In atmospheric pressure plasma treatments water molecules in the substrate material may disrupt the molecular arrangement in the substrate and thus greatly influence the outcome of the plasma treatment. This paper summarizes the results of our recent studies on how moisture influences the etching, surface chemical modification, crystallinity and aging of aramid, ultrahigh molecular weight polyethylene (UHMWPE), polyamide fibers, and poly(vinyl alcohol) (PVA) films. Overall, a higher moisture regain often results in a greatly enhanced etch rate, less surface chemical composition change, increased near-surface crystallinity, which could lead to a higher surface wettability, higher interfacial shear strength between the fibers and resin, decreased water solubility for PVA films, and delayed hydrophobic recovery of plasma treated fibers. Therefore, it is important to control the moisture contained in the substrate in atmospheric pressure plasma treatments. (C) Koninklijke Brill NV, Leiden, 2012