Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.14, No.3 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (26 articles)

E5 - E7	Multimetallic Electrocatalysts of Pt, Ru, and Ir Supported on Anatase and Rutile TiO2 for Oxygen Evolution in an Acid Environment Fuentes RE, Farell J, Weidner JW
F1 - F3	Electrochemical Behavior of the Hexafluorouranate Anion in 1-Butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)amide Room Temperature Ionic Liquid Kanatani T, Matsumoto K, Nohira T, Hagiwara R
P5 - P8	Effect of Postdeposition Oxidation and Subsequent Reduction Annealing on Electric and Optical Properties of Amorphous ZnO-SnO2 Transparent Conducting Films Wang CH, Chen SW, Wu JM, Wei CN, Bor HY
P9 - P11	Anisotropy of Magnetization and Nanocrystalline Texture in Electrodeposited CeO2 Films Fernandes V, Schio P, Mossanek RJO, de Oliveira AJA, Ortiz WA, Demaille D, Vidal F, Zheng Y, Fichtner P, Amaral L, Abbate M, Varalda J, Schreiner WH, Mosca DH
S1 - S1	N-2-Based Thermal Passivation of Porous Silicon to Achieve Long-Term Optical Stability (vol 13, pg H428, 2010) James TD, Lai MF, Parish G, Musca CA, Keating AJ
A25 - A28	Experimental Studies of Mediator-Enhanced Polymer Electrolyte Supercapacitors Zhou JJ, Yin YJ, Mansour AN, Zhou XY
A29 - A31	Improved Mechanical Integrity of ALD-Coated Composite Electrodes for Li-Ion Batteries Riley LA, Cavanagh AS, George SM, Lee SH, Dillon AC
B35 - B37	The Mechanism of H2S Poisoning Ni/YSZ Electrode Studied by Impedance Spectroscopy Li TS, Wang WG
B38 - B40	Preparation of MEA with the Polybenzimidazole Membrane for High Temperature PEM Fuel Cell Cho YH, Kim SK, Kim TH, Cho YH, Lim JW, Jung N, Yoon WS, Lee JC, Sung YE
D23 - D25	Highly Oriented VO2 Thin Films Prepared by Electrodeposition Cezar AB, Graff IL, Rikers Y, Schreiner WH, Mattoso N
D26 - D29	CVD of Pure Copper Films from Amidinate Precursor Krisyuk V, Aloui L, Prud'homme N, Sysoev S, Senocq F, Samelor D, Vahlas C
D30 - D32	Direct Preparation of 1.35-eV-Bandgap CuO:S Film by Chemical Bath Deposition Izaki M, Yamane Y, Sasano J, Shinagawa T, Inoue M
D33 - D35	Fabrication of Ultrathin Nb Nanopin Arrays Son JY, Shin YS, Shin YH, Jang HM
J13 - J15	Photoconductive Gain and Low-Frequency Noise Characteristics of ZnO Nanorods Peng SM, Su YK, Ji LW, Young SJ, Tsai CN, Wu CZ, Chao WC, Cheng WB, Huang CJ
J16 - J18	Photoluminescence Characteristics of Ca(9)Ln(PO4)(7):Tb3+ (Ln(3+) = Y3+,La3+,Gd3+) under VUV Excitation Zhang F, Wang YH, Zhang J, Liu BT, Wen Y, Tao Y
K17 - K19	Preparation and Electrochemistry of Boron-Doped Diamond Nanoparticles on Glassy Carbon Electrodes Cunci L, Cabrera CR
H107 - H109	Changes to Charge and Defects in Dielectrics from Ion and Photon Fluences during Plasma Exposure Ren H, Nishi Y, Shohet JL
H110 - H113	Enhanced Detection of Copper Impurity in Silicon Wafer by Dynamic Secondary Ion Mass Spectrometry Koh SF, Lim WL, Tou TY
H114 - H116	Influence of H2O Dipole on Subthreshold Swing of Amorphous Indium-Gallium-Zinc-Oxide Thin Film Transistors Chung WF, Chang TC, Li HW, Chen CW, Chen YC, Chen SC, Tseng TY, Tai YH
H117 - H119	Self-Aligned Gate-First In0.7Ga0.3As n-MOSFETs with an InP Capping Layer for Performance Enhancement Gong XA, Ivana, Chin HC, Zhu Z, Lin YR, Ko CH, Wann CH, Yeo YC
H120 - H123	Improved Light Extraction of GaN-Based Green Light-Emitting Diodes with an Antireflection Layer of ZnO Nanorod Arrays Kang JW, Oh MS, Choi YS, Cho CY, Park TY, Tu CW, Park SJ
H124 - H127	Tuning the Crystallization Temperature of Amorphous Ge2Sb2Te5 by O and Si Recoil Implantation Carria E, Mio AM, Gibilisco S, Miritello M, Grimaldi MG, Rimini E
H128 - H131	Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films Wang LY, Liu B, Song ZT, Liu WL, Feng SL, Huang D, Babu SV
H132 - H134	RF Sputtered Low-Resistivity and High-Transmittance Indium Gallium Zinc Oxide Films for Near-UV Applications Chang HJ, Huang KM, Chen SF, Huang TH, Wu MC
H135 - H138	Influence of Nanocrystals on Resistive Switching Characteristic in Binary Metal Oxides Memory Devices Tsai YT, Chang TC, Lin CC, Chen SC, Chen CW, Sze SM, Yeh FS, Tseng TY
H139 - H141	Depth Profiling of La2O3/HfO2 Stacked Dielectrics for Nanoelectronic Device Applications Alshareef HN, Mure S, Majhi P, Quevedo-Lopez MA