E7 - E10 |
Variation of mechanical properties of TiO2 during Li insertion Lindstrom H, Dericioglu A, Kamei M, Kagawa Y |
B81 - B86 |
Measurement of oxygen exchange kinetics on thin-film La0.6Sr0.4CoO3-delta using nonlinear electrochemical impedance spectroscopy Wilson JR, Sase M, Kawada T, Adler SB |
B87 - B90 |
The effect of sn addition on a Pt/C electrocatalyst synthesized by borohydride reduction and hydrothermal treatment for a low-temperature fuel cell Lim DH, Choi DH, Lee WD, Park DR, Lee HI |
B91 - B95 |
Mitigation of highly resistive grain-boundary phase in gadolinia-doped ceria by the addition of SrO Kim DK, Cho PS, Lee JH, Kim DY, Park HM, Auchterlonie G, Drennan J |
B96 - B100 |
Mediated enzyme electrodes with combined micro- and nanoscale supports Barton SC, Sun YH, Chandra B, White S, Hone J |
C35 - C38 |
Inhibition of filiform corrosion on AA6111-T4 using in-coating phenylphosphonic acid Coleman AJ, McMurray HN, Williams G, Afseth A, Scamans GM |
C39 - C43 |
Pitting of Al-based amorphous-nanocrystalline alloys with solute-lean nanocrystals Lucente AM, Scully JR |
C44 - C46 |
Fabrication of freestanding metallic micro hollow tubes by template-free localized electrochemical deposition Seol SK, Kim JT, Je JH, Hwu Y, Margaritondo G |
D43 - D46 |
Selectivity enhancement of electroless Co deposition for Cu capping process via spontaneous diazonium ion reduction Chang SY, Wan CC, Wang YY |
D47 - D50 |
Reactive ion etching of Ge2Sb2Te5 in CHF3/O-2 plasma for nonvolatile phase-change memory device Feng GM, Liu B, Song ZT, Feng SL, Chen B |
D51 - D54 |
Electroenhanced metallorganic chemical vapor deposition of copper films Kuo L, Lee C, Chen G, Liu KL, Yen YW |
F13 - F17 |
Double-walled carbon nanotube electrodes for electrochemical sensing Punbusayakul N, Talapatra S, Ci L, Surareungchai W, Ajayan PM |
F18 - F21 |
Electrochemical reduction of oxygen on multiwalled carbon nanotube modified glassy carbon electrodes in acid media Alexeyeva N, Tammeveski K |
G25 - G28 |
Properties of Pt/SrBi2Ta2O9/BL/Si MFIS structures containing HfO2, SiO2, and Si3N4 buffer layers Leu CC, Leu CF, Chien CH, Yang MJ, Huang RH, Lin CH, Hsu FY |
G29 - G32 |
Strain effects on the ferromagnetic and electronic properties in (La-0.91,Sr-0.09)MnO3 thin films Chen YH, Wu TB |
J55 - J57 |
Improvement of current injection and efficiency of polymer light-emitting diodes with the octadecyltrichlorosilane-treated PEDOT : PSS Lee YK, Kwon SK, Park TJ, Choo DJ, Kwon JH, Jang J, Jin JK, You H |
J58 - J60 |
Nonenzymatic glucose sensor using freestanding single-wall carbon nanotube films Wang JX, Sun XW, Cai XP, Lei Y, Song L, Xie SS |
J61 - J64 |
Crystallization of amorphous silicon thin films using self-limiting ALD of nickel oxide So BS, You YH, Kim KH, Hwang J, Cho W, Lee SS, Chung TM, Lee YK, Kim CG, An KS, Kim YC, Lee YH, Seo WS |
J65 - J67 |
Thermal annealing effect on amorphous silicon thin-film transistors fabricated on a flexible stainless steel substrate Han CW, Han MK, Paek SH, Kim CD, Chung IJ |
J68 - J70 |
Solvent effect of the passivation layer on performance of an organic thin-film transistor Han SH, Kim JH, Son YR, Lee KJ, Kim WS, Cho GS, Jang J, Lee SH, Choo DJ |
A127 - A129 |
Nanocrystalline rutile TiO2 electrode for high-capacity and high-rate lithium storage Jiang CH, Honma I, Kudo T, Zhou HS |
A130 - A133 |
A lithium-ion cell based on Li4/3Ti5/3O4 and LiVPO4F Barker J, Gover RKB, Burns P, Bryan AJ |
A134 - A138 |
Size-dependent lithium miscibility gap in nanoscale Li1-xFePO4 Meethong N, Huang HYS, Carter WC, Chiang YM |
B101 - B104 |
PEM fuel cell Pt/C dissolution and deposition in nafion electrolyte Bi W, Gray GE, Fuller TF |
H135 - H138 |
High-performance, spin-coated zinc tin oxide thin-film transistors Chang YJ, Lee DH, Herman GS, Chang CH |
H139 - H141 |
Reduction of dry etch damage to GaAs using pulse-time modulated plasmas Khanna R, Stafford L, Pearton SJ, Wang HT, Ren F, Westermann R, Johnson D, Constantine C |
H142 - H144 |
A fabrication method for reduction of silicide contamination in polycrystalline-silicon thin-film transistors Song NK, Kim YS, Kim MS, Han SH, Joo SK |
H145 - H148 |
Surface activation using remote plasma for hydrophilic bonding at elevated temperature Belford RE, Sood S |
H149 - H152 |
Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O Fedorenko Y, Swerts J, Maes JW, Tois E, Haukka S, Wang CG, Wilk G, Delabie A, Deweerd W, De Gendt S |
H153 - H155 |
Electrochemical formation of size-controlled InP nanostructures using anodic and cathodic reactions Sato T, Fujino T, Hashizume T |
H156 - H159 |
Enhancement of hole injection in organic TFTs by ozone treatment of indium tin oxide electrodes Cho JH, Lee HS, Hwang M, Choi HH, Kim WK, Lee JL, Cho K |