A novel non-isothermal deposition (NITD) system is developed for electroless plating in this work. This developed system is capable of enhancing the bath deposition rate and stability simultaneously. Although the deposition rate is in opposition to bath stability in a traditional EN system, this conflict is resolved by the developed NITD system. In this study, the effect of the stabilizer on the performance of the NITD electroless nickel (EN) system is investigated, and a mechanism is proposed to explain the outstanding characteristics of the NITD system such that bath stability remains unchanged as the deposition rate increases in the absence of a stabilizer. Bath stability is determined through observation of the precipitate using both laser light scattering and naked eye.