Journal of Crystal Growth
Journal of Crystal Growth, Vol.230, No.3-4 Entire volume, number list
ISSN: 0022-0248 (Print)
In this Issue (53 articles)
IX - IX |
Gallium nitride EGW-4: 2000 - Proceedings of the Fourth European Workshop on Gallium Nitride Nottingham, UK, 2-5 July 2000 - Preface Orton J, Harrison I, Foxon T |
341 - 345 |
Lateral confined epitaxy of GaN layers on Si substrates Zamir S, Meyler B, Salzman J |
346 - 350 |
Selective area growth of GaN microstructures on patterned (111) and (001) Si substrates Honda Y, Kawaguchi Y, Ohtake Y, Tanaka S, Yamaguchi M, Sawaki N |
351 - 356 |
Enhanced two-dimensional growth of MOVPE InN films on sapphire (0001) substrates Yamamoto A, Adachi M, Hashimoto A |
357 - 360 |
Thermally induced stress in GaN layers with regard to film coalescence Einfeldt S, Bottcher T, Figge S, Hommel D |
361 - 367 |
In situ optical monitoring of AlGaN thickness and composition during MOVPE growth of AlGaN/GaN microwave HFETs Balmer RS, Pickering C, Kier AM, Birbeck JCH, Saker M, Martin T |
368 - 371 |
Optical and electrical properties of Be doped GaN bulk crystals Suski T, Litwin-Staszewska E, Perlin P, Wisniewski P, Teisseyre H, Grzegory I, Bockowski M, Porowski S, Saarinen K, Nissila J |
372 - 376 |
Hydrogen and nitrogen ambient effects on epitaxial growth of GaN by hydride vapour phase epitaxy Aujol E, Trassoudaine A, Siozade L, Pimpinelli A, Cadoret R |
377 - 380 |
Influence of growth parameters on crack density in thick epitaxially lateral overgrown GaN layers by hydride vapor phase epitaxy Wang CX, Chung HYA, Seyboth M, Kamp M, Ebeling KJ, Beccard R, Heuken M |
381 - 386 |
Defect and stress relaxation in HVPE-GaN films using high temperature reactively sputtered AlN buffer Paskova T, Valcheva E, Birch J, Tungasmita S, Persson POA, Paskov PP, Evtimova S, Abrashev M, Monemar B |
387 - 391 |
Reduction of threading dislocations in migration enhanced epitaxy grown GaN with N-polarity by use of AlN multiple interlayer Kusakabe K, Kishino K, Kikuchi A, Yamada T, Sugihara D, Nakamura S |
392 - 397 |
Growth of AlN films on SiC substrates by RF-MBE and RF-MEE Teraguchi N, Suzuki A, Saito Y, Yamaguchi T, Araki T, Nanishi Y |
398 - 404 |
Microstructure and composition analysis of group III nitrides by X-ray scattering Fewster PF, Andrew NL, Foxon CT |
405 - 409 |
Study of group-III binary and ternary nitrides using X-ray absorption fine structure measurements Katsikini M, Paloura EC, Antonopoulos J, Bressler P, Moustakas TD |
410 - 414 |
Profiling band structure in GaN devices by electron holography Cherns D, Mokhtari H, Jiao CG, Averbeck R, Riechert H |
415 - 420 |
A structural study of phase transitions within GaN layers grown by low-temperature molecular beam epitaxy Marlafeka S, Bock N, Cheng TS, Novikov SV, Winser AJ, Harrison I, Foxon CT, Brown PD |
421 - 425 |
MBE growth of cubic AlyGa1-yN/GaN heterostructures structural, vibrational and optical properties As DJ, Frey T, Bartels M, Lischka K, Goldhahn R, Shokhovets S, Tabata A, Fernandez JRL, Leite JR |
426 - 431 |
Hexagonal AlN films grown on nominal and off-axis Si(001) substrates Lebedev V, Jinschek J, Krausslich J, Kaiser U, Schroter B, Richter W |
432 - 437 |
Ab initio study of the effect of doping on stacking faults in GaN Chisholm JA, Bristowe PD |
438 - 441 |
Chemical mapping of InGaN MQWs Sharma N, Tricker D, Thomas P, Bougrioua Z, Jacobs K, Cheyns J, Moerman I, Thrush T, Considine L, Boyd A, Humphreys C |
442 - 447 |
Evidence of free carrier concentration gradient along the c-axis for undoped GaN single crystals Frayssinet E, Knap W, Krukowski S, Perlin P, Wisniewski P, Suski T, Grzegory I, Porowski S |
448 - 453 |
Indium content determination related with structural and optical properties of InGaN layers Pereira S, Correia MR, Monteiro T, Pereira E, Soares MR, Alves E |
454 - 458 |
Ion implantation effects on the microhardness and microstructure of GaN Kavouras P, Katsikini M, Vouroutzis N, Lioutas CB, Paloura EC, Antonopoulos J, Karakostas T |
459 - 461 |
Absorption spectra of GaN: film characterization by Urbach spectral tail and the effect of electric field Jacobson MA, Konstantinov OV, Nelson DK, Romanovskii SO, Hatzopoulos Z |
462 - 466 |
Polar optical phonon scattering and negative Kromer-Esaki-Tsu differential conductivity in bulk GaN Bulutay C, Ridley BK, Zakhleniuk NA |
467 - 472 |
Spectrally resolved electroluminescence microscopy and mu-electroluminescence investigation of GaN-based LEDs Xia R, Xu H, Harrison I, Beaument B, Andrianov A, Dods SRA, Morgan JM, Larkins EC |
473 - 476 |
Photoluminescence of InGaN/GaN multiple quantum wells grown by mass transport Pozina G, Bergman JP, Monemar B, Iwaya M, Nitta S, Amano H, Akasaki I |
477 - 480 |
Photoluminescence study of homoepitaxial N-polar GaN grown on differently misoriented single crystal substrates Kirilyuk V, Zauner ARA, Christianen PCM, Weyher JL, Hageman PR, Larsen PK |
481 - 486 |
Luminescence studies of defects and piezoelectric fields in InGaN/GaN single quantum wells Henley SJ, Bewick A, Cherns D, Ponce FA |
487 - 491 |
Magneto-photoluminescence of AlGaN/GaN quantum wells Shields PA, Nicholas RJ, Grandjean N, Massies J |
492 - 496 |
Charge storage and screening of the internal field in GaN/AlGaN quantum wells Traetta G, Di Carlo A, Reale A, Lugli P, Lomascolo M, Passaseo A, Cingolani R, Bonfiglio A, Berti M, Napolitani E, Natali M, Sinha SK, Drigo AV |
497 - 502 |
Industrial production of GaN and InGaN-light emitting diodes on SiC-substrates Zehnder U, Weimar A, Strauss U, Fehrer M, Hahn B, Lugauer HJ, Harle V |
503 - 506 |
Emission studies of InGaN layers and LEDs grown by plasma-assisted MBE Laukkanen P, Lehkonen S, Uusimaa P, Pessa M, Seppala A, Ahlgren T, Rauhala E |
507 - 511 |
Influence of strain on growth mode and electro-optical properties of high-brightness InGaN-LEDs on SiC Baur J, Strauss U, Bruederl G, Eisert D, Oberschmid R, Hahn B, Lugauer HJ, Bader S, Zehnder U, Fehrer M, Harle V |
512 - 516 |
GaN-based lasers on SiC: influence of mirror reflectivity on L-I characteristics Schwegler V, Schad SS, Scherer M, Kamp M, Ulu G, Emsley M, Unlu MS, Lell A, Bader S, Hahne B, Lugauer HJ, Kuhn F, Weimar A, Harle V |
517 - 521 |
Spatially and spectrally resolved measurement of optical loss in InGaN laser structures Summers HD, Smowton PM, Blood P, Dineen M, Perks RM, Bour DP, Kneissel M |
522 - 526 |
Analysis of the threshold current in nitride-based lasers Hangleiter A, Heppel S, Off J, Kuhn B, Scholz F, Bader S, Hahn B, Harle V |
527 - 532 |
Blue emission from arsenic doped gallium nitride Winser AJ, Harrison I, Novikov SV, Davis CS, Campion R, Cheng TS, Foxon CT |
533 - 536 |
Growth of strain-compensated GaInNAs/GaAsP quantum wells for 1.3 mu m lasers Li W, Turpeinen J, Melanen P, Savolainen P, Uusimaa P, Pessa M |
537 - 543 |
AlGaN-based UV photodetectors Monroy E, Calle F, Pau JL, Munoz E, Omnes F, Beaumont B, Gibart P |
544 - 548 |
AlGaN photodetectors grown on Si(111) by molecular beam epitaxy Pau JL, Monroy E, Munoz E, Naranjo FB, Calle F, Sanchez-Garcia MA, Calleja E |
549 - 553 |
Multiple-step annealing for 50% enhanced p-conductivity of GaN Chung HYA, Pelzmann A, Drechsler M, Scherer M, Schwegler V, Seyboth M, Kirchner C, Kamp M |
554 - 557 |
Characterization of etched facets for GaN-based lasers Scherer M, Schwegler V, Seyboth M, Eberhard F, Kirchner C, Kamp M, Ulu G, Unlu MS, Gruhler R, Hollricher O |
558 - 563 |
Investigation of metal-GaN and metal-AlGaN contacts by XPS depth profiles and by electrical measurements Dumont J, Monroy E, Munoz E, Caudano R, Sporken R |
564 - 568 |
Investigation of Ni/Au-contacts on p-GaN annealed in different atmospheres Mistele D, Fedler F, Klausing H, Rotter T, Stemmer J, Semchinova OK, Aderhold J |
569 - 572 |
A comparison of commercial sources of epitaxial material for GaN HFETs fabrication Wallis RH, Davies RA, Jones SK, Beanland R, Phillips WA |
573 - 578 |
Material optimisation for AlGaN/GaN HFET applications Bougrioua Z, Moerman I, Sharma N, Wallis RH, Cheyns J, Jacobs K, Thrush EJ, Considine L, Beanland R, Farvacque JL, Humphreys C |
579 - 583 |
Electrical characterisation of AlGaN/GaN heterostructure wafers for high-power HFETs Uren MJ, Lee D, Hughes BT, Parmiter PJM, Birbeck JC, Balmer R, Martin T, Wallis RH, Jones SK |
584 - 589 |
Defect reduction in GaN epilayers and HFET structures grown on (0001)sapphire by ammonia MBE Webb JB, Tang H, Bardwell JA, Moisa S, Peters C, MacElwee T |
590 - 595 |
Impedance spectroscopy analysis of AlGaN/GaN HFET structures Paszkiewicz B |
596 - 601 |
Experimental and theoretical investigations of the electrical properties of undoped and magnesium-doped GaN layers Nguyen ND, Germain M, Schmeits M, Evrard R, Schineller B, Heuken M |
602 - 606 |
Electrical properties of photoanodically generated thin oxide films on n-GaN Rotter T, Ferretti R, Mistele D, Fedler F, Klausing H, Stemmer J, Semchinova OK, Aderhold J, Graul J |
607 - 610 |
Polarization induced 2D hole gas in GaN/AlGaN heterostructures Hackenbuchner S, Majewski JA, Zandler G, Vogl P |