews M
2152 - 2156 Structural and magnetic properties of transition metal doped ZnO films
Jin CG, Gao Y, Wu XM, Cui ML, Zhuge LJ, Chen ZC, Hong B
2157 - 2162 The effect of annealing on single-layer CoCrPtNb thin films
Kashi MA, Marashi SPH, Pouladi R, Grundy PJ
2163 - 2166 SiO2 layer thickness effects on the (001) texture of FePtCu:SiO2 nanocomposite films
Ma B, Zha CL, Zhang ZZ, Jin QY
2167 - 2170 Self-assembled nano-size FePt islands for ultra-high density magnetic recording media
Lin GP, Kuo PC, Huang KT, Shen CL, Tsai TL, Lin YH, Wu MS
2171 - 2174 Low temperature ordering of FePt films by in-situ heating deposition plus post deposition annealing
Yu YS, Li HB, Li WL, Liu M, Zhang YM, Fei WD, Sellmyer DJ
2175 - 2178 Correlation between isotropic ferromagnetic resonance field shift and rotatable anisotropy in polycrystalline NiFe/FeMn bilayers
Fan WJ, Qiu XP, Shi Z, Zhou SM, Cheng ZH
2179 - 2185 Deposition pressure and rate effects on the microstructure and magnetic properties of sputtered tape media
Han JX, Hintz M, Sexton J, Skorjanec J, Lundstrom G
2186 - 2193 In-situ protein adsorption study on biofunctionalized surfaces using spectroscopic ellipsometry
Goyal DK, Subramanian A
2194 - 2199 Aerosol deposition of silicon-substituted hydroxyapatite coatings for biomedical applications
Hahn BD, Lee JM, Park DS, Choi JJ, Ryu J, Yoon WH, Lee BK, Shin DS, Kim HE
2200 - 2205 Nanostructured carbon nanotubes/copper phthalocyanine hybrid multilayers prepared using layer-by-layer self-assembly approach
Baba A, Kanetsuna Y, Sriwichai S, Ohdaira Y, Shinbo K, Kato K, Phanichphant S, Kaneko F
2206 - 2209 Photoemission study of the tin doped cerium oxide thin films prepared by RF magnetron sputtering
Tsud N, Skala T, Masek K, Hanys P, Takahashi M, Suga H, Mori T, Yoshikawa H, Yoshitake M, Kobayashi K, Matolin V
2210 - 2215 Comparative study of the structural, optical and photocatalytic properties of semiconductor metal oxides toward degradation of methylene blue
Talebian N, Nilforoushan MR
2216 - 2221 Electrical characterization of the polyaniline/p-silicon and polyaniline titanium dioxide tetradecyltrimethylammonium bromide/p-silicon heterojunctions
Boyarbay B, Cetin H, Uygun A, Ayyildiz E
2222 - 2227 Flexible copper-7,7,8,8 tetracyanochinodimethane memory devices -Operation, cross talk and bending
Novak M, Burkhardt M, Jedaa A, Halik M
2228 - 2233 Fourier transform infrared studies of the aluminum chemical vapor deposition using aluminum boro-hydride trimethylamine
Kang SW, Park YJ, Yang JY, Shin YH, Yun JY
2234 - 2240 Organically modified silicate thin films doped with colourimetric pH indicators methyl red and bromocresol green as pH responsive sol-gel hybrid materials
Jurmanovic S, Kordic S, Steinberg MD, Steinberg IM
2241 - 2246 Effect of stabilizing binder and dispersion media on spin-on zeolite thin films
Lakiss L, Yordanov I, Majano G, Metzger T, Mintova S
2247 - 2249 Optical properties and aging of gasochromic WO3
Ghosh R, Baker MB, Lopez R
2250 - 2257 Improved electrochromical properties of sol-gel WO3 thin films by doping gold nanocrystals
Naseri N, Azimirad R, Akhavan O, Moshfegh AZ
2258 - 2260 Study on the dynamic resistance switching properties of NiO thin films
Kugeler C, Weng R, Schroeder H, Symanczyk R, Majewski P, Ufert KD, Waser R, Kund M
2261 - 2265 Dielectric permittivity and conductivity spectra of La0.5Ca0.5MnO3 thin films presenting electric held induced metal-insulator transition
Villafuerte M, Bridoux G, Heluani SP, Tirado M, Grosse C
2266 - 2270 Self-assembly of perylenediimide based semiconductor on polymer substrate
Wiatrowski M, Dobruchowska E, Maniukiewicz W, Pietsch U, Kowalski J, Szamel Z, Ulanski J
2271 - 2274 Effect of annealing on the electrical, optical and structural properties of cadmium stannate thin films prepared by spray pyrolysis technique
Kumaravel R, Krishnakumar V, Gokulakrishnan V, Ramamurthi K, Jeganathan K
2275 - 2279 Anisotropic electronic structure in single crystalline orthorhombic TbMnO3 thin films
Wu KH, Gou IC, Luo CW, Uen TM, Lin JY, Juang JY, Chen CK, Lee JM, Chen JM
2280 - 2284 Transmission electron microscopy study of the initial growth stage of GaSb grown on Si (001) substrate by molecular beam epitaxy method
Kim YH, Noh YK, Kim MD, Oh JE, Chung KS
2285 - 2289 Improvement of the properties and electrical performance on TiCl4-based TiN film using sequential flow chemical vapor deposition process
Cheng MD, Luoh T, Su CT, Yang TH, Chen KC, Lu CY
2290 - 2294 On the structure and surface chemical composition of indium-tin oxide films prepared by long-throw magnetron sputtering
Chuang MJ, Huang HF, Wen CH, Chu AK
2295 - 2298 TEM study of RTD structure fabricated with epi-Si/gamma-Al2O3 heterostructure
Shahjahan M, Khatun MH, Sawada K, Ishida M