Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.8, No.10 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (50 articles)

B51 - B54	Inhibition effect of hydroxamic and phosphonic acids Langmuir-Blodgett films on iron corrosion in sodium perchlorate solution Rigo T, Miko A, Telegdi J, Lakatos-Varsanyi M, Shaban A, Kalman E
B55 - B59	Passive layer cracking studies performed on A95056 aluminum alloy by DEIS and acoustic emission Darowicki K, Orlikowski J, Arutunow A, Jurczak W
B60 - B63	Use of ionic liquids for the electrochemical characterization of water transport in organic coatings Simoes AM, Tallman DE, Bierwagen GP
D31 - D34	Diffusion-limited growth of FTO-nanofilm-coated tin fractals Bera D, Patil S, Scammon K, Seal S
E67 - E69	Nonlinear electrical properties of grain boundaries in oxygen ion conductors - Modeling the varistor behavior Meyer R, Guo X, Waser R
F37 - F39	Comparison between Hf-silicate films deposited by ALD with BDMAS [SiH2(N(CH3)(2)] and TDMAS [SiH(N(CH3)(2))(3)] precursors Kamiyama S, Miura T, Nara Y
F40 - F42	High-k nanomixed HfxAlyOz film capacitors grown on Ru metal electrodes by atomic layer deposition Seong NJ, Yoon SG, Yeom SJ, Woo HK, Kil DS, Roh JS, Sohn HC
F43 - F46	Surface chemistry and nanoscale characterizations of multiferroic BiFeO3 thin films Lee YH, Wu JM, Chen YC, Lu YH, Lin HN
H83 - H86	Fabrication and field emission characteristics of highly ordered titanium oxide nanodot arrays Chen PL, Huang WJ, Chang JK, Kuo CT, Pan FM
H87 - H89	One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems Iker F, Andre N, Pardoen T, Raskin JP
J21 - J23	Composition dependence of the energy barrier for lithium diffusion in amorphous WO3 Gracia L, Garcia-Canadas J, Garcia-Belmonte G, Beltran A, Andres J, Bisquert J
J24 - J26	Emission intensity and degradation processes of Alq(3) films Baldacchini G, Baldacchini T, Pace A, Pode RB
A489 - A491	Self-organized Pt/SnO2 electrocatalysts on multiwalled carbon nanotubes Waki K, Matsubara K, Ke K, Yamazaki Y
A492 - A494	Hydrophobization of carbon-supported catalysts with 2,3,4,5,6-pentafluorophenyl moieties for fuel cells Xu ZQ, Qi ZG, Kaufman A
A495 - A499	Electrochemical capacitor of MnFe2O4 with NaCl electrolyte Kuo SL, Wu NL
A500 - A503	Lithium insertion and extraction of cobalt vanadium oxide Hibino M, Ozawa N, Murakami T, Nakamura M, Yao T
A504 - A508	Dual ion-beam-assisted deposition as a method to obtain low loading-high performance electrodes for PEMFCs Gulla AF, Saha MS, Allen RJ, Mukerjee S
A509 - A512	Effects of PAA-NH4 addition on the dispersion property of aqueous LiCoO2 slurries and the cell performance of As-prepared LiCoO2 cathodes Li CC, Lee JT, Lo CY, Wu MS
A513 - A515	Measurement of anion diffusion and transference numbers in an anhydrous proton conducting electrolyte Lott KF, Ghosh BD, Ritchie JE
A516 - A520	Chemical vapor deposited silicon/graphite compound material as negative electrode for lithium-ion batteries Holzapfel M, Buqa H, Krumeich F, Novak P, Petrat FM, Veit C
A521 - A524	In situ Raman scattering measurements of a LiMn2O4 single crystal microelectrode Shi QF, Takahashi Y, Akimoto J, Stefan IC, Scherson DA
A525 - A527	Ceria incorporation into YSZ columnar nanostructures Saraf L, Matson DW, Shutthanandan V, Wang CM, Marina O, Thevuthasan S
A528 - A530	Photoelectrochemical solar cells based on polyterthiophenes containing Porphyrins using ionic liquid electrolyte Chen J, Officer DL, Pringle JM, MacFarlane DR, Too CO, Wallace GG
A531 - A533	Direct solid oxide fuel cell operation using a dimethyl ether/air fuel mixture Murray EP, Harris SJ, Liu J, Barnett SA
A534 - A538	Electrochemical hydrogen storage characteristics of thin film Mg (X, X = Sc, Ti, V, Cr) compounds Niessen RAH, Notten PHL
A539 - A543	Alkaline cation intercalation into graphite used as a conducting material in nickel electrode of aqueous secondary batteries Morishita M, Kobayakawa K, Sato Y
A544 - A548	A unique structure of Ni(III) in LiNi0.3Co0.7O2 without Jahn-Teller distortion Mansour AN, Croguennec L, Delmas C
A549 - A553	Effect of transient hydrogen evolution/oxidation reactions on the OCV of direct methanol fuel cells Ye Q, Zhao TS, Liu JG
A554 - A557	Synthesis and electrochemical properties of Li0.44MnO2 as a novel 4 V cathode material Akimoto J, Awaka J, Takahashi Y, Kijima N, Tabuchi M, Nakashima A, Sakaebe H, Tatsumi K
C131 - C133	Well-aligned silicon nanograss fabricated by hydrogen plasma dry etching Yang MC, Shieh J, Hsu CC, Cheng TC
C134 - C137	Electrochemical synthesis of SnHPO4/H3PO3 on Pt and forming SnP2O7 Ho WH, Yen SK
C138 - C140	Electrochemical deposition of titanium oxide on boron-doped diamond electrodes Manivannan A, Spataru N, Arihara K, Fujishima A
C141 - C144	Direct physical casting of the mesostructure in lyotropic liquid crystalline media by electroless deposition Yamauchi Y, Yokoshima T, Momma T, Osaka T, Kuroda K
C145 - C147	Growth and density time dependence of electroless Cu films deposited onto Au using Cu-EDTA-HCHO bath Hasan NM, Filho SGD, Schwarzacher W
C148 - C150	Galvanic deposition of nanostructured noble-metal films on silicon Song YY, Gao ZD, Kelly JJ, Xia XH
C151 - C154	Electrochemical nucleation of copper on ruthenium - Effect of Cl-, PEG, and SPS Zheng M, Willey M, West AC
C155 - C159	Effects of B2H6 pretreatment on ALD of W film using a sequential supply of WF6 and SiH4 Kim SH, Hwang ES, Kim BM, Lee JW, Sun HJ, Hong TE, Kim JK, Sohn H, Kim J, Yoon TS
G251 - G253	Visible light emission from porous silicon prepared by photoetching in alkaline solution Adachi S, Tomioka K
G254 - G257	Synthesis of Si-Ge oxide nanowires via the transformation of Si-Ge thin films with self-assembled Au catalysts He JH, Wu TH, Hsin CL, Chen LJ, Wang ZL
G258 - G260	Trilayer wafer passivation structure for (100) oriented silicon Pun AF, Wang X, Durbin SM, Zheng JP
G261 - G264	Impact of metal gate deposition method on characteristics of gate-first MOSFET with Hf-silicate Song SC, Lee BH, Zhang Z, Choi K, Bae SH, Zeitzoff P
G265 - G267	High-thermal-stability and low-resistance p-GaN contact for thin-GaN light emitting diodes structure Lin CL, Wang SJ, Liu CY
G268 - G270	A dynamic study for wafer-level bonding strength uniformity in low-temperature wafer bonding Zhang XX, Raskin JP
G271 - G274	Integration of dual metal gate CMOS on high-k dielectrics utilizing a metal wet etch process Zhang ZB, Song SC, Huffman C, Hussain MM, Barnett J, Moumen N, Alshareef HN, Majhi P, Sim JH, Bae SH, Lee BH
G275 - G279	Fabrication of freestanding GaN micromechanical structures on silicon-on-insulator substrates Shah MA, Vicknesh S, Wang LS, Arokiaraj J, Ramam A, Chua SJ, Tripathy S
G280 - G282	Formation of high-quality Ag-based ohmic contact to p-type GaN for UV LEDs using a tin-zinc oxide interlayer Hong HG, Hong WK, Ban KY, Lee T, Seong TY, Song JO, Ferguson IT, Kwak JS
G283 - G285	Electrochemical dissolution of Ta and TaN diffusion barrier materials Du B, Suni II
G286 - G289	A study of process-induced oxygen updiffusion in pseudomorphic boron-doped sub-50 nm SiGeC layers grown by LPCVD Enicks D, Oleszek G
G290 - G293	Localized lateral growth of single-walled carbon nanotubes for field-effect transistors by a cobalt-mix-TEOS method Chen BH, Lo PY, Wei JH, Tsai MJ, Hwang CL, Chao TS, Lin HC, Huang TY
G294 - G296	Interstitial oxygen incorporation into silicon substrate during plasma enhanced atomic layer deposition of Al2O3 Kim H, Jeon WS, Jung SH, Ahn BT