We have developed two simple techniques to impart superhydrophobic properties to the surfaces of microdevices. In the first approach, thin films of a fluoropolymer were spin-coated on the device surfaces followed by an oxygen plasma treatment. By varying the oxygen plasma treatment time, the water contact angles on device surface could be tuned from 120 degrees to 169 degrees. In the second approach, a nanoimprint process was used to create nanostructures on the devices. To fabricate nanoimprint stamps with various feature sizes, nanosphere lithography was employed to produce a monolayer of well-ordered close-packed nanoparticle array on the silicon surfaces. After oxygen plasma trimming, metal deposition and dry etching process, silicon stamps with different nanostructures were obtained. These stamps were used to imprint nanostructures on hydrophobic coatings, such as Teflon, over the device surfaces. The water contact angle as high as 167 degrees was obtained by the second approach. (c) Koninklijke Brill NV, Leiden, 2008