화학공학소재연구정보센터

Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.10, No.5 Entire volume, number list
ISSN: 1099-0062 (Print) 

In this Issue (31 articles)

E7 - E10 Variation of mechanical properties of TiO2 during Li insertion
Lindstrom H, Dericioglu A, Kamei M, Kagawa Y
B81 - B86 Measurement of oxygen exchange kinetics on thin-film La0.6Sr0.4CoO3-delta using nonlinear electrochemical impedance spectroscopy
Wilson JR, Sase M, Kawada T, Adler SB
B87 - B90 The effect of sn addition on a Pt/C electrocatalyst synthesized by borohydride reduction and hydrothermal treatment for a low-temperature fuel cell
Lim DH, Choi DH, Lee WD, Park DR, Lee HI
B91 - B95 Mitigation of highly resistive grain-boundary phase in gadolinia-doped ceria by the addition of SrO
Kim DK, Cho PS, Lee JH, Kim DY, Park HM, Auchterlonie G, Drennan J
B96 - B100 Mediated enzyme electrodes with combined micro- and nanoscale supports
Barton SC, Sun YH, Chandra B, White S, Hone J
C35 - C38 Inhibition of filiform corrosion on AA6111-T4 using in-coating phenylphosphonic acid
Coleman AJ, McMurray HN, Williams G, Afseth A, Scamans GM
C39 - C43 Pitting of Al-based amorphous-nanocrystalline alloys with solute-lean nanocrystals
Lucente AM, Scully JR
C44 - C46 Fabrication of freestanding metallic micro hollow tubes by template-free localized electrochemical deposition
Seol SK, Kim JT, Je JH, Hwu Y, Margaritondo G
D43 - D46 Selectivity enhancement of electroless Co deposition for Cu capping process via spontaneous diazonium ion reduction
Chang SY, Wan CC, Wang YY
D47 - D50 Reactive ion etching of Ge2Sb2Te5 in CHF3/O-2 plasma for nonvolatile phase-change memory device
Feng GM, Liu B, Song ZT, Feng SL, Chen B
D51 - D54 Electroenhanced metallorganic chemical vapor deposition of copper films
Kuo L, Lee C, Chen G, Liu KL, Yen YW
F13 - F17 Double-walled carbon nanotube electrodes for electrochemical sensing
Punbusayakul N, Talapatra S, Ci L, Surareungchai W, Ajayan PM
F18 - F21 Electrochemical reduction of oxygen on multiwalled carbon nanotube modified glassy carbon electrodes in acid media
Alexeyeva N, Tammeveski K
G25 - G28 Properties of Pt/SrBi2Ta2O9/BL/Si MFIS structures containing HfO2, SiO2, and Si3N4 buffer layers
Leu CC, Leu CF, Chien CH, Yang MJ, Huang RH, Lin CH, Hsu FY
G29 - G32 Strain effects on the ferromagnetic and electronic properties in (La-0.91,Sr-0.09)MnO3 thin films
Chen YH, Wu TB
J55 - J57 Improvement of current injection and efficiency of polymer light-emitting diodes with the octadecyltrichlorosilane-treated PEDOT : PSS
Lee YK, Kwon SK, Park TJ, Choo DJ, Kwon JH, Jang J, Jin JK, You H
J58 - J60 Nonenzymatic glucose sensor using freestanding single-wall carbon nanotube films
Wang JX, Sun XW, Cai XP, Lei Y, Song L, Xie SS
J61 - J64 Crystallization of amorphous silicon thin films using self-limiting ALD of nickel oxide
So BS, You YH, Kim KH, Hwang J, Cho W, Lee SS, Chung TM, Lee YK, Kim CG, An KS, Kim YC, Lee YH, Seo WS
J65 - J67 Thermal annealing effect on amorphous silicon thin-film transistors fabricated on a flexible stainless steel substrate
Han CW, Han MK, Paek SH, Kim CD, Chung IJ
J68 - J70 Solvent effect of the passivation layer on performance of an organic thin-film transistor
Han SH, Kim JH, Son YR, Lee KJ, Kim WS, Cho GS, Jang J, Lee SH, Choo DJ
A127 - A129 Nanocrystalline rutile TiO2 electrode for high-capacity and high-rate lithium storage
Jiang CH, Honma I, Kudo T, Zhou HS
A130 - A133 A lithium-ion cell based on Li4/3Ti5/3O4 and LiVPO4F
Barker J, Gover RKB, Burns P, Bryan AJ
A134 - A138 Size-dependent lithium miscibility gap in nanoscale Li1-xFePO4
Meethong N, Huang HYS, Carter WC, Chiang YM
B101 - B104 PEM fuel cell Pt/C dissolution and deposition in nafion electrolyte
Bi W, Gray GE, Fuller TF
H135 - H138 High-performance, spin-coated zinc tin oxide thin-film transistors
Chang YJ, Lee DH, Herman GS, Chang CH
H139 - H141 Reduction of dry etch damage to GaAs using pulse-time modulated plasmas
Khanna R, Stafford L, Pearton SJ, Wang HT, Ren F, Westermann R, Johnson D, Constantine C
H142 - H144 A fabrication method for reduction of silicide contamination in polycrystalline-silicon thin-film transistors
Song NK, Kim YS, Kim MS, Han SH, Joo SK
H145 - H148 Surface activation using remote plasma for hydrophilic bonding at elevated temperature
Belford RE, Sood S
H149 - H152 Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O
Fedorenko Y, Swerts J, Maes JW, Tois E, Haukka S, Wang CG, Wilk G, Delabie A, Deweerd W, De Gendt S
H153 - H155 Electrochemical formation of size-controlled InP nanostructures using anodic and cathodic reactions
Sato T, Fujino T, Hashizume T
H156 - H159 Enhancement of hole injection in organic TFTs by ozone treatment of indium tin oxide electrodes
Cho JH, Lee HS, Hwang M, Choi HH, Kim WK, Lee JL, Cho K