Plasma Chemistry and Plasma Processing, Vol.29, No.3, 229-240, 2009
Remote Oxygen and Nitrogen Plasma Inactivation of Staphylococcus aureus: Effects and Mechanisms
The distribution of active species in remote oxygen and nitrogen plasma and the germicidal effect (GE) of Staphylococcus aureus on the surface of medical poly(tetrafluoroethylene), polyvinyl chloride and polyethylene terephthalate films, which had been widely used in medical devices, were studied. The results showed that the concentration of electrons and ions decreased rapidly with increasing the distance from the center of induction coil, which approximated to 0 at 40 cm, whereas the concentration of both oxygen and nitrogen radicals reduced slowly, which decreased 20% within 40 cm. Fast etching action on cell membrane by electrons, ions and radicals are primary reasons of oxygen and nitrogen plasma inactivation, which leads to the cellular contents effuse and engender bacteria death, however, the GE of UV radiation in remote plasma is feebleness comparatively. The GE also depends on the oxidation of gas for discharge and the surface characters of material.