Eight new copolymers containing hindered amine (HA) were synthesized by copolymerization of vinyl monomers [styrene (St), methyl methacrylate (MMA)] with new functional monomers produced by reaction of 4-amino-2,2,6,6-tetramethylpiperidine (ATMP) and epoxy compounds containing double bond, and mixture copolymerization of vinyl monomers (St and MMA) with a mixture of ATMP and above epoxy compounds. The structure of these new copolymers were characterized by IR, NMR, and elemental analysis, The properties of these new copolymers were described and their photoprotecting effectiveness examined. Experimental results indicate that they possess high photoprotecting effectiveness comparable to or higher than that of a commercial polymeric HALS "PDS."