L5 - L5 |
Visualization of methanol concentration using the electrochromism of nickel oxide (vol 8, pg A277, 2005) Shim HS, Ahn HJ, Seong TY, Park KW |
C85 - C88 |
Evaluation of a novel Cu(I) precursor for chemical vapor deposition Ye DX, Carrow B, Pimanpang S, Bakhru H, Ten Eyck GA, Wang GC, Lu TM |
C89 - C90 |
Nano-laminated ZrO2-Al2O3 films prepared by electrochemical deposition Yao MM, He YD, Wang DR, Gao W |
C91 - C94 |
Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl-WCl4 melt at 250 degrees C Nakajima H, Nohira T, Hagiwara R |
C95 - C97 |
Impurity incorporation during copper electrodeposition in the curvature-enhanced accelerator coverage regime Zhang W, Brongersma SH, Conard T, Wu W, Van Hove M, Vandervorst W, Maex K |
E53 - E55 |
Contribution of the acoustic emission technique to study aluminum behavior in aqueous alkaline solution Bernard J, Boinet M, Chatenet M, Dalard F |
F21 - F24 |
Removal of plasma-modified low-k layer using dilute HF: Influence of concentration Le QT, Baklanov MR, Kesters E, Azioune A, Struyf H, Boullart W, Pireaux JJ, Vanhaelemeersch S |
H55 - H57 |
Synthesis and luminescent properties of MgIn2-xGaxO4 : Eu3+ phosphors Tsai BS, Chang YH, Chen YC |
H58 - H60 |
Fabrication of transparent HfO2(40%)-Gd2O3 : Eu ceramics from nanosized powders Ji YM, Jiang DY, Chen JY, Liao YK, Feng T, Shi JL |
J17 - J19 |
The inherent capacitive behavior of imidazolium-based room-temperature ionic liquids at carbon paste electrode Liu HT, He P, Li ZY, Liu Y, Li J, Zheng LZ, Li JH |
A333 - A336 |
Surface modification of a doped BaCeO3 to function as an electrolyte and as an anode for SOFCs Tomita A, Hibino T, Sano M |
A337 - A340 |
PVD synthesis and characterization of pt-modified molybdenum carbides as potential electrocatalysts Weigert EC, Smith NA, Willis BG, Amorelli A, Chen JG |
A341 - A343 |
Low-temperature processed anode for solid oxide fuel cells Petrovsky V, Suzuki T, Jasinski P, Anderson HU |
A344 - A347 |
Anodic polymerization of vinyl ethylene carbonate in Li-ion battery electrolyte Chen GY, Zhuang GV, Richardson TJ, Liu G, Ross PN |
A348 - A352 |
Characterization of limiting factors in laminar flow-based membraneless microfuel cells Choban ER, Waszczuk P, Kenis PJA |
A353 - A356 |
High specific-energy lead-acid batteries through organic metals Martha SK, Hariprakash B, Gaffoor SA, Trivedi DC, Shukla AK |
A357 - A360 |
Double-layer capacitance of carbide derived carbons in sulfuric acid Chmiola J, Yushin G, Dash RK, Hoffman EN, Fischer JE, Barsoum MW, Gogotsi Y |
A361 - A364 |
Direct observation of the bulk degradation of Li1.1Mn1.9O4 single crystals after high-temperature storage Akimoto J, Takahashi Y, Kijima N |
A365 - A368 |
LiBOB as additive in LiP(F)6-based lithium ion electrolytes Xu K, Zhang SS, Jow TR |
A369 - A372 |
Electrochemical characterization of electrochemically prepared ruthenium oxide/carbon nanotube electrode for supercapacitor application Kim IH, Kim JH, Kim KB |
A373 - A377 |
High capacitance of electrodeposited MnO2 by the effect of a surface-active agent Devaraj S, Munichandraiah N |
G153 - G155 |
Synthesis and formation mechanism of gallium nitride nanotubular structure Lu MC, Chueh YL, Chen LJ, Chou LJ, Hsiao HL, Yang AB |
G156 - G159 |
Fully silicided Ni1-xPtxSi metal gate electrode for p-MOSFETs Lee RTP, Liew SL, Wang WD, Chua EKC, Chow SY, Lai MY, Chi DZ |
G160 - G163 |
Operation mechanism on SiGe/Si/Si PIN diodes explained using numerical simulation Hirose F, Kurita K, Takahashi Y, Mukaida M |
G164 - G166 |
A two-step oxidation mediated condensation process for ultrathin high Ge content SiGe epitaxial films on insulator Mukherjee-Roy M, Agarwal A, Balakumar S, Du AY, Trigg AD, Kumar R, Balasubramanian N, Kwong DL |
G167 - G169 |
Pt/indium tin oxide ohmic contacts to arsenic-doped p-type ZnO layers Kim SH, Maeng JT, Choi CJ, Leem JH, Han MS, Seong TY |
G170 - G171 |
Enhancement of p-GaN conductivity using PECVD SiOx Karouta A, Kappers MJ, Kramer MCJCM, Jacobs B |
G172 - G175 |
Natural lithography of si surfaces using localized anodization and subsequent chemical etching Oide A, Asoh H, Ono S |
G176 - G178 |
Highly sensitive monitoring of Ru etching using optical emission Shamiryan D, Baklanov MR, Boullart W |
G179 - G181 |
Large grain polycrystalline silicon film produced by nano-aluminum-enhanced crystallization of amorphous silicon Cai L, Wang HY, Brown W, Zou M |
G182 - G185 |
Nucleation and adhesion of ALD copper on cobalt adhesion layers and tungsten nitride diffusion barriers Li ZW, Gordon RG, Farmer DB, Lin YB, Vlassak J |