1 - 7 |
First-principle calculations for mechanisms of semiconductor epitaxial growth Oshiyama A |
8 - 13 |
Applications of morphological stability theory Coriell SR, McFadden GB |
14 - 20 |
Statistical mechanics of vicinal surface with adsorption Akutsu N, Akutsu Y, Yamamoto T |
21 - 27 |
Metal adsorption induced faceting on a Si(h h m) surface where m/h=1.4-1.5 Minoda H |
28 - 34 |
Step dynamics on growing silicon surfaces observed by ultrahigh vacuum scanning electron microscopy Homma Y, Finnie P |
35 - 38 |
In situ observation of initial homoepitaxial growth on the Si(111) 7 x 7 surface using scanning tunnelling microscopy Shimada W, Tochihara H |
39 - 42 |
Non-equilibrium shape of two-dimensional islands: kinetic modeling of morphological changes Balykov LN, Kitamura M, Maksimov IL |
43 - 46 |
Step bunching induced by drift of adatoms with anisotropic surface diffusion Sato M, Uwaha M, Saito Y |
47 - 50 |
Sound-induced melting of solid He-4 in a superfluid Okumura Y, Maekawa M, Suzuki Y, Nomura R, Okuda Y |
51 - 54 |
Effective distribution coefficients and growth rates of a binary dilute solid solution controlled by kink kinetics and volume diffusion Matsumoto N, Kitamura M |
55 - 59 |
Rapid formation of nanocrystalline apatite Sarig S, Kahana F |
60 - 64 |
Crystal growth kinetics of pentacadmium dihydrogen tetrakis(phosphate) tetrahydrate in solution at 37 degrees C Madsen HEL, Christensen BT |
65 - 69 |
Transport-kinetical phenomena in nanotube growth Louchev OA |
70 - 75 |
The study of impurities effect on the growth and nucleation kinetics of potassium dihydrogen phosphate Podder J |
76 - 80 |
Meta-stable condensation induced by collisions with rare-gas atoms at a substrate surface from a plasma Imamura N, Sakaguchi J, Asatani S, Hashiguchi S, Obara K |
81 - 85 |
Effects of gravity on pattern formation in directional growth of ice crystals Nagashima K, Furukawa Y |
86 - 89 |
Habit changes of NaBrO3 crystals grown from aqueous solution doped with sodium acetate Sone M, Inoue T, Yanagiya S, Mori A |
90 - 94 |
Influence of the growth rate on the microstructure of a Nb-Al-Ni ternary eutectic Rios CT, Milenkovic S, Gama S, Caram R |
95 - 100 |
Effect of the growth parameters on the Ni-Ni3Si eutectic microstructure Milenkovic S, Caram R |
101 - 105 |
Heterogeneous 2D nucleation-induced surface instability Liu XY |
106 - 110 |
Pattern formation and transformation by self-epitaxial nucleation and growth Liu XY |
111 - 115 |
Striped phases in thin layers: simulation and observation van der Eerden JPJM, Snel MME, Makkinje J, van Dijk ADJ, Rinia HA |
116 - 120 |
Theoretical investigations of thermodynamic stability for Si1-x-yGexCy Ito T, Kangawa Y |
121 - 124 |
Theoretical investigation of migration of group V adatoms on GaAs(001) surface Seino K, Ishii A, Aisaka T |
125 - 131 |
Phase-field model of dendritic growth Suzuki T, Ode M, Kim SG, Kim WT |
132 - 137 |
Pattern formation in the crystallization of ascorbic acid Uesaka H, Kobayashi R |
138 - 143 |
Phase field modeling of shallow cells during directional solidification of a binary alloy Bi ZQ, Sekerka RF |
144 - 148 |
Phase field model for phase transformations of multi-phase and multi-component alloys Sakai K |
149 - 153 |
History effects during the selection of primary dendrite spacing. Comparison of phase-field simulations with experimental observations Diepers HJ, Ma D, Steinbach I |
154 - 158 |
2D and 3D phase-field simulations of lamella and fibrous eutectic growth Apel M, Boettger B, Diepers HJ, Steinbach I |
159 - 163 |
A coupled map lattice model for dendrite in diffusion field Ohtaki M, Honjo H, Sakaguchi H |
164 - 168 |
Curvature evolution of interface in two-dimensional ice crystals Maruyama M, Kawabata K |
169 - 173 |
Tip-sticking probability and the branching distribution of a fractal pattern in a diffusion field Sakamoto A, Ohta S |
174 - 177 |
Simulation on the instability of a solid-liquid interface from a molar flux with a diffuse interface layer Kotake S |
178 - 180 |
Feedback control of morphological instability Savina TV, Nepomnyashchy AA, Brandon S, Golovin AA, Lewin DR |
181 - 187 |
The stability of triangular'droplet' phases on Si(111) Hannon JB, Tersoff J, Tromp RM |
188 - 191 |
Cross-sectional HRTEM study of Si(5512) reconstructed surface Liu JL, Takeguchi M, Yasuda H, Furuya K |
192 - 195 |
Surface structure changes associated with Ga diffusion on Si(111)7 x 7 surface Onodera T, Ichikawa T, Mizoguchi A |
196 - 200 |
Extreme band bending at MBE-grown InAs(001) surfaces induced by in situ sulphur passivation Lowe MJ, Veal TD, McConville CF, Bell GR, Tsukamoto S, Koguchi N |
201 - 205 |
Nanoscale faceting of a NaCl(110) homoepitaxial layer Sugawara A, Mae K |
206 - 211 |
First principles and macroscopic theories of semiconductor epitaxial growth Shiraishi K, Oyama N, Okajima K, Miyagishima N, Takeda K, Yamaguchi H, Ito T, Ohno T |
212 - 216 |
Adsorption, diffusion and desorption of Cl atoms on Si(111) surfaces Sakurai S, Nakayama T |
217 - 222 |
Plasma sputtering of silicon dioxide substrate by low energy Ar ion bombardment: molecular dynamics simulation Kim DH, Lee SY, Kim DH |
223 - 226 |
Empirical interatomic potential calculations for relative stability of Ga adatom on GaAs(100) and (n11)A surfaces Kangawa Y, Ito T, Taguchi A, Shiraishi K, Ohachi T |
227 - 233 |
Nanostructures formation and optical properties of II-VI semiconductor compounds Mariette H, Marsal L, Besombes L, Tinjod F, Gilles B, Kheng K, Rouviere JL |
234 - 238 |
Phase diagrams in nanometer-sized alloy systems Yasuda H, Mori H |
239 - 243 |
Improved size control of InP nanopyramids by selective-area flow rate modulation epitaxy Oga R, Yamamoto S, Ohzawa I, Fujiwara Y, Takeda Y |
244 - 248 |
Heteroepitaxial growth of alkali halide solid solution on GaAs(100) Kiguchi M, Saiki K, Koma A |
249 - 253 |
TEM observation of beta-FeSi2(110),(101)/Si(111) layers grown by reactive deposition epitaxy in the presence of an Sb flux Arakawa T, Shao G, Makiuchi S, Ono T, Tatsuoka H, Kuwabara H |
254 - 258 |
In-situ observation of Pd2Si islands on Si by UHV-TEM/STM Tanaka M, Takeguchi M, Furuya K |
259 - 263 |
Defect density in non-selective and selective Si/SiGe structures Menon C, Bentzen A, Landgren G, Radamson HH |
264 - 268 |
Investigation of indium segregation in InGaAs/(Al)GaAs quantum wells grown by MOCVD Marmalyuk AA, Govorkov OI, Petrovsky AV, Nikitin DB, Padalitsa AA, Bulaev PV, Budkin IV, Zalevsky ID |
269 - 273 |
Atomic and electronic structure of the LiF/LiBr(001) interface Katayama M, Kiguchi M, Saiki K, Koma A |
274 - 277 |
Characterization of MBE grown GaAs/AlGaAs heterointerfaces with photoluminescence from quantum wells Harima N, Nelson JT, Ohachi T |
278 - 282 |
The surface and domain structure of NbTe2 Cukjati D, Prodan A, Jug N, van Midden HJP, Starowicz P, Karic E, Hla SW, Bohm H, Boswell FW, Bennett JC |
283 - 288 |
Polyhedral (in-)stability of protein crystals Nanev CN, Penkova AN |
289 - 294 |
pH-dependent oligomerization of BPTI in undersaturated and supersaturated solutions studied by dynamic light scattering Tanaka S, Ataka M, Onuma K, Astier JP, Veesler S |
295 - 299 |
Systematic analysis of the effect of supersaturation on protein crystal quality Yoshizaki I, Nakamura H, Sato T, Igarashi N, Komatsu H, Yoda S |
300 - 305 |
Morphological evaluation of the gamma-polymorph of indomethacin Slavin PA, Sheen DB, Shepherd EEA, Sherwood JN, Feeder N, Docherty R, Milojevic S |
306 - 311 |
Crystal growth of macromolecular crystals: correlation between crystal symmetry and growth mechanisms Plomp M, McPherson A, Malkin AJ |
312 - 316 |
Damping of natural convection in the aqueous protein solutions by the application of high magnetic fields Wang LB, Zhong CW, Wakayama NI |
317 - 323 |
Microscopic strain analysis of semiconductor crystals using a synchrotron X-ray microbeam Matsui J, Tsusaka Y, Yokoyama K, Takeda S, Urakawa M, Kagoshima Y, Kimura S |
324 - 329 |
Characterization of silicon-on-insulator wafers by photoluminescence under UV light excitation Tajima M |
330 - 337 |
X-ray CTR scattering and interference for atomic-scale characterization of semiconductor heterostructures Takeda Y, Tabuchi M |
338 - 344 |
The morphology of grown-in defects in nitrogen-doped silicon crystals Fujimori H, Fujisawa H, Hirano Y, Okabe T |
345 - 349 |
Analysis of silicon incorporation into VGF-grown GaAs Birkmann B, Weingartner R, Wellmann P, Wiedemann B, Muller G |
350 - 355 |
Synchrotron X-ray topography of undoped VCz GaAs crystals Tuomi T, Knuuttila L, Riikonen J, McNally PJ, Chen WM, Kanatharana J, Neubert M, Rudolph P |
356 - 360 |
Lateral photovoltage scanning (LPS) method for the visualization of the solid-liquid interface of Si1-xGex single crystals Abrosimov NV, Ludge A, Riemann H, Schroder W |
361 - 366 |
Characterization of trap levels in long-duration phosphor crystals Katsumata T, Toyomane S, Tonegawa A, Kanai Y, Kaneyama U, Shakuno K, Sakai R, Komuro S, Morikawa T |
367 - 372 |
Ultrahigh-purity aluminum single crystals with a low dislocation density grown by strain-annealing method Mizuno K, Yamamoto S, Okamoto H, Kuga M, Hashimoto E |
373 - 378 |
Polytypic transformation during crystal growth monitored by newly developed micro-FTIR system for three-dimensional structural studies Kubota H, Kaneko F, Kawaguchi T, Kawasaki M |
379 - 382 |
Self-preservation effect and dissociation rates of CH4 hydrate Takeya S, Ebinuma T, Uchida T, Nagao J, Narita H |
383 - 387 |
CO2 hydrate film formation at the boundary between CO2 and water: effects of temperature, pressure and additives on the formation rate Uchida T, Ikeda IY, Takeya S, Ebinuma T, Nagao J, Narita H |
388 - 392 |
In situ transmission and reflection electron microscopy studies of palladium silicide islands grown on silicon (111) surface Takeguchi M, Liu J, Zhang Q, Tanaka M, Yasuda H, Furuya K |
393 - 397 |
Spectro-ellipsometric monitoring and characterization of the growth of Si/Si1-xGex multiple quantum wells Akazawa H |
398 - 402 |
Real-time observation of surface morphology of indium phosphide MOVPE growth with using X-ray reflectivity technique Kawamura T, Watanabe Y, Fujikawa S, Bhunia S, Uchida K, Matsui J, Kagoshima Y, Tsusaka Y |
403 - 407 |
Study of voltage changes at interface during growth of beta-BaB2O4 crystals and possibilities for improving their quality by an external potential Tyurikov VI, Tsvetkov EG |
408 - 413 |
Crystal growth of sodium oxalate from aqueous solution Lowe J, Ogden M, McKinnon A, Parkinson G |
414 - 418 |
Induction time and three-electrode current vs. voltage characteristics for electrical nucleation of concentrated solutions of sodium acetate trihydrate Yoshii Y, Kuraoka M, Sengoku K, Ohachi T |
419 - 423 |
Formation process of calcium carbonate from highly supersaturated solution Kawano J, Shimobayashi N, Kitamura M, Shinoda K, Aikawa N |
424 - 429 |
Investigation into the effect of phosphonate inhibitors on barium sulfate precipitation Jones F, Oliveira A, Rohl AL, Parkinson GM, Ogden MI, Reyhani MM |
430 - 437 |
Defects in epitaxially grown perovskite thin films Fujimoto M |
438 - 442 |
Characterization of Ba(Zr0.2Ti0.8)O-3 thin films deposited by RF-magnetron sputtering Choi WS, Jang BS, Lim DG, Yi J, Hong B |
443 - 447 |
Preparation of BaxSr1-xTiO3 thin films with seeding layer by a sol-gel method Wei Z, Xu H, Noda M, Okuyama M |
448 - 454 |
Growth of ferroelectric PbZrxTi1-xO3 thin films by metalorganic chemical vapor deposition (MOCVD) Shimizu M, Fujisawa H, Niu H, Honda K |
455 - 458 |
Composition dependence of ferroelectric properties of epitaxial Pb(ZrxTi1-x)O-3 thin films grown by metalorganic chemical vapor deposition Oikawa T, Aratani M, Saito K, Funakubo H |
459 - 463 |
Observations of initial growth stage of epitaxial Pb(Zr,Ti)O-3 thin films on SrTiO3(100) substrate by MOCVD Fujisawa H, Nonomura H, Shimizu M, Niu H |
464 - 467 |
Domain structures in epitaxial Pb(Zr-0.68,Ti-0.32)O-3 thin films Saito K, Oikawa T, Yamaji I, Akai T, Funakubo H |
468 - 472 |
Structural, morphology and electrical studies on ferroelectric bismuth titanate thin films prepared by sol-gel technique Giridharan NV, Madeswaran S, Jayavel R |
473 - 477 |
Preparation of SrBi2(Ta0.7Nb0.3)(2)O-9-Bi3TaTiO9 solid solution films by MOCVD and their properties Mitsuya M, Osada M, Saito K, Funakubo H |
478 - 481 |
Preparation and characterization of Bi4Ti3O12-SrBi4Ti4O15 ferroelectric thin films by pulsed laser deposition Noda M, Nakaiso T, Takarabe K, Kodama K, Okuyama M |
482 - 486 |
Preparation and orientation control of RMnO3 (R = Y, Yb) thin film by chemical solution deposition Suzuki K, Nishizawa K, Miki T, Kato K |
487 - 491 |
Growth process and interfacial structure of epitaxial Y2O3/Si thin films deposited by pulsed laser deposition Kakuno K, Ito D, Fujimura N, Matsui T, Ito T |
492 - 495 |
X-ray study of the surface morphology of crystalline and amorphous tantalum peroxide thin films prepared by RF magnetron sputtering Huang TW, Lee HY, Hsieh YW, Lee CH |
496 - 502 |
Near-UV emitting diodes based on a transparent p-n Junction composed of heteroepitaxially grown p-SrCu2O2 and n-Zno Hosono H, Ohta H, Hayashi K, Orita M, Hirano M |
503 - 508 |
Growth of N-doped and Ga plus N-codoped ZnO films by radical source molecular beam epitaxy Nakahara K, Takasu H, Fons P, Yamada A, Iwata K, Matsubara K, Hunger R, Niki S |
509 - 513 |
Crystal growth of ZnO Oka K, Shibata H, Kashiwaya S |
514 - 517 |
Spatial composition fluctuations in blue-luminescent ZnCdO semiconductor films grown by molecular beam epitaxy Sakurai K, Takagi T, Kubo T, Kajita D, Tanabe T, Takasu H, Fujita S, Fujita S |
518 - 522 |
CdO epitaxial layers grown on (001) GaAs surfaces by metalorganic molecular-beam epitaxy Ashrafi ABMA, Kumano H, Suemune I, Ok YW, Seong TY |
523 - 527 |
Piezoelectric and optical properties of ZnO films deposited by an electron-cyclotron-resonance sputtering system Kadota M, Miura T, Minakata M |
528 - 532 |
Metalorganic molecular beam epitaxy of ZnO using DEZn and H2O precursors Shirakata S, Saeki K, Terasako T |
533 - 537 |
Electro-optic property of ZnO : X (X = Li,Mg) thin films Nagata T, Shimura T, Ashida A, Fujimura N, Ito T |
538 - 543 |
Growth and characterization of Ga-doped ZnO layers on a-plane sapphire substrates grown by molecular beam epitaxy Kato H, Sano M, Miyamoto K, Yao T |
544 - 547 |
Epitaxial growth and optoelectronic properties of nitrogen-doped ZnO films on (11(2)over-bar-0) Al2O3 substrate Guo XL, Tabata H, Kawai T |
548 - 552 |
Optical and electrical properties of Co-doped epitaxial ZnO films Jin ZW, Fukumura T, Hasegawa K, Yoo YZ, Ando K, Sekiguchi T, Ahmet P, Chikyow T, Hasegawa T, Koinuma H, Kawasaki M |
553 - 557 |
ZnO growth using homoepitaxial technique on sapphire and Si substrates by metalorganic vapor phase epitaxy Ogata K, Kawanishi T, Maejima K, Sakurai K, Fujita S, Fujita S |
558 - 563 |
Fabrication of epitaxial In2O3(ZnO)(5) thin films by RF sputtering and their characterization by X-ray and electron diffraction techniques Ohashi N, Ogino T, Sakaguchi I, Hishita S, Komatsu M, Takenaka T, Haneda H |
564 - 568 |
Preparation and characterization of nanosized ZnO arrays by electrophoretic deposition Wang YC, Leu IC, Hon MH |
569 - 573 |
Characterization of epitaxial TiO2 films prepared by pulsed laser deposition Yamamoto S, Sumita T, Yamaki T, Miyashita A, Naramoto H |
574 - 579 |
Preparation of epitaxial TiO2 films by PLD for photocatalyst applications Yamaki T, Sumita T, Yamamoto S, Miyashita A |
580 - 585 |
Crystallization of amorphous alumina films induced by high-energy ion irradiation Nakao S, Jin P, Xu G, Ikeyama M, Miyagawa Y, Miyagawa S |
586 - 590 |
MOCVD precursors for Ta- and Hf-compound films Machida H, Hoshino A, Suzuki T, Ogura A, Ohshita Y |
591 - 595 |
Room-temperature epitaxial growth of NiO(111) thin films by pulsed laser deposition Kakehi Y, Nakao S, Satoh K, Kusaka T |
596 - 601 |
Lithium niobate films on periodic poled lithium niobate substrates prepared by liquid phase epitaxy Callejo D, Bermudez V, Serrano MD, Dieguez E |
602 - 607 |
Liquid phase epitaxy of KTiOPO4 on KTi1-xGexOPO4 substrates Sole R, Nikolov V, Vilalta A, Carvajal JJ, Massons J, Gavalda J, Aguilo M, Diaz F |
608 - 611 |
Epitaxial growth of oxide films (La-Ca-Mn-0 and Y-Ba-Cu-O) by the facing-target sputtering technique Zhao K, Zhou LZ, Leung CH, Yeung CF, Fung CK, Wong HK |
612 - 615 |
Sol-gel growth of LiCoO2 films on Si substrates by a spin-coating method Kushida K, Kuriyama K |
616 - 620 |
Hydrogen treatment for polycrystalline nitrogen-doped Cu2O thin film Ishizuka S, Kato S, Okamoto Y, Akimoto K |
621 - 628 |
Crystal growth and optical properties of rare earth calcium oxoborates Vivien D, Aka G, Kahn-Harari A, Aron A, Mougel F, Benitez JM, Ferrand B, Klein R, Kugel G, Le Nain N, Jacquet M |
629 - 631 |
Effect of crystal growth atmosphere on the crystal birefringence of GdYCOB for third harmonic generation of Nd : YAG laser Kawamura K, Nakao H, Furuya H, Yasuda S, Yap YK, Yoshimura M, Mori Y, Sasaki T |
632 - 636 |
Crystal growth of GdYCOB for non-critical phase-matched second-harmonic generation at 860 nm Nakao H, Makio S, Furuya H, Kawamura K, Yasuda S, Yap YK, Yoshimura M, Mori Y, Sasaki T |
637 - 640 |
Ce, Er, Yb : YCa4O(BO3)(3) crystals Kuzmicheva GM, Ageev AY, Rybakov VB, Panyutin VL, Yu YM, Chizhikov VI |
641 - 644 |
Influence of Ca4GdO(BO3)(3) doping on its properties Lukasiewicz T, Kityk IV, Makowska-Janusik M, Majchrowski A, Galazka Z, Kaddouri H, Mierczyk Z |
645 - 648 |
Effect of crystallinity on the bulk laser damage and UV absorption of CLBO crystals Ono R, Kamimura T, Fukumoto S, Yap YK, Yoshimura M, Mori Y, Sasaki T, Yoshida K |
649 - 653 |
Growth and optical properties of a new nonlinear optical lanthanum calcium borate crystal Xu XW, Chong TC, Zhang GY, Cheng SD, Li MH, Phua CC |
654 - 657 |
The crystal growth and nonlinear optical properties of K2Al2B2O7 Hu ZG, Ushiyama N, Yap YK, Yoshimura M, Mori Y, Sasaki T |
658 - 662 |
The major problems of seeding and growth of barium borate crystals in terms of new data on phase relations in BaO-B2O3-Na2O system Tsvetkov EG, Tyurikov VI, Khranenko GG |
663 - 667 |
Theoretical studies of nonlinear optical crystals in metal cluster compounds Wu KC, Chen SH, Snijders JG, Sa RJ, Lin CS, Zhuang BT |
668 - 671 |
Morphologic characterization of DyxY1-xAl3(BO3)(4) single crystals grown from the flux and vapour phase Vazquez RM, Caballero MA, Gonzalez-Manas M, Kokanyan EP, Ruiz CM, Dieguez E |
672 - 676 |
Flux growth of large potassium titanyl phosphate crystals and their electro-optical applications Wang XY, Yuan X, Li W, Qi JB, Wang SJ, Shen DZ |
677 - 681 |
Engineering of lithium niobate domain structure through the off-centered Czochralski growth technique Bermudez V, Callejo D, Vilaplana R, Capmany J, Dieguez E |
682 - 686 |
Chemical and thermal conditions for the formation of stoichiometric LiNbO3 Polgar K, Peter A, Poppl L, Ferriol M, Foldvari I |
687 - 693 |
Modeling of defects and surfaces in perovskite ferroelectrics Borstel G, Eglitis RI, Kotomin EA, Heifets E |
694 - 699 |
Growth and characterization of potassium tantalate niobate single crystals by the step-cooling technique Ilangovan R, Ravi G, Subramanian C, Ramasamy P, Sakai S |
700 - 702 |
Growth and ferroelectric properties of Nd-doped strontium-barium niobate crystals Ivleva LI, Volk TR, Isakov DV, Gladkii VV, Polozkov NM, Lykov PA |
703 - 706 |
Crystal growth and physical properties of Cs2Nb4O11 and Rb2Nb4O11 single crystals Kharitonova EP, Voronkova VI, Yanovskii VK, Stefanovich SY |
707 - 713 |
Growth habits of 3 and 4-inch langasite single crystals Uda S, Wang SQ, Konishi N, Inaba H, Harada J |
714 - 719 |
High-quality langasite films grown by liquid phase epitaxy Klemenz C |
720 - 724 |
Growth of epitaxial substrate Gd3Ga5O12 (GGG) single crystal through pure GGG phase polycrystalline material Zhao GJ, Li T, Xu J |
725 - 729 |
MoO3-Li2O flux LPE growth of YIG films and its characterization Takagi T, Fujino M, Fujii T |
730 - 734 |
The growth of TiO2 (rutile) single crystals using the FZ method under high oxygen pressure Park JK, Shim KB, Auh KH, Tanaka I |
735 - 739 |
In situ measurement of Bi4Ge3O12 interface supercooling during melt crystal growth Golyshev VD, Gonik MA, Tsvetovsky VB |
740 - 744 |
Bi4B2O9 - crystal growth and some new attractive properties Muehlberg M, Burianek M, Edongue H, Poetsch C |
745 - 748 |
Optical properties of EFG grown Nd : YVO4 single crystals dependent on Nd concentration Hur MG, Yang WS, Suh SJ, Ivanov MA, Kochurikhin VV, Yoon DH |
749 - 752 |
Growth of large Bi2Sr2CaCu2Oy single crystals by a modified vertical Bridgman method Tanaka H, Kishida S |
753 - 755 |
Growth of La-doped Bi2Sr2CaCu2O, single crystals by a self-flux method Uemoto H, Maki K, Kishida S |
756 - 761 |
On the growth of underdoped Bi2Sr2CaCu2O8+delta single crystals by TSFZ method Liang B, Lin CT |
762 - 766 |
Crystal growth of BiSrCaCuo thin films on submicron-sized step structures Ishibashi T, Yonemitsu K, Inagaki K, Sato K |
767 - 771 |
Construction of (Nd0.33Eu0.33Gd0.33)Ba2CU3Ox phase diagram and its crystallization Hayakawa Y, Murai T, Aswal DK, Kumagawa M |
772 - 777 |
Growth mechanism and additive effect of high-T-c superconducting crystals Chen C, Wondre F, Ryan JF, Narlikar A, Samanta SB |
778 - 782 |
Top-seeded solution growth of Ca-doped YBCO single crystals Lin CT, Liang B, Chen HC |
783 - 786 |
Crystal growth of YCuO2 delafossite containing triangular Cu planes Isawa K, Nagano M, Yamada K |
787 - 791 |
Bulk single-crystal growth of strontium ruthenates by a floating-zone method Ikeda SI, Azuma U, Shirakawa N, Nishihara Y, Maeno Y |
792 - 795 |
Growth of bulk Pr2-xCexCuO4+delta single crystals by B2O3 encapsulated flux technique Jayavel R, Mochiku T, Ooi S, Hirata K |
796 - 800 |
Crystal growth of SrCu2O3 under high pressure Loffert A, Gross C, Assmus W |
801 - 805 |
Crystal growth of Ca12Al14O33 by the floating zone method Watauchi S, Tanaka I, Hayashi K, Hirano M, Hosono H |
806 - 809 |
Growth of large La1-xSrxMnO3 single crystals under argon pressure by the floating-zone technique Prabhakaran D, Coldea AI, Boothroyd AT, Blundell S |
810 - 814 |
Floating zone growth and properties of La(1-x)A(x)MnO(3) (A = Ca,Sr) single crystals Shulyatev D, Karabashev S, Arsenov A, Mukovskii Y, Zverkov S |
815 - 819 |
Growth of large La2-xSrxNiO4+delta single crystals by the floating-zone technique Prabhakaran D, Isla P, Boothroyd AT |
820 - 827 |
Historical review of quartz crystal growth Iwasaki F, Iwasaki H |
828 - 832 |
Kinetics of dissolution and state of silica in hydrothermal solutions of Na2CO3 and NaOH, and accelerated method for the quartz crystal characterization against growth rate Balitsky VS, Kurashige M, Balitskaya L, Iwasaki H |
833 - 836 |
Experimental study of the simultaneous dissolution and growth of quartz and topaz Balitsky VS, Balitskaya L, Lu T, Shigley JE |
837 - 842 |
OH impurities in GaPO4 crystals: correlation between infrared absorption and mass loss during thermal treatment Jacobs K, Hofmann P, Klimm D |
843 - 847 |
Growth striations in GaPO4 single crystals obtained under hydrothermal conditions Barz RU, Grassl M, Gille P |
848 - 852 |
Piezoelectric single crystal Pb[(Zn1/3Nb2/3)(0.93)Ti-0.07]O-3 (PZNT 93/7) for ultrasonic transducers Harada K, Hosono Y, Kobayashi T, Yamashita Y, Wada S, Tsurumi T |
853 - 857 |
Growth of 3-in single crystals of piezoelectric Pb[(Zn1/3Nb2/3)(0.91)Ti-0.09]O-3 by the supported solution Bridgman method Matsushita M, Tachi Y, Echizenya K |
858 - 863 |
Growth of Co-doped (Ba,Sr)TiO3 single crystals and their characterization Madeswaran S, Girldharan NV, Jayavel R, Subramanian C |
864 - 868 |
One possible mechanism of spiral/footing growth of Cz-grown Li6Gd(BO3)(3) Chaminade JP, Viraphong O, Miyazawa S |
869 - 873 |
Growth of luminescent Zn2SiO4 : Mn2+ particles inside oxidized porous silicon: emergence of yellow luminescence Taghavinia N, Lerondel G, Makino H, Yamamoto A, Yao T, Kawazoe Y, Goto T |
874 - 878 |
X-ray diffraction and FTIR spectroscopy of heat treated R2O3 : 3Ga(2)O(3): 4B(2)O(3) systems Beregi E, Watterich A, Madarasz J, Toth M, Polgar K |
879 - 883 |
Growth of high-melting sesquioxides by the heat exchanger method Peters V, Bolz A, Petermann K, Huber G |
884 - 889 |
Growth and crystal structure of the BeAl6O10 single crystals Alimpiev AI, Merkulov AA, Solntsev VP, Tsvetkov EG, Matrosov VN, Pestryakov EV |
890 - 893 |
Growth and characterization of deuterated analog of L-arginine phosphate single crystals Hameed ASH, Ravi G, Ilangovan R, Azariah AN, Ramasamy P |
894 - 898 |
Influence of neutral environment in the growth of Cr-doped LiCAF/LiSAF crystals: X-ray powder diffraction and EPR analysis Vazquez RM, Santos MT, Lopez FJ, Bravo D, Dieguez E |
899 - 903 |
Peculiarities of the growth of disordered Na, R-fluorite (R=Y, Ce-Lu) single crystals Blistanov AA, Chernov SP, Karimov DN, Ouvarova TV |
905 - 911 |
Nitride semiconductors - impact on the future world Akasaki I |
912 - 921 |
Growth and characterization of freestanding GaN substrates Motoki K, Okahisa T, Nakahata S, Matsumoto N, Kimura H, Kasai H, Takemoto K, Uematsu K, Ueno M, Kumagai Y, Koukitu A, Seki H |
922 - 925 |
Bulk GaN growth by direct synthesis method Nishino K, Kikuta D, Sakai S |
926 - 930 |
The effect of metallic catalysts on the synthesis of GaN micro-crystals Roh CH, Park YJ, Kim EK, Shim KB |
931 - 935 |
GaN-MOVPE growth and its microscopic chemistry of gaseous phase by computational thermodynamic analysis Hirako A, Yoshitani M, Nishibayashi M, Nishikawa Y, Ohkawa K |
936 - 941 |
Quantum chemical study of gas-phase reactions of trimethylaluminium and triethylaluminium with ammonia in III-V nitride semiconductor crystal growth Ikenaga M, Nakamura K, Tachibana A, Matsumoto K |
942 - 946 |
Key issues for obtaining high-quality GaN films by two-flow metalorganic vapor phase epitaxy Morimoto K, Inoue N |
947 - 950 |
Relaxation of misfit-induced stress in nitride-based heterostructures Terao S, Iwaya M, Sano T, Nakamura T, Kamiyama S, Amano H, Akasaki I |
951 - 955 |
Suppression of phase separation of AlGaN during lateral growth and fabrication of high-efficiency UV-LED on optimized AlGaN Iwaya M, Terao S, Sano T, Ukai T, Nakamura R, Kamiyama S, Amano H, Akasaki I |
956 - 960 |
Metalorganic vapor phase epitaxy growth of AlGaN/GaN heterostructures on sapphire substrates Hiroki M, Maeda N, Kobayashi N |
961 - 967 |
MOCVD growth of high reflective GaN/AlGaN distributed Bragg reflectors Nakada N, Ishikawa H, Egawa T, Jimbo T, Umeno M |
968 - 971 |
MOVPE growth and characterization of Al1-xInxN/GaN multiple layers Kosaki M, Mochizuki S, Nakamura T, Watanabe Y, Yukawa Y, Nitta S, Yamaguchi S, Amano H, Akasaki I |
972 - 977 |
Epitaxial growth of high quality BAlGaN quaternary lattice matched to AlN on 6H-SiC substrate by LP-MOVPE for deep-UV emission Takano T, Kurimoto M, Yamamoto J, Kawanishi H |
978 - 982 |
Growth of GaN and related materials by gas-source molecular-beam epitaxy using uncracked ammonia gas Yoshida S |
983 - 987 |
Effect of hydrogen on morphological changes in columnar structure of GaN grown by ECR-MBE Araki T, Onogi A, Juni N, Nanishi Y |
988 - 992 |
Overgrowth of GaN layer on GaN nano-columns by RF-molecular beam epitaxy Kusakabe K, Kikuchi A, Kishino K |
993 - 997 |
Effect of sapphire substrate nitridation on determining rotation domain in GaN growth Yamaguchi T, Araki T, Saito Y, Kano K, Kanazawa H, Nanishi Y, Teraguchi N, Suzuki A |
998 - 1002 |
In-situ real-time analysis on strain relaxation process in GaN growth on sapphire by RF-MBE Xu K, Yano N, Jia AW, Yoshikawa A, Takahashi K |
xiv - xvii |
Proceedings of the thirteenth International Conference on Crystal Growth in conjunction with the Eleventh International Conference on Vapor Growth and Epitaxy Kyoto, Japan, 30 July-4 August 2001 -Chairpersons' preface Nishinaga T, Takahashi K |
1003 - 1007 |
Polarity control of GaN grown on sapphire substrate by RF-MBE Xu K, Yano N, Jia AW, Yoshikawa A, Takahashi K |
1008 - 1011 |
GaN growth by compound source molecular beam epitaxy Honda T, Sato K, Hashimoto T, Shinohara M, Kawanishi H |
1012 - 1016 |
Lattice relaxation process of AlN growth on atomically flat 6H-SiC substrate in molecular beam epitaxy Onojima N, Suda J, Matsunami H |
1017 - 1021 |
Growth of high-quality InN using low-temperature intermediate layers by RF-MBE Saito Y, Yamaguchi T, Kanazawa H, Kano K, Araki T, Nanishi Y, Teraguchi N, Suzuki A |
1022 - 1026 |
Effect of atomic hydrogen irradiation on native oxides of InN surface Ohashi T, Saito Y, Maruyama T, Nanishi Y |
1027 - 1031 |
MBE growth of Eu- or Tb-doped GaN and its optical properties Bang H, Morishima S, Li ZQ, Akimoto K, Nomura M, Yagi E |
1032 - 1036 |
Effect of GaN buffer layer on crystallinity of InN grown on (111)GaAs Guo QX, Okada A, Kidera H, Tanaka T, Nishio M, Ogawa H |
1037 - 1041 |
Crystal growth of nitride-rich GaNP by laser-assisted metalorganic chemical-vapor deposition Yoshida S, Kikawa J, Itoh Y |
1042 - 1046 |
NH3 flow rates dependence of crystallinity in GaN thin films grown by reactive close-spaced method at low temperature Watanabe Y, Sano M |
1047 - 1054 |
Electron microscopy analyses of microstructures in ELO-GaN Kuwano N, Horibuchi K, Kagawa K, Nishimoto S, Sueyoshi M |
1055 - 1059 |
Carrier-gas dependence of ELO GaN grown by hydride VPE Miyake H, Bohyama S, Fukui M, Hiramatsu K, Iyechika Y, Maeda T |
1060 - 1064 |
Reduction of defect density in GaN epilayer having buried Ga metal by MOCVD Sumiya M, Kurumasa Y, Ohtsuka K, Kuwahara K, Takano Y, Fuke S |
1065 - 1069 |
Reduction of threading dislocation density in AlXGa1-XN grown on periodically grooved substrates Mochizuki S, Detchprohm T, Sano S, Nakamura T, Amano H, Akasaki I |
1070 - 1074 |
Microstructures of two-step facet-controlled ELO-GaN grown by MOVPE method - effect of mask geometry Horibuchi K, Kuwano N, Miyake H, Hiramatsu K |
1075 - 1078 |
Impurity incorporation in epitaxially laterally overgrown GaN detected by cryogenic photoluminescence microscope with sub-micron spatial resolution Yoshimoto M, Saraie J, Nakamura S |
1079 - 1083 |
Heteroepitaxial growth of gallium nitride on (111)GaAs substrates by radio frequency magnetron sputtering Guo QX, Okada A, Kidera H, Tanaka T, Nishio M, Ogawa H |
1084 - 1088 |
Comparison of GaN growth processes on GaAs(111)A and (111)B substrates studied by ab initio calculation Matsuo Y, Kumagai Y, Irisawa T, Koukitu A |
1089 - 1093 |
Growth parameter dependence of HVPE GaN and polarity and crystal quality of the grown layers Namerikawa M, Sato T, Takahashi O, Suemasu T, Hasegawa F |
1094 - 1098 |
Effect of buffer layer on the growth of GaN on Si substrate Lee JW, Jung SH, Shin HY, Lee IH, Yang CW, Lee SH, Yoo JB |
1099 - 1103 |
Fabrication of GaN/AlGaN heterostructures on a (111)Si substrate by selective MOVPE Kato T, Honda Y, Yamaguchi M, Sawaki N |
1104 - 1109 |
Investigation of initial growth layers grown on Si(001) process for GaN heteroepitaxial and Si(111) substrates by ECR-assisted MBE Yodo T, Ando H, Nosei D, Harada Y, Tamura M |
1110 - 1113 |
Growth of wurtzite-GaN on Si(211) by metalorganic vapor phase epitaxy Chen XF, Honda Y, Kato T, Sawaki N |
1114 - 1117 |
Heteroepitaxial growth of group-III nitrides on lattice-matched metal boride ZrB2 (0001) by molecular beam epitaxy Suda J, Matsunami H |
1118 - 1123 |
New oxide crystal (La,Sr)(Al,Ta)O-3 as substrate for GaN epitaxy Lukasiewicz T, Swirkowicz M, Sakowska H, Turos A, Leszczynski M, Ratajczak R |
1124 - 1128 |
Effects of growth temperature in selective-area growth of cubic GaN on GaAs (100) by MOVPE Sanorpim S, Wu J, Onabe K, Shiraki Y |
1129 - 1132 |
Structural analysis of Si-doped AlGaN/GaN multi-quantum wells Nakamura T, Mochizuki S, Terao S, Sano T, Iwaya M, Kamiyama S, Amano H, Akasaki I |
1133 - 1138 |
Atomic scale characterization of GaInN/GaN layers grown on sapphire substrates with low-temperature deposited AlN buffer layers Tabuchi M, Kyouzu H, Takeda Y, Yamaguchi S, Amano H, Akasaki I |
1139 - 1142 |
Characterization of local structures around In atoms in Ga1-In-x(x) layers by fluorescence EXAFS measurements Tabuchi M, Katou D, Kyouzu H, Takeda Y, Yamaguchi S, Amano H, Akasaki I |
1143 - 1147 |
Influence of lattice polarity on wurzite GaN {0001} decomposition as studied by in situ gravimetric monitoring method Mayumi M, Satoh F, Kumagai Y, Takemoto K, Koukitu A |
1148 - 1152 |
Growth and characterizations of InGaN on N- and Ga-polarity GaN grown by plasma-assisted molecular-beam epitaxy Shen XQ, Ide T, Shimizu M, Okumura H |
1153 - 1157 |
CAICISS characterization of GaN films grown by pulsed laser deposition Ohta J, Fujioka H, Furusawa M, Sasaki A, Yoshimoto M, Koinuma H, Sumiya M, Oshima M |
1158 - 1162 |
G-GIXD characterization of GaN grown by laser MBE Takahashi H, Ohta J, Fujioka H, Oshima M, Kimura M |
1163 - 1166 |
Low-pressure MOCVD growth of GaN/AlGaN multiple quantum wells for intersubband transitions Hoshino K, Someya T, Hirakawa K, Arakawa Y |
1167 - 1171 |
Valence transition of Eu ions in GaN near the surface Maruyama T, Morishima S, Bang H, Akimoto K, Nanishi Y |
1172 - 1175 |
Effects of internal piezoelectric field on electronic states of InGaN quantum dots grown on GaN Saito T, Arakawa Y |
1176 - 1179 |
On the capacitance-voltage characteristics of Al/BaTiO3/GaN MFS structures Kumar MS, Sumathi RR, Giridharan NV, Jayavel R, Kumar J |
1180 - 1186 |
Growth of large high-quality SiC single crystals Ohtani N, Fujimoto T, Katsuno M, Aigo T, Yashiro H |
1187 - 1191 |
Evolution of domain walls in 6H-and 4H-SiC single crystals Siche D, Rost HJ, Doerschel J, Schulz D, Wollweber J |
1192 - 1195 |
Mechanism of nitrogen incorporation in sublimation growth of SiC Naitoh M, Hara K, Hirose F, Onda S |
1196 - 1201 |
Computational study on the SiC sublimation growth Bottcher K, Schulz D |
1202 - 1205 |
Synthesis and growth of 3C-SiC crystals from solution at 950 degrees C Tanaka A, Shiozaki N, Katsuno H |
1206 - 1212 |
Epitaxial growth of thick 4H-SiC layers in a vertical radiant-heating reactor Tsuchida H, Kamata I, Jikimoto T, Izumi K |
1213 - 1218 |
High-purity 4H-SiC epitaxial growth by hot-wall chemical vapor deposition Nakazawa S, Kimoto T, Hashimoto K, Matsunami H |
1219 - 1223 |
SiC hornoepitaxy on Al-ion-implanted layers for fabricating power device structures Imaizumi M, Tanimura J, Tarui Y, Sugimoto H, Ohtsuka K, Takami T, Ozeki T |
1224 - 1229 |
Selective homoepitaxy of 4H-SiC on (0001) and (1 1 (2)over-bar 0) masked substrates Chen Y, Kimoto T, Takeuchi Y, Matsunami H |
1230 - 1234 |
Study of nitrogen, aluminium and boron incorporation in SiC layers grown by sublimation epitaxy Syvajarvi M, Yakimova R, Kakanakova-Georgieva A, Sridhara SG, Linnarsson MK, Janzen E |
1235 - 1238 |
Crystal growth of silicon carbide in hydrogen atmosphere by sublimation close space technique Furusho T, Lilov SK, Ohshima S, Nishino S |
1239 - 1243 |
A proposal for CVD growth of 15R-SiC by observing the etch pits on 15R-SiC (0 0 0 (1)over-bar) C-face Nishiguchi T, Masuda Y, Ohshima S, Nishino S |
1244 - 1249 |
3C-SiC hetero-epitaxial growth on undulant Si(001) substrate Nagasawa H, Yagi K, Kawahara T |
1250 - 1253 |
Lateral over-growth of 3C-SiC on patterned Si(111) substrates Nishino S, Jacob C, Okui Y, Ohshima S, Masuda Y |
1254 - 1259 |
In situ observation of reflection high-energy electron diffraction during the initial growth of SiC on Si using dimethylsilane Yasui K, Narita Y, Inubushi T, Akahane T |
1260 - 1263 |
Growth kinetics in plasma CVD of a-SiC films from monomethylsilane revealed by in situ spectroscopy Kaneko T, Miyakawa N, Yamazaki H, Iikawa Y |
1264 - 1268 |
Orientation dependence of solid phase growth of implantation-induced amorphous layer in 6H-SiC Nakamura T, Matsumoto S, Satoh M |
1269 - 1276 |
Device-grade homoepitaxial diamond film growth Okushi H, Watanabe H, Ri S, Yamanaka S, Takeuchi D |
1277 - 1280 |
Heteroepitaxial diamond thin film growth on Ir(001)/MgO(001) substrate by antenna-edge plasma assisted chemical vapor deposition Tachiki M, Fujisaki T, Taniyama N, Kudo M, Kawarada H |
1281 - 1285 |
Growth rate of high-quality large diamond crystals Sumiya H, Toda N, Satoh S |
1286 - 1290 |
Growth morphology and change in growth conditions of a spinel-twinned natural diamond Abduriyim A, Kitamura M |
1291 - 1295 |
Molecular-beam epitaxy of InAs on GaAs substrates with hole arrays patterned by focused ion beam Morishita Y, Ishiguro M, Miura S, Enmei Y |
1296 - 1300 |
Luminescence in excess of 1.5 mu m at room-temperature of InAs quantum dots capped by a thin InGaAs strain-reducing layer Tatebayashi J, Nishioka M, Arakawa Y |
1301 - 1306 |
Uniform formation process of self-organized InAs quantum dots Yamaguchi K, Kaizu T, Yujobo K, Saito Y |
1307 - 1311 |
Effect of buffer composition on lateral alignment of self-assembled In0.4Ga0.6As island arrays grown on GaAs (311)B substrates Xu HZ, Akahane K, Song HZ, Okada Y, Kawabe M |
1312 - 1315 |
Fabrication of GaN quantum dots by metalorganic chemical vapor selective deposition Tachibana K, Someya T, Ishida S, Arakawa Y |
1316 - 1319 |
Stranski-Krastanow growth of GaN quantum dots by metalorganic chemical vapor deposition Miyamura M, Tachibana K, Someya T, Arakawa Y |
1320 - 1325 |
Alloying of CdSe/ZnSe quantum dot grown by an alternate molecular beam supply Ohishi M, Tanaka K, Fujimoto T, Yoneta M, Saito H |
1326 - 1330 |
Preparation of ferromagnetic (In,Mn)As with relatively low hole concentration and Curie temperature 50 K Slupinski T, Oiwa A, Yanagi S, Munekata H |
1331 - 1333 |
Preparation of ferromagnetic quaternary (In,Ga,Mn)As Slupinski T, Munekata H, Oiwa A |
1334 - 1338 |
Effect of low-temperature annealing on the crystallinity of III-V-based diluted magnetic semiconductors Hashimoto Y, Hayashi T, Katsumoto S, Iye Y |
1339 - 1343 |
Growth and properties of new III-V diluted magnetic semiconductor Ga1-xCrxAs Zaets W, Saito H, Ando K |
1344 - 1348 |
Preparation of quaternary magnetic alloy semiconductor epilayers (Ga, Mn, Fe)As Moriya R, Munekata H, Kondo T, Oiwa A |
1349 - 1352 |
Growth and properties of (Ga,Mn)As on Si (100) substrate Zhao JH, Matsukura F, Abe E, Chiba D, Ohno Y, Takamura K, Ohno H |
1353 - 1357 |
Molecular beam epitaxy of (Ga,Mn)N Kondo T, Kuwabara S, Owa H, Munekata H |
1358 - 1362 |
Molecular beam epitaxy of wurtzite (Ga,Mn)N films on sapphire(0001) showing the ferromagnetic behaviour at room temperature Sonoda S, Shimizu S, Sasaki T, Yamamoto Y, Hori H |
1363 - 1369 |
Room temperature ferromagnetism in novel magnetic semiconductors based on II-IV-V-2 chalcopyrite compounds Sato K, Medvedkin GA, Ishibashi T |
1370 - 1373 |
Growth of (Cd, Mn)GeP2 ferromagnetic semiconductor Hirose K, Medvedkin GA, Ishibashi T, Nishi T, Sato K |
1374 - 1377 |
MBE growth of MnTe/ZnTe superlattices on GaAs (100) vicinal substrates Suzuki T, Ishibe I, Nabetani Y, Kato T, Matsumoto T |
1378 - 1382 |
Growth of Fe(100) on GaAs(100) for tunnel magneto-resistance junctions Manago T, Mizuguchi M, Akinaga F |
1383 - 1387 |
MBE growth of ultrathin Co films on a Si(111) surface with ultrathin buffer layers Hyomi K, Murayama A, Oka Y, Kondoh S, Falco CM |
1388 - 1393 |
Surface and bulk characterization of thermally induced defects during silicon single wafer epitaxy Feichtinger P, Goorsky MS, Muemmler F, Rickborn S, Tran Q, Oster D, Moreland J |
1394 - 1398 |
Effects of ions and electrons in electron-beam-excited plasma assisted CVD on nanocrystalline silicon film properties Ohshita Y, Yamaguchi K, Motegi H, Yamaguchi M |
1399 - 1403 |
Effect of UV-O-2, NF3/H-2 surface preparation on the crystalline defects in silicon homoepitaxy (Part I. A study on photochemical surface preparation in series) Sun MC, Kim DH, Kwon SK |
1404 - 1409 |
New Si atomic-layer-controlled growth technique with thermally cracked hydride molecule Suda Y, Hosoya N, Shiratori D |
1410 - 1417 |
Microchannel epitaxy: an overview Nishinaga T |
1418 - 1422 |
Crystallographic orientation dependence of impurity incorporation during epitaxial lateral overgrowth of InP Sun YT, Anand S, Lourdudoss S |
1423 - 1427 |
Erbium-doped GaP grown by MOMBE and their optical properties Suemune I, Uesugi K, Shimozawa T, Kumano H, Machida H, Shimoyama N |
1428 - 1433 |
Growth kinetics of GaP in LPE Inatomi Y, Horiuchi K, Kato A, Kuribayashi K |
1434 - 1439 |
Silicon doping into MBE-grown GaAs at high arsenic vapor pressures Miyagawa A, Yamamoto T, Ohnishi Y, Nelson JT, Ohachi T |
1440 - 1444 |
Growth and characterization of carbon-doped low-temperature GaAs Herfort J, Ulrici W, Moreno M, Ploog KH |
1445 - 1449 |
X-ray diffraction analysis of LT-GaAs multilayer structures Fukushima S, Mukai K, Otsuka N |
1450 - 1454 |
Growth of GaAs epitaxial layers on Si substrate with porous Si intermediate layer by chemical beam epitaxy Saravanan S, Hayashi Y, Soga T, Jimbo T, Umeno M, Sato N, Yonehara T |
1455 - 1459 |
Maskless selective direct growth and doping of GaAs using a Ga-Sn low energy focused ion beam for in-situ micro-device structures fabrication Cho DH, Suzuki Y, Tanaka M, Hachiro M, Pak K |
1460 - 1465 |
A new way to achieve dislocation-free heteroepitaxial growth by molecular beam epitaxy: vertical microchannel epitaxy Matsunaga Y, Naritsuka S, Nishinaga T |
1466 - 1470 |
Characterization of GaAs on MnZn ferrite with a MnAs buffer layer Ito S, Fujioka H, Kiwata H, Ikeda T, Oshima M |
1471 - 1475 |
Quantitative imaging of InGaAs/GaAs layers using transmission electron microscopy methods: characterization of stresses and chemical composition Leifer K, Buffat PA, Cagnon J, Kapon E, Rudra A, Stadelmann PA |
1476 - 1480 |
Dependence on In content of InxGa1-xAs quantum dots grown along GaAs multiatomic steps by MOVPE Ishihara T, Lee S, Akabori M, Motohisa J, Fukui T |
1481 - 1485 |
Metalorganic vapor phase epitaxial growth of metastable GaAs1-xBix alloy Oe K |
1486 - 1490 |
High-density V-groove InGaAs/AlGaAs quantum wires on submicron gratings by constant growth technique Tsurumachi N, Son CS, Kim TG, Ogura M |
1491 - 1494 |
First successful growth of TlInGaAs layers on GaAs substrates by gas source MBE Lee HJ, Mizobata A, Konishi K, Maeda O, Asami K, Asahi H |
1495 - 1498 |
Growth of TlGaAs by low-temperature molecular-beam epitaxy Kajikawa Y, Kubota H, Asahina S, Kanayama N |
1499 - 1503 |
In0.53Ga0.47As/GaAs0.5Sb0.5/In(0.52)Al(0.4)sAs asymmetric type II quantum well structures lattice-matched to InP grown by molecular beam epitaxy Kawamura Y, Kondo A, Fujimoto M, Higashino T, Takasaki H, Naito H, Inoue N |
1504 - 1509 |
Uniform growth of high-quality 2-in diameter In0.53Ga0.47As/In0.52Al0.48As/InP and In0.2Ga0.8As/GaAs/AlGaAs multi-quantum well wafers by MBE with GaP and GaAs decomposition sources Song JD, Kim JM, Lee YT |
1510 - 1514 |
Growth, characterization and avalanche photodiode application of strain compensated InGaAsP/InAlAs superlattice Suzuki A, Yokotsuka T, Tanaka H, Yamada A, Ohki Y |
1515 - 1518 |
Control of dark currents in multi-quantum well solar cells fabricated by atomic H-assisted molecular beam epitaxy Okada Y, Seki S, Takeda T, Kawabe M |
1519 - 1524 |
Sb surface segregation effect on the phase separation of MBE grown InAsSb Miyoshi H, Suzuki R, Amano H, Horikoshi Y |
1525 - 1530 |
A novel method to grow high quality In1-xGaxAs ELO and bridge layers with high indium compositions Balakrishnan K, Iida S, Kumagawa M, Hayakawa Y |
1531 - 1535 |
The preparation of B-Sb thin films by molecular flow region PVD process Kumashiro Y, Nakamura K, Doi Y, Hirata K, Yokoyama T, Sato K |
1536 - 1540 |
Fabrication of wurtzite quantum-well structures of CdSe/ZnCdSe by molecular beam epitaxy Matsumura N, Yasui K, Saraie J |
1541 - 1544 |
HRTEM observation of CdSe/ZnSe SQWs grown on vicinal GaAs substrate Nabetani Y, Kobayashi Y, Ito Y, Kato T, Matsumoto T |
1545 - 1549 |
Epitaxial growth and characterization of Cl-doped ZnSe layer by MBE Yoneta M, Nanami K, Uechi H, Ohishi M, Saito H, Yoshino K |
1550 - 1553 |
Composition control of CdSeTe layers grown by molecular beam epitaxy Matsumura N, Sakamoto T, Saraie J |
1554 - 1558 |
Amorphous Zn predeposition for growth of low-defect-density CdTe films and low-optical-loss Cd1-xMnxTe magneto-optic waveguide on GaAs substrate Zaets W, Ando K |
1559 - 1565 |
The effect of the electron irradiation on the electrical properties of thin polycrystalline CdSe and CdS layers Antohe S, Ruxandra V, Alexandru H |
1566 - 1569 |
Defects-induced volume deviations in ZnSe Ebe H, Sakurai F, Chen ZQ, Uedono A, Zhang BP, Segawa Y, Suto K, Nishizawa J |
1570 - 1574 |
Luminescence properties of lithium-doped ZnS epitaxial layers grown by MOCVD Nakamura S, Yamaguchi J, Takagimoto S, Yamada Y, Taguchi T |
1575 - 1579 |
Preparation and Raman spectra of ZnSe/GaAs heteroepitaxial layers Mitsumoto T, Kao N, Kitagawa H, Kitahara K, Mizuno K, Noda Y |
1580 - 1584 |
Photo luminescence spectra of arsenic-doped ZnTe films grown by metalorganic vapor phase epitaxy (MOVPE) using triethylarsine Hayashida K, Tanaka T, Nishio M, Chang Y, Wang J, Wang SL, Guo QX, Ogawa H |
1585 - 1588 |
Crystalline structure of CdTe directly grown on hydrogen-terminated Si(111) without pre-heat treatment Seto S, Yamada S, Miyakawa T, Suzuki K |
1589 - 1593 |
Structural and optical properties of Zn1-xMnxTe epilayers as diluted magnetic II-VI semiconductors Yu YM, Park JG, Hyun MH, Nam S, Byungsung O, Lee KS, An KS, Choi YD, Yoon MY, Yu PY |
1594 - 1598 |
Comparison of hexagonal ZnS film properties on c- and a-sapphires Yoo YZ, Chikyow T, Ahmet P, Jin ZW, Kawasaki M, Koinuma H |
1599 - 1602 |
Energetics in the growth mechanism of semiconductor heteroepitaxy Miyagishima N, Okajima K, Oyama N, Shiraishi K, Takeda K, Ohno T, Ito T |
1603 - 1609 |
A quadratic convergence method for MOVPE thermodynamic analysis Hasegawa T, Koukitu A, Kumagai Y |
1610 - 1614 |
Epitaxial growth of a vacancy-ordered Ga2Se3 thin film on a vicinal Si(001) substrate Ueno K, Tokuchi S, Saiki K, Koma A |
1615 - 1619 |
Growth of CuCl nanostructures on CaF2(111) substrates by MBE - their morphology and optical spectra Kawamori A, Edamatsu K, Itoh T |
1621 - 1627 |
Charged native point defects in GaAs and other III-V compounds Hurle DTJ |
1628 - 1637 |
Experimental analysis and modeling of melt growth processes Muller G |
1638 - 1645 |
Crystal growth under microgravity: present results and future prospects towards the International Space Station Benz KW, Dold P |
1646 - 1650 |
Protein crystal growth in space, past and future DeLucas LJ, Moore KM, Long MM, Rouleau R, Bray T, Crysel W, Weise L |
1651 - 1656 |
Effect of the axial temperature gradient on the formation of grown-in defect regions in Czochralski silicon crystals; reversion of the defect regions between the inside and outside of the Ring-OSF Okui M, Nishimoto M |
1657 - 1662 |
Controlling oxygen concentration and distribution in 200 mm diameter Si crystals using the electromagnetic Czochralski (EMCZ) method Watanabe M, Eguchi M, Wang W, Hibiya T, Kuragaki S |
1663 - 1666 |
The effects of boron impurity on the extended defects in CZ silicon crystals grown under interstitial rich conditions Terashima K, Noguchi H |
1667 - 1670 |
Variation of silicon melt viscosity with boron addition Nishimura S, Matsumoto S, Terashima K |
1671 - 1677 |
Measurement of microscopic growth rates in float zone silicon crystals Dold P, Schweizer M, Croll A, Benz KW |
1678 - 1684 |
Grown-in defects in silicon crystals Nakamura K, Saishoji T, Tomioka J |
1685 - 1691 |
Silicon defect and impurity studies using float-zone crystal growth as a tool Ciszek TF, Wang TH |
1692 - 1696 |
Numerical simulation of effect of ampoule rotation for the growth of InGaSb by rotational Bridgman method Ozawa T, Hayakawa Y, Balakrishnan K, Kumagawa M |
1697 - 1700 |
InP melts: investigation of wetting between boat materials in Bridgman growth Shimizu A, Nishizawa J, Oyama Y, Suto K |
1701 - 1706 |
Influence of temperature oscillations on the interface velocity during Bridgman crystal growth Stelian C, Duffar T, Santailler JL, Nicoara I |
1707 - 1710 |
CVD growth of bulk polycrystalline ZnS and its optical properties Fang ZY, Chai YC, Hao YL, Yang YY, Dong YP, Yan ZW, Tian HC, Xiao HT, Wang HM |
1711 - 1715 |
The growth of CdTe bulk crystals using the multi-tube physical vapour transport system Sanghera HK, Cantwell B, Aitken NM, Brinkman AW |
1716 - 1719 |
Experimental and numerical study of the VGF growth of CdTe crystal Okano Y, Kondo H, Kishimoto W, Li L, Dost S |
1720 - 1725 |
Heat treatment in semi-closed ampoule for obtaining stoichiometrically controlled cadmium telluride Zha M, Bissoli F, Zappettini A, Zuccalli G, Zanotti L, Paorici C |
1726 - 1730 |
Photoluminescence study on compensating defects in CdTe : Al Song SH, Wang J, Ishikawa Y, Seto S, Isshiki M |
1731 - 1735 |
Growth and characterization of SPR-ZnS bulk crystal Yoneta M, Ichino K, Yoshino K, Saito H, Ohishi M, Kobayashi H |
1736 - 1740 |
Numerical methods for industrial vertical Bridgman growth of (Cd,Zn)Te Lin K, Boschert S, Dold P, Benz KW, Kriessl O, Schmidt A, Siebert KG, Dziuk G |
1741 - 1744 |
Modelling of the growth of ternary compound cadmium zinc telluride (in a semi-open Markov-like system) from the binary sources CdTe and ZnTe Sanghera HK, Cantwell BJ, Brinkman AW |
1745 - 1751 |
Optimization of VGF-growth of GaAs crystals by the aid of numerical modelling Muller G, Birkmann B |
1752 - 1756 |
The axial and radial segregation due to the thermo-convection, the decrease of the melt in the ampoule and the effect of the precrystallization-zone in the semiconductor crystals grown in a Bridgman-Stockbarger system in a low gravity environment Mihailovici MM, Balint AM, Balint S |
1757 - 1761 |
Numerical study of 3D unsteady melt convection during indu strial-scale CZ Si-crystal growth Evstratov IY, Kalaev VV, Zhmakin AI, Makarov YN, Abramov AG, Ivanov NG, Korsakov AB, Smirnov EM, Dornberger E, Virbulis J, Tomzig E, von Ammon W |
1762 - 1768 |
Factors affecting the isotherm shape of semi-transparent BaF2 crystals grown by Bridgman method Barvinschi F, Bunoiu O, Nicoara I, Nicoara D, Santailler JL, Duffar T |
1769 - 1772 |
Numerical study of interface shape control in the VGF growth of compound semiconductor crystal Okano Y, Kondo H, Dost S |
1773 - 1778 |
Octahedral void defects in Czochralski silicon Itsumi M |
1779 - 1784 |
Numerical study of transport phenomena in the THM growth of compound semiconductor crystal Okano Y, Nishino S, Ohkubo S, Dost S |
1785 - 1790 |
Effects of rotating magnetic fields on temperature and oxygen distributions in silicon melt Kakimoto K |
1791 - 1796 |
Electrical measurements on molten TiO2 using a floating zone furnace Katsumata T, Shiina T, Shibasaki M, Matsuo T |
1797 - 1801 |
Density of molten calcium fluoride Jingu S, Chen XM, Nishimura S, Oyama Y, Terashima K |
1802 - 1805 |
Magnetic field-induced alignment of steel microstructures Maruta K, Shimotomai M |
1806 - 1812 |
Effect of foreign particles: a comprehensive understanding of 3D heterogeneous nucleation Liu XY |
1813 - 1817 |
Crystal nucleation and growth in binary phase-field theory Granasy L, Borzsonyi T, Pusztai T |
1818 - 1824 |
Characteristic lengthscales of step bunching in KDP crystal growth: in situ differential phase-shifting interferometry study Booth NA, Chernov AA, Vekilov PG |
1825 - 1830 |
Particle ordering at the initial stage of colloidal crystallization: implication for non-classical dynamic behavior Ishikawa M, Morimoto H, Maekawa T |
1831 - 1834 |
Drop experiments on crystallization of InGaSb semiconductor Hayakawa Y, Balakrishnan K, Komatsu H, Murakami N, Nakamura T, Koyama T, Ozawa T, Okano Y, Miyazawa M, Dost S, Dao LH, Kumagawa M |
1835 - 1839 |
Crystallization from a molten zone and pendant drop under supercooling conditions Kimura H, Miyazaki A |
1840 - 1843 |
Containerless crystallization of silicon Kuribayashi K, Aoyama T |
1844 - 1848 |
Bridgman growth of detached GeSi crystals Volz MP, Schweizer M, Kaiser N, Cobb SD, Vujisic L, Motakef S, Szofran FR |
1849 - 1853 |
Buoyant-thermocapillary and pure thermocapillary convective instabilities in Czochralski systems Schwabe D |
1854 - 1858 |
Non-invasive techniques for observing the surface behavior of molten silicon Hibiya T, Nakamura S, Sumiji M, Azami T |
1859 - 1863 |
Growth of homogeneous mixed crystals of In0.3Ga0.7As by the traveling liquidus-zone method Kinoshita K, Hanaue Y, Nakamura H, Yoda S, Iwai M, Tsuru T, Muramatsu Y |
1864 - 1869 |
Coarsening dynamics in off-critically quenched binary systems under microgravity conditions Enomoto Y |
1870 - 1875 |
Three-dimensional GSMAC-FEM simulations of the deformation process and the flow structure in the floating zone method Kohno H, Tanahashi T |
1876 - 1880 |
Mathematical simulation of the traveling heater method growth of ternary semiconductor materials under suppressed gravity conditions Lent B, Dost S, Redden RF, Liu Y |
1881 - 1885 |
Three-dimensional analysis of flow and segregation control by slow rotation for Bridgman crystal growth in microgravity Lan CW, Tu CY |
1886 - 1891 |
Features of mass transfer for the laminar melt flow along the interface Bykova SV, Golyshev VD, Gonik MA, Tsvetovsky VB, Frjazinov IV, Marchenko MP |
1892 - 1897 |
Self-assembled Ge quantum dots on Si and their applications Wang KL, Liu JL, Jin G |
1898 - 1903 |
Ordering and self-organized growth of Si in the Si/SiO2 superlattice system Lockwood DJ, Grom GF, Fauchet PM, Tsybeskov L |
1904 - 1908 |
Proof of kinetic influence in Ge nanowire formation on Si(113) Sumitomo K, Zhang Z, Omi H, Bottomley DJ, Ogino T |
1909 - 1914 |
Crystallization of fine silicon particles from silicon monoxide Mamiya M, Kikuchi M, Takei H |
1915 - 1919 |
Development of ballistic electron cold cathode by a low-temperature processing of polycrystalline silicon films Ichihara T, Honda Y, Aizawa K, Komoda T, Koshida N |
1920 - 1925 |
Unexpected room temperature growth of silicon dioxide crystallites on passivated porous silicon Stolyarova S, El-Bahar A, Nemirovsky Y |
1926 - 1930 |
Mass production of multiwalled carbon nanotubes by hydrogen arc discharge Ando Y, Zhao XL, Inoue S, Iijima S |
1931 - 1936 |
Vapor phase preparation of super-elastic carbon micro-coils Chen X, Motojima S, Iwanga H |
1937 - 1941 |
Magnetoresistance in carbon micro-coils annealed at various temperatures Fujii M, Matsui M, Motojima S, Hishikawa Y |
1942 - 1945 |
Formation of ultrafine platinum particles in an aqueous solution with a surfactant Hahakura S, Isoda S, Ogawa T, Moriguchi S, Kobayashi T |
1946 - 1950 |
Fabrication and structural control of nano-structured thin films by solid-state reaction of compositionally modulated multilayers Matsui T, Tsuda H, Mabuchi H, Morii K |
1951 - 1955 |
Composition dependence of constituent phase of Fe-Si thin film prepared by MOCVD Akiyama K, Ohya S, Konuma S, Numata K, Funakubo H |
1956 - 1960 |
Structural observation of Mn silicide islands on Si(111) 7 x 7 surface with UHV-TEM Zhang Q, Takeguchi M, Tanaka M, Furuya K |
1961 - 1965 |
Formation of beta-FeSi2 thin films using laser ablation Komuro S, Katsumata T, Morikawa T, Kokai H, Zhao X, Aoyagi Y |
1966 - 1970 |
Growth evolution of beta-FeSi2 layers grown by Sb mediated reactive deposition epitaxy Makiuchi S, Koga T, Arakawa T, Tomoda W, Maeda Y, Saito K, Tatsuoka H, Kuwabara H |
1971 - 1975 |
Crystal growth of beta-FeSi2 by temperature gradient solution growth method using Zn solvent Udono H, Takaku S, Kikuma I |
1976 - 1980 |
Single-crystal growth of binary and ternary rare earth silicides Behr G, Loser W, Bitterlich H, Graw G, Souptel D, Sampathkumaran EV |
1981 - 1985 |
Liquid phase growth of bulk beta-FeSi2 single crystals using Sb solvent Kuramoto M, Nose Y, Momose Y, Saito K, Tatsuoka H, Kuwabara H |
1986 - 1992 |
Cu-based multinary compounds and their crystal growth: synthesis processes, phase diagrams and control of vapor pressures Matsushita H, Katsui A, Takizawa T |
1993 - 1999 |
Molecular beam epitaxial growth and characterization of CuInSe2 and CuGaSe2 for device applications Niki S, Yamada A, Hunger R, Fons PJ, Iwata K, Matsubara K, Nishio A, Nakanishi H |
2000 - 2004 |
ZnGeP2 growth: melt non-stoichiometry and defect substructure Verozubova GA, Gribenyukov AI, Korotkova VV, Vere AW, Flynn CJ |
2005 - 2008 |
Structural properties of Cu(Ga1-xInx)(y)S-z bulk alloys Kato T, Hayashi S, Kiuchi T, Ishihara Y, Nabetani Y, Matsumoto T |
2009 - 2013 |
Single-crystal growth and optical properties of undoped and Ce3+ doped CaGa2S4 Hidaka C, Takizawa T |
2014 - 2018 |
Lattice dynamics of the chalcopyrite and defect stannite phases in the Cu-(In, Ga)-Se system Nomura S, Endo S |
2019 - 2022 |
Growth and band gap of the filled tetrahedral semiconductor LiMgN Kuriyama K, Nagasawa K, Kushida K |
2023 - 2027 |
Visualization of light dispersion and structural phase transitions with light figures Yamamoto N, Mamedov N, Shinohara T, Kunie A |
2028 - 2034 |
Heteroepitaxy - new challenges and opportunities for materials engineering through molecular beam epitaxy Ploog KH |
2035 - 2040 |
Self-organized growth of nanosized flat dots and vertical magnetic Co pillars on Au(111) Fruchart O, Renaud G, Deville JP, Barbier A, Scheurer F, Klaua M, Barthel J, Noblet M, Ulrich O, Mane-Mane J, Kirschner J |
2041 - 2045 |
Collision processes between sputtered particles on high speed rotating substrate and atomic mass dependence of sticking coefficient Obara K, Fu ZX, Arima M, Yamada T, Fujikawa T, Imamura N, Terada N |
2046 - 2049 |
Thin-film epitaxial growth of the Heusler alloy Cu2AlMn Bach H, Westerholt K, Geiersbach U |
2050 - 2054 |
Preparation of superconducting epitaxial thin films of transition metal nitrides on silicon wafers by molecular beam epitaxy Inumaru K, Okamoto H, Yamanaka S |
2055 - 2060 |
Epitaxial growth of Se100-xTex alloy films deposited on (100) surfaces of KI and KBr Nagashima S |
2061 - 2064 |
Growth characteristics of CaxCd1-xF2 films on Si substrates using CaF2 buffer layer Kambayashi H, Gotoh T, Maeda H, Tsutsui K |
2065 - 2070 |
Crystal growth and evaporation of a triphenylboroxine thin film Irie S, Sakamoto A, Ukeda S, Tokunaga Y, Isa K, Sasaki T, Sakurai K |
2071 - 2075 |
Monolayer and bilayer formation of 17,19-dotetracontadiyne at a liquid/solid interface Takajo D, Fujiwara E, Irie S, Nemoto T, Isoda S, Ozaki H, Toda N, Tomii S, Magara T, Mazaki Y, Yamamoto G |
2076 - 2081 |
Structural relationship between epitaxially grown para-sexiphenyl and mica (001) substrates Plank H, Resel R, Andreev A, Sariciftci NS, Sitter H |
2082 - 2090 |
Study of impurity segregation, crystallinity, and detector performance of melt-grown cadmium zinc telluride crystals Schieber M, Schlesinger TE, James RB, Hermon H, Yoon H, Goorsky M |
2091 - 2097 |
Growth of highly oriented LiNbO3 thin films through structure controlled metal alkoxide precursor solution Hirano S, Takeichi Y, Sakamoto W, Yogo T |
2098 - 2103 |
Facet formation during fiber pulling from the melt Epelbaum BM, Hofmann D |
2104 - 2106 |
High-quality crystal growth of organic nonlinear optical crystal DAST Tsunesada F, Iwai T, Watanabe T, Adachi H, Yoshimura M, Mori Y, Sasaki T |
2107 - 2111 |
Stability of detached-grown germanium single crystals Schweizer M, Volz MP, Cobb SD, Vujisic L, Motakef S, Szoke J, Szofran FR |
2112 - 2115 |
Influence of pressure control on the growth of bulk GaN single crystal using a Na flux Onda M, Iwahashi T, Okamoto M, Yap YK, Yoshimura M, Mori Y, Sasaki T |
2116 - 2120 |
Plasma characteristics of a multi-cusp plasma-sputter-type ion source for thin film formation of gallium nitride Flauta R, Kasuya T, Ohachi T, Wada M |
2121 - 2124 |
Growth of Ca2Si layers on Mg2Si/Si(111) substrates Matsui H, Kuramoto M, Ono T, Nose Y, Tatsuoka H, Kuwabara H |
2125 - 2129 |
Preparation of (Bi, Sb)(2)S-3 semiconductor films by photochemical deposition method Sasaki H, Shibayama K, Ichimura M, Masui K |
2130 - 2135 |
Some aspects of the importance of metastable zone width and nucleation in industrial crystallizers Ulrich J, Strege C |
2136 - 2141 |
Growth behaviour of crystals formed by primary nucleation on different crystalliser scales Westhoff GM, Butler BK, Kramer HJM, Jansens PJ |
2142 - 2147 |
Effects of operating variables on the induction period of CaCl2-Na2CO3 system Tai CY, Chien WC |
2148 - 2152 |
Analysis of nucleation of zeolite A from clear solutions Marui Y, Irie R, Takiyama H, Uchida H, Matsuoka M |
2153 - 2159 |
The effect of additives on the co-crystallisation of calcium with barium sulphate Hennessy AJB, Graham GM |
2160 - 2165 |
An assessment of the formation of electrodeposited scales using scanning electron and atomic force microscopy Morizot AP, Neville A, Taylor JD |
2166 - 2171 |
Removal of carbon dioxide by reactive crystallization in a scrubber-kinetics of barium carbonate crystals Chen PC, Kou KL, Tai HK, Jin SL, Lye CL, Lin CY |
2172 - 2177 |
Scale formation of ice from electrolyte solutions on a scraped surface heat exchanger plate Vaessen RJC, Himawan C, Witkamp GJ |
2178 - 2182 |
The effect of isotopic substitution of deuterium for hydrogen on the morphology of products precipitated from synthetic Bayer solutions Loh JSC, Watling HR, Parkinson GM |
2183 - 2187 |
Crystallization phenomena of magnesium ammonium phosphate (MAP) in a fluidized-bed-type crystallizer Hirasawa I, Kaneko S, Kanai Y, Hosoya S, Okuyama K, Kamahara T |
2188 - 2193 |
Secondary nucleation due to crystal-impeller and crystal-vessel collisions by population balances in CFD-modelling Liiri M, Koiranen T, Aittamaa J |
2194 - 2198 |
Relationship between growth rate and supercooling in the formation of ice lenses in a glass powder Watanabe K |
2199 - 2204 |
Wet calcining of trona (sodium sesquicarbonate) and bicarbonate in a mixed solvent Gartner RS, Witkamp GJ |
2205 - 2214 |
Controlling factor of polymorphism in crystallization process Kitamura M |
2215 - 2220 |
Molecular modelling of the crystallization of polymorphs. Part I: The morphology of HMX polymorphs ter Horst JH, Kramer HJM, van Rosmalen GM, Jansens PJ |
2221 - 2226 |
Polymorphic transformation of DL-methionine crystals in aqueous solutions Yamanobe M, Takiyama H, Matsuoka M |
2227 - 2232 |
X-ray and vibrational spectroscopic study on polymorphism of trielaidin Dohi K, Kaneko F, Kawaguchi T |
2233 - 2239 |
Dissolution and phase transition of pharmaceutical compounds Garcia E, Hoff C, Veesler S |
2240 - 2245 |
Crystal growth of drug materials by spherical crystallization Szabo-Revesz P, Hasznos-Nezdei M, Farkas B, Goczo H, Pintye-Hodi K, Eros I |
2246 - 2250 |
Axial dispersion in a Kureha Crystal Purifier (KCP) Otawara K, Matsuoka T |
2251 - 2256 |
Influences of reflux ratio on separation and purification of acrylic acid by inclined column crystallizer Funakoshi K, Uchida H, Takiyama H, Matsuoka M |
2257 - 2263 |
Dynamic modeling and simulation of eutectic freeze crystallization Himawan C, Vaessen RJC, Kramer HJM, Seckler MM, Witkamp GJ |
xviii - xix |
Proceedings of the thirteenth International Conference on Crystal Growth in conjunction with the Eleventh International Conference on Vapor Growth and Epitaxy Kyoto, Japan, 30 July-4 August 2001 - Editors' preface Hibiya T, Mullin JB, Uwaha M |