Solar Energy Materials and Solar Cells, Vol.74, No.1-4, 373-377, 2002
In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si : H solar cells
Effects of the chamber cleaning on properties of hydrogenated amorphous Si films prepared by catalytic chemical vapor deposition are shown. It is also revealed that the chamber is easily cleaned by atomic H generated on the heated catalyzer from H-2 gas molecules. In situ chamber cleaning using only H-2 gas is applicable to in-line apparatuses for mass production of solar cells, which brings about the reduction of the production cost. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords:catalytic chemical vapor deposition;hot-wire chemical vapor deposition;chamber cleaning;hydrogenated amorphous silicon;solar cells;atomic hydrogen;mass-production apparatus