Chemical Reviews

Chemical Reviews, Vol.96, No.4 Entire volume, number list

ISSN: 0009-2665 (Print)

In this Issue (17 articles)

1221 - 1221	Surface-Chemistry - Advances and Technological Impact 1996 Yates JT
1223 - 1235	Modern Surface Science and Surface Technologies - An Introduction Somorjai GA
1237 - 1259	Semiconductor Surface Reconstruction - The Structural Chemistry of 2-Dimensional Surface-Compounds Duke CB
1261 - 1290	Atomically-Resolved Studies of the Chemistry and Bonding at Silicon Surfaces Hamers RJ, Wang YJ
1291 - 1305	Reconstruction of Clean and Adsorbate-Covered Metal-Surfaces Titmuss S, Wander A, King DA
1307 - 1326	High-Resolution Helium Atom Time-of-Flight Spectroscopy of Low-Frequency Vibrations of Adsorbates Hofmann F, Toennies JP
1327 - 1341	Modeling of Surface Processes as Exemplified by Hydrocarbon Reactions Garrison BJ, Kodali PB, Srivastava D
1343 - 1360	Liquid Interfaces Probed by 2nd-Harmonic and Sum-Frequency Spectroscopy Eisenthal KB
1361 - 1390	Mimicking Aspects of Heterogeneous Catalysis - Generating, Isolating, and Reacting Proposed Surface Intermediates on Single-Crystals in Vacuum Bent BE
1391 - 1411	Probing Surface-Reaction Mechanisms Using Chemical and Vibrational Methods - Alkyl Oxidation and Reactivity of Alcohols on Transitions Metal-Surfaces Weldon MK, Friend CM
1413 - 1430	Organic-Reactions at Well-Defined Oxide Surfaces Barteau MA
1431 - 1447	Surface-Structure and Reactivity - Reactions on Face-Centered-Cubic (110)-Metal-Surfaces Involving Adatom-Induced Reconstructions Kiskinova M
1449 - 1475	Chemical-Reactions and Solvation at Liquid Interfaces - A Microscopic Perspective Benjamin I
1477 - 1498	Carbide and Nitride Overlayers on Early Transition-Metal Surfaces - Preparation, Characterization, and Reactivities Chen JG
1499 - 1517	Role of Surface-Chemistry in Semiconductor Thin-Film Processing Ekerdt JG, Sun YM, Szabo A, Szulczewski GJ, White JM
1519 - 1532	Surface-Chemistry in the Chemical-Vapor-Deposition of Electronic Materials Gates SM
1533 - 1554	Formation and Structure of Self-Assembled Monolayers Ulman A