Materials Research Bulletin, Vol.43, No.12, 3537-3542, 2008
Fabrication of ZnO thin films by the photochemical deposition method
ZnO thin films were fabricated by the photochemical deposition (PCD) method. The deposition solution contains ZnSO(4), Na(2)SO(3), Na(2)S(2)O(3) and a small amount of NH(4)OH for pH adjustment. We blew oxygen or oxygen + ozone (O(3)) gas into the solution to increase the dissolved oxygen content and enhance the oxidation reaction. The films were characterized by Auger electron and optical spectroscopy, and a photoelectrochemical (PEC) measurement. On an indium-tin-oxide (ITO) substrate, the films showed high optical transmission in the visible range. In a current-voltage measurement for films on p-Si substrate, the O(3) bubbling sample showed rectification properties and photovoltaic effects. (C) 2008 Elsevier Ltd. All rights reserved.